JP2002241121A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002241121A5 JP2002241121A5 JP2001200895A JP2001200895A JP2002241121A5 JP 2002241121 A5 JP2002241121 A5 JP 2002241121A5 JP 2001200895 A JP2001200895 A JP 2001200895A JP 2001200895 A JP2001200895 A JP 2001200895A JP 2002241121 A5 JP2002241121 A5 JP 2002241121A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- solution
- silicon
- structure according
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 16
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000004094 surface-active agent Substances 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 4
- 230000002209 hydrophobic effect Effects 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- 239000013078 crystal Substances 0.000 claims 1
- 230000003301 hydrolyzing effect Effects 0.000 claims 1
- 230000001105 regulatory effect Effects 0.000 claims 1
- -1 silicon alkoxide Chemical class 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001200895A JP2002241121A (ja) | 2000-07-25 | 2001-07-02 | 細孔を有する構造体の製造方法 |
| US09/910,886 US20020041932A1 (en) | 2000-07-25 | 2001-07-24 | Method of preparing porous materials |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000223642 | 2000-07-25 | ||
| JP2000382545 | 2000-12-15 | ||
| JP2000-223642 | 2000-12-15 | ||
| JP2000-382545 | 2000-12-15 | ||
| JP2001200895A JP2002241121A (ja) | 2000-07-25 | 2001-07-02 | 細孔を有する構造体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002241121A JP2002241121A (ja) | 2002-08-28 |
| JP2002241121A5 true JP2002241121A5 (enExample) | 2004-11-25 |
Family
ID=27344159
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001200895A Pending JP2002241121A (ja) | 2000-07-25 | 2001-07-02 | 細孔を有する構造体の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20020041932A1 (enExample) |
| JP (1) | JP2002241121A (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060110424A1 (en) * | 2000-03-24 | 2006-05-25 | Lyles Mark B | Ceramic and metal compositions |
| JP4497863B2 (ja) * | 2002-08-09 | 2010-07-07 | キヤノン株式会社 | 金属酸化物を含有する膜及びその製造方法 |
| US7618703B2 (en) * | 2003-08-08 | 2009-11-17 | Canon Kabushiki Kaisha | Mesostructured film, mesoporous material film, and production methods for the same |
| WO2005049757A1 (en) * | 2003-11-21 | 2005-06-02 | The University Of Queensland | Silica films and method of production thereof |
| US8734906B2 (en) * | 2003-11-21 | 2014-05-27 | Brismat Inc. | Films and method of production thereof |
| JP4708861B2 (ja) * | 2005-05-25 | 2011-06-22 | キヤノン株式会社 | 電界効果型トランジスタの製造方法 |
| EP1920023A4 (en) * | 2005-05-31 | 2009-08-19 | Xerocoat Inc | METHOD FOR TARGETING THE MORPHOLOGICAL RATIO OF SILICULATE ACID FILMS |
| JP4873142B2 (ja) * | 2005-07-14 | 2012-02-08 | 株式会社豊田中央研究所 | 球状シリカ系メソ多孔体の製造方法 |
| JP2008044825A (ja) * | 2006-08-18 | 2008-02-28 | Mitsubishi Electric Corp | ナノ多孔質材料の形成方法 |
| JP5156256B2 (ja) * | 2007-04-17 | 2013-03-06 | 花王株式会社 | メソポーラスシリカ膜 |
| WO2012038457A1 (en) * | 2010-09-23 | 2012-03-29 | Nanolith Sverige Ab | Manufacture of structures comprising silicon dioxide on a surface |
| CN102408251B (zh) * | 2011-07-25 | 2013-03-27 | 重庆文理学院 | 一种低介电常数介孔氧化硅薄膜材料的制备方法 |
| KR102340755B1 (ko) * | 2013-12-17 | 2021-12-17 | 도쿄엘렉트론가부시키가이샤 | 기판 상의 자가조립 단층 또는 주기적 유기실리케이트의 스핀온 코팅을 위한 시스템 및 방법 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5858457A (en) * | 1997-09-25 | 1999-01-12 | Sandia Corporation | Process to form mesostructured films |
-
2001
- 2001-07-02 JP JP2001200895A patent/JP2002241121A/ja active Pending
- 2001-07-24 US US09/910,886 patent/US20020041932A1/en not_active Abandoned
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103079989B (zh) | 有孔可渗透薄膜及其制备方法 | |
| JPH08511379A (ja) | マイクロマシニングされたセンサ用懸下部材の製造方法 | |
| JP2003031650A5 (enExample) | ||
| CA2233115A1 (en) | Semiconductor substrate and method of manufacturing the same | |
| JP2008505507A5 (enExample) | ||
| CA2192630A1 (en) | Fabrication process and fabrication apparatus of soi substrate | |
| WO2005043266A3 (en) | Variable reluctance fast positioning system and methods | |
| JP2004523896A5 (enExample) | ||
| EP2019081B1 (en) | Boron doped shell for MEMS device | |
| WO2012071940A1 (zh) | 一种细线条的制备方法 | |
| JP2007196376A5 (enExample) | ||
| JPH02122617A (ja) | 電子デバイス用ウエハ，ウエハ用棒状基材および電子デバイス | |
| WO2006019633A2 (en) | Formation of a self-assembled release monolayer in the vapor phase | |
| JP2004006290A5 (ja) | 導電性部材の製造方法及び導電性部材 | |
| GB2458906A (en) | Nanowire manufacture | |
| CN106553993A (zh) | 与cmos工艺兼容的纳米结构制备方法 | |
| WO2002089192A8 (en) | Method of wet etching an inorganic antireflection layer | |
| KR101424329B1 (ko) | 실리카 나노 구조체, 그 제조방법 및 이를 이용한 식각 마스크 | |
| JP2005217370A (ja) | 圧電素子の製造方法 | |
| CN117701373A (zh) | 测序芯片及其制备方法 | |
| JP4830104B2 (ja) | パターン化ハニカム状多孔質体の製造方法 | |
| JP2002055333A5 (enExample) | ||
| JP2005053006A (ja) | 微小成形体の製造方法 | |
| WO2013075405A1 (zh) | 一种制备超细线条的方法 | |
| JP2005060755A5 (enExample) |