JPS5562976A - Coating composition - Google Patents

Coating composition

Info

Publication number
JPS5562976A
JPS5562976A JP14114779A JP14114779A JPS5562976A JP S5562976 A JPS5562976 A JP S5562976A JP 14114779 A JP14114779 A JP 14114779A JP 14114779 A JP14114779 A JP 14114779A JP S5562976 A JPS5562976 A JP S5562976A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
coating composition
coating
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14114779A
Other versions
JPS6032360B2 (en )
Inventor
Uiriamu Kootonii Robaato
Jiyon Paakaa Suchiibun
Chiyaarusu Suretsudogooru Aran
Original Assignee
Coates Brothers & Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • H05K3/287Photosensitive compositions
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0783Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
JP14114779A 1978-11-01 1979-10-31 Expired JPS6032360B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB7842748 1978-11-01

Publications (2)

Publication Number Publication Date
JPS5562976A true true JPS5562976A (en) 1980-05-12
JPS6032360B2 JPS6032360B2 (en) 1985-07-27

Family

ID=10500726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14114779A Expired JPS6032360B2 (en) 1978-11-01 1979-10-31

Country Status (4)

Country Link
JP (1) JPS6032360B2 (en)
DE (1) DE2944097C2 (en)
DK (1) DK460579A (en)
FR (1) FR2440978B1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5726846A (en) * 1980-05-27 1982-02-13 Du Pont Photosensitive layer
JPS62178542A (en) * 1986-01-30 1987-08-05 Nippon Kayaku Co Ltd (meth)acrylic acid ester and reactive compound for coating or printing ink
JPH05320312A (en) * 1990-11-20 1993-12-03 W R Grace & Co Preparation of unsaturated epoxy ester resin and carboxylated unsaturated epoxy ester resin, and photosensitive resin composition containing the same
US8399583B2 (en) 2008-03-05 2013-03-19 Nippon Shokubai Co., Ltd. Polymer, curable resin composition, cured product, and article

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0281808B1 (en) * 1987-03-12 1994-07-20 Siemens Aktiengesellschaft Radiation cross-linkable polymer system for application as photoresist and dielectric for micro wiring

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1549956A (en) * 1967-03-02 1968-12-13
US3661576A (en) * 1970-02-09 1972-05-09 Brady Co W H Photopolymerizable compositions and articles
US3876432A (en) * 1972-09-11 1975-04-08 Sun Chemical Corp Fatty ester modified epoxy resin photopolymerizable compositions
DE2326314C2 (en) * 1973-05-23 1983-10-27 Siemens Ag, 1000 Berlin Und 8000 Muenchen, De
JPS5017827A (en) * 1973-06-18 1975-02-25
FR2255629B1 (en) * 1973-12-20 1976-10-22 Ibm
US4072592A (en) * 1974-05-20 1978-02-07 Mobil Oil Corporation Radiation curable coating
US4003877A (en) * 1974-05-24 1977-01-18 Dynachem Corporation Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions
DE2534012C3 (en) * 1975-07-30 1981-05-14 Bayer Ag, 5090 Leverkusen, De
DE2702660C3 (en) * 1976-01-27 1980-07-10 Ppg Industries, Inc., Pittsburgh, Pa. (V.St.A.)
JPS5344346B2 (en) * 1976-03-30 1978-11-28
CA1116919A (en) * 1976-10-27 1982-01-26 Joseph E. Gervay Flame retardant radiation sensitive element of photopolymerizable composition containing halogen and an acrylonitrile containing polymeric binder

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5726846A (en) * 1980-05-27 1982-02-13 Du Pont Photosensitive layer
JPS62178542A (en) * 1986-01-30 1987-08-05 Nippon Kayaku Co Ltd (meth)acrylic acid ester and reactive compound for coating or printing ink
JPH05320312A (en) * 1990-11-20 1993-12-03 W R Grace & Co Preparation of unsaturated epoxy ester resin and carboxylated unsaturated epoxy ester resin, and photosensitive resin composition containing the same
JP2593019B2 (en) * 1990-11-20 1997-03-19 ダブリュー・アール・グレース・アンド・カンパニー−コーン Production method and a photosensitive resin composition containing the same unsaturated epoxy ester resin and carboxylated unsaturated epoxy ester resin
US8399583B2 (en) 2008-03-05 2013-03-19 Nippon Shokubai Co., Ltd. Polymer, curable resin composition, cured product, and article

Also Published As

Publication number Publication date Type
DK460579A (en) 1980-05-02 application
FR2440978B1 (en) 1985-07-19 grant
DE2944097C2 (en) 1988-07-28 grant
DE2944097A1 (en) 1980-05-14 application
FR2440978A1 (en) 1980-06-06 application
JPS6032360B2 (en) 1985-07-27 grant

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