JP2002231721A5 - - Google Patents
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- Publication number
- JP2002231721A5 JP2002231721A5 JP2001029807A JP2001029807A JP2002231721A5 JP 2002231721 A5 JP2002231721 A5 JP 2002231721A5 JP 2001029807 A JP2001029807 A JP 2001029807A JP 2001029807 A JP2001029807 A JP 2001029807A JP 2002231721 A5 JP2002231721 A5 JP 2002231721A5
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- JP
- Japan
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Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001029807A JP2002231721A (ja) | 2001-02-06 | 2001-02-06 | 半導体装置 |
US09/964,462 US6888243B2 (en) | 2001-02-06 | 2001-09-28 | Semiconductor device |
TW090128916A TW523932B (en) | 2001-02-06 | 2001-11-22 | Semiconductor device |
KR10-2001-0074141A KR100443855B1 (ko) | 2001-02-06 | 2001-11-27 | 반도체 장치 |
US10/684,437 US7009277B2 (en) | 2001-02-06 | 2003-10-15 | Semiconductor device with improved radiation property |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001029807A JP2002231721A (ja) | 2001-02-06 | 2001-02-06 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2002231721A JP2002231721A (ja) | 2002-08-16 |
JP2002231721A5 true JP2002231721A5 (ja) | 2008-03-21 |
Family
ID=18894112
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001029807A Pending JP2002231721A (ja) | 2001-02-06 | 2001-02-06 | 半導体装置 |
Country Status (4)
Country | Link |
---|---|
US (2) | US6888243B2 (ja) |
JP (1) | JP2002231721A (ja) |
KR (1) | KR100443855B1 (ja) |
TW (1) | TW523932B (ja) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4869546B2 (ja) * | 2003-05-23 | 2012-02-08 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
WO2005001930A1 (en) * | 2003-06-27 | 2005-01-06 | Koninklijke Philips Electronics N.V. | Integrated circuit with an integrated heat sink |
US20050057897A1 (en) * | 2003-09-16 | 2005-03-17 | Shiu Hsiung Ming | Heat dissipating device with heat conductive posts |
KR100675275B1 (ko) | 2004-12-16 | 2007-01-26 | 삼성전자주식회사 | 반도체 장치 및 이 장치의 패드 배치방법 |
JP4591821B2 (ja) * | 2005-02-09 | 2010-12-01 | エルピーダメモリ株式会社 | 半導体装置 |
JP2007134615A (ja) * | 2005-11-14 | 2007-05-31 | Nec Electronics Corp | 半導体装置 |
DE102006000724A1 (de) * | 2006-01-03 | 2007-07-12 | Infineon Technologies Ag | Halbleiterbauteil mit Durchgangskontakten und mit Kühlkörper sowie Verfahren zur Herstellung des Halbleiterbauteils |
JP4533873B2 (ja) * | 2006-08-23 | 2010-09-01 | 株式会社東芝 | 半導体装置およびその製造方法 |
KR100829789B1 (ko) * | 2006-11-29 | 2008-05-16 | 삼성전자주식회사 | 반도체 장치 및 이의 제조 방법 |
FR2919213B1 (fr) * | 2007-07-23 | 2009-08-28 | Commissariat Energie Atomique | Procede de soudure de deux elements entre eux au moyen d'un materiau de brasure |
WO2010134267A1 (ja) * | 2009-05-19 | 2010-11-25 | パナソニック株式会社 | 半導体装置 |
JP5335914B2 (ja) * | 2009-06-29 | 2013-11-06 | 富士通株式会社 | 半導体装置およびその製造方法 |
WO2011037003A1 (ja) * | 2009-09-24 | 2011-03-31 | 国立大学法人東北大学 | 電界効果型トランジスタおよび集積回路 |
EP2400538A1 (en) * | 2010-06-22 | 2011-12-28 | Nxp B.V. | A silicon on insulator structure |
JP5735099B2 (ja) * | 2011-04-01 | 2015-06-17 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法ならびに携帯電話機 |
US9093164B2 (en) * | 2011-11-17 | 2015-07-28 | International Business Machines Corporation | Redundant via structure for metal fuse applications |
US20160141226A1 (en) * | 2014-11-14 | 2016-05-19 | International Business Machines Corporation | Device connection through a buried oxide layer in a silicon on insulator wafer |
CN107039372B (zh) * | 2016-02-04 | 2019-05-28 | 中芯国际集成电路制造(上海)有限公司 | 半导体结构及其形成方法 |
DE102016104256B3 (de) * | 2016-03-09 | 2017-07-06 | Infineon Technologies Ag | Transistorzellen und Kompensationsstruktur aufweisende Halbleitervorrichtung mit breitem Bandabstand |
TWI619212B (zh) | 2016-03-17 | 2018-03-21 | 瑞昱半導體股份有限公司 | 用於半導體裝置之接合線式散熱結構 |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US214400A (en) * | 1879-04-15 | Improvement in fifth-wheels for vehicles | ||
US225759A (en) * | 1880-03-23 | Draft-regulator for harrows | ||
JPS6213063A (ja) * | 1985-07-11 | 1987-01-21 | Nec Corp | 化合物半導体多層集積回路 |
JPH03248458A (ja) | 1990-02-26 | 1991-11-06 | Nec Corp | 半導体集積回路用ポリシリコン抵抗 |
JP2776149B2 (ja) * | 1992-06-15 | 1998-07-16 | 日本電気株式会社 | 半導体集積回路 |
JPH0722583A (ja) * | 1992-12-15 | 1995-01-24 | Internatl Business Mach Corp <Ibm> | 多層回路装置 |
US5457344A (en) * | 1994-03-25 | 1995-10-10 | Bartelink; Dirk J. | Test fixtures for C4 solder-bump technology |
JP3770631B2 (ja) * | 1994-10-24 | 2006-04-26 | 株式会社ルネサステクノロジ | 半導体装置の製造方法 |
US5900668A (en) * | 1995-11-30 | 1999-05-04 | Advanced Micro Devices, Inc. | Low capacitance interconnection |
JP3482779B2 (ja) * | 1996-08-20 | 2004-01-06 | セイコーエプソン株式会社 | 半導体装置およびその製造方法 |
TW377495B (en) * | 1996-10-04 | 1999-12-21 | Hitachi Ltd | Method of manufacturing semiconductor memory cells and the same apparatus |
DE19646369B4 (de) * | 1996-11-09 | 2008-07-31 | Robert Bosch Gmbh | Keramische Mehrlagenschaltung und Verfahren zu ihrer Herstellung |
JPH10198292A (ja) * | 1996-12-30 | 1998-07-31 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
JP3105815B2 (ja) | 1997-03-28 | 2000-11-06 | 日本電気株式会社 | 半導体集積回路装置 |
KR100230428B1 (ko) * | 1997-06-24 | 1999-11-15 | 윤종용 | 다층 도전성 패드를 구비하는 반도체장치 및 그 제조방법 |
JPH1197525A (ja) * | 1997-09-19 | 1999-04-09 | Hitachi Ltd | 半導体装置およびその製造方法 |
US5891797A (en) * | 1997-10-20 | 1999-04-06 | Micron Technology, Inc. | Method of forming a support structure for air bridge wiring of an integrated circuit |
JP3111948B2 (ja) * | 1997-10-31 | 2000-11-27 | 日本電気株式会社 | 半導体集積回路 |
US6034433A (en) * | 1997-12-23 | 2000-03-07 | Intel Corporation | Interconnect structure for protecting a transistor gate from charge damage |
JPH11238734A (ja) * | 1998-02-20 | 1999-08-31 | Nec Corp | 半導体集積回路 |
US6121659A (en) * | 1998-03-27 | 2000-09-19 | International Business Machines Corporation | Buried patterned conductor planes for semiconductor-on-insulator integrated circuit |
JPH11354807A (ja) | 1998-06-10 | 1999-12-24 | Nissan Motor Co Ltd | 半導体装置及びその製造方法 |
JP3147095B2 (ja) * | 1998-07-24 | 2001-03-19 | 日本電気株式会社 | 半導体記憶装置 |
KR100268424B1 (ko) * | 1998-08-07 | 2000-10-16 | 윤종용 | 반도체 장치의 배선 형성 방법 |
JP2974022B1 (ja) * | 1998-10-01 | 1999-11-08 | ヤマハ株式会社 | 半導体装置のボンディングパッド構造 |
JP3534668B2 (ja) * | 1998-11-20 | 2004-06-07 | セイコーインスツルメンツ株式会社 | 半導体集積回路 |
US6246118B1 (en) * | 1999-02-18 | 2001-06-12 | Advanced Micro Devices, Inc. | Low dielectric semiconductor device with rigid, conductively lined interconnection system |
US6307252B1 (en) * | 1999-03-05 | 2001-10-23 | Agere Systems Guardian Corp. | On-chip shielding of signals |
-
2001
- 2001-02-06 JP JP2001029807A patent/JP2002231721A/ja active Pending
- 2001-09-28 US US09/964,462 patent/US6888243B2/en not_active Expired - Fee Related
- 2001-11-22 TW TW090128916A patent/TW523932B/zh not_active IP Right Cessation
- 2001-11-27 KR KR10-2001-0074141A patent/KR100443855B1/ko not_active IP Right Cessation
-
2003
- 2003-10-15 US US10/684,437 patent/US7009277B2/en not_active Expired - Fee Related