JP4896287B2 - コーティング装置のチャンバ部品の作動温度を低下させるためのコーティング - Google Patents

コーティング装置のチャンバ部品の作動温度を低下させるためのコーティング Download PDF

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Publication number
JP4896287B2
JP4896287B2 JP2000115974A JP2000115974A JP4896287B2 JP 4896287 B2 JP4896287 B2 JP 4896287B2 JP 2000115974 A JP2000115974 A JP 2000115974A JP 2000115974 A JP2000115974 A JP 2000115974A JP 4896287 B2 JP4896287 B2 JP 4896287B2
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Japan
Prior art keywords
layers
coating
pair
layer
refractive index
Prior art date
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Expired - Fee Related
Application number
JP2000115974A
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English (en)
Japanese (ja)
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JP2000355756A (ja
JP2000355756A5 (enExample
Inventor
ウィリアム・ランドルフ・ストウェル
ジョン・フレデリック・アッカーマン
ジェフリー・アレン・コナー
ジョン・ダグラス・エバンス，セニア
アントニオ・フランク・マリコッチ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of JP2000355756A publication Critical patent/JP2000355756A/ja
Publication of JP2000355756A5 publication Critical patent/JP2000355756A5/ja
Application granted granted Critical
Publication of JP4896287B2 publication Critical patent/JP4896287B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/26—Reflecting filters

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
JP2000115974A 1999-04-19 2000-04-18 コーティング装置のチャンバ部品の作動温度を低下させるためのコーティング Expired - Fee Related JP4896287B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/293965 1999-04-19
US09/293,965 US6181727B1 (en) 1999-04-19 1999-04-19 Coating for reducing operating temperatures of chamber components of a coating apparatus

Publications (3)

Publication Number Publication Date
JP2000355756A JP2000355756A (ja) 2000-12-26
JP2000355756A5 JP2000355756A5 (enExample) 2007-06-07
JP4896287B2 true JP4896287B2 (ja) 2012-03-14

Family

ID=23131315

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000115974A Expired - Fee Related JP4896287B2 (ja) 1999-04-19 2000-04-18 コーティング装置のチャンバ部品の作動温度を低下させるためのコーティング

Country Status (6)

Country Link
US (1) US6181727B1 (enExample)
EP (1) EP1091017B1 (enExample)
JP (1) JP4896287B2 (enExample)
BR (1) BR0001637A (enExample)
DE (1) DE60041527D1 (enExample)
SG (1) SG84588A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002103092A1 (fr) * 2001-06-14 2002-12-27 Shin-Etsu Handotai Co., Ltd. Dispositif permettant la production d'un monocristal semi-conducteur et procede permettant de produire un monocristal semi-conducteur au moyen de ce dispositif
US6889568B2 (en) * 2002-01-24 2005-05-10 Sensarray Corporation Process condition sensing wafer and data analysis system
RU2217525C1 (ru) * 2002-05-06 2003-11-27 Федеральное государственное унитарное предприятие УРАЛЬСКИЙ ЭЛЕКТРОХИМИЧЕСКИЙ КОМБИНАТ Способ нанесения покрытия, имеющего высокую теплоотражательную способность
US20050100757A1 (en) * 2003-11-12 2005-05-12 General Electric Company Thermal barrier coating having a heat radiation absorbing topcoat
TWI405281B (zh) * 2005-12-13 2013-08-11 聖斯艾瑞公司 製程條件感應晶圓及資料分析系統
US8604361B2 (en) * 2005-12-13 2013-12-10 Kla-Tencor Corporation Component package for maintaining safe operating temperature of components
KR20080098383A (ko) * 2006-01-27 2008-11-07 포스벨 인터렉츄얼 리미티드 플래어 팁의 수명 및 성능 향상
US9677180B2 (en) * 2010-12-30 2017-06-13 Rolls-Royce Corporation Engine hot section component and method for making the same
WO2015142411A2 (en) 2014-02-07 2015-09-24 United Technologies Corporation Article having multi-layered coating
KR102496476B1 (ko) * 2015-11-19 2023-02-06 삼성전자주식회사 전자기파 반사체 및 이를 포함하는 광학소자
US20180016919A1 (en) * 2016-07-12 2018-01-18 Delavan Inc Thermal barrier coatings with enhanced reflectivity

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5628487A (en) * 1979-08-14 1981-03-20 Tokyo Shibaura Electric Co Heat reflecting plate
JPS60195502A (ja) * 1984-03-19 1985-10-04 Canon Inc 金属回転多面鏡
JPS61219004A (ja) * 1985-03-25 1986-09-29 Canon Inc 多層膜反射鏡
JPS63186875A (ja) * 1987-01-29 1988-08-02 Tadahiro Omi 表面反応成膜装置
JP2927857B2 (ja) * 1990-01-19 1999-07-28 株式会社東芝 基板加熱装置
GB9400323D0 (en) * 1994-01-10 1994-03-09 Pilkington Glass Ltd Coatings on glass
JP3362552B2 (ja) * 1995-03-10 2003-01-07 東京エレクトロン株式会社 成膜処理装置
JP3341619B2 (ja) * 1997-03-04 2002-11-05 東京エレクトロン株式会社 成膜装置
US6021152A (en) * 1997-07-11 2000-02-01 Asm America, Inc. Reflective surface for CVD reactor walls
KR100286325B1 (ko) * 1997-11-27 2001-05-02 김영환 화학기상증착 장비의 가열장치

Also Published As

Publication number Publication date
EP1091017A2 (en) 2001-04-11
JP2000355756A (ja) 2000-12-26
EP1091017B1 (en) 2009-02-11
SG84588A1 (en) 2001-11-20
DE60041527D1 (de) 2009-03-26
EP1091017A3 (en) 2003-07-02
BR0001637A (pt) 2000-10-31
US6181727B1 (en) 2001-01-30

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