IN2014CN02940A - - Google Patents
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- Publication number
- IN2014CN02940A IN2014CN02940A IN2940CHN2014A IN2014CN02940A IN 2014CN02940 A IN2014CN02940 A IN 2014CN02940A IN 2940CHN2014 A IN2940CHN2014 A IN 2940CHN2014A IN 2014CN02940 A IN2014CN02940 A IN 2014CN02940A
- Authority
- IN
- India
- Prior art keywords
- reaction mixture
- partially alkylated
- products
- trialkylgallium
- raici
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 abstract 3
- 238000000034 method Methods 0.000 abstract 3
- 239000011541 reaction mixture Substances 0.000 abstract 3
- UPWPDUACHOATKO-UHFFFAOYSA-K gallium trichloride Chemical compound Cl[Ga](Cl)Cl UPWPDUACHOATKO-UHFFFAOYSA-K 0.000 abstract 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 abstract 1
- 229910001508 alkali metal halide Inorganic materials 0.000 abstract 1
- 150000008045 alkali metal halides Chemical class 0.000 abstract 1
- 125000005234 alkyl aluminium group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- -1 alkylaluminium compound Chemical class 0.000 abstract 1
- 230000029936 alkylation Effects 0.000 abstract 1
- 238000005804 alkylation reaction Methods 0.000 abstract 1
- 239000002585 base Substances 0.000 abstract 1
- 238000009835 boiling Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 229910052733 gallium Inorganic materials 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000002243 precursor Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/582—Recycling of unreacted starting or intermediate materials
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Catalysts (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011119487 | 2011-11-28 | ||
| DE201210013941 DE102012013941A1 (de) | 2012-07-16 | 2012-07-16 | Verfahren zur Herstellung von Galliumtrialkylverbindungen |
| PCT/EP2012/073772 WO2013083450A1 (en) | 2011-11-28 | 2012-11-28 | Process for preparing trialkylgallium compounds |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN2014CN02940A true IN2014CN02940A (enrdf_load_stackoverflow) | 2015-07-03 |
Family
ID=47278289
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN2940CHN2014 IN2014CN02940A (enrdf_load_stackoverflow) | 2011-11-28 | 2012-11-28 |
Country Status (9)
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI632151B (zh) | 2011-11-28 | 2018-08-11 | 烏明克股份有限兩合公司 | 第iiia族金屬的三烷基化合物之製法 |
| US8513447B1 (en) * | 2012-02-01 | 2013-08-20 | Chemtura Corporation | Preparation of tri-alkyl gallium or tri-alkyl indium compounds |
| EP3036243B1 (de) | 2013-08-22 | 2019-10-09 | Umicore AG & Co. KG | Verfahren zur herstellung von alkylindium-verbindungen und deren verwendung |
| RU2016110113A (ru) * | 2013-08-22 | 2018-11-23 | Умикоре Аг Унд Ко. Кг | Способ получения алкилиндиевых соединений и их применение |
| JP6413801B2 (ja) * | 2014-02-07 | 2018-10-31 | 宇部興産株式会社 | トリアルキルガリウムの製造方法 |
| WO2015136049A1 (de) * | 2014-03-14 | 2015-09-17 | Umicore Ag & Co. Kg | Verfahren zur herstellung von trialkylgallium-verbindungen und deren verwendung |
| EP3409676B1 (de) * | 2017-05-29 | 2020-10-14 | Umicore Ag & Co. Kg | Herstellung von trialkylindiumverbindungen in gegenwart von carboxylaten |
| US11401282B2 (en) | 2017-10-31 | 2022-08-02 | Nouryon Chemicals International B.V. | Method for storing and/or transporting gallium chloride |
| WO2019115377A1 (en) * | 2017-12-13 | 2019-06-20 | Akzo Nobel Chemicals International B.V. | Process for purification of dimethyl aluminium chloride |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL264689A (enrdf_load_stackoverflow) | 1960-05-14 | |||
| DE4005726A1 (de) * | 1989-04-28 | 1990-10-31 | Messer Griesheim Gmbh | Verfahren zur herstellung von galliumalkylverbindungen |
| US5043462A (en) * | 1989-04-28 | 1991-08-27 | Messer Greisheim | Process for the production of gallium-alkyl compounds |
| US5473090A (en) | 1992-07-02 | 1995-12-05 | Air Products And Chemicals, Inc. | Process for the preparation of trialkyl compounds of group 3a metals |
| US5350869A (en) | 1993-07-27 | 1994-09-27 | Cvd, Incorporated | Purification of trialkylgallium, synthesis of trialkylgallium |
| US5756786A (en) | 1997-06-25 | 1998-05-26 | Morton International, Inc. | High purity trimethylindium, method of synthesis |
| JP2000005503A (ja) | 1998-06-24 | 2000-01-11 | Nippon Shokubai Co Ltd | 反応蒸留装置および反応蒸留方法 |
| GB2344822A (en) | 1998-12-19 | 2000-06-21 | Epichem Ltd | Organometallic compound production using distillation |
| GB0017968D0 (en) | 2000-07-22 | 2000-09-13 | Epichem Ltd | An improved process and apparatus for the isolation of pure,or substantially pure,organometallic compounds |
| KR100852361B1 (ko) * | 2001-04-06 | 2008-08-14 | 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 | 트리알킬 ｖａ족 금속 화합물 |
| US6770769B2 (en) | 2002-04-06 | 2004-08-03 | Shipley Company, L.L.C. | Trialkylindium preparation |
| JP4054997B2 (ja) | 2003-06-19 | 2008-03-05 | 信越化学工業株式会社 | 高純度アルキルガリウムの製造方法 |
| TW200619222A (en) | 2004-09-02 | 2006-06-16 | Rohm & Haas Elect Mat | Method for making organometallic compounds |
| JP4470682B2 (ja) | 2004-10-13 | 2010-06-02 | 住友化学株式会社 | トリメチルガリウムの製造方法 |
| US7667063B2 (en) | 2005-03-23 | 2010-02-23 | Nichia Corporation | Method for producing trialkyl gallium |
| JP4774776B2 (ja) | 2005-03-23 | 2011-09-14 | 日亜化学工業株式会社 | トリアルキルガリウムの製造方法 |
| CN1872862A (zh) | 2005-06-03 | 2006-12-06 | 大连保税区科利德化工科技开发有限公司 | 三甲基镓制备和提纯方法 |
| CN1872861A (zh) | 2005-06-03 | 2006-12-06 | 大连保税区科利德化工科技开发有限公司 | 三甲基镓生产方法及设备 |
| JP4784729B2 (ja) | 2005-06-09 | 2011-10-05 | 信越化学工業株式会社 | トリメチルガリウムの製造方法 |
| JP2009007786A (ja) * | 2007-06-26 | 2009-01-15 | Miracle Three Corporation | 階段室型共同住宅の増築方法及びこの方法で増築された建築物 |
| US20090054717A1 (en) * | 2007-08-21 | 2009-02-26 | The Nippon Synthetic Chemical Industry Co., Ltd. | Method of Producing 3,4-Diacyloxy-1-Butene |
| US20090149008A1 (en) | 2007-10-05 | 2009-06-11 | Applied Materials, Inc. | Method for depositing group iii/v compounds |
| JP2009126835A (ja) | 2007-11-27 | 2009-06-11 | Ube Ind Ltd | 高純度トリアルキルガリウム及びその製法 |
| JP5423039B2 (ja) | 2009-02-23 | 2014-02-19 | 宇部興産株式会社 | 高純度トリアルキルガリウム及びその製造方法 |
| TWI632151B (zh) | 2011-11-28 | 2018-08-11 | 烏明克股份有限兩合公司 | 第iiia族金屬的三烷基化合物之製法 |
-
2012
- 2012-11-27 TW TW106104275A patent/TWI632151B/zh not_active IP Right Cessation
- 2012-11-27 TW TW101144306A patent/TWI632149B/zh active
- 2012-11-28 KR KR1020147011627A patent/KR102071084B1/ko active Active
- 2012-11-28 US US13/261,859 patent/US9108985B2/en active Active
- 2012-11-28 US US14/358,069 patent/US9695201B2/en active Active
- 2012-11-28 WO PCT/EP2012/073771 patent/WO2013083449A1/en active Application Filing
- 2012-11-28 CN CN201280058149.4A patent/CN103958529A/zh active Pending
- 2012-11-28 CN CN201810250898.6A patent/CN108341834B/zh active Active
- 2012-11-28 CN CN201811396095.8A patent/CN109456345A/zh active Pending
- 2012-11-28 CN CN201710084832.XA patent/CN107021973A/zh active Pending
- 2012-11-28 RU RU2014126213A patent/RU2014126213A/ru not_active Application Discontinuation
- 2012-11-28 JP JP2014542885A patent/JP6165159B2/ja not_active Expired - Fee Related
- 2012-11-28 EP EP12794701.8A patent/EP2785724B1/en active Active
- 2012-11-28 RU RU2014126212A patent/RU2014126212A/ru not_active Application Discontinuation
- 2012-11-28 KR KR1020147011622A patent/KR102109904B1/ko not_active Expired - Fee Related
- 2012-11-28 KR KR1020207012873A patent/KR102231740B1/ko active Active
- 2012-11-28 WO PCT/EP2012/073772 patent/WO2013083450A1/en active Application Filing
- 2012-11-28 CN CN201280058143.7A patent/CN103958528A/zh active Pending
- 2012-11-28 IN IN2940CHN2014 patent/IN2014CN02940A/en unknown
- 2012-11-28 JP JP2014542886A patent/JP6165160B2/ja not_active Expired - Fee Related
- 2012-11-28 EP EP12798251.0A patent/EP2785725B1/en active Active
-
2017
- 2017-03-21 JP JP2017054178A patent/JP6644726B2/ja active Active
- 2017-03-21 JP JP2017054179A patent/JP6679527B2/ja active Active
-
2019
- 2019-11-08 JP JP2019203284A patent/JP6983851B2/ja not_active Expired - Fee Related
-
2021
- 2021-07-29 JP JP2021124454A patent/JP2021169529A/ja active Pending
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