BR0001637A - Revestimento para reduzir as temperaturas de operação dos componentes da câmara de um aparelho de revestimento - Google Patents

Revestimento para reduzir as temperaturas de operação dos componentes da câmara de um aparelho de revestimento

Info

Publication number
BR0001637A
BR0001637A BR0001637-3A BR0001637A BR0001637A BR 0001637 A BR0001637 A BR 0001637A BR 0001637 A BR0001637 A BR 0001637A BR 0001637 A BR0001637 A BR 0001637A
Authority
BR
Brazil
Prior art keywords
coating
reduce
layer
operating temperatures
pair
Prior art date
Application number
BR0001637-3A
Other languages
English (en)
Portuguese (pt)
Inventor
William Randolph Stowell
John Frederick Ackerman
Jeffrey Allen Conner
John Douglas Evans
Antonio Frank Maricocchi
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of BR0001637A publication Critical patent/BR0001637A/pt

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/26—Reflecting filters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
BR0001637-3A 1999-04-19 2000-04-18 Revestimento para reduzir as temperaturas de operação dos componentes da câmara de um aparelho de revestimento BR0001637A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/293,965 US6181727B1 (en) 1999-04-19 1999-04-19 Coating for reducing operating temperatures of chamber components of a coating apparatus

Publications (1)

Publication Number Publication Date
BR0001637A true BR0001637A (pt) 2000-10-31

Family

ID=23131315

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0001637-3A BR0001637A (pt) 1999-04-19 2000-04-18 Revestimento para reduzir as temperaturas de operação dos componentes da câmara de um aparelho de revestimento

Country Status (6)

Country Link
US (1) US6181727B1 (enExample)
EP (1) EP1091017B1 (enExample)
JP (1) JP4896287B2 (enExample)
BR (1) BR0001637A (enExample)
DE (1) DE60041527D1 (enExample)
SG (1) SG84588A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002103092A1 (fr) * 2001-06-14 2002-12-27 Shin-Etsu Handotai Co., Ltd. Dispositif permettant la production d'un monocristal semi-conducteur et procede permettant de produire un monocristal semi-conducteur au moyen de ce dispositif
US6889568B2 (en) * 2002-01-24 2005-05-10 Sensarray Corporation Process condition sensing wafer and data analysis system
RU2217525C1 (ru) * 2002-05-06 2003-11-27 Федеральное государственное унитарное предприятие УРАЛЬСКИЙ ЭЛЕКТРОХИМИЧЕСКИЙ КОМБИНАТ Способ нанесения покрытия, имеющего высокую теплоотражательную способность
US20050100757A1 (en) * 2003-11-12 2005-05-12 General Electric Company Thermal barrier coating having a heat radiation absorbing topcoat
TWI405281B (zh) * 2005-12-13 2013-08-11 Sensarray Corp 製程條件感應晶圓及資料分析系統
US8604361B2 (en) * 2005-12-13 2013-12-10 Kla-Tencor Corporation Component package for maintaining safe operating temperature of components
PL1979677T3 (pl) * 2006-01-27 2013-02-28 Fosbel Intellectual Ltd Ulepszenia trwałości i działania końcówek pochodni
US9677180B2 (en) * 2010-12-30 2017-06-13 Rolls-Royce Corporation Engine hot section component and method for making the same
EP3105509B1 (en) 2014-02-07 2020-08-05 United Technologies Corporation Combustor comprising multi-layer coated panel and method of fabricating an article having multi-layered coating
KR102496476B1 (ko) * 2015-11-19 2023-02-06 삼성전자주식회사 전자기파 반사체 및 이를 포함하는 광학소자
US20180016919A1 (en) * 2016-07-12 2018-01-18 Delavan Inc Thermal barrier coatings with enhanced reflectivity

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5628487A (en) * 1979-08-14 1981-03-20 Tokyo Shibaura Electric Co Heat reflecting plate
JPS60195502A (ja) * 1984-03-19 1985-10-04 Canon Inc 金属回転多面鏡
JPS61219004A (ja) * 1985-03-25 1986-09-29 Canon Inc 多層膜反射鏡
JPS63186875A (ja) * 1987-01-29 1988-08-02 Tadahiro Omi 表面反応成膜装置
JP2927857B2 (ja) * 1990-01-19 1999-07-28 株式会社東芝 基板加熱装置
GB9400323D0 (en) * 1994-01-10 1994-03-09 Pilkington Glass Ltd Coatings on glass
JP3362552B2 (ja) * 1995-03-10 2003-01-07 東京エレクトロン株式会社 成膜処理装置
JP3341619B2 (ja) * 1997-03-04 2002-11-05 東京エレクトロン株式会社 成膜装置
US6021152A (en) * 1997-07-11 2000-02-01 Asm America, Inc. Reflective surface for CVD reactor walls
KR100286325B1 (ko) * 1997-11-27 2001-05-02 김영환 화학기상증착 장비의 가열장치

Also Published As

Publication number Publication date
SG84588A1 (en) 2001-11-20
EP1091017A2 (en) 2001-04-11
JP2000355756A (ja) 2000-12-26
JP4896287B2 (ja) 2012-03-14
US6181727B1 (en) 2001-01-30
DE60041527D1 (de) 2009-03-26
EP1091017B1 (en) 2009-02-11
EP1091017A3 (en) 2003-07-02

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Legal Events

Date Code Title Description
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]

Free format text: INDEFIRO O PRESENTE PEDIDO DE PATENTE COMO INVENCAO - DE ACORDO COM O ART. 8O DA LPI.

B09B Patent application refused [chapter 9.2 patent gazette]

Free format text: MANTIDO O INDEFERIMENTO UMA VEZ QUE NAO FOI APRESENTADO RECURSO DENTRO DO PRAZO LEGAL.