JP2000508783A - 勾配構造を有する光学部品、および該部品の製造方法 - Google Patents
勾配構造を有する光学部品、および該部品の製造方法Info
- Publication number
- JP2000508783A JP2000508783A JP9535827A JP53582797A JP2000508783A JP 2000508783 A JP2000508783 A JP 2000508783A JP 9535827 A JP9535827 A JP 9535827A JP 53582797 A JP53582797 A JP 53582797A JP 2000508783 A JP2000508783 A JP 2000508783A
- Authority
- JP
- Japan
- Prior art keywords
- matrix phase
- nanoscale particles
- gradient
- particles
- potential difference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0087—Simple or compound lenses with index gradient
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/773—Nanoparticle, i.e. structure having three dimensions of 100 nm or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
- Y10S977/779—Possessing nanosized particles, powders, flakes, or clusters other than simple atomic impurity doping
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/832—Nanostructure having specified property, e.g. lattice-constant, thermal expansion coefficient
- Y10S977/834—Optical properties of nanomaterial, e.g. specified transparency, opacity, or index of refraction
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. 固体マトリックス中に埋込まれたナノスケール粒子によって生じる物質勾 配が存在する、勾配構造を有する光学部品。 2. 液状硬化性マトリックス相中に分散されたナノスケール粒子を、ポテンシ ャル差に基づいてマトリックス相中を移動させ、物質勾配を形成させ、その後、 物質勾配を保持しながらマトリックス相を硬化させる、請求項1に記載の光学部 品を作製する方法。 3. ポテンシャル差が電場を適用することによって生じるものである、請求項 2に記載の方法。 4. ポテンシャル差が、化学的ポテンシャル差であり、好ましくは濃度勾配に よって生じるものである、請求項2に記載の方法。 5. ポテンシャル差が、異なる界面ポテンシャルに基づくものであり、好まし くは(より)親水性のマトリックス相中において疎水性表面基を有するナノスケー ル粒子によって生じるものである、請求項2に記載の方法。 6. ナノスケール粒子が50nm以下、好ましくは20nm以下の直径を有する、請求 項2〜5のいずれか1つに記載の方法。 7. ナノスケール粒子が酸化物、カルコゲナイド、ハ ロゲン化物、炭化物、ヒ化物、アンチモン化物、窒化物、リン化物、リン酸塩、 ケイ酸塩、チタン酸塩、ジルコン酸塩、スズ酸塩、アルミン酸塩および/または 対応する混合酸化物を含む、請求項2〜6のいずれか1つに記載の方法。 8. 液状マトリックス相が、重合可能な有機モノマーおよび/またはオリゴマ ーおよび/またはプレポリマーおよび/または下記一般式(I)または(II)の加水 分解可能なシランおよび/またはそれから誘導される初期縮合物を含む、請求項 2〜7のいずれか1つに記載の方法: SiX4 (I) [式中、基Xは、同一または異なって、加水分解性基または水酸基である]; R1 aR2 BSiX(4-a-b) (II) [式中、R゛は、非加水分解性基であり、R2は、官能基を含む基であり、Xは、 上記と同様であり、aおよびbは、0、1、2または3の値を有し、(a+b)の合計は1、2 または3の値を有する]。 9. 熱的および/または光化学的重合開始剤が液状マトリックス相に混和され 、マトリックス相が熱的および/または光化学的に硬化される、請求項2〜8の いずれか1つに記載の方法。 10. ナノスケール粒子がその中に分散された液状マトリックス相の調製のた めに、 (a)マトリックス形成成分を含む溶液にナノスケール粒子を分散し、その後、溶 媒を除去する;または (b)ナノスケール粒子の存在下にマトリックス相を生じさせる;または (c)マトリックス相の存在下にナノスケール粒子を生じさせる、 のいずれかを行なう、請求項2〜9のいずれか1つに記載の方法。 11. ナノスケール粒子がその中に分散された液状マトリックス相を透明な支 持体に塗布し、物質勾配が形成された後にマトリックス相を熱的および/または 光化学的に硬化させる、請求項2〜10のいずれか1つに記載の方法。 12. ナノスケール粒子がその中に分散された液状マトリックス相を型に入れ 、物質勾配が形成された後にマトリックス相を熱的および/または光化学的に硬 化させる、請求項2〜10のいずれか1つに記載の方法。 13. 物質勾配が、疎水性表面基を有するナノスケール粒子の(より)親水性の マトリックス相/空気界面への移動によってもたらされる、請求項11に記載の 方法。 14. 屈折率の勾配を有する光学レンズを作製するために使用される、請求項 2〜13のいずれか1つに記載の方法。 15. 微小光学部品が、重合によってもたらされる濃度勾配を生み出すときに 、微小構造化方法を使用することにより作製される、請求項2〜13のいずれか 1つに記載の方法。 16. 光学部品が、固体構造物、光伝導性光学層、または勾配層を設けられた 透明な支持体を含む、請求項2〜15のいずれか1つに記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19613645A DE19613645A1 (de) | 1996-04-04 | 1996-04-04 | Optische Bauteile mit Gradientenstruktur und Verfahren zu deren Herstellung |
DE19613645.8 | 1996-04-04 | ||
PCT/EP1997/001678 WO1997038333A1 (de) | 1996-04-04 | 1997-04-03 | Optische bauteile mit gradientenstruktur und verfahren zu deren herstellung |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2000508783A true JP2000508783A (ja) | 2000-07-11 |
JP2000508783A5 JP2000508783A5 (ja) | 2004-12-02 |
JP4320456B2 JP4320456B2 (ja) | 2009-08-26 |
Family
ID=7790554
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53582797A Expired - Lifetime JP4320456B2 (ja) | 1996-04-04 | 1997-04-03 | 勾配構造を有する光学部品、および該部品の製造方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US6236493B1 (ja) |
EP (1) | EP0891565B1 (ja) |
JP (1) | JP4320456B2 (ja) |
CN (1) | CN1091522C (ja) |
AT (1) | ATE204991T1 (ja) |
DE (2) | DE19613645A1 (ja) |
ES (1) | ES2160343T3 (ja) |
WO (1) | WO1997038333A1 (ja) |
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---|---|---|---|---|
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JP2004133473A (ja) * | 2002-10-11 | 2004-04-30 | Eastman Kodak Co | ナノ粒子により誘発された屈折率勾配を有する導波路 |
JP2004269898A (ja) * | 2001-08-30 | 2004-09-30 | Toto Ltd | 光触媒性コーティング剤及び光触媒性複合材並びにその製造方法 |
JP2005077740A (ja) * | 2003-08-29 | 2005-03-24 | Tdk Corp | ホログラム用記録材料、ホログラム用記録媒体、及び、ホログラム用記録材料の製造方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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US6882460B2 (en) * | 2002-08-23 | 2005-04-19 | Energy Conversion Devices, Inc. | Phase angle controlled stationary elements for long wavelength electromagnetic radiation |
DE10302605B4 (de) * | 2003-01-23 | 2006-05-24 | Humboldt-Universität Zu Berlin | Anordnung und Verfahren zum Beugen von Lichtwellen an einer Beugungsstruktur |
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US20050036179A1 (en) * | 2003-08-13 | 2005-02-17 | General Electric Company | Holographic storage medium comprising metal-containing high refractive index region, and storage article containing same |
JP3978729B2 (ja) * | 2003-09-26 | 2007-09-19 | 康生 富田 | ホログラム記録材料組成物及びホログラム記録媒体 |
US20070105050A1 (en) * | 2003-11-05 | 2007-05-10 | Dsm Ip Assets B.V. | Method and apparatus for producing microchips |
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US20050208230A1 (en) * | 2004-03-16 | 2005-09-22 | Fuji Photo Film, Co., Ltd. | Antireflection film, production process of the same, polarizing plate and image displaying apparatus |
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US8836331B2 (en) | 2004-03-25 | 2014-09-16 | Dai Nippon Printing Co., Ltd. | Volume hologram resin composition, surface relief hologram resin composition, and hologram layer, hologram transfer foil and brittle hologram label using the same |
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JP2006134492A (ja) * | 2004-11-08 | 2006-05-25 | Fujinon Corp | 光記録媒体用対物光学系およびこれを用いた光ピックアップ装置 |
US20060105483A1 (en) * | 2004-11-18 | 2006-05-18 | Leatherdale Catherine A | Encapsulated light emitting diodes and methods of making |
DE102004061323A1 (de) | 2004-12-20 | 2006-06-22 | Epg (Engineered Nanoproducts Germany)Gmbh | Optische Komponente aus einem anorganisch-organischen Hybridmaterial zur Herstellung von Brechzahlgradientenschichten mit hoher lateraler Auflösung und Verfahren zu ihrer Herstellung |
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WO2007103310A2 (en) | 2006-03-07 | 2007-09-13 | Qd Vision, Inc. | An article including semiconductor nanocrystals |
US8718437B2 (en) | 2006-03-07 | 2014-05-06 | Qd Vision, Inc. | Compositions, optical component, system including an optical component, devices, and other products |
US9874674B2 (en) | 2006-03-07 | 2018-01-23 | Samsung Electronics Co., Ltd. | Compositions, optical component, system including an optical component, devices, and other products |
US8849087B2 (en) * | 2006-03-07 | 2014-09-30 | Qd Vision, Inc. | Compositions, optical component, system including an optical component, devices, and other products |
CN101529256A (zh) * | 2006-05-25 | 2009-09-09 | I2Ic公司 | 具有不同粒子分布浓度的板的加工方法 |
US7935212B2 (en) * | 2006-07-31 | 2011-05-03 | Essilor International Compagnie | Process for transferring onto a surface of an optical article a layer having a variable index of refraction |
DE102006044312A1 (de) | 2006-09-18 | 2008-03-27 | Nano-X Gmbh | Verfahren zur Beschichtung von Oberflächen und Verwendung des Verfahrens |
US8836212B2 (en) | 2007-01-11 | 2014-09-16 | Qd Vision, Inc. | Light emissive printed article printed with quantum dot ink |
WO2008098069A1 (en) * | 2007-02-06 | 2008-08-14 | Nanodynamics, Inc. | Directed migration of hydrophobic nanomaterials at surfaces |
EP2152788B1 (en) | 2007-05-29 | 2019-08-21 | Tpk Holding Co., Ltd | Surfaces having particles and related methods |
WO2009014707A2 (en) | 2007-07-23 | 2009-01-29 | Qd Vision, Inc. | Quantum dot light enhancement substrate and lighting device including same |
DE102007035387A1 (de) | 2007-07-26 | 2009-01-29 | Leibnitz-Institut für neue Materialien Gemeinnützige GmbH | Verfahren und Vorrichtung zur Herstellung von strukturierten optischen Materialien |
US20090041984A1 (en) * | 2007-08-10 | 2009-02-12 | Nano Terra Inc. | Structured Smudge-Resistant Coatings and Methods of Making and Using the Same |
US8128249B2 (en) | 2007-08-28 | 2012-03-06 | Qd Vision, Inc. | Apparatus for selectively backlighting a material |
JP5115125B2 (ja) * | 2007-10-05 | 2013-01-09 | Tdk株式会社 | ホログラム記録材料及びホログラム記録媒体 |
JP5115137B2 (ja) * | 2007-10-16 | 2013-01-09 | Tdk株式会社 | ホログラム記録媒体 |
KR20100114048A (ko) * | 2007-12-28 | 2010-10-22 | 다우 글로벌 테크놀로지스 인크. | 액정 물질로 침윤된 중합체 나노 입자를 포함하는 위상 보상 필름 |
JP5241853B2 (ja) * | 2007-12-28 | 2013-07-17 | ダウ グローバル テクノロジーズ エルエルシー | 微小機能性材料 |
US9207385B2 (en) | 2008-05-06 | 2015-12-08 | Qd Vision, Inc. | Lighting systems and devices including same |
JP2011524064A (ja) | 2008-05-06 | 2011-08-25 | キユーデイー・ビジヨン・インコーポレーテツド | 量子閉じ込め半導体ナノ粒子を含有する固体照明装置 |
WO2009137053A1 (en) | 2008-05-06 | 2009-11-12 | Qd Vision, Inc. | Optical components, systems including an optical component, and devices |
JP2012500865A (ja) * | 2008-08-21 | 2012-01-12 | イノーバ ダイナミクス インコーポレイテッド | 増強された表面、コーティング、および関連方法 |
EP2233976A1 (en) * | 2009-03-25 | 2010-09-29 | Sony DADC Austria AG | Photopolymerisable system for hologram formation |
JP2011227466A (ja) * | 2010-04-02 | 2011-11-10 | Canon Inc | レンズ及びレンズの製造方法 |
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US9829663B2 (en) | 2014-02-25 | 2017-11-28 | Empire Technology Development Llc | Silicon chip with refractive index gradient for optical communication |
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US10437083B1 (en) | 2014-10-20 | 2019-10-08 | Lockheed Martin Corporation | Individually addressable infrared mask array |
US11465375B2 (en) * | 2015-12-15 | 2022-10-11 | Vadient Optics, Llc | Nanocomposite refractive index gradient variable focus optic |
US9969647B2 (en) | 2016-05-17 | 2018-05-15 | Lockheed Martin Energy, Llc | Glass composites having a gradient index of refraction and methods for production thereof |
US10661476B2 (en) * | 2016-05-19 | 2020-05-26 | Cal Poly Corporation | Porous nanostructures and methods of fabrication |
US9908808B1 (en) | 2016-08-18 | 2018-03-06 | Lockheed Martin Corporation | Ternary glass materials with low refractive index variability |
DE102017214334A1 (de) | 2017-08-17 | 2019-02-21 | Technische Universität Dresden | Multi-Material-Verbund und Verfahren zu dessen Herstellung |
CN112852239A (zh) * | 2020-12-29 | 2021-05-28 | 重庆中防德邦防水技术有限公司 | 一种自主形成梯度分布层的有机/无机复合涂层 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4173475A (en) * | 1977-05-31 | 1979-11-06 | Bell Telephone Laboratories, Incorporated | Latent image thick refractive index recordings |
US4453805A (en) * | 1981-02-19 | 1984-06-12 | Bell Telephone Laboratories, Incorporated | Optical grating using a liquid suspension of dielectric particles |
US4403031A (en) * | 1981-06-25 | 1983-09-06 | Corning Glass Works | Method for providing optical patterns in glass |
US4514053A (en) * | 1983-08-04 | 1985-04-30 | Corning Glass Works | Integral photosensitive optical device and method |
US4627689A (en) * | 1983-12-08 | 1986-12-09 | University Of Pittsburgh | Crystalline colloidal narrow band radiation filter |
US4632517A (en) * | 1983-12-08 | 1986-12-30 | University Of Pittsburgh | Crystalline colloidal narrow band radiation filter |
US4778744A (en) * | 1986-11-21 | 1988-10-18 | Corning Glass Works | Method for providing high-intensity optical patterns in glass |
IL86636A0 (en) * | 1988-06-06 | 1988-11-30 | Israel Atomic Energy Comm | Optical glass elements having a graded refraction index for ir light and method for their production |
US5104210A (en) * | 1989-04-24 | 1992-04-14 | Monsanto Company | Light control films and method of making |
DE3925462A1 (de) * | 1989-08-01 | 1991-02-07 | Fraunhofer Ges Forschung | Verfahren zur photoinitiierten steuerung der anorganischen netzwerkbildung beim sol-gel-prozess |
US5360834A (en) * | 1989-08-01 | 1994-11-01 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Process for photoinitiated control of inorganic network formation in the sol-gel process |
US5100589A (en) * | 1989-12-04 | 1992-03-31 | Lockheed Missiles & Space Company, Inc. | Optical method for altering molecular alignment in selected regions of a non-linear optical polymeric structure |
US5158933A (en) * | 1990-11-15 | 1992-10-27 | Holtz Ronald L | Phase separated composite materials |
US5266238A (en) * | 1990-12-24 | 1993-11-30 | American Cyanamid Company | Narrow band radiation filter films |
US5716679A (en) * | 1991-09-13 | 1998-02-10 | Institut Fur Neue Materialien Gemeinnutzige Gmbh | Optical elements containing nanoscaled particles and having an embossed surface and process for their preparation |
DE4130550A1 (de) * | 1991-09-13 | 1993-03-18 | Inst Neue Mat Gemein Gmbh | Optische elemente und verfahren zu deren herstellung |
DE4133621A1 (de) * | 1991-10-10 | 1993-04-22 | Inst Neue Mat Gemein Gmbh | Nanoskalige teilchen enthaltende kompositmaterialien, verfahren zu deren herstellung und deren verwendung fuer optische elemente |
JP3219437B2 (ja) * | 1991-10-28 | 2001-10-15 | オリンパス光学工業株式会社 | 屈折率分布型光学素子 |
DE69316792T2 (de) * | 1992-06-17 | 1998-05-28 | Nitto Denko Corp | Verfahren zur Herstellung von Polymerisation oder vernetzter Rate-distribuierte Produkte und Verfahren zur Herstellung einer Linse, Linsenanordnung oder Lichtwellenleiter durch dieses Verfahren |
WO1996000969A1 (de) * | 1994-06-29 | 1996-01-11 | Robert Bosch Gmbh | Anisotrop leitender kleber und verfahren zur herstellung eines anisotrop leitenden klebers |
FR2731081B1 (fr) * | 1995-02-27 | 1997-04-11 | Essilor Int | Procede d'obtention d'un article transparent a gradient d'indice de refraction |
US5849373A (en) * | 1996-02-05 | 1998-12-15 | Sandia Corporation | Process for the synthesis of nanophase dispersion-strengthened aluminum alloy |
US5926740A (en) * | 1997-10-27 | 1999-07-20 | Micron Technology, Inc. | Graded anti-reflective coating for IC lithography |
-
1996
- 1996-04-04 DE DE19613645A patent/DE19613645A1/de not_active Withdrawn
-
1997
- 1997-04-03 WO PCT/EP1997/001678 patent/WO1997038333A1/de active IP Right Grant
- 1997-04-03 CN CN97193414A patent/CN1091522C/zh not_active Expired - Lifetime
- 1997-04-03 DE DE59704453T patent/DE59704453D1/de not_active Expired - Lifetime
- 1997-04-03 US US09/155,639 patent/US6236493B1/en not_active Expired - Lifetime
- 1997-04-03 ES ES97919317T patent/ES2160343T3/es not_active Expired - Lifetime
- 1997-04-03 EP EP97919317A patent/EP0891565B1/de not_active Expired - Lifetime
- 1997-04-03 JP JP53582797A patent/JP4320456B2/ja not_active Expired - Lifetime
- 1997-04-03 AT AT97919317T patent/ATE204991T1/de not_active IP Right Cessation
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Also Published As
Publication number | Publication date |
---|---|
DE19613645A1 (de) | 1997-10-09 |
WO1997038333A1 (de) | 1997-10-16 |
JP4320456B2 (ja) | 2009-08-26 |
ES2160343T3 (es) | 2001-11-01 |
ATE204991T1 (de) | 2001-09-15 |
CN1214773A (zh) | 1999-04-21 |
US6236493B1 (en) | 2001-05-22 |
DE59704453D1 (de) | 2001-10-04 |
CN1091522C (zh) | 2002-09-25 |
EP0891565B1 (de) | 2001-08-29 |
EP0891565A1 (de) | 1999-01-20 |
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