JP2001196293A - 露光装置及びそれを用いたデバイスの製造方法 - Google Patents

露光装置及びそれを用いたデバイスの製造方法

Info

Publication number
JP2001196293A
JP2001196293A JP2000006489A JP2000006489A JP2001196293A JP 2001196293 A JP2001196293 A JP 2001196293A JP 2000006489 A JP2000006489 A JP 2000006489A JP 2000006489 A JP2000006489 A JP 2000006489A JP 2001196293 A JP2001196293 A JP 2001196293A
Authority
JP
Japan
Prior art keywords
light
optical system
exposure
light source
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000006489A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001196293A5 (enExample
Inventor
Kazuhiro Takahashi
和弘 高橋
Yoshiyuki Nagai
善之 永井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000006489A priority Critical patent/JP2001196293A/ja
Priority to US09/749,926 priority patent/US6744492B2/en
Publication of JP2001196293A publication Critical patent/JP2001196293A/ja
Publication of JP2001196293A5 publication Critical patent/JP2001196293A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000006489A 2000-01-14 2000-01-14 露光装置及びそれを用いたデバイスの製造方法 Pending JP2001196293A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000006489A JP2001196293A (ja) 2000-01-14 2000-01-14 露光装置及びそれを用いたデバイスの製造方法
US09/749,926 US6744492B2 (en) 2000-01-14 2000-12-29 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000006489A JP2001196293A (ja) 2000-01-14 2000-01-14 露光装置及びそれを用いたデバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2001196293A true JP2001196293A (ja) 2001-07-19
JP2001196293A5 JP2001196293A5 (enExample) 2007-03-01

Family

ID=18535012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000006489A Pending JP2001196293A (ja) 2000-01-14 2000-01-14 露光装置及びそれを用いたデバイスの製造方法

Country Status (2)

Country Link
US (1) US6744492B2 (enExample)
JP (1) JP2001196293A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005086172A (ja) * 2003-09-11 2005-03-31 Nikon Corp 積算光量むら計測方法、露光方法、及びデバイス製造方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998006679A1 (fr) * 1996-08-08 1998-02-19 Hitachi Chemical Company, Ltd. Particules de graphite et element secondaire au lithium les utilisant en tant que materiau de cathode
KR100482369B1 (ko) * 2002-09-19 2005-04-13 삼성전자주식회사 조사광의 광에너지 검사장치, 이를 갖는 노광조건조절시스템, 노광조건 검사방법 및 그에 따른 반도체소자제조방법
JP4174307B2 (ja) * 2002-12-02 2008-10-29 キヤノン株式会社 露光装置
JP2004200495A (ja) * 2002-12-19 2004-07-15 Dainippon Screen Mfg Co Ltd 反射防止膜改質装置および反射防止膜改質方法
JP2007024758A (ja) * 2005-07-20 2007-02-01 Tokyo Seimitsu Co Ltd 光学式検査装置及びその照明方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0996908A (ja) * 1995-09-29 1997-04-08 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
JPH09115802A (ja) * 1995-10-16 1997-05-02 Canon Inc 露光方法及び露光装置及びそれを用いたデバイスの製造方法
WO1998048452A1 (en) * 1997-04-18 1998-10-29 Nikon Corporation Method and device for exposure control, method and device for exposure, and method of manufacture of device
JPH11135428A (ja) * 1997-08-27 1999-05-21 Nikon Corp 投影露光方法及び投影露光装置
JP2000182954A (ja) * 1998-12-16 2000-06-30 Asm Lithography Bv リソグラフィ投影装置
JP2002023382A (ja) * 1997-07-25 2002-01-23 Nikon Corp 投影露光装置および投影露光方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4825247A (en) 1987-02-16 1989-04-25 Canon Kabushiki Kaisha Projection exposure apparatus
JP3456597B2 (ja) * 1994-04-14 2003-10-14 株式会社ニコン 露光装置
JP3186011B2 (ja) 1994-06-24 2001-07-11 キヤノン株式会社 投影露光装置及びデバイス製造方法
JP3412981B2 (ja) 1995-08-29 2003-06-03 キヤノン株式会社 投影露光装置および投影露光方法
JPH09129550A (ja) * 1995-08-30 1997-05-16 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
KR100210569B1 (ko) * 1995-09-29 1999-07-15 미따라이 하지메 노광방법 및 노광장치, 그리고 이를 이용한 디바이스제조방법
JPH09320932A (ja) * 1996-05-28 1997-12-12 Nikon Corp 露光量制御方法及び装置
JPH1092722A (ja) * 1996-09-18 1998-04-10 Nikon Corp 露光装置
JPH10116766A (ja) 1996-10-11 1998-05-06 Canon Inc 露光装置及びデバイス製造方法
JP3610175B2 (ja) 1996-10-29 2005-01-12 キヤノン株式会社 投影露光装置及びそれを用いた半導体デバイスの製造方法
JPH1116816A (ja) 1997-06-25 1999-01-22 Nikon Corp 投影露光装置、該装置を用いた露光方法、及び該装置を用いた回路デバイスの製造方法
JPH11251239A (ja) * 1997-12-15 1999-09-17 Nikon Corp 照度分布計測方法、露光方法及びデバイス製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0996908A (ja) * 1995-09-29 1997-04-08 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
JPH09115802A (ja) * 1995-10-16 1997-05-02 Canon Inc 露光方法及び露光装置及びそれを用いたデバイスの製造方法
WO1998048452A1 (en) * 1997-04-18 1998-10-29 Nikon Corporation Method and device for exposure control, method and device for exposure, and method of manufacture of device
JP2002023382A (ja) * 1997-07-25 2002-01-23 Nikon Corp 投影露光装置および投影露光方法
JPH11135428A (ja) * 1997-08-27 1999-05-21 Nikon Corp 投影露光方法及び投影露光装置
JP2000182954A (ja) * 1998-12-16 2000-06-30 Asm Lithography Bv リソグラフィ投影装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005086172A (ja) * 2003-09-11 2005-03-31 Nikon Corp 積算光量むら計測方法、露光方法、及びデバイス製造方法

Also Published As

Publication number Publication date
US6744492B2 (en) 2004-06-01
US20010015798A1 (en) 2001-08-23

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