JP2001319880A5 - - Google Patents

Download PDF

Info

Publication number
JP2001319880A5
JP2001319880A5 JP2001086935A JP2001086935A JP2001319880A5 JP 2001319880 A5 JP2001319880 A5 JP 2001319880A5 JP 2001086935 A JP2001086935 A JP 2001086935A JP 2001086935 A JP2001086935 A JP 2001086935A JP 2001319880 A5 JP2001319880 A5 JP 2001319880A5
Authority
JP
Japan
Prior art keywords
film
silicon
silicon film
amorphous
crystalline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001086935A
Other languages
English (en)
Japanese (ja)
Other versions
JP3875033B2 (ja
JP2001319880A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001086935A priority Critical patent/JP3875033B2/ja
Priority claimed from JP2001086935A external-priority patent/JP3875033B2/ja
Publication of JP2001319880A publication Critical patent/JP2001319880A/ja
Publication of JP2001319880A5 publication Critical patent/JP2001319880A5/ja
Application granted granted Critical
Publication of JP3875033B2 publication Critical patent/JP3875033B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2001086935A 1994-09-29 2001-03-26 結晶性珪素膜の作製方法 Expired - Fee Related JP3875033B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001086935A JP3875033B2 (ja) 1994-09-29 2001-03-26 結晶性珪素膜の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP25911794 1994-09-29
JP6-259117 1994-09-29
JP2001086935A JP3875033B2 (ja) 1994-09-29 2001-03-26 結晶性珪素膜の作製方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP27170395A Division JP3727387B2 (ja) 1994-09-29 1995-09-26 結晶性珪素膜の作製方法、デバイス、液晶表示装置、薄膜トランジスタおよび電子機器

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2006271004A Division JP4559397B2 (ja) 1994-09-29 2006-10-02 結晶性珪素膜の作製方法、及び薄膜トランジスタの作製方法

Publications (3)

Publication Number Publication Date
JP2001319880A JP2001319880A (ja) 2001-11-16
JP2001319880A5 true JP2001319880A5 (enExample) 2004-09-09
JP3875033B2 JP3875033B2 (ja) 2007-01-31

Family

ID=26543974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001086935A Expired - Fee Related JP3875033B2 (ja) 1994-09-29 2001-03-26 結晶性珪素膜の作製方法

Country Status (1)

Country Link
JP (1) JP3875033B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5123349B2 (ja) * 2010-04-19 2013-01-23 Hoya株式会社 多階調マスクの製造方法

Similar Documents

Publication Publication Date Title
JPH10223532A5 (enExample)
JPH1187243A5 (enExample)
JPH09312260A5 (enExample)
US7452762B2 (en) Thin film transistor and method of fabricating the same
JP2000228361A5 (enExample)
JPH10223533A5 (enExample)
JPH10229048A5 (enExample)
JP2003124114A5 (enExample)
JPH10242476A5 (enExample)
TW201119043A (en) Method of fabricating polysilicon layer, thin film transistor, organic light emitting diode display device including the same, and method of fabricating the same
JPH10135468A5 (enExample)
KR970060525A (ko) 반도체 장치 및 그 제작 방법
RU2009123511A (ru) Стальной лист, имеющий высокую интеграцию плоскостей {222}, и способ его производства
JPH10233529A5 (enExample)
JPH10233365A5 (enExample)
JP2001319880A5 (enExample)
JP2000003875A5 (enExample)
TW200840054A (en) Method of semiconductor thin film crystallization and semiconductor device fabrication
JP2000183360A5 (ja) 半導体装置の作製方法
JPH1050608A5 (enExample)
TW200428664A (en) A thermal plate crystallization method
JPH1187732A5 (enExample)
JP2003318108A5 (enExample)
JP2001352073A5 (enExample)
JP2003163165A5 (enExample)