JPS5667980A - Semiconductor laser system and preparation method thereof - Google Patents
Semiconductor laser system and preparation method thereofInfo
- Publication number
- JPS5667980A JPS5667980A JP14477779A JP14477779A JPS5667980A JP S5667980 A JPS5667980 A JP S5667980A JP 14477779 A JP14477779 A JP 14477779A JP 14477779 A JP14477779 A JP 14477779A JP S5667980 A JPS5667980 A JP S5667980A
- Authority
- JP
- Japan
- Prior art keywords
- face
- laser system
- protective film
- distribution corresponding
- oscillation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0267—Integrated focusing lens
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Formation Of Insulating Films (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To prevent deterioration of an oscillating end face and to improve the laser characteristics by stabilizing an oscillation mode by a method wherein a protective film having a reflection factor distribution corresponding to an oscillation mode is vapored to an oscillation end face of a laser system. CONSTITUTION:A protective film 11 having a reflection factor distribution corresponding to an oscillation mode is attached to an oscillating end face 4a of a semiconductor laser system 1. And further, within a vapor growth atmosphere of SiO2, Si3N4, etc. the laser system 1 is made to oscillate and the protective film 11 as aforementioned is vapored on the oscillating end face. For example, the laser system having a constitution as shown in a figure is installed in a CVD furnace 9 taking Ar as a carrier gas, and in an atmosphere wherein SiH4 and N2O are supplied, the system 1 is made to oscillate in a fundamental mode. And only at an injection face 4a of a laser light 10 in an activated area 4, the SiO2 film having a film thickness distribution corresponding to the fundamental mode is made to vapor grow.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14477779A JPS5667980A (en) | 1979-11-08 | 1979-11-08 | Semiconductor laser system and preparation method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14477779A JPS5667980A (en) | 1979-11-08 | 1979-11-08 | Semiconductor laser system and preparation method thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5667980A true JPS5667980A (en) | 1981-06-08 |
Family
ID=15370182
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14477779A Pending JPS5667980A (en) | 1979-11-08 | 1979-11-08 | Semiconductor laser system and preparation method thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5667980A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5948977A (en) * | 1982-09-14 | 1984-03-21 | Nec Corp | Manufacture of laser diode |
JP2006228892A (en) * | 2005-02-16 | 2006-08-31 | Matsushita Electric Ind Co Ltd | Semiconductor light emitting element and its manufacturing method |
-
1979
- 1979-11-08 JP JP14477779A patent/JPS5667980A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5948977A (en) * | 1982-09-14 | 1984-03-21 | Nec Corp | Manufacture of laser diode |
JP2006228892A (en) * | 2005-02-16 | 2006-08-31 | Matsushita Electric Ind Co Ltd | Semiconductor light emitting element and its manufacturing method |
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