JP2000355756A5 - - Google Patents

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Publication number
JP2000355756A5
JP2000355756A5 JP2000115974A JP2000115974A JP2000355756A5 JP 2000355756 A5 JP2000355756 A5 JP 2000355756A5 JP 2000115974 A JP2000115974 A JP 2000115974A JP 2000115974 A JP2000115974 A JP 2000115974A JP 2000355756 A5 JP2000355756 A5 JP 2000355756A5
Authority
JP
Japan
Prior art keywords
layers
pair
coating
layer
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000115974A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000355756A (ja
JP4896287B2 (ja
Filing date
Publication date
Priority claimed from US09/293,965 external-priority patent/US6181727B1/en
Application filed filed Critical
Publication of JP2000355756A publication Critical patent/JP2000355756A/ja
Publication of JP2000355756A5 publication Critical patent/JP2000355756A5/ja
Application granted granted Critical
Publication of JP4896287B2 publication Critical patent/JP4896287B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2000115974A 1999-04-19 2000-04-18 コーティング装置のチャンバ部品の作動温度を低下させるためのコーティング Expired - Fee Related JP4896287B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/293,965 US6181727B1 (en) 1999-04-19 1999-04-19 Coating for reducing operating temperatures of chamber components of a coating apparatus
US09/293965 1999-04-19

Publications (3)

Publication Number Publication Date
JP2000355756A JP2000355756A (ja) 2000-12-26
JP2000355756A5 true JP2000355756A5 (enExample) 2007-06-07
JP4896287B2 JP4896287B2 (ja) 2012-03-14

Family

ID=23131315

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000115974A Expired - Fee Related JP4896287B2 (ja) 1999-04-19 2000-04-18 コーティング装置のチャンバ部品の作動温度を低下させるためのコーティング

Country Status (6)

Country Link
US (1) US6181727B1 (enExample)
EP (1) EP1091017B1 (enExample)
JP (1) JP4896287B2 (enExample)
BR (1) BR0001637A (enExample)
DE (1) DE60041527D1 (enExample)
SG (1) SG84588A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002103092A1 (fr) * 2001-06-14 2002-12-27 Shin-Etsu Handotai Co., Ltd. Dispositif permettant la production d'un monocristal semi-conducteur et procede permettant de produire un monocristal semi-conducteur au moyen de ce dispositif
US6889568B2 (en) * 2002-01-24 2005-05-10 Sensarray Corporation Process condition sensing wafer and data analysis system
RU2217525C1 (ru) * 2002-05-06 2003-11-27 Федеральное государственное унитарное предприятие УРАЛЬСКИЙ ЭЛЕКТРОХИМИЧЕСКИЙ КОМБИНАТ Способ нанесения покрытия, имеющего высокую теплоотражательную способность
US20050100757A1 (en) * 2003-11-12 2005-05-12 General Electric Company Thermal barrier coating having a heat radiation absorbing topcoat
TWI405281B (zh) * 2005-12-13 2013-08-11 Sensarray Corp 製程條件感應晶圓及資料分析系統
US8604361B2 (en) * 2005-12-13 2013-12-10 Kla-Tencor Corporation Component package for maintaining safe operating temperature of components
CA2637943A1 (en) * 2006-01-27 2007-08-02 Fosbel Intellectual Limited Longevity and performance improvements to flare tips
US9677180B2 (en) * 2010-12-30 2017-06-13 Rolls-Royce Corporation Engine hot section component and method for making the same
EP3105509B1 (en) 2014-02-07 2020-08-05 United Technologies Corporation Combustor comprising multi-layer coated panel and method of fabricating an article having multi-layered coating
KR102496476B1 (ko) * 2015-11-19 2023-02-06 삼성전자주식회사 전자기파 반사체 및 이를 포함하는 광학소자
US20180016919A1 (en) * 2016-07-12 2018-01-18 Delavan Inc Thermal barrier coatings with enhanced reflectivity

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5628487A (en) * 1979-08-14 1981-03-20 Tokyo Shibaura Electric Co Heat reflecting plate
JPS60195502A (ja) * 1984-03-19 1985-10-04 Canon Inc 金属回転多面鏡
JPS61219004A (ja) * 1985-03-25 1986-09-29 Canon Inc 多層膜反射鏡
JPS63186875A (ja) * 1987-01-29 1988-08-02 Tadahiro Omi 表面反応成膜装置
JP2927857B2 (ja) * 1990-01-19 1999-07-28 株式会社東芝 基板加熱装置
GB9400323D0 (en) * 1994-01-10 1994-03-09 Pilkington Glass Ltd Coatings on glass
JP3362552B2 (ja) * 1995-03-10 2003-01-07 東京エレクトロン株式会社 成膜処理装置
JP3341619B2 (ja) * 1997-03-04 2002-11-05 東京エレクトロン株式会社 成膜装置
US6021152A (en) * 1997-07-11 2000-02-01 Asm America, Inc. Reflective surface for CVD reactor walls
KR100286325B1 (ko) * 1997-11-27 2001-05-02 김영환 화학기상증착 장비의 가열장치

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