ITTO20000510A0 - Composizione di rivestimento superiore per fotoresist e procedimento per formare disegni fini utilizzante tale composizione. - Google Patents
Composizione di rivestimento superiore per fotoresist e procedimento per formare disegni fini utilizzante tale composizione.Info
- Publication number
- ITTO20000510A0 ITTO20000510A0 IT2000TO000510A ITTO20000510A ITTO20000510A0 IT TO20000510 A0 ITTO20000510 A0 IT TO20000510A0 IT 2000TO000510 A IT2000TO000510 A IT 2000TO000510A IT TO20000510 A ITTO20000510 A IT TO20000510A IT TO20000510 A0 ITTO20000510 A0 IT TO20000510A0
- Authority
- IT
- Italy
- Prior art keywords
- composition
- procedure
- top coating
- forming fine
- coating composition
- Prior art date
Links
- 239000008199 coating composition Substances 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000000203 mixture Substances 0.000 title 1
- 229920002120 photoresistant polymer Polymers 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Structural Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Architecture (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Paints Or Removers (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-1999-0020538A KR100401116B1 (ko) | 1999-06-03 | 1999-06-03 | 아민오염방지 물질 및 이를 이용한 미세패턴 형성방법 |
Publications (3)
Publication Number | Publication Date |
---|---|
ITTO20000510A0 true ITTO20000510A0 (it) | 2000-06-01 |
ITTO20000510A1 ITTO20000510A1 (it) | 2001-12-01 |
IT1320493B1 IT1320493B1 (it) | 2003-12-10 |
Family
ID=19589910
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT2000TO000510A IT1320493B1 (it) | 1999-06-03 | 2000-06-01 | Composizione di rivestimento superiore per fotoresist e procedimentoper formare disegni fini utilizzante tale composizione. |
Country Status (9)
Country | Link |
---|---|
JP (1) | JP2001022080A (it) |
KR (1) | KR100401116B1 (it) |
CN (1) | CN1215375C (it) |
DE (1) | DE10027587A1 (it) |
FR (1) | FR2794538B1 (it) |
GB (1) | GB2352825B (it) |
IT (1) | IT1320493B1 (it) |
NL (1) | NL1015367C2 (it) |
TW (1) | TWI266958B (it) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100537181B1 (ko) * | 1999-12-30 | 2005-12-16 | 주식회사 하이닉스반도체 | 노광후 현상 지연에 의한 패턴 불량을 방지할 수 있는포토레지스트 패턴 형성 방법 |
KR100390991B1 (ko) * | 2001-05-29 | 2003-07-12 | 주식회사 하이닉스반도체 | 반도체소자의 감광막패턴 형성방법 |
KR100390998B1 (ko) * | 2001-06-26 | 2003-07-12 | 주식회사 하이닉스반도체 | 반도체소자의 감광막패턴 형성방법 |
JP3476082B2 (ja) * | 2001-11-05 | 2003-12-10 | 東京応化工業株式会社 | パターン微細化用被覆形成剤およびそれを用いた微細パターンの形成方法 |
KR100642416B1 (ko) | 2004-08-31 | 2006-11-03 | 주식회사 하이닉스반도체 | 상부 반사방지막 조성물 및 이를 이용한 반도체 소자의패턴 형성 방법 |
CN1786830A (zh) * | 2004-12-09 | 2006-06-14 | 三洋电机株式会社 | 抗蚀剂图案形成方法 |
US8168367B2 (en) * | 2008-07-11 | 2012-05-01 | Shin-Etsu Chemical Co., Ltd. | Resist composition and patterning process |
KR102200511B1 (ko) * | 2013-01-24 | 2021-01-11 | 닛산 가가쿠 가부시키가이샤 | 리소그래피용 레지스트 상층막 형성 조성물 및 이것을 이용한 반도체장치의 제조방법 |
WO2014119396A1 (ja) * | 2013-01-31 | 2014-08-07 | 富士フイルム株式会社 | パターン形成方法、並びに、これらを用いた電子デバイスの製造方法、及び、電子デバイス |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3652273A (en) * | 1967-09-11 | 1972-03-28 | Ibm | Process using polyvinyl butral topcoat on photoresist layer |
JPS5034966B2 (it) * | 1972-07-24 | 1975-11-12 | ||
GB8700599D0 (en) * | 1987-01-12 | 1987-02-18 | Vickers Plc | Printing plate precursors |
DE3715790A1 (de) * | 1987-05-12 | 1988-11-24 | Hoechst Ag | Strahlungsempfindliches aufzeichnungsmaterial |
WO1992005474A1 (en) * | 1990-09-18 | 1992-04-02 | International Business Machines Corporation | Top coat for acid catalyzed resists |
JPH04204848A (ja) * | 1990-11-30 | 1992-07-27 | Matsushita Electric Ind Co Ltd | 微細パターン形成方法 |
DE4117127A1 (de) * | 1991-05-25 | 1992-11-26 | Basf Ag | Lichtempfindliche aufzeichnungselemente, verfahren zu ihrer herstellung und weiterverarbeitung sowie geraete fuer die durchfuehrung dieser verfahren |
SG52770A1 (en) * | 1992-07-10 | 1998-09-28 | Hoechst Celanese Corp | Metal ion reduction in top anti-reflective coatings for photoresists |
JP3362797B2 (ja) * | 1993-04-30 | 2003-01-07 | 東洋紡績株式会社 | 印刷原版用感光性樹脂積層体 |
US5631314A (en) * | 1994-04-27 | 1997-05-20 | Tokyo Ohka Kogyo Co., Ltd. | Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition |
US5506090A (en) * | 1994-09-23 | 1996-04-09 | Minnesota Mining And Manufacturing Company | Process for making shoot and run printing plates |
JP3510003B2 (ja) * | 1995-05-01 | 2004-03-22 | クラリアント インターナショナル リミテッド | 反射防止コーティング用組成物 |
JPH0971765A (ja) * | 1995-06-29 | 1997-03-18 | Nippon Zeon Co Ltd | 粘着防止用組成物 |
JP3694703B2 (ja) * | 1996-04-25 | 2005-09-14 | Azエレクトロニックマテリアルズ株式会社 | 反射防止コーティング用組成物 |
JPH10261574A (ja) * | 1997-03-19 | 1998-09-29 | Fujitsu Ltd | 半導体装置の製造方法 |
-
1999
- 1999-06-03 KR KR10-1999-0020538A patent/KR100401116B1/ko not_active IP Right Cessation
-
2000
- 2000-05-23 TW TW089109900A patent/TWI266958B/zh not_active IP Right Cessation
- 2000-05-26 GB GB0012727A patent/GB2352825B/en not_active Expired - Fee Related
- 2000-05-30 CN CNB001093614A patent/CN1215375C/zh not_active Expired - Fee Related
- 2000-05-31 JP JP2000162999A patent/JP2001022080A/ja active Pending
- 2000-05-31 NL NL1015367A patent/NL1015367C2/nl not_active IP Right Cessation
- 2000-05-31 FR FR0007020A patent/FR2794538B1/fr not_active Expired - Fee Related
- 2000-06-01 IT IT2000TO000510A patent/IT1320493B1/it active
- 2000-06-02 DE DE10027587A patent/DE10027587A1/de not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
KR20010001380A (ko) | 2001-01-05 |
DE10027587A1 (de) | 2000-12-21 |
CN1215375C (zh) | 2005-08-17 |
JP2001022080A (ja) | 2001-01-26 |
FR2794538B1 (fr) | 2004-08-20 |
NL1015367C2 (nl) | 2001-05-17 |
GB2352825A (en) | 2001-02-07 |
GB2352825B (en) | 2003-12-17 |
CN1276541A (zh) | 2000-12-13 |
NL1015367A1 (nl) | 2000-12-06 |
FR2794538A1 (fr) | 2000-12-08 |
GB0012727D0 (en) | 2000-07-19 |
TWI266958B (en) | 2006-11-21 |
IT1320493B1 (it) | 2003-12-10 |
ITTO20000510A1 (it) | 2001-12-01 |
KR100401116B1 (ko) | 2003-10-10 |
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