JP2001068410A5 - - Google Patents
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- Publication number
- JP2001068410A5 JP2001068410A5 JP2000224404A JP2000224404A JP2001068410A5 JP 2001068410 A5 JP2001068410 A5 JP 2001068410A5 JP 2000224404 A JP2000224404 A JP 2000224404A JP 2000224404 A JP2000224404 A JP 2000224404A JP 2001068410 A5 JP2001068410 A5 JP 2001068410A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19935404.9 | 1999-07-30 | ||
| DE19935404A DE19935404A1 (de) | 1999-07-30 | 1999-07-30 | Beleuchtungssystem mit mehreren Lichtquellen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001068410A JP2001068410A (ja) | 2001-03-16 |
| JP2001068410A5 true JP2001068410A5 (US06573293-20030603-C00064.png) | 2007-09-06 |
Family
ID=7916329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000224404A Abandoned JP2001068410A (ja) | 1999-07-30 | 2000-07-25 | 複数の光源を備えた照明系 |
Country Status (5)
Families Citing this family (57)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3193634B2 (ja) * | 1996-05-29 | 2001-07-30 | 第一化学薬品株式会社 | Ｌｄｌコレステロールの定量方法 |
| USRE42065E1 (en) * | 1998-05-05 | 2011-01-25 | Carl Zeiss Smt Ag | Illumination system particularly for microlithography |
| DE19935404A1 (de) * | 1999-07-30 | 2001-02-01 | Zeiss Carl Fa | Beleuchtungssystem mit mehreren Lichtquellen |
| US7142285B2 (en) * | 1998-05-05 | 2006-11-28 | Carl Zeiss Smt Ag | Illumination system particularly for microlithography |
| US6947124B2 (en) * | 1998-05-05 | 2005-09-20 | Carl Zeiss Smt Ag | Illumination system particularly for microlithography |
| US6947120B2 (en) * | 1998-05-05 | 2005-09-20 | Carl Zeiss Smt Ag | Illumination system particularly for microlithography |
| US6859515B2 (en) * | 1998-05-05 | 2005-02-22 | Carl-Zeiss-Stiftung Trading | Illumination system, particularly for EUV lithography |
| US7329886B2 (en) | 1998-05-05 | 2008-02-12 | Carl Zeiss Smt Ag | EUV illumination system having a plurality of light sources for illuminating an optical element |
| WO2002093260A1 (fr) * | 2001-05-11 | 2002-11-21 | Nikon Corporation | Masque et procede de production associe, element optique et procede de production associe, dispositif optique d'eclairage fourni avec ledit element optique et systeme d'exposition |
| JP4174195B2 (ja) * | 2001-05-28 | 2008-10-29 | キヤノン株式会社 | 画像表示装置 |
| JP2003185798A (ja) | 2001-12-13 | 2003-07-03 | Nikon Corp | 軟ｘ線光源装置およびｅｕｖ露光装置ならびに照明方法 |
| US7002164B2 (en) * | 2003-01-08 | 2006-02-21 | Intel Corporation | Source multiplexing in lithography |
| JP2004273245A (ja) * | 2003-03-07 | 2004-09-30 | Canon Inc | 擬似太陽光照射方法および装置 |
| JP4049789B2 (ja) * | 2003-03-28 | 2008-02-20 | 三洋電機株式会社 | 多灯式照明装置及び投写型映像表示装置 |
| DE10317667A1 (de) * | 2003-04-17 | 2004-11-18 | Carl Zeiss Smt Ag | Optisches Element für ein Beleuchtungssystem |
| EP1500981A1 (en) * | 2003-07-23 | 2005-01-26 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US6774366B1 (en) * | 2003-08-07 | 2004-08-10 | The United States Of America As Represented By The Secretary Of The Army | Image integration and multiple laser source projection |
| US7481544B2 (en) | 2004-03-05 | 2009-01-27 | Optical Research Associates | Grazing incidence relays |
| US7277158B2 (en) * | 2004-12-02 | 2007-10-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| DE102004063832B4 (de) | 2004-12-29 | 2010-02-11 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung eines gepulsten Laserstrahls hoher Durchschnittsleistung |
| US7331676B2 (en) * | 2005-02-09 | 2008-02-19 | Coherent, Inc. | Apparatus for projecting a reduced image of a photomask using a schwarzschild objective |
| US7405809B2 (en) * | 2005-03-21 | 2008-07-29 | Carl Zeiss Smt Ag | Illumination system particularly for microlithography |
| US7638780B2 (en) * | 2005-06-28 | 2009-12-29 | Eastman Kodak Company | UV cure equipment with combined light path |
| JP2007150295A (ja) * | 2005-11-10 | 2007-06-14 | Carl Zeiss Smt Ag | ラスタ要素を有する光学装置、及びこの光学装置を有する照射システム |
| TWI285785B (en) * | 2005-11-23 | 2007-08-21 | Benq Corp | Light source apparatus for optical projection system |
| JP4749299B2 (ja) * | 2006-09-28 | 2011-08-17 | 株式会社日立ハイテクノロジーズ | 露光装置、露光方法、及び表示用パネル基板の製造方法 |
| WO2008101664A1 (en) * | 2007-02-20 | 2008-08-28 | Carl Zeiss Smt Ag | Optical element with multiple primary light sources |
| US20080258356A1 (en) | 2007-04-19 | 2008-10-23 | Inbev S.A. | Integrally blow-moulded bag-in-container comprising an inner layer and an outer layer comprising energy absorbing additives, and preform for making it |
| US9919841B2 (en) | 2007-04-19 | 2018-03-20 | Anheuser-Busch Inbev S.A. | Integrally blow-moulded bag-in-container having interface vents opening to the atmosphere at location adjacent to bag's mouth, preform for making it; and processes for producing the preform and bag-in-container |
| US20080257883A1 (en) | 2007-04-19 | 2008-10-23 | Inbev S.A. | Integrally blow-moulded bag-in-container having an inner layer and the outer layer made of the same material and preform for making it |
| US20080259298A1 (en) * | 2007-04-19 | 2008-10-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| GB2457296A (en) * | 2008-02-09 | 2009-08-12 | Apticol Ltd | Optical device e.g. radiant-power-transferring light engine |
| US20100149669A1 (en) * | 2008-12-15 | 2010-06-17 | Nikon Corporation | Method and Apparatus for Combining EUV Sources |
| CH701854A1 (fr) * | 2009-09-17 | 2011-03-31 | Pasan Sa | Dispositif d'éclairage pour l'obtention d'un champ uniformément éclairé. |
| DE102009045694B4 (de) * | 2009-10-14 | 2012-03-29 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
| DE102012203716A1 (de) | 2012-03-09 | 2013-09-12 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithografie sowie optisches System mit einer derartigen Beleuchtungsoptik |
| EP2823360B1 (de) | 2012-03-09 | 2022-06-22 | Carl Zeiss SMT GmbH | Beleuchtungsoptik für die euv-projektionslithografie sowie optisches system mit einer derartigen beleuchtungsoptik |
| US8749179B2 (en) * | 2012-08-14 | 2014-06-10 | Kla-Tencor Corporation | Optical characterization systems employing compact synchrotron radiation sources |
| DE102012218105A1 (de) | 2012-10-04 | 2013-08-14 | Carl Zeiss Smt Gmbh | Vorrichtung zur Einkopplung von Beleuchtungsstrahlung in eine Beleuchtungsoptik |
| US9277634B2 (en) * | 2013-01-17 | 2016-03-01 | Kla-Tencor Corporation | Apparatus and method for multiplexed multiple discharge plasma produced sources |
| DE102013204443A1 (de) | 2013-03-14 | 2014-10-02 | Carl Zeiss Smt Gmbh | Optische Baugruppe zur Lichtleitwerterhöhung |
| DE102013223935A1 (de) | 2013-11-22 | 2015-05-28 | Carl Zeiss Smt Gmbh | Beleuchtungssystem für die EUV-Belichtungslithographie |
| US9835950B2 (en) | 2014-01-27 | 2017-12-05 | Asml Netherland B.V. | Radiation source |
| KR102313345B1 (ko) * | 2014-10-02 | 2021-10-15 | 삼성전자주식회사 | 광대역 광원 및 이를 구비하는 광학 검사장치 |
| DE102014221313A1 (de) | 2014-10-21 | 2016-04-21 | Carl Zeiss Smt Gmbh | Beleuchtung für die EUV-Projektionslithografie |
| TWI701517B (zh) | 2014-12-23 | 2020-08-11 | 德商卡爾蔡司Ｓｍｔ有限公司 | 光學構件 |
| DE102014226918A1 (de) | 2014-12-23 | 2016-06-23 | Carl Zeiss Smt Gmbh | Optische Komponente |
| DE102014226920A1 (de) | 2014-12-23 | 2016-06-23 | Carl Zeiss Smt Gmbh | Optische Komponente |
| DE102014226917A1 (de) | 2014-12-23 | 2015-12-17 | Carl Zeiss Smt Gmbh | Beleuchtungssystem für die EUV-Projektionslithographie |
| DE102014226921A1 (de) | 2014-12-23 | 2016-06-23 | Carl Zeiss Smt Gmbh | Strahlungsquellenmodul |
| DE102015212878A1 (de) | 2015-07-09 | 2017-01-12 | Carl Zeiss Smt Gmbh | Strahlführungsvorrichtung |
| DE102015215216A1 (de) | 2015-08-10 | 2017-02-16 | Carl Zeiss Smt Gmbh | Optisches System |
| DE102015220955A1 (de) | 2015-10-27 | 2015-12-17 | Carl Zeiss Smt Gmbh | Optisches Bauelement |
| US11099483B2 (en) | 2016-05-19 | 2021-08-24 | Nikon Corporation | Euv lithography system for dense line patterning |
| DE102016217426A1 (de) | 2016-09-13 | 2017-08-24 | Carl Zeiss Smt Gmbh | Strahlteiler |
| DE102018212224A1 (de) | 2018-07-23 | 2020-01-23 | Carl Zeiss Smt Gmbh | Vorrichtung zur Rückkopplung von emittierter Strahlung in eine Laserquelle |
| WO2024052300A1 (en) * | 2022-09-09 | 2024-03-14 | Carl Zeiss Smt Gmbh | Illumination system, radiation source apparatus, method for illuminating a reticle, and lithography system |
Family Cites Families (60)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4195913A (en) | 1977-11-09 | 1980-04-01 | Spawr Optical Research, Inc. | Optical integration with screw supports |
| DE2910280C2 (de) | 1978-03-18 | 1993-10-28 | Canon Kk | Optische Abbildungssysteme |
| DE3268933D1 (en) | 1981-06-03 | 1986-03-20 | Hitachi Ltd | Reflection type optical focusing apparatus |
| US4389115A (en) | 1981-08-06 | 1983-06-21 | Richter Thomas A | Optical system |
| US4688932A (en) | 1985-02-12 | 1987-08-25 | Canon Kabushiki Kaisha | Exposure apparatus |
| US4651012A (en) | 1985-03-21 | 1987-03-17 | Martin Marietta Corporation | High brilliance lensless projection system of test patterns |
| US5148442A (en) | 1986-09-30 | 1992-09-15 | The United States Of America As Represented By The Department Of Energy | Dye lasing arrangement including an optical assembly for altering the cross-section of its pumping beam and method |
| US4740276A (en) | 1987-05-08 | 1988-04-26 | The United States Of America As Represented By The Secretary Of The Air Force | Fabrication of cooled faceplate segmented aperture mirrors (SAM) by electroforming |
| US4996441A (en) | 1988-09-16 | 1991-02-26 | Siemens Aktiengesellschaft | Lithographic apparatus for structuring a subject |
| NL8901077A (nl) | 1989-04-28 | 1990-11-16 | Koninkl Philips Electronics Nv | Optische belichtingsstelsel en projectie-apparaat voorzien van een dergelijk stelsel. |
| US5071240A (en) | 1989-09-14 | 1991-12-10 | Nikon Corporation | Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image |
| US5222112A (en) | 1990-12-27 | 1993-06-22 | Hitachi, Ltd. | X-ray pattern masking by a reflective reduction projection optical system |
| US5402267A (en) | 1991-02-08 | 1995-03-28 | Carl-Zeiss-Stiftung | Catadioptric reduction objective |
| JP2997351B2 (ja) * | 1991-08-12 | 2000-01-11 | 旭光学工業株式会社 | 照明光学装置 |
| US5353322A (en) | 1992-05-05 | 1994-10-04 | Tropel Corporation | Lens system for X-ray projection lithography camera |
| JP2946950B2 (ja) | 1992-06-25 | 1999-09-13 | キヤノン株式会社 | 照明装置及びそれを用いた露光装置 |
| US6404482B1 (en) * | 1992-10-01 | 2002-06-11 | Nikon Corporation | Projection exposure method and apparatus |
| JP2698521B2 (ja) | 1992-12-14 | 1998-01-19 | キヤノン株式会社 | 反射屈折型光学系及び該光学系を備える投影露光装置 |
| CZ378092A3 (en) | 1992-12-21 | 1994-06-15 | Miroslav Hanecka | Lighting system for lighting fittings, projection and enlarging apparatus |
| JP2655465B2 (ja) | 1993-01-20 | 1997-09-17 | 日本電気株式会社 | 反射型ホモジナイザーおよび反射型照明光学装置 |
| US5581605A (en) * | 1993-02-10 | 1996-12-03 | Nikon Corporation | Optical element, production method of optical element, optical system, and optical apparatus |
| JP3336664B2 (ja) | 1993-03-10 | 2002-10-21 | セイコーエプソン株式会社 | 投写型表示装置 |
| US5815248A (en) * | 1993-04-22 | 1998-09-29 | Nikon Corporation | Illumination optical apparatus and method having a wavefront splitter and an optical integrator |
| US5439781A (en) * | 1993-05-10 | 1995-08-08 | At&T Corp. | Device fabrication entailing synchrotron radiation |
| US5361292A (en) | 1993-05-11 | 1994-11-01 | The United States Of America As Represented By The Department Of Energy | Condenser for illuminating a ring field |
| US5339346A (en) | 1993-05-20 | 1994-08-16 | At&T Bell Laboratories | Device fabrication entailing plasma-derived x-ray delineation |
| US5677939A (en) | 1994-02-23 | 1997-10-14 | Nikon Corporation | Illuminating apparatus |
| USRE38438E1 (en) | 1994-08-23 | 2004-02-24 | Nikon Corporation | Catadioptric reduction projection optical system and exposure apparatus having the same |
| JPH08179514A (ja) | 1994-12-22 | 1996-07-12 | Canon Inc | 露光装置および露光方法 |
| JPH08179216A (ja) | 1994-12-27 | 1996-07-12 | Nikon Corp | 反射屈折光学系 |
| JP3630807B2 (ja) | 1994-12-28 | 2005-03-23 | キヤノン株式会社 | 走査露光装置及び当該走査露光装置を用いたデバイスの製造方法 |
| JPH08211294A (ja) | 1995-02-02 | 1996-08-20 | Nikon Corp | 投影露光装置 |
| US5512759A (en) | 1995-06-06 | 1996-04-30 | Sweatt; William C. | Condenser for illuminating a ringfield camera with synchrotron emission light |
| US5755503A (en) | 1995-11-13 | 1998-05-26 | Industrial Technology Research Institute | Optical illumination system having improved efficiency and uniformity and projection instrument comprising such a system |
| US5737137A (en) | 1996-04-01 | 1998-04-07 | The Regents Of The University Of California | Critical illumination condenser for x-ray lithography |
| JP3862347B2 (ja) | 1996-04-11 | 2006-12-27 | キヤノン株式会社 | Ｘ線縮小露光装置およびこれを利用したデバイス製造方法 |
| JP3284045B2 (ja) | 1996-04-30 | 2002-05-20 | キヤノン株式会社 | Ｘ線光学装置およびデバイス製造方法 |
| US5963305A (en) | 1996-09-12 | 1999-10-05 | Canon Kabushiki Kaisha | Illumination system and exposure apparatus |
| US6268904B1 (en) * | 1997-04-23 | 2001-07-31 | Nikon Corporation | Optical exposure apparatus and photo-cleaning method |
| JP3259657B2 (ja) | 1997-04-30 | 2002-02-25 | キヤノン株式会社 | 投影露光装置及びそれを用いたデバイスの製造方法 |
| US6064072A (en) * | 1997-05-12 | 2000-05-16 | Cymer, Inc. | Plasma focus high energy photon source |
| US6233039B1 (en) * | 1997-06-05 | 2001-05-15 | Texas Instruments Incorporated | Optical illumination system and associated exposure apparatus |
| JP3888486B2 (ja) * | 1997-07-25 | 2007-03-07 | フジノン株式会社 | 投射型表示装置 |
| JPH1152289A (ja) | 1997-08-05 | 1999-02-26 | Minolta Co Ltd | 二次元照明光学系及びこれを用いた液晶プロジェクター |
| AU9762398A (en) * | 1997-11-10 | 1999-05-31 | Nikon Corporation | Exposure apparatus |
| JP2000091209A (ja) * | 1998-09-14 | 2000-03-31 | Nikon Corp | 露光装置の製造方法、露光装置、及びデバイス製造方法 |
| JP4238390B2 (ja) | 1998-02-27 | 2009-03-18 | 株式会社ニコン | 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法 |
| JPH11251226A (ja) | 1998-03-05 | 1999-09-17 | Nikon Corp | Ｘ線投影露光装置 |
| JPH11271619A (ja) * | 1998-03-19 | 1999-10-08 | Nikon Corp | 照明光学装置および該照明光学装置を備えた露光装置 |
| JPH11316353A (ja) * | 1998-04-30 | 1999-11-16 | Fuji Photo Optical Co Ltd | 投射型表示装置 |
| US6438199B1 (en) | 1998-05-05 | 2002-08-20 | Carl-Zeiss-Stiftung | Illumination system particularly for microlithography |
| DE19935404A1 (de) * | 1999-07-30 | 2001-02-01 | Zeiss Carl Fa | Beleuchtungssystem mit mehreren Lichtquellen |
| EP0955641B1 (de) * | 1998-05-05 | 2004-04-28 | Carl Zeiss | Beleuchtungssystem insbesondere für die EUV-Lithographie |
| US6727980B2 (en) * | 1998-09-17 | 2004-04-27 | Nikon Corporation | Apparatus and method for pattern exposure and method for adjusting the apparatus |
| US6583937B1 (en) | 1998-11-30 | 2003-06-24 | Carl-Zeiss Stiftung | Illuminating system of a microlithographic projection exposure arrangement |
| US6195201B1 (en) | 1999-01-27 | 2001-02-27 | Svg Lithography Systems, Inc. | Reflective fly's eye condenser for EUV lithography |
| JP2000349009A (ja) | 1999-06-04 | 2000-12-15 | Nikon Corp | 露光方法及び装置 |
| DE19931848A1 (de) | 1999-07-09 | 2001-01-11 | Zeiss Carl Fa | Astigmatische Komponenten zur Reduzierung des Wabenaspektverhältnisses bei EUV-Beleuchtungssystemen |
| DE10001291A1 (de) * | 2000-01-14 | 2001-07-19 | Zeiss Carl | Adaptronischer Spiegel |
| US6396068B1 (en) * | 2000-10-02 | 2002-05-28 | Euv Llc | Illumination system having a plurality of movable sources |
-
1999
- 1999-07-30 DE DE19935404A patent/DE19935404A1/de not_active Withdrawn
-
2000
- 2000-07-18 KR KR1020000041019A patent/KR100785824B1/ko not_active IP Right Cessation
- 2000-07-21 EP EP00115730A patent/EP1072957B1/de not_active Expired - Lifetime
- 2000-07-21 DE DE50013897T patent/DE50013897D1/de not_active Expired - Lifetime
- 2000-07-25 JP JP2000224404A patent/JP2001068410A/ja not_active Abandoned
- 2000-07-27 US US09/627,559 patent/US6570168B1/en not_active Expired - Lifetime
-
2003
- 2003-05-05 US US10/429,927 patent/US7071476B2/en not_active Expired - Fee Related
