IT1261393B - Dispositivo e metodo per formare un rivestimento mediante pirolisi - Google Patents

Dispositivo e metodo per formare un rivestimento mediante pirolisi

Info

Publication number
IT1261393B
IT1261393B ITTO930986A ITTO930986A IT1261393B IT 1261393 B IT1261393 B IT 1261393B IT TO930986 A ITTO930986 A IT TO930986A IT TO930986 A ITTO930986 A IT TO930986A IT 1261393 B IT1261393 B IT 1261393B
Authority
IT
Italy
Prior art keywords
coating chamber
substrate
coating
nozzle
face
Prior art date
Application number
ITTO930986A
Other languages
English (en)
Inventor
Robert Terneu
Secondo Franceschi
Original Assignee
Glaverbel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Glaverbel filed Critical Glaverbel
Publication of ITTO930986A0 publication Critical patent/ITTO930986A0/it
Publication of ITTO930986A1 publication Critical patent/ITTO930986A1/it
Application granted granted Critical
Publication of IT1261393B publication Critical patent/IT1261393B/it

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45595Atmospheric CVD gas inlets with no enclosed reaction chamber
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001General methods for coating; Devices therefor
    • C03C17/002General methods for coating; Devices therefor for flat glass, e.g. float glass
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)

Abstract

Un dispositivo per formare, mediante pirolisi, un rivestimento di metallo o composto metallico su una faccia di un substrato (16) di vetro caldo in movimento portando detta faccia a contatto con un reagente gassoso, comprende mezzi di supporto (20) per trasportare il substrato (16) attraverso una camera di rivestimento (14), un ugello di eiezione (10) per fornire e distribuire reagente gassoso alla camera di rivestimento (14) e mezzi per evacuare gas di scarico dalla camera di rivestimento (14). L'ugello (10) ha una feritoia (12), di lunghezza almeno uguale alla larghezza del substrato (16) da rivestire che si estende trasversalmente al percorso del substrato (16), si apre direttamente nella camera di rivestimento (14) e ha pareti longitudinali interne (24) della feritoia sostanzialmente parallele tra loro. Le pareti interne dell'ugello (10) definiscono un percorso convergente continuo, per far adattare il flusso di reagente gassoso alle dimensioni della feritoia (12), con angolo di convergenza (?) che non supera in alcun punto 14°.(Figura 1).
ITTO930986A 1993-01-11 1993-12-23 Dispositivo e metodo per formare un rivestimento mediante pirolisi IT1261393B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB939300400A GB9300400D0 (en) 1993-01-11 1993-01-11 A device and method for forming a coating by pyrolysis

Publications (3)

Publication Number Publication Date
ITTO930986A0 ITTO930986A0 (it) 1993-12-23
ITTO930986A1 ITTO930986A1 (it) 1994-07-12
IT1261393B true IT1261393B (it) 1996-05-20

Family

ID=10728522

Family Applications (2)

Application Number Title Priority Date Filing Date
ITTO930986A IT1261393B (it) 1993-01-11 1993-12-23 Dispositivo e metodo per formare un rivestimento mediante pirolisi
ITTO930987A IT1261394B (it) 1993-01-11 1993-12-23 Dispositivo e metodo per formare un rivestimento mediante pirolisi

Family Applications After (1)

Application Number Title Priority Date Filing Date
ITTO930987A IT1261394B (it) 1993-01-11 1993-12-23 Dispositivo e metodo per formare un rivestimento mediante pirolisi

Country Status (15)

Country Link
US (3) US5522911A (it)
JP (2) JP3423388B2 (it)
AT (2) AT405831B (it)
BE (2) BE1008559A3 (it)
CA (2) CA2113028A1 (it)
CH (2) CH687204A5 (it)
CZ (2) CZ287432B6 (it)
DE (2) DE4400209A1 (it)
ES (2) ES2112093B1 (it)
FR (2) FR2700325B1 (it)
GB (3) GB9300400D0 (it)
IT (2) IT1261393B (it)
LU (2) LU88451A1 (it)
NL (2) NL9400042A (it)
SE (3) SE504491C2 (it)

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US6022414A (en) * 1994-07-18 2000-02-08 Semiconductor Equipment Group, Llc Single body injector and method for delivering gases to a surface
US6200389B1 (en) 1994-07-18 2001-03-13 Silicon Valley Group Thermal Systems Llc Single body injector and deposition chamber
US6231971B1 (en) * 1995-06-09 2001-05-15 Glaverbel Glazing panel having solar screening properties
US5882368A (en) * 1997-02-07 1999-03-16 Vidrio Piiano De Mexico, S.A. De C.V. Method for coating glass substrates by ultrasonic nebulization of solutions
US6027766A (en) 1997-03-14 2000-02-22 Ppg Industries Ohio, Inc. Photocatalytically-activated self-cleaning article and method of making same
US7096692B2 (en) * 1997-03-14 2006-08-29 Ppg Industries Ohio, Inc. Visible-light-responsive photoactive coating, coated article, and method of making same
US6103015A (en) * 1998-01-19 2000-08-15 Libbey-Owens-Ford Co. Symmetrical CVD coater with lower upstream exhaust toe
DE19923591A1 (de) * 1999-05-21 2000-11-23 Fleissner Maschf Gmbh Co Vorrichtung mit einem Düsenbalken zur Erzeugung von Flüssigkeitsstrahlen zur Strahlbeaufschlagung der Fasern einer Warenbahn
US6413579B1 (en) 2000-01-27 2002-07-02 Libbey-Owens-Ford Co. Temperature control of CVD method for reduced haze
US6808741B1 (en) * 2001-10-26 2004-10-26 Seagate Technology Llc In-line, pass-by method for vapor lubrication
JP2006501793A (ja) * 2002-07-31 2006-01-12 シドクラフト、アクチボラグ 電気機械
WO2004084222A1 (ja) 2003-03-19 2004-09-30 Matsushita Electric Industrial Co., Ltd. 車載用記録再生装置、記録再生装置、記録再生システム、および記録再生方法
JP4124046B2 (ja) * 2003-07-10 2008-07-23 株式会社大阪チタニウムテクノロジーズ 金属酸化物被膜の成膜方法および蒸着装置
US9017480B2 (en) 2006-04-06 2015-04-28 First Solar, Inc. System and method for transport
TW201011114A (en) * 2008-05-19 2010-03-16 Du Pont Apparatus and method of vapor coating in an electronic device
EP2123793A1 (en) * 2008-05-20 2009-11-25 Helianthos B.V. Vapour deposition process
US8557328B2 (en) * 2009-10-02 2013-10-15 Ppg Industries Ohio, Inc. Non-orthogonal coater geometry for improved coatings on a substrate
FI9160U1 (fi) * 2010-01-04 2011-04-14 Beneq Oy Pinnoituslaite
FI20106088A0 (fi) * 2010-10-21 2010-10-21 Beneq Oy Pinnankäsittelylaite ja -menetelmä
KR101806916B1 (ko) * 2011-03-17 2017-12-12 한화테크윈 주식회사 그래핀 필름 제조 장치 및 그래핀 필름 제조 방법
US20130130597A1 (en) * 2011-11-21 2013-05-23 James William Brown Glass treatment apparatus and methods of treating glass
JP5148743B1 (ja) * 2011-12-20 2013-02-20 シャープ株式会社 薄膜成膜装置、薄膜成膜方法および薄膜太陽電池の製造方法
MX2014013233A (es) * 2014-10-30 2016-05-02 Ct Investig Materiales Avanzados Sc Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol.
US20160186320A1 (en) * 2014-12-26 2016-06-30 Metal Industries Research And Development Centre Apparatus for continuously forming a film through chemical vapor deposition
JP6426298B2 (ja) * 2015-10-19 2018-11-21 東芝三菱電機産業システム株式会社 成膜装置
WO2019239192A1 (en) * 2018-06-15 2019-12-19 Arcelormittal Vacuum deposition facility and method for coating a substrate

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US3597178A (en) * 1969-04-17 1971-08-03 Ppg Industries Inc Process and apparatus for removing atmospheric contaminants in a float glass operation
US3837832A (en) * 1971-04-29 1974-09-24 Ppg Industries Inc Apparatus for making float glass
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CH628600A5 (fr) * 1979-02-14 1982-03-15 Siv Soc Italiana Vetro Procede pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide et installation pour la mise en oeuvre de ce procede.
CH643469A5 (fr) * 1981-12-22 1984-06-15 Siv Soc Italiana Vetro Installation pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide.
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GB8914047D0 (en) * 1989-06-19 1989-08-09 Glaverbel Method of and apparatus for pyrolytically forming an oxide coating on a hot glass substrate
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GB2247691B (en) * 1990-08-31 1994-11-23 Glaverbel Method of coating glass
FR2672518B1 (fr) * 1991-02-13 1995-05-05 Saint Gobain Vitrage Int Buse a alimentation dissymetrique pour la formation d'une couche de revetement sur un ruban de verre, par pyrolyse d'un melange gazeux.
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Also Published As

Publication number Publication date
GB9400045D0 (en) 1994-03-02
ITTO930986A0 (it) 1993-12-23
ES2111418B1 (es) 1998-10-16
NL9400041A (nl) 1994-08-01
FR2700325B1 (fr) 1996-11-29
JPH072548A (ja) 1995-01-06
GB2274115B (en) 1995-08-23
JP3423388B2 (ja) 2003-07-07
US6112554A (en) 2000-09-05
ITTO930986A1 (it) 1994-07-12
SE9400037D0 (sv) 1994-01-10
GB2274116B (en) 1995-08-23
ATA1494A (de) 1998-11-15
ES2111418A1 (es) 1998-03-01
ES2112093A1 (es) 1998-03-16
CZ1694A3 (en) 1995-06-14
CZ287432B6 (en) 2000-11-15
GB2274115A (en) 1994-07-13
BE1008560A3 (fr) 1996-06-04
FR2700326A1 (fr) 1994-07-13
BE1008559A3 (fr) 1996-06-04
CA2113029A1 (en) 1994-07-12
SE9400038D0 (sv) 1994-01-10
FR2700326B1 (fr) 1996-11-29
GB2274116A (en) 1994-07-13
CZ1794A3 (en) 1995-06-14
SE504491C2 (sv) 1997-02-24
CA2113028A1 (en) 1994-07-12
US5709726A (en) 1998-01-20
JPH073463A (ja) 1995-01-06
ES2112093B1 (es) 1998-11-16
CZ284096B6 (cs) 1998-08-12
LU88451A1 (fr) 1994-12-01
FR2700325A1 (fr) 1994-07-13
ITTO930987A0 (it) 1993-12-23
GB9400046D0 (en) 1994-03-02
US5522911A (en) 1996-06-04
CH687203A5 (fr) 1996-10-15
DE4400208A1 (de) 1994-07-14
SE9400038L (sv) 1994-07-12
CH687204A5 (fr) 1996-10-15
DE4400209A1 (de) 1994-07-14
AT405279B (de) 1999-06-25
NL9400042A (nl) 1994-08-01
GB9300400D0 (en) 1993-03-03
ATA1394A (de) 1999-04-15
SE508197C2 (sv) 1998-09-14
SE9400037L (sv) 1994-07-12
AT405831B (de) 1999-11-25
ITTO930987A1 (it) 1995-06-23
IT1261394B (it) 1996-05-20
LU88450A1 (fr) 1994-12-01

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19971020