HK1146751A1 - Film type transfer material - Google Patents
Film type transfer materialInfo
- Publication number
- HK1146751A1 HK1146751A1 HK11100873.9A HK11100873A HK1146751A1 HK 1146751 A1 HK1146751 A1 HK 1146751A1 HK 11100873 A HK11100873 A HK 11100873A HK 1146751 A1 HK1146751 A1 HK 1146751A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- transfer material
- film type
- type transfer
- film
- type
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/0005—Enlarging or reduction of graphic information on a support by stretching or contracting the support, optionally in combination with the recording
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20070107798 | 2007-10-25 | ||
KR1020080104904A KR101115162B1 (ko) | 2007-10-25 | 2008-10-24 | 필름형 감광성 전사재료 |
PCT/KR2008/006318 WO2009054705A2 (en) | 2007-10-25 | 2008-10-24 | Film type transfer material |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1146751A1 true HK1146751A1 (en) | 2011-07-08 |
Family
ID=40765057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK11100873.9A HK1146751A1 (en) | 2007-10-25 | 2011-01-27 | Film type transfer material |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP5483734B2 (zh) |
KR (1) | KR101115162B1 (zh) |
CN (1) | CN101836162B (zh) |
HK (1) | HK1146751A1 (zh) |
MY (1) | MY167509A (zh) |
TW (1) | TWI395058B (zh) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101258733B1 (ko) * | 2009-09-30 | 2013-04-30 | 코오롱인더스트리 주식회사 | 드라이필름 포토레지스트 |
CN103119663B (zh) * | 2010-09-28 | 2015-06-24 | 三菱制纸株式会社 | 导电材料前体及导电材料 |
KR102194713B1 (ko) | 2014-01-27 | 2020-12-23 | 삼성전기주식회사 | 드라이 필름 포토레지스트 |
DE102014001688A1 (de) * | 2014-02-07 | 2015-08-13 | Giesecke & Devrient Gmbh | Herstellung eines Sicherheitselements mit Farbänderungseigenschaften |
KR102287289B1 (ko) * | 2014-07-08 | 2021-08-06 | 주식회사 동진쎄미켐 | 투명 전극 복합체 |
KR102578975B1 (ko) * | 2015-03-20 | 2023-09-18 | 아지노모토 가부시키가이샤 | 밀봉체의 제조 방법 |
TWI763631B (zh) | 2015-07-08 | 2022-05-11 | 日商昭和電工材料股份有限公司 | 感光性元件、抗蝕劑圖案的形成方法及印刷配線板的製造方法 |
EP3424743B1 (en) * | 2016-03-08 | 2020-08-19 | Dai Nippon Printing Co., Ltd. | Thermal transfer sheet and combination of transfer foil and thermal transfer sheet |
WO2019008898A1 (ja) * | 2017-07-06 | 2019-01-10 | リンテック株式会社 | 樹脂膜形成用フィルム及び樹脂膜形成用複合シート |
CN107172804B (zh) * | 2017-07-11 | 2023-12-26 | 昆山倬跃蓝天电子科技有限公司 | 一种感光覆盖膜及产品 |
WO2019215848A1 (ja) | 2018-05-09 | 2019-11-14 | 日立化成株式会社 | 感光性エレメント、バリア層形成用樹脂組成物、レジストパターンの形成方法及びプリント配線板の製造方法 |
CN110534647B (zh) * | 2019-08-28 | 2023-12-26 | 云谷(固安)科技有限公司 | 柔性衬底、显示基板和显示面板 |
WO2024075158A1 (ja) * | 2022-10-03 | 2024-04-11 | 株式会社レゾナック | 感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59137948A (ja) * | 1983-01-27 | 1984-08-08 | Mitsubishi Chem Ind Ltd | ドライフイルム状フオトレジスト材料 |
IL84298A0 (en) * | 1986-11-14 | 1988-03-31 | Thiokol Morton Inc | Improved photosensitive laminate |
JP2992128B2 (ja) * | 1991-06-21 | 1999-12-20 | 日本合成化学工業株式会社 | フォトレジストフィルム |
JP3051252B2 (ja) * | 1992-02-28 | 2000-06-12 | 日本合成化学工業株式会社 | フォトレジストフイルムのラミネート方法 |
JPH06161098A (ja) * | 1992-11-20 | 1994-06-07 | Tokyo Ohka Kogyo Co Ltd | サンドブラスト用感光性樹脂組成物及びこれを用いた感光性フィルム |
JP3241144B2 (ja) * | 1993-02-19 | 2001-12-25 | 日立化成工業株式会社 | 感光性樹脂組成物積層体、レジストパターンの製造法、基板、プリント配線板の製造法、プリント配線板及び機器 |
JP4129543B2 (ja) * | 2002-08-08 | 2008-08-06 | 三菱樹脂株式会社 | ドライフィルムレジスト用保護フィルム |
JP2005227398A (ja) * | 2004-02-10 | 2005-08-25 | Fuji Photo Film Co Ltd | 感光性転写シート |
TWI318333B (en) * | 2004-03-26 | 2009-12-11 | Fujifilm Corp | Photosensitive composition, photosensitive transfer material, light shielding layer for display device, color filter, liquid crystal display element, substrate having light shielding layer and process for producing the same |
US20060037100A1 (en) * | 2004-08-12 | 2006-02-16 | Kim Young S | Fungal resistant transgenic pepper plants and their production method |
DE602005010378D1 (de) * | 2004-12-22 | 2008-11-27 | Rohm & Haas Elect Mat | Verfahren zur Herstellung optischer Vorrichtungen mit Polymerschichten |
WO2007125992A1 (ja) * | 2006-04-28 | 2007-11-08 | Asahi Kasei Emd Corporation | 感光性樹脂積層体 |
JP4979391B2 (ja) * | 2007-01-17 | 2012-07-18 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂積層体 |
JP2009083482A (ja) * | 2007-09-13 | 2009-04-23 | Asahi Kasei Electronics Co Ltd | 感光性樹脂積層体 |
-
2008
- 2008-10-24 CN CN2008801126086A patent/CN101836162B/zh active Active
- 2008-10-24 KR KR1020080104904A patent/KR101115162B1/ko active IP Right Grant
- 2008-10-24 JP JP2010530935A patent/JP5483734B2/ja active Active
- 2008-10-24 MY MYPI2010001855A patent/MY167509A/en unknown
- 2008-10-27 TW TW097141236A patent/TWI395058B/zh active
-
2011
- 2011-01-27 HK HK11100873.9A patent/HK1146751A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW200937114A (en) | 2009-09-01 |
JP2011501233A (ja) | 2011-01-06 |
MY167509A (en) | 2018-09-04 |
TWI395058B (zh) | 2013-05-01 |
CN101836162A (zh) | 2010-09-15 |
JP5483734B2 (ja) | 2014-05-07 |
KR101115162B1 (ko) | 2012-02-24 |
CN101836162B (zh) | 2012-11-14 |
KR20090042192A (ko) | 2009-04-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20231024 |