IL112006A - Waterborne photoresists having associate thickeners - Google Patents
Waterborne photoresists having associate thickenersInfo
- Publication number
- IL112006A IL112006A IL11200694A IL11200694A IL112006A IL 112006 A IL112006 A IL 112006A IL 11200694 A IL11200694 A IL 11200694A IL 11200694 A IL11200694 A IL 11200694A IL 112006 A IL112006 A IL 112006A
- Authority
- IL
- Israel
- Prior art keywords
- neutralised
- compsn
- base
- binder polymer
- carboxylic acid
- Prior art date
Links
- 239000002562 thickening agent Substances 0.000 title abstract 2
- 229920002120 photoresistant polymer Polymers 0.000 title 1
- 239000011230 binding agent Substances 0.000 abstract 2
- 150000001732 carboxylic acid derivatives Chemical group 0.000 abstract 2
- 239000004816 latex Substances 0.000 abstract 2
- 229920000126 latex Polymers 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 239000004721 Polyphenylene oxide Substances 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 229920000570 polyether Polymers 0.000 abstract 1
- 229920002635 polyurethane Polymers 0.000 abstract 1
- 239000004814 polyurethane Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Paints Or Removers (AREA)
- Paper (AREA)
- Telephone Function (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
- Polymerisation Methods In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Colloid Chemistry (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US18687594A | 1994-01-25 | 1994-01-25 | |
| US08/199,037 US5364737A (en) | 1994-01-25 | 1994-02-18 | Waterbone photoresists having associate thickeners |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IL112006A0 IL112006A0 (en) | 1995-03-15 |
| IL112006A true IL112006A (en) | 1999-11-30 |
Family
ID=26882508
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL11200694A IL112006A (en) | 1994-01-25 | 1994-12-16 | Waterborne photoresists having associate thickeners |
Country Status (14)
| Country | Link |
|---|---|
| US (5) | US5364737A (enExample) |
| EP (1) | EP0664490B1 (enExample) |
| JP (1) | JP2705907B2 (enExample) |
| KR (5) | KR0142022B1 (enExample) |
| CN (1) | CN1078357C (enExample) |
| AT (1) | ATE164013T1 (enExample) |
| AU (1) | AU660392B1 (enExample) |
| BR (1) | BR9404738A (enExample) |
| CA (1) | CA2131044C (enExample) |
| DE (1) | DE69408970T2 (enExample) |
| ES (1) | ES2115165T3 (enExample) |
| IL (1) | IL112006A (enExample) |
| SG (1) | SG43077A1 (enExample) |
| TW (4) | TW269018B (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5741621A (en) * | 1994-01-10 | 1998-04-21 | E. I. Du Pont De Nemours And Company | Process for using photoimageable films prepared for aqueous photoimageable liquid emulsions |
| TW353158B (en) * | 1994-03-09 | 1999-02-21 | Nat Starch Chem Invest | Aqueous photoresist composition, method for preparing the same and circuit board comprising thereof |
| JPH08328251A (ja) * | 1995-03-31 | 1996-12-13 | W R Grace & Co | 水性感光性樹脂組成物 |
| JPH08328252A (ja) * | 1995-03-31 | 1996-12-13 | W R Grace & Co | 水性感光性樹脂組成物 |
| US5565302A (en) * | 1995-04-21 | 1996-10-15 | W. R. Grace & Co.-Conn. | Process for preparing photosensitive resin composition |
| US5512607A (en) * | 1995-06-06 | 1996-04-30 | W. R. Grace & Co.-Conn. | Unsaturated epoxy ester with quaternary ammonium and phosphate groups |
| WO1996041240A1 (en) * | 1995-06-07 | 1996-12-19 | W.R. Grace & Co.-Conn. | Water photoresist emulsions and methods of preparation thereof |
| AU709577B2 (en) * | 1995-06-07 | 1999-09-02 | E.I. Du Pont De Nemours And Company | Process for using photoimageable films prepared from aqueous photoimageable liquid emulsions |
| US5925499A (en) * | 1995-08-01 | 1999-07-20 | Morton International, Inc. | Epoxy-containing waterborne photoimageable composition |
| US5846699A (en) * | 1996-09-11 | 1998-12-08 | Eastman Kodak Company | Coating composition including polyurethane for imaging elements |
| US6063550A (en) * | 1998-04-29 | 2000-05-16 | Morton International, Inc. | Aqueous developing solutions for reduced developer residue |
| US5922522A (en) * | 1998-04-29 | 1999-07-13 | Morton International, Inc. | Aqueous developing solutions for reduced developer residue |
| US6248506B1 (en) | 1998-12-04 | 2001-06-19 | Nichigo-Morton | Aqueous developing solutions for reduced developer residue |
| JP2000267270A (ja) * | 1999-03-19 | 2000-09-29 | Clariant (Japan) Kk | ロールコート用感光性樹脂組成物およびロールコート方法 |
| NL1013300C2 (nl) * | 1999-10-15 | 2001-04-18 | Stahl Int Bv | Werkwijze voor de bereiding van een dispersie van een anionische polymeer in water waarin geen vluchtige tertiaire-amines voorkomen, de verkregen dispersies en coatings welke met de genoemde dispersies verkregen worden. |
| TW461988B (en) | 1999-12-17 | 2001-11-01 | Ind Tech Res Inst | Water soluble polymer and photoresist composition containing the same |
| US6436540B1 (en) * | 2000-02-18 | 2002-08-20 | Omnova Solutions Inc. | Co-mingled polyurethane-polyvinyl ester polymer compositions and laminates |
| US6306557B1 (en) * | 2000-04-20 | 2001-10-23 | Industrial Technology Research Foundation | Process for preparing water dispersible negative-type photosensitive compositions |
| US6797146B2 (en) | 2000-11-02 | 2004-09-28 | Shipley Company, L.L.C. | Seed layer repair |
| US7063895B2 (en) * | 2001-08-01 | 2006-06-20 | National Starch And Chemical Investment Holding Corporation | Hydrophobically modified solution polymers and their use in surface protecting formulations |
| RU2311968C2 (ru) * | 2002-03-06 | 2007-12-10 | Акцо Нобель Коатингс Интернэшнл Б.В. | Водосодержащая покрывная композиция для способов переноса пленки и отливки |
| KR20120086737A (ko) * | 2002-05-03 | 2012-08-03 | 디에스엠 아이피 어셋츠 비.브이. | 방사선 경화성 수지 조성물 및 이를 이용한 급속 성형법 |
| US20040058276A1 (en) * | 2002-09-23 | 2004-03-25 | Dueber Thomas E. | Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto |
| US7226959B2 (en) * | 2003-11-06 | 2007-06-05 | Sun Chemical Corporation | Water soluble energy curable stereo-crosslinkable ionomer compositions |
| JP5955526B2 (ja) * | 2011-10-08 | 2016-07-20 | 株式会社日本触媒 | 塗料用水性樹脂組成物 |
| US8703385B2 (en) * | 2012-02-10 | 2014-04-22 | 3M Innovative Properties Company | Photoresist composition |
| CN103700432A (zh) * | 2013-12-20 | 2014-04-02 | 南昌大学 | 一种含流平剂涂层的漆包线 |
| US11213976B2 (en) * | 2016-12-22 | 2022-01-04 | Illumina, Inc. | Imprinting apparatus |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3929743A (en) * | 1972-10-10 | 1975-12-30 | Johnson & Son Inc S C | Polyampholytes |
| US3912516A (en) * | 1973-07-27 | 1975-10-14 | Upjohn Co | Photopolyer composition containing a polyurethane binding agent |
| DE2443785A1 (de) * | 1974-09-13 | 1976-04-01 | Basf Ag | Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten |
| US4079028A (en) * | 1975-10-03 | 1978-03-14 | Rohm And Haas Company | Polyurethane thickeners in latex compositions |
| US4248958A (en) * | 1979-05-23 | 1981-02-03 | Hoechst Aktiengesellschaft | Photopolymerizable mixture containing polyurethanes |
| US4426485A (en) * | 1982-06-14 | 1984-01-17 | Union Carbide Corporation | Polymers with hydrophobe bunches |
| US4952481A (en) * | 1985-02-12 | 1990-08-28 | Napp Systems (Usa), Inc. | Photosensitive resin composition |
| US4767826A (en) * | 1985-07-18 | 1988-08-30 | Polytechnic Institute Of New York | Radiation-sensitive polymers |
| US4743698A (en) * | 1985-10-01 | 1988-05-10 | Alco Chemical Corp. | Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein |
| US4762747A (en) * | 1986-07-29 | 1988-08-09 | Industrial Technology Research Institute | Single component aqueous acrylic adhesive compositions for flexible printed circuits and laminates made therefrom |
| JPH0246460A (ja) * | 1988-08-08 | 1990-02-15 | Toyobo Co Ltd | 感光性樹脂組成物 |
| US4904772A (en) * | 1988-10-03 | 1990-02-27 | Aqualon Company | Mixed hydrophobe polymers |
| US5045435A (en) * | 1988-11-25 | 1991-09-03 | Armstrong World Industries, Inc. | Water-borne, alkali-developable, photoresist coating compositions and their preparation |
| US5268256A (en) * | 1990-08-02 | 1993-12-07 | Ppg Industries, Inc. | Photoimageable electrodepositable photoresist composition for producing non-tacky films |
| JP3040202B2 (ja) * | 1991-07-12 | 2000-05-15 | ダブリュー・アール・グレース・アンド・カンパニー−コーン | 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法 |
| CA2084369A1 (en) * | 1991-12-11 | 1993-06-12 | Brent T. Speelman | Water-borne photoimageable compositions |
| JP3240769B2 (ja) * | 1992-10-02 | 2001-12-25 | ジェイエスアール株式会社 | 感光性樹脂組成物 |
| JPH06258832A (ja) * | 1992-11-17 | 1994-09-16 | W R Grace & Co | 感光性樹脂組成物 |
| JPH06230573A (ja) * | 1993-01-29 | 1994-08-19 | Japan Synthetic Rubber Co Ltd | レジスト組成物 |
| EP0666504B1 (en) * | 1994-01-10 | 1998-06-03 | E.I. Du Pont De Nemours And Company | Aqueous photoimageable liquid emulsion, photoimageable film and process of manufacture |
-
1994
- 1994-02-18 US US08/199,037 patent/US5364737A/en not_active Expired - Lifetime
- 1994-03-30 US US08/221,313 patent/US5387494A/en not_active Expired - Lifetime
- 1994-04-06 US US08/223,615 patent/US5389495A/en not_active Expired - Lifetime
- 1994-05-04 US US08/238,133 patent/US5393643A/en not_active Expired - Lifetime
- 1994-05-12 US US08/241,872 patent/US5411837A/en not_active Expired - Fee Related
- 1994-08-29 CA CA002131044A patent/CA2131044C/en not_active Expired - Fee Related
- 1994-08-29 AU AU71547/94A patent/AU660392B1/en not_active Ceased
- 1994-08-30 TW TW083107966A patent/TW269018B/zh not_active IP Right Cessation
- 1994-09-16 CN CN94116129A patent/CN1078357C/zh not_active Expired - Lifetime
- 1994-09-24 TW TW083108860A patent/TW300289B/zh not_active IP Right Cessation
- 1994-09-24 TW TW083108859A patent/TW263569B/zh not_active IP Right Cessation
- 1994-09-24 TW TW083108862A patent/TW301720B/zh active
- 1994-10-07 KR KR1019940025629A patent/KR0142022B1/ko not_active Expired - Lifetime
- 1994-10-27 DE DE69408970T patent/DE69408970T2/de not_active Expired - Fee Related
- 1994-10-27 ES ES94307904T patent/ES2115165T3/es not_active Expired - Lifetime
- 1994-10-27 AT AT94307904T patent/ATE164013T1/de not_active IP Right Cessation
- 1994-10-27 EP EP94307904A patent/EP0664490B1/en not_active Expired - Lifetime
- 1994-10-27 SG SG1996003334A patent/SG43077A1/en unknown
- 1994-11-21 KR KR1019940030569A patent/KR0149903B1/ko not_active Expired - Fee Related
- 1994-11-21 KR KR1019940030566A patent/KR0144639B1/ko not_active Expired - Lifetime
- 1994-11-21 KR KR1019940030567A patent/KR0149902B1/ko not_active Expired - Fee Related
- 1994-11-21 KR KR1019940030568A patent/KR950024021A/ko not_active Ceased
- 1994-11-24 BR BR9404738A patent/BR9404738A/pt not_active IP Right Cessation
- 1994-12-16 IL IL11200694A patent/IL112006A/xx not_active IP Right Cessation
-
1995
- 1995-01-09 JP JP7001114A patent/JP2705907B2/ja not_active Expired - Lifetime
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FF | Patent granted | ||
| KB | Patent renewed | ||
| KB | Patent renewed | ||
| KB | Patent renewed | ||
| MM9K | Patent not in force due to non-payment of renewal fees | ||
| ERR | Corrigendum |
Free format text: CORRECT DATE OF APPLICATION 15.4.2001 |