HK1257065A1 - 基板處理裝置及元件製造方法 - Google Patents

基板處理裝置及元件製造方法

Info

Publication number
HK1257065A1
HK1257065A1 HK18116233.3A HK18116233A HK1257065A1 HK 1257065 A1 HK1257065 A1 HK 1257065A1 HK 18116233 A HK18116233 A HK 18116233A HK 1257065 A1 HK1257065 A1 HK 1257065A1
Authority
HK
Hong Kong
Prior art keywords
substrate processing
processing device
manufacturing
device manufacturing
substrate
Prior art date
Application number
HK18116233.3A
Other languages
English (en)
Chinese (zh)
Inventor
鈴木智也
奈良圭
加藤正紀
渡辺智行
鬼頭義昭
堀正和
林田洋祐
小宮山弘樹
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1257065A1 publication Critical patent/HK1257065A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G03F7/70366—Rotary scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
HK18116233.3A 2015-02-27 2017-10-13 基板處理裝置及元件製造方法 HK1257065A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015039243 2015-02-27

Publications (1)

Publication Number Publication Date
HK1257065A1 true HK1257065A1 (zh) 2019-10-11

Family

ID=56788595

Family Applications (1)

Application Number Title Priority Date Filing Date
HK18116233.3A HK1257065A1 (zh) 2015-02-27 2017-10-13 基板處理裝置及元件製造方法

Country Status (6)

Country Link
JP (2) JP6794980B2 (ja)
KR (1) KR102206992B1 (ja)
CN (3) CN107209461B (ja)
HK (1) HK1257065A1 (ja)
TW (2) TWI699624B (ja)
WO (1) WO2016136974A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016136974A1 (ja) * 2015-02-27 2016-09-01 株式会社ニコン 基板処理装置、デバイス製造システム及びデバイス製造方法
CN115561736B (zh) * 2022-10-25 2023-10-13 山东莱恩光电科技股份有限公司 一种激光雷达免维护护罩及雷达

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JPS6111720A (ja) * 1984-06-26 1986-01-20 Canon Inc 画像形成装置
JPH03163477A (ja) * 1989-11-21 1991-07-15 Brother Ind Ltd 分割露光装置
US5668588A (en) * 1993-04-01 1997-09-16 Dainippon Screen Mfg. Co., Ltd. Spiral scanning image recording apparatus and image recording method
JPH07246729A (ja) * 1994-03-11 1995-09-26 Dainippon Screen Mfg Co Ltd 画像記録装置
JPH10142538A (ja) * 1996-11-12 1998-05-29 Asahi Optical Co Ltd マルチヘッド走査光学系を持つレーザ描画装置
JPH10246861A (ja) * 1997-01-06 1998-09-14 Asahi Optical Co Ltd カスケード走査光学系を備えた記録装置
JP2000019438A (ja) * 1998-06-30 2000-01-21 Mitsubishi Chemicals Corp 走査装置
JP3648516B2 (ja) 1999-02-05 2005-05-18 ペンタックスインダストリアルインスツルメンツ株式会社 走査式描画装置
JP2001305454A (ja) * 2000-04-24 2001-10-31 Asahi Optical Co Ltd 走査式描画装置
JP2003115449A (ja) * 2001-02-15 2003-04-18 Nsk Ltd 露光装置
JP2003140069A (ja) * 2001-10-30 2003-05-14 Panasonic Communications Co Ltd 光走査装置及びその調整方法
KR101085372B1 (ko) * 2002-12-10 2011-11-21 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
CN101840162B (zh) * 2005-06-20 2011-09-28 株式会社V技术 曝光装置及图形形成方法
JP2007298603A (ja) * 2006-04-28 2007-11-15 Shinko Electric Ind Co Ltd 描画装置および描画方法
JP4683016B2 (ja) * 2007-07-17 2011-05-11 ブラザー工業株式会社 光走査装置及び印刷装置
JP5319175B2 (ja) * 2008-06-17 2013-10-16 日立造船株式会社 パターン描画方法及び装置
US8264666B2 (en) * 2009-03-13 2012-09-11 Nikon Corporation Exposure apparatus, exposure method, and method of manufacturing device
CN103958379B (zh) * 2011-11-04 2016-12-28 株式会社尼康 基板处理装置及基板处理方法
CN106773558B (zh) * 2012-03-26 2018-05-11 株式会社尼康 扫描曝光装置
JP6074898B2 (ja) * 2012-03-26 2017-02-08 株式会社ニコン 基板処理装置
KR101907365B1 (ko) * 2012-08-28 2018-10-11 가부시키가이샤 니콘 기판 처리 장치
CN102890429B (zh) * 2012-09-18 2015-02-11 天津芯硕精密机械有限公司 光刻系统中倾斜扫描显示下提高数据传输速度的方法
JP2015145990A (ja) * 2014-02-04 2015-08-13 株式会社ニコン 露光装置
JP6361273B2 (ja) * 2014-05-13 2018-07-25 株式会社ニコン 基板処理装置及びデバイス製造方法
WO2016136974A1 (ja) * 2015-02-27 2016-09-01 株式会社ニコン 基板処理装置、デバイス製造システム及びデバイス製造方法

Also Published As

Publication number Publication date
WO2016136974A1 (ja) 2016-09-01
TWI720911B (zh) 2021-03-01
TW201702746A (zh) 2017-01-16
CN108919610B (zh) 2021-02-02
CN110794651A (zh) 2020-02-14
TW202036178A (zh) 2020-10-01
JP6648798B2 (ja) 2020-02-14
JP6794980B2 (ja) 2020-12-02
CN107209461B (zh) 2019-10-18
TWI699624B (zh) 2020-07-21
CN110794651B (zh) 2021-07-09
JPWO2016136974A1 (ja) 2017-12-07
CN107209461A (zh) 2017-09-26
KR102206992B1 (ko) 2021-01-25
JP2019049731A (ja) 2019-03-28
KR20170121168A (ko) 2017-11-01
CN108919610A (zh) 2018-11-30

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