IN2013DN02549A - - Google Patents

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Publication number
IN2013DN02549A
IN2013DN02549A IN2549DEN2013A IN2013DN02549A IN 2013DN02549 A IN2013DN02549 A IN 2013DN02549A IN 2549DEN2013 A IN2549DEN2013 A IN 2549DEN2013A IN 2013DN02549 A IN2013DN02549 A IN 2013DN02549A
Authority
IN
India
Prior art keywords
semiconductor chip
trench
gap
insulating layer
polymeric filler
Prior art date
Application number
Other languages
English (en)
Inventor
Michael Z Su
Ahmed Gamal Refai
Bryan Black
Original Assignee
Advanced Micro Devices Inc
Ati Technologies Ulc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Micro Devices Inc, Ati Technologies Ulc filed Critical Advanced Micro Devices Inc
Publication of IN2013DN02549A publication Critical patent/IN2013DN02549A/en

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    • H01L23/18Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device
    • H01L23/24Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device solid or gel at the normal operating temperature of the device
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    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
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