HK1198303A1 - Semiconductor device and method of manufacturing the same - Google Patents
Semiconductor device and method of manufacturing the same Download PDFInfo
- Publication number
- HK1198303A1 HK1198303A1 HK14111822.5A HK14111822A HK1198303A1 HK 1198303 A1 HK1198303 A1 HK 1198303A1 HK 14111822 A HK14111822 A HK 14111822A HK 1198303 A1 HK1198303 A1 HK 1198303A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- insulating film
- film
- semiconductor device
- region
- forming
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/20—Inductors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/40—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/201—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates the substrates comprising an insulating layer on a semiconductor body, e.g. SOI
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
- H10W20/497—Inductive arrangements or effects of, or between, wiring layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/019—Manufacture or treatment of bond pads
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/811—Multiple chips on leadframes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/075—Connecting or disconnecting of bond wires
- H10W72/07541—Controlling the environment, e.g. atmosphere composition or temperature
- H10W72/07553—Controlling the environment, e.g. atmosphere composition or temperature changes in shapes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/531—Shapes of wire connectors
- H10W72/537—Multiple bond wires having different shapes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/541—Dispositions of bond wires
- H10W72/5445—Dispositions of bond wires being orthogonal to a side surface of the chip, e.g. parallel arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/541—Dispositions of bond wires
- H10W72/5449—Dispositions of bond wires not being orthogonal to a side surface of the chip, e.g. fan-out arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/541—Dispositions of bond wires
- H10W72/547—Dispositions of multiple bond wires
- H10W72/5473—Dispositions of multiple bond wires multiple bond wires connected to a common bond pad
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/551—Materials of bond wires
- H10W72/552—Materials of bond wires comprising metals or metalloids, e.g. silver
- H10W72/5522—Materials of bond wires comprising metals or metalloids, e.g. silver comprising gold [Au]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/59—Bond pads specially adapted therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/931—Shapes of bond pads
- H10W72/932—Plan-view shape, i.e. in top view
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/941—Dispositions of bond pads
- H10W72/944—Dispositions of multiple bond pads
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/981—Auxiliary members, e.g. spacers
- H10W72/983—Reinforcing structures, e.g. collars
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/753—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between laterally-adjacent chips
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Manufacturing & Machinery (AREA)
- Coils Or Transformers For Communication (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012279843A JP6091206B2 (ja) | 2012-12-21 | 2012-12-21 | 半導体装置および半導体装置の製造方法 |
| JP2012-279843 | 2012-12-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| HK1198303A1 true HK1198303A1 (en) | 2015-03-27 |
Family
ID=50956112
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK14111822.5A HK1198303A1 (en) | 2012-12-21 | 2014-11-21 | Semiconductor device and method of manufacturing the same |
Country Status (4)
| Country | Link |
|---|---|
| US (4) | US8987861B2 (enExample) |
| JP (1) | JP6091206B2 (enExample) |
| CN (1) | CN103887287B (enExample) |
| HK (1) | HK1198303A1 (enExample) |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8994494B2 (en) | 2008-10-10 | 2015-03-31 | Polaris Industries Inc. | Vehicle security system |
| US9162558B2 (en) | 2009-06-15 | 2015-10-20 | Polaris Industries Inc. | Electric vehicle |
| US8517136B2 (en) | 2010-04-06 | 2013-08-27 | Polaris Industries Inc. | Vehicle |
| WO2012138991A2 (en) | 2011-04-08 | 2012-10-11 | Polaris Industries Inc. | Electric vehicle with range extender |
| CN102832189B (zh) * | 2012-09-11 | 2014-07-16 | 矽力杰半导体技术(杭州)有限公司 | 一种多芯片封装结构及其封装方法 |
| US9929038B2 (en) | 2013-03-07 | 2018-03-27 | Analog Devices Global | Insulating structure, a method of forming an insulating structure, and a chip scale isolator including such an insulating structure |
| US9653396B2 (en) * | 2013-03-25 | 2017-05-16 | Renesas Electronics Corporation | Semiconductor device and method of manufacturing the same |
| JP6395304B2 (ja) | 2013-11-13 | 2018-09-26 | ローム株式会社 | 半導体装置および半導体モジュール |
| CN104810244B (zh) * | 2014-01-26 | 2018-12-18 | 中芯国际集成电路制造(上海)有限公司 | 一种半导体器件的制造方法、半导体器件和电子装置 |
| JP6402978B2 (ja) * | 2014-07-25 | 2018-10-10 | セイコーエプソン株式会社 | 半導体回路素子、電子機器、および移動体 |
| US10236265B2 (en) | 2014-07-28 | 2019-03-19 | Infineon Technologies Ag | Semiconductor chip and method for forming a chip pad |
| JP6434763B2 (ja) * | 2014-09-29 | 2018-12-05 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| DE102014117510A1 (de) | 2014-11-28 | 2016-06-02 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement |
| CN105789108B (zh) * | 2014-12-16 | 2019-02-12 | 中芯国际集成电路制造(上海)有限公司 | 功率晶体管芯片的制作方法及功率晶体管芯片 |
| JP6589277B2 (ja) * | 2015-01-14 | 2019-10-16 | 富士電機株式会社 | 高耐圧受動素子および高耐圧受動素子の製造方法 |
| JP6724308B2 (ja) * | 2015-08-07 | 2020-07-15 | セイコーエプソン株式会社 | 発振モジュール、振動デバイス、電子機器、および移動体 |
| JP2017045864A (ja) * | 2015-08-26 | 2017-03-02 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
| US20180261467A1 (en) * | 2015-10-01 | 2018-09-13 | Renesas Electronics Corporation | Semiconductor device and method of manufacturing the same |
| US9941565B2 (en) | 2015-10-23 | 2018-04-10 | Analog Devices Global | Isolator and method of forming an isolator |
| US10204732B2 (en) | 2015-10-23 | 2019-02-12 | Analog Devices Global | Dielectric stack, an isolator device and method of forming an isolator device |
| JP2017098334A (ja) * | 2015-11-19 | 2017-06-01 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
| JP2018182223A (ja) * | 2017-04-20 | 2018-11-15 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
| JP6819564B2 (ja) * | 2017-12-19 | 2021-01-27 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
| DE102019122844B4 (de) | 2018-08-29 | 2024-07-25 | Analog Devices International Unlimited Company | Back-to-Back-Isolationsschaltung |
| CN109326571B (zh) * | 2018-09-26 | 2020-12-29 | 矽力杰半导体技术(杭州)有限公司 | 芯片封装组件及其制造方法 |
| JP2020088200A (ja) * | 2018-11-27 | 2020-06-04 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
| US11450469B2 (en) | 2019-08-28 | 2022-09-20 | Analog Devices Global Unlimited Company | Insulation jacket for top coil of an isolated transformer |
| US11716117B2 (en) * | 2020-02-14 | 2023-08-01 | Texas Instruments Incorporated | Circuit support structure with integrated isolation circuitry |
| JP7332775B2 (ja) * | 2020-03-19 | 2023-08-23 | 株式会社東芝 | アイソレータ |
| JP7284121B2 (ja) * | 2020-03-23 | 2023-05-30 | 株式会社東芝 | アイソレータ |
| JP2021174955A (ja) * | 2020-04-30 | 2021-11-01 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
| DE112021004413B4 (de) * | 2020-09-23 | 2024-06-13 | Rohm Co. Ltd. | Halbleitervorrichtung, Halbleitermodul, Motoransteuerungsvorrichtung und Fahrzeug |
| JP7535953B2 (ja) * | 2021-01-13 | 2024-08-19 | 三菱電機株式会社 | トランス装置および半導体装置 |
| JP2022144836A (ja) | 2021-03-19 | 2022-10-03 | 株式会社東芝 | アイソレータ |
| CN113035507B (zh) * | 2021-04-22 | 2025-09-30 | 全球能源互联网研究院有限公司 | 一种用于直流gis的电压互感器 |
| US11887948B2 (en) * | 2021-08-02 | 2024-01-30 | Stmicroelectronics S.R.L. | Integrated circuit chip including a passivation nitride layer in contact with a high voltage bonding pad and method of making |
| CN115831916B (zh) * | 2021-09-17 | 2024-03-15 | 上海玻芯成微电子科技有限公司 | 一种隔离器及芯片 |
| JP7615073B2 (ja) * | 2022-02-25 | 2025-01-16 | 三菱電機株式会社 | トランス素子、半導体装置、トランス素子の製造方法、および半導体装置の製造方法 |
| US20240113094A1 (en) * | 2022-09-30 | 2024-04-04 | Texas Instruments Incorporated | Galvanic isolation device |
| WO2024072851A1 (en) * | 2022-09-30 | 2024-04-04 | Texas Instruments Incorporated | Micro device with shear pad |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0413212A (ja) * | 1990-05-07 | 1992-01-17 | Mitsubishi Electric Corp | 薄膜磁気ヘッド |
| JPH0629662A (ja) * | 1992-07-10 | 1994-02-04 | Toray Ind Inc | 多層配線構成体およびポリイミド系絶縁膜のパターン加工方法 |
| JPH10255239A (ja) * | 1997-03-06 | 1998-09-25 | Read Rite S M I Kk | インダクティブ/mr複合型薄膜磁気ヘッド |
| JP3420703B2 (ja) * | 1998-07-16 | 2003-06-30 | 株式会社東芝 | 半導体装置の製造方法 |
| JP3408172B2 (ja) * | 1998-12-10 | 2003-05-19 | 三洋電機株式会社 | チップサイズパッケージ及びその製造方法 |
| US6483662B1 (en) * | 1999-07-09 | 2002-11-19 | Read-Rite Corporation | High density multi-coil magnetic write head having a reduced yoke length and short flux rise time |
| JP2005150329A (ja) * | 2003-11-14 | 2005-06-09 | Canon Inc | 配線構造及びその作製方法 |
| US7470927B2 (en) * | 2005-05-18 | 2008-12-30 | Megica Corporation | Semiconductor chip with coil element over passivation layer |
| JP2009212332A (ja) * | 2008-03-05 | 2009-09-17 | Nec Electronics Corp | 半導体装置及びその製造方法 |
| JP2009267215A (ja) * | 2008-04-28 | 2009-11-12 | Fuji Electric Device Technology Co Ltd | 半導体装置の製造方法 |
| JP2009302268A (ja) * | 2008-06-13 | 2009-12-24 | Toyota Central R&D Labs Inc | トランス素子が形成されている半導体装置とその製造方法 |
| JP2009302418A (ja) | 2008-06-17 | 2009-12-24 | Nec Electronics Corp | 回路装置及びその製造方法 |
| KR101548777B1 (ko) * | 2011-12-19 | 2015-09-01 | 삼성전기주식회사 | 노이즈 제거 필터 |
| US9653396B2 (en) * | 2013-03-25 | 2017-05-16 | Renesas Electronics Corporation | Semiconductor device and method of manufacturing the same |
| EP3101685B1 (en) * | 2014-01-29 | 2020-01-01 | Renesas Electronics Corporation | Semiconductor device |
-
2012
- 2012-12-21 JP JP2012279843A patent/JP6091206B2/ja active Active
-
2013
- 2013-12-13 US US14/106,569 patent/US8987861B2/en active Active
- 2013-12-20 CN CN201310712188.8A patent/CN103887287B/zh not_active Expired - Fee Related
-
2014
- 2014-11-21 HK HK14111822.5A patent/HK1198303A1/xx unknown
-
2015
- 2015-02-18 US US14/625,390 patent/US9219108B2/en active Active
- 2015-12-07 US US14/961,622 patent/US9818815B2/en active Active
-
2017
- 2017-10-31 US US15/799,772 patent/US10157974B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2014123671A (ja) | 2014-07-03 |
| CN103887287A (zh) | 2014-06-25 |
| US9818815B2 (en) | 2017-11-14 |
| US8987861B2 (en) | 2015-03-24 |
| CN103887287B (zh) | 2019-04-09 |
| US20180069073A1 (en) | 2018-03-08 |
| JP6091206B2 (ja) | 2017-03-08 |
| US10157974B2 (en) | 2018-12-18 |
| US20140175602A1 (en) | 2014-06-26 |
| US9219108B2 (en) | 2015-12-22 |
| US20150162395A1 (en) | 2015-06-11 |
| US20160087025A1 (en) | 2016-03-24 |
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