HK1214406A1 - 曝光設備、曝光方法、設備製造方法、程序和記錄介質 - Google Patents

曝光設備、曝光方法、設備製造方法、程序和記錄介質

Info

Publication number
HK1214406A1
HK1214406A1 HK16102132.7A HK16102132A HK1214406A1 HK 1214406 A1 HK1214406 A1 HK 1214406A1 HK 16102132 A HK16102132 A HK 16102132A HK 1214406 A1 HK1214406 A1 HK 1214406A1
Authority
HK
Hong Kong
Prior art keywords
exposure
program
recording medium
production method
device production
Prior art date
Application number
HK16102132.7A
Other languages
English (en)
Inventor
Shinji Sato
Nobutaka Matsumura
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1214406A1 publication Critical patent/HK1214406A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK16102132.7A 2012-12-27 2016-02-25 曝光設備、曝光方法、設備製造方法、程序和記錄介質 HK1214406A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012285783A JP6119242B2 (ja) 2012-12-27 2012-12-27 露光装置、露光方法、及びデバイス製造方法
PCT/JP2013/084694 WO2014104107A1 (ja) 2012-12-27 2013-12-25 露光装置、露光方法、デバイス製造方法、プログラム、及び記録媒体

Publications (1)

Publication Number Publication Date
HK1214406A1 true HK1214406A1 (zh) 2016-07-22

Family

ID=51021185

Family Applications (2)

Application Number Title Priority Date Filing Date
HK16102132.7A HK1214406A1 (zh) 2012-12-27 2016-02-25 曝光設備、曝光方法、設備製造方法、程序和記錄介質
HK18110210.3A HK1250794A1 (zh) 2012-12-27 2018-08-08 曝光設備、曝光方法及裝置製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK18110210.3A HK1250794A1 (zh) 2012-12-27 2018-08-08 曝光設備、曝光方法及裝置製造方法

Country Status (4)

Country Link
EP (2) EP2940713B1 (zh)
JP (1) JP6119242B2 (zh)
HK (2) HK1214406A1 (zh)
WO (1) WO2014104107A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2009692A (en) 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
KR102206979B1 (ko) 2016-09-12 2021-01-25 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치를 위한 유체 처리 구조물
WO2019115197A1 (en) 2017-12-15 2019-06-20 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure
CN112684665B (zh) * 2020-12-25 2024-06-25 浙江启尔机电技术有限公司 一种浸液供给回收装置

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG93267A1 (en) 1996-11-28 2002-12-17 Nikon Corp An exposure apparatus and an exposure method
DE69829614T2 (de) 1997-03-10 2006-03-09 Asml Netherlands B.V. Lithographiegerät mit einer positioniervorrichtung mit zwei objekthaltern
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
US6452292B1 (en) 2000-06-26 2002-09-17 Nikon Corporation Planar motor with linear coil arrays
JP2002154495A (ja) * 2000-11-21 2002-05-28 Mitsubishi Heavy Ind Ltd 微小重力環境振動吸収リンク機構
US6611316B2 (en) 2001-02-27 2003-08-26 Asml Holding N.V. Method and system for dual reticle image exposure
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
AU2003256081A1 (en) 2002-08-23 2004-03-11 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
CN100446179C (zh) * 2002-12-10 2008-12-24 株式会社尼康 曝光设备和器件制造法
EP3223053A1 (en) 2003-09-03 2017-09-27 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
JP5167572B2 (ja) * 2004-02-04 2013-03-21 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
TWI402893B (zh) * 2004-03-25 2013-07-21 尼康股份有限公司 曝光方法
KR101511876B1 (ko) 2004-06-09 2015-04-13 가부시키가이샤 니콘 기판 유지 장치 및 그것을 구비하는 노광 장치, 노광 방법, 디바이스 제조 방법, 그리고 발액 플레이트
TWI424260B (zh) 2005-03-18 2014-01-21 尼康股份有限公司 A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
JP4567651B2 (ja) * 2005-11-16 2010-10-20 エーエスエムエル ネザーランズ ビー．ブイ． 露光装置及びデバイス製造方法
US7864292B2 (en) 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN101356623B (zh) 2006-01-19 2012-05-09 株式会社尼康 移动体驱动方法及移动体驱动系统、图案形成方法及图案形成装置、曝光方法及曝光装置、以及元件制造方法
TWI439813B (zh) * 2006-05-10 2014-06-01 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
JP4366407B2 (ja) * 2007-02-16 2009-11-18 キヤノン株式会社 露光装置及びデバイス製造方法
JP2009088037A (ja) * 2007-09-28 2009-04-23 Nikon Corp 露光方法及びデバイス製造方法、並びに露光装置
US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
EP2940713B1 (en) 2017-11-22
EP3330799A1 (en) 2018-06-06
EP3330799B1 (en) 2020-03-04
JP2014127697A (ja) 2014-07-07
JP6119242B2 (ja) 2017-04-26
HK1250794A1 (zh) 2019-01-11
EP2940713A4 (en) 2016-11-02
EP2940713A1 (en) 2015-11-04
WO2014104107A1 (ja) 2014-07-03

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20221225