HK75587A - Coating compositions - Google Patents

Coating compositions

Info

Publication number
HK75587A
HK75587A HK755/87A HK75587A HK75587A HK 75587 A HK75587 A HK 75587A HK 755/87 A HK755/87 A HK 755/87A HK 75587 A HK75587 A HK 75587A HK 75587 A HK75587 A HK 75587A
Authority
HK
Hong Kong
Prior art keywords
reaction product
filler
polymerisable
organic solvent
photopolymerisable
Prior art date
Application number
HK755/87A
Other languages
English (en)
Inventor
William Courtney Robert
John Parker Stephen
Charles Threadgold Alan
Original Assignee
Coates Brothers Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coates Brothers Plc filed Critical Coates Brothers Plc
Publication of HK75587A publication Critical patent/HK75587A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
HK755/87A 1978-11-01 1987-10-15 Coating compositions HK75587A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB7842748 1978-11-01

Publications (1)

Publication Number Publication Date
HK75587A true HK75587A (en) 1987-10-23

Family

ID=10500726

Family Applications (1)

Application Number Title Priority Date Filing Date
HK755/87A HK75587A (en) 1978-11-01 1987-10-15 Coating compositions

Country Status (10)

Country Link
JP (1) JPS6032360B2 (enrdf_load_stackoverflow)
BR (1) BR7907098A (enrdf_load_stackoverflow)
CH (1) CH645395A5 (enrdf_load_stackoverflow)
DE (1) DE2944097A1 (enrdf_load_stackoverflow)
DK (1) DK460579A (enrdf_load_stackoverflow)
FR (1) FR2440978B1 (enrdf_load_stackoverflow)
HK (1) HK75587A (enrdf_load_stackoverflow)
IT (1) IT1124219B (enrdf_load_stackoverflow)
NO (1) NO159729C (enrdf_load_stackoverflow)
SE (1) SE445647B (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR8103183A (pt) * 1980-05-27 1982-02-09 Du Pont Camada foto-sensivel fina;elemento foto-resistor;substrato com uma camada foto-sensivel fina laminada;e processo para aparacao de camada foto-sensivel e de um material polimerico fino
JPS62178542A (ja) * 1986-01-30 1987-08-05 Nippon Kayaku Co Ltd （メタ）アクリル酸エステル及びコ−テイング又は印刷インキ用反応性化合物
DE3850689D1 (de) * 1987-03-12 1994-08-25 Siemens Ag Strahlungsvernetzbares Polymersystem zur Anwendung als Photoresist und Dielektrikum für Mikroverdrahtungen.
CA2055833C (en) * 1990-11-20 2001-04-24 Katsue Nishikawa Preparation of unsaturated epoxy ester resin and carboxylated unsaturated epoxy ester resin and photosensitive composition comprising the same
US8399583B2 (en) 2008-03-05 2013-03-19 Nippon Shokubai Co., Ltd. Polymer, curable resin composition, cured product, and article

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1549956A (enrdf_load_stackoverflow) * 1967-03-02 1968-12-13
US3661576A (en) * 1970-02-09 1972-05-09 Brady Co W H Photopolymerizable compositions and articles
US3876432A (en) * 1972-09-11 1975-04-08 Sun Chemical Corp Fatty ester modified epoxy resin photopolymerizable compositions
DE2326314C2 (de) * 1973-05-23 1983-10-27 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung von Reliefstrukturen
JPS5017827A (enrdf_load_stackoverflow) * 1973-06-18 1975-02-25
FR2255629B1 (enrdf_load_stackoverflow) * 1973-12-20 1976-10-22 Ibm
US4072592A (en) * 1974-05-20 1978-02-07 Mobil Oil Corporation Radiation curable coating
US4003877A (en) * 1974-05-24 1977-01-18 Dynachem Corporation Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions
DE2534012C3 (de) * 1975-07-30 1981-05-14 Bayer Ag, 5090 Leverkusen Verfahren zur Herstellung von Bindemitteln
DE2702660C3 (de) * 1976-01-27 1980-07-10 Ppg Industries, Inc., Pittsburgh, Pa. (V.St.A.) Durch Strahlung härtbare Überzugsmasse und Verfahren zu ihrer Herstellung
JPS52117985A (en) * 1976-03-30 1977-10-03 Hitachi Chem Co Ltd Photosensitive polymer composition
GB1588368A (en) * 1976-10-27 1981-04-23 Du Pont Flame retardant radiation sensitive element

Also Published As

Publication number Publication date
FR2440978B1 (fr) 1985-07-19
NO159729B (no) 1988-10-24
DK460579A (da) 1980-05-02
SE445647B (sv) 1986-07-07
FR2440978A1 (fr) 1980-06-06
DE2944097C2 (enrdf_load_stackoverflow) 1988-07-28
BR7907098A (pt) 1980-10-07
NO159729C (no) 1989-02-01
CH645395A5 (en) 1984-09-28
DE2944097A1 (de) 1980-05-14
NO793475L (no) 1980-05-05
IT7912796A0 (it) 1979-10-31
IT1124219B (it) 1986-05-07
SE7909024L (sv) 1980-05-02
JPS5562976A (en) 1980-05-12
JPS6032360B2 (ja) 1985-07-27

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Legal Events

Date Code Title Description
PE Patent expired