HK1257065A1 - Substrate processing device and device manufacturing method - Google Patents

Substrate processing device and device manufacturing method

Info

Publication number
HK1257065A1
HK1257065A1 HK18116233.3A HK18116233A HK1257065A1 HK 1257065 A1 HK1257065 A1 HK 1257065A1 HK 18116233 A HK18116233 A HK 18116233A HK 1257065 A1 HK1257065 A1 HK 1257065A1
Authority
HK
Hong Kong
Prior art keywords
substrate processing
processing device
manufacturing
device manufacturing
substrate
Prior art date
Application number
HK18116233.3A
Other languages
Chinese (zh)
Inventor
鈴木智也
奈良圭
加藤正紀
渡辺智行
鬼頭義昭
堀正和
林田洋祐
小宮山弘樹
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1257065A1 publication Critical patent/HK1257065A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G03F7/70366—Rotary scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
HK18116233.3A 2015-02-27 2017-10-13 Substrate processing device and device manufacturing method HK1257065A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015039243 2015-02-27

Publications (1)

Publication Number Publication Date
HK1257065A1 true HK1257065A1 (en) 2019-10-11

Family

ID=56788595

Family Applications (1)

Application Number Title Priority Date Filing Date
HK18116233.3A HK1257065A1 (en) 2015-02-27 2017-10-13 Substrate processing device and device manufacturing method

Country Status (6)

Country Link
JP (2) JP6794980B2 (en)
KR (1) KR102206992B1 (en)
CN (3) CN110794651B (en)
HK (1) HK1257065A1 (en)
TW (2) TWI720911B (en)
WO (1) WO2016136974A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI720911B (en) * 2015-02-27 2021-03-01 日商尼康股份有限公司 Pattern drawing device
CN115561736B (en) * 2022-10-25 2023-10-13 山东莱恩光电科技股份有限公司 Laser radar maintenance-free shield and radar

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JPS6111720A (en) * 1984-06-26 1986-01-20 Canon Inc Image forming device
JPH03163477A (en) * 1989-11-21 1991-07-15 Brother Ind Ltd Dividing exposing device
JPH07246729A (en) * 1994-03-11 1995-09-26 Dainippon Screen Mfg Co Ltd Image recorder
US5668588A (en) * 1993-04-01 1997-09-16 Dainippon Screen Mfg. Co., Ltd. Spiral scanning image recording apparatus and image recording method
JPH10142538A (en) * 1996-11-12 1998-05-29 Asahi Optical Co Ltd Laser plotting device having multihead scanning optical system
JPH10246861A (en) * 1997-01-06 1998-09-14 Asahi Optical Co Ltd Recording device equipped with cascade scanning optical system
JP2000019438A (en) * 1998-06-30 2000-01-21 Mitsubishi Chemicals Corp Scanner
JP3648516B2 (en) 1999-02-05 2005-05-18 ペンタックスインダストリアルインスツルメンツ株式会社 Scanning drawing device
JP2001305454A (en) * 2000-04-24 2001-10-31 Asahi Optical Co Ltd Scanning type plotting device
JP2003115449A (en) * 2001-02-15 2003-04-18 Nsk Ltd Projection aligner
JP2003140069A (en) * 2001-10-30 2003-05-14 Panasonic Communications Co Ltd Optical scanner and its adjusting method
SG171468A1 (en) * 2002-12-10 2011-06-29 Nikon Corp Exposure apparatus and method for producing device
CN101840162B (en) * 2005-06-20 2011-09-28 株式会社V技术 Exposure unit and pattern forming method
JP2007298603A (en) * 2006-04-28 2007-11-15 Shinko Electric Ind Co Ltd Drawing device and drawing method
JP4683016B2 (en) * 2007-07-17 2011-05-11 ブラザー工業株式会社 Optical scanning apparatus and printing apparatus
JP5319175B2 (en) * 2008-06-17 2013-10-16 日立造船株式会社 Pattern drawing method and apparatus
US8264666B2 (en) * 2009-03-13 2012-09-11 Nikon Corporation Exposure apparatus, exposure method, and method of manufacturing device
KR101623695B1 (en) * 2011-11-04 2016-05-23 가부시키가이샤 니콘 Substrate processing apparatus and substrate processing method
JP6074898B2 (en) * 2012-03-26 2017-02-08 株式会社ニコン Substrate processing equipment
CN106773558B (en) * 2012-03-26 2018-05-11 株式会社尼康 Scanning-exposure apparatus
JP6245174B2 (en) * 2012-08-28 2017-12-13 株式会社ニコン Substrate support apparatus and exposure apparatus
CN102890429B (en) * 2012-09-18 2015-02-11 天津芯硕精密机械有限公司 Method for increasing data transmission speed in photoetching system through skew scanning display
JP2015145990A (en) * 2014-02-04 2015-08-13 株式会社ニコン exposure apparatus
JP6361273B2 (en) * 2014-05-13 2018-07-25 株式会社ニコン Substrate processing apparatus and device manufacturing method
TWI720911B (en) * 2015-02-27 2021-03-01 日商尼康股份有限公司 Pattern drawing device

Also Published As

Publication number Publication date
JPWO2016136974A1 (en) 2017-12-07
CN108919610A (en) 2018-11-30
KR102206992B1 (en) 2021-01-25
CN110794651A (en) 2020-02-14
CN108919610B (en) 2021-02-02
JP6648798B2 (en) 2020-02-14
TW201702746A (en) 2017-01-16
TWI699624B (en) 2020-07-21
JP2019049731A (en) 2019-03-28
TWI720911B (en) 2021-03-01
TW202036178A (en) 2020-10-01
JP6794980B2 (en) 2020-12-02
CN107209461B (en) 2019-10-18
CN107209461A (en) 2017-09-26
CN110794651B (en) 2021-07-09
KR20170121168A (en) 2017-11-01
WO2016136974A1 (en) 2016-09-01

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