HK1211134A1 - Mobile body device, exposure device, and device-manufacturing method - Google Patents

Mobile body device, exposure device, and device-manufacturing method

Info

Publication number
HK1211134A1
HK1211134A1 HK15111738.7A HK15111738A HK1211134A1 HK 1211134 A1 HK1211134 A1 HK 1211134A1 HK 15111738 A HK15111738 A HK 15111738A HK 1211134 A1 HK1211134 A1 HK 1211134A1
Authority
HK
Hong Kong
Prior art keywords
manufacturing
mobile body
exposure
exposure device
body device
Prior art date
Application number
HK15111738.7A
Other languages
English (en)
Chinese (zh)
Inventor
Yuichi Shibazaki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1211134A1 publication Critical patent/HK1211134A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816—Bearings
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K7/00—Arrangements for handling mechanical energy structurally associated with dynamo-electric machines, e.g. structural association with mechanical driving motors or auxiliary dynamo-electric machines
    • H02K7/08—Structural association with bearings
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18—Machines moving with multiple degrees of freedom

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Linear Motors (AREA)
  • Control Of Position, Course, Altitude, Or Attitude Of Moving Bodies (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
HK15111738.7A 2012-10-02 2015-11-27 Mobile body device, exposure device, and device-manufacturing method HK1211134A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012219946 2012-10-02
PCT/JP2013/076819 WO2014054689A1 (ja) 2012-10-02 2013-10-02 移動体装置、露光装置、及びデバイス製造方法

Publications (1)

Publication Number Publication Date
HK1211134A1 true HK1211134A1 (en) 2016-05-13

Family

ID=50435010

Family Applications (2)

Application Number Title Priority Date Filing Date
HK15111738.7A HK1211134A1 (en) 2012-10-02 2015-11-27 Mobile body device, exposure device, and device-manufacturing method
HK19101385.0A HK1258908A1 (zh) 2012-10-02 2019-01-28 曝光裝置以及器件製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK19101385.0A HK1258908A1 (zh) 2012-10-02 2019-01-28 曝光裝置以及器件製造方法

Country Status (7)

Country Link
US (2) US10133194B2 (xx)
EP (1) EP2905804B1 (xx)
JP (2) JP6394967B2 (xx)
KR (1) KR102126664B1 (xx)
CN (2) CN104798178B (xx)
HK (2) HK1211134A1 (xx)
WO (1) WO2014054689A1 (xx)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111435222B (zh) * 2019-01-14 2021-04-02 上海微电子装备（集团）股份有限公司 一种运动台随动压力补偿装置、光刻机系统及其驱动方法
EP3973623B1 (de) * 2019-06-27 2023-11-01 Beckhoff Automation GmbH Anordnung von statormodulen für ein planarantriebssystem
JP2023061293A (ja) 2021-10-19 2023-05-01 東京エレクトロン株式会社 基板搬送装置及び基板搬送方法
DE102021127039A1 (de) * 2021-10-19 2023-04-20 Beckhoff Automation Gmbh Verfahren zum Betreiben eines Planarantriebssystems und Planarantriebssystem

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US5677758A (en) * 1995-02-09 1997-10-14 Mrs Technology, Inc. Lithography System using dual substrate stages
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EP1063742A4 (en) 1998-03-11 2005-04-20 Nikon Corp ULTRAVIOLET LASER DEVICE AND EXPOSURE APPARATUS COMPRISING SUCH A ULTRAVIOLET LASER DEVICE
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US6351041B1 (en) * 1999-07-29 2002-02-26 Nikon Corporation Stage apparatus and inspection apparatus having stage apparatus
JP2001102429A (ja) * 1999-07-29 2001-04-13 Nikon Corp ステージ装置およびそれを備えた検査装置
JP2001118773A (ja) * 1999-10-18 2001-04-27 Nikon Corp ステージ装置及び露光装置
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KR20010085493A (ko) 2000-02-25 2001-09-07 시마무라 기로 노광장치, 그 조정방법, 및 상기 노광장치를 이용한디바이스 제조방법
US6408767B1 (en) * 2000-03-01 2002-06-25 Nikon Corporation Low stiffness suspension for a stage
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KR101245070B1 (ko) * 2004-06-21 2013-03-18 가부시키가이샤 니콘 노광 장치 및 그 부재의 세정 방법, 노광 장치의 메인터넌스 방법, 메인터넌스 기기, 그리고 디바이스 제조 방법
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US20080012511A1 (en) * 2004-07-15 2008-01-17 Nikon Corporation Planar Motor Device, Stage Device, Exposure Device and Device Manufacturing Method
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JP4826766B2 (ja) * 2006-06-26 2011-11-30 日立金属株式会社 Ｘｙステージ
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TWI422981B (zh) * 2006-08-31 2014-01-11 尼康股份有限公司 Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method
JP5146323B2 (ja) 2006-12-27 2013-02-20 株式会社ニコン ステージ装置、露光装置、及びデバイスの製造方法
JP5505584B2 (ja) * 2006-12-28 2014-05-28 株式会社ニコン 露光装置
CN102566320B (zh) 2007-12-28 2015-01-28 株式会社尼康 曝光装置、曝光方法以及器件制造方法
WO2009110202A1 (ja) * 2008-03-07 2009-09-11 株式会社ニコン 移動体装置及び露光装置
US8294878B2 (en) * 2009-06-19 2012-10-23 Nikon Corporation Exposure apparatus and device manufacturing method
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JP2011133398A (ja) * 2009-12-25 2011-07-07 Nikon Corp 移動体装置、露光装置、デバイス製造方法、及び移動体の位置情報計測方法
JP5573214B2 (ja) * 2010-02-12 2014-08-20 株式会社ニコン 露光装置のメンテナンス方法、露光装置の製造方法及びデバイス製造方法

Also Published As

Publication number Publication date
KR102126664B1 (ko) 2020-06-25
JP6394967B2 (ja) 2018-09-26
US20150301458A1 (en) 2015-10-22
US20190079415A1 (en) 2019-03-14
EP2905804A1 (en) 2015-08-12
EP2905804A4 (en) 2017-01-25
EP2905804B1 (en) 2019-05-01
US10133194B2 (en) 2018-11-20
HK1258908A1 (zh) 2019-11-22
CN104798178B (zh) 2018-07-20
US10474044B2 (en) 2019-11-12
KR20150060982A (ko) 2015-06-03
CN108983554A (zh) 2018-12-11
JP2018146983A (ja) 2018-09-20
JP6566218B2 (ja) 2019-08-28
WO2014054689A1 (ja) 2014-04-10
JPWO2014054689A1 (ja) 2016-08-25
CN104798178A (zh) 2015-07-22

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20230930