HK1250794A1 - 曝光設備、曝光方法及裝置製造方法 - Google Patents

曝光設備、曝光方法及裝置製造方法

Info

Publication number
HK1250794A1
HK1250794A1 HK18110210.3A HK18110210A HK1250794A1 HK 1250794 A1 HK1250794 A1 HK 1250794A1 HK 18110210 A HK18110210 A HK 18110210A HK 1250794 A1 HK1250794 A1 HK 1250794A1
Authority
HK
Hong Kong
Prior art keywords
exposure apparatus
device manufacturing
exposing
exposing method
manufacturing
Prior art date
Application number
HK18110210.3A
Other languages
English (en)
Inventor
Shinji Sato
Nobutaka Matsumura
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1250794A1 publication Critical patent/HK1250794A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK18110210.3A 2012-12-27 2018-08-08 曝光設備、曝光方法及裝置製造方法 HK1250794A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012285783A JP6119242B2 (ja) 2012-12-27 2012-12-27 露光装置、露光方法、及びデバイス製造方法

Publications (1)

Publication Number Publication Date
HK1250794A1 true HK1250794A1 (zh) 2019-01-11

Family

ID=51021185

Family Applications (2)

Application Number Title Priority Date Filing Date
HK16102132.7A HK1214406A1 (zh) 2012-12-27 2016-02-25 曝光設備、曝光方法、設備製造方法、程序和記錄介質
HK18110210.3A HK1250794A1 (zh) 2012-12-27 2018-08-08 曝光設備、曝光方法及裝置製造方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
HK16102132.7A HK1214406A1 (zh) 2012-12-27 2016-02-25 曝光設備、曝光方法、設備製造方法、程序和記錄介質

Country Status (4)

Country Link
EP (2) EP2940713B1 (zh)
JP (1) JP6119242B2 (zh)
HK (2) HK1214406A1 (zh)
WO (1) WO2014104107A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2009692A (en) 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
KR102206979B1 (ko) 2016-09-12 2021-01-25 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치를 위한 유체 처리 구조물
US11156921B2 (en) 2017-12-15 2021-10-26 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure
CN112684665B (zh) * 2020-12-25 2024-06-25 浙江启尔机电技术有限公司 一种浸液供给回收装置

Family Cites Families (24)

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Publication number Priority date Publication date Assignee Title
KR20030096435A (ko) 1996-11-28 2003-12-31 가부시키가이샤 니콘 노광장치 및 노광방법
US6262796B1 (en) 1997-03-10 2001-07-17 Asm Lithography B.V. Positioning device having two object holders
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
US6452292B1 (en) 2000-06-26 2002-09-17 Nikon Corporation Planar motor with linear coil arrays
JP2002154495A (ja) * 2000-11-21 2002-05-28 Mitsubishi Heavy Ind Ltd 微小重力環境振動吸収リンク機構
EP1364257A1 (en) 2001-02-27 2003-11-26 ASML US, Inc. Simultaneous imaging of two reticles
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
AU2003256081A1 (en) 2002-08-23 2004-03-11 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
KR20050085235A (ko) * 2002-12-10 2005-08-29 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR20170070264A (ko) 2003-09-03 2017-06-21 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
JP5167572B2 (ja) * 2004-02-04 2013-03-21 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
KR101253355B1 (ko) * 2004-03-25 2013-04-11 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
WO2005122219A1 (ja) 2004-06-09 2005-12-22 Nikon Corporation 基板保持装置及びそれを備える露光装置、露光方法、デバイス製造方法、並びに撥液プレート
TWI424260B (zh) 2005-03-18 2014-01-21 尼康股份有限公司 A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
US7864292B2 (en) 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4567651B2 (ja) * 2005-11-16 2010-10-20 エーエスエムエル ネザーランズ ビー．ブイ． 露光装置及びデバイス製造方法
TW201901745A (zh) 2006-01-19 2019-01-01 日商尼康股份有限公司 曝光裝置及曝光方法、以及元件製造方法
JP5151977B2 (ja) * 2006-05-10 2013-02-27 株式会社ニコン 露光装置及びデバイス製造方法
JP4366407B2 (ja) * 2007-02-16 2009-11-18 キヤノン株式会社 露光装置及びデバイス製造方法
JP2009088037A (ja) * 2007-09-28 2009-04-23 Nikon Corp 露光方法及びデバイス製造方法、並びに露光装置
US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
EP2940713A1 (en) 2015-11-04
EP3330799A1 (en) 2018-06-06
EP2940713A4 (en) 2016-11-02
HK1214406A1 (zh) 2016-07-22
WO2014104107A1 (ja) 2014-07-03
JP2014127697A (ja) 2014-07-07
EP3330799B1 (en) 2020-03-04
EP2940713B1 (en) 2017-11-22
JP6119242B2 (ja) 2017-04-26

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