MY167509A - Film tyoe transfer material - Google Patents

Film tyoe transfer material

Info

Publication number
MY167509A
MY167509A MYPI2010001855A MYPI2010001855A MY167509A MY 167509 A MY167509 A MY 167509A MY PI2010001855 A MYPI2010001855 A MY PI2010001855A MY PI2010001855 A MYPI2010001855 A MY PI2010001855A MY 167509 A MY167509 A MY 167509A
Authority
MY
Malaysia
Prior art keywords
film
transfer material
exposure process
tyoe
type photosensitive
Prior art date
Application number
MYPI2010001855A
Inventor
Hee Wan Moon
Seung Je Jho
Byeong Il Lee
Original Assignee
Kolon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kolon Inc filed Critical Kolon Inc
Publication of MY167509A publication Critical patent/MY167509A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/0005Enlarging or reduction of graphic information on a support by stretching or contracting the support, optionally in combination with the recording
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Abstract

DISCLOSED IS A FILM TYPE PHOTOSENSITIVE TRANSFER MATERIAL INCLUDING A BASE FILM (40), A RESIN PROTECTIVE LAYER (30), A PHOTOSENSITIVE RESIN LAYER (20) AND A COVER FILM (10), IN WHICH THE RESIN PROTECTIVE LAYER (30) HAS ADHESION OF 0.005 KGF/CM2 OR LESS. WHEN THE FILM TYPE PHOTOSENSITIVE TRANSFER MATERIAL IS APPLIED ON A PRINTED CIRCUIT BOARD, IT IS POSSIBLE TO PERFORM AN EXPOSURE PROCESS IN A STATE IN WHICH A BASE FILM (40) IS REMOVED, AND THUS AN INTERVAL BETWEEN A MASK (60) AND A PHOTOSENSITIVE RESIN LAYER (20) CAN BE NARROWED IN THE EXPOSURE PROCESS, THEREBY IMPROVING THE RESOLUTION OF A PATTERN. THE FILM TYPE PHOTOSENSITIVE TRANSFER MATERIAL ALLOWS THE BASE FILM (40) TO BE REMOVED BEFORE THE EXPOSURE PROCESS, AND CAN BE PROCESSED IN SHEETS OR CAN BE APPLIED TO A ROLL-TO-ROLL PROCESS.
MYPI2010001855A 2007-10-25 2008-10-24 Film tyoe transfer material MY167509A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20070107798 2007-10-25
KR1020080104904A KR101115162B1 (en) 2007-10-25 2008-10-24 Film type transfer material

Publications (1)

Publication Number Publication Date
MY167509A true MY167509A (en) 2018-09-04

Family

ID=40765057

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2010001855A MY167509A (en) 2007-10-25 2008-10-24 Film tyoe transfer material

Country Status (6)

Country Link
JP (1) JP5483734B2 (en)
KR (1) KR101115162B1 (en)
CN (1) CN101836162B (en)
HK (1) HK1146751A1 (en)
MY (1) MY167509A (en)
TW (1) TWI395058B (en)

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KR101258733B1 (en) * 2009-09-30 2013-04-30 코오롱인더스트리 주식회사 Dry film photoresist
CN103119663B (en) * 2010-09-28 2015-06-24 三菱制纸株式会社 Conductive material precursor and conductive material
KR102194713B1 (en) 2014-01-27 2020-12-23 삼성전기주식회사 Dry film photoresist
DE102014001688A1 (en) * 2014-02-07 2015-08-13 Giesecke & Devrient Gmbh Production of a security element with color change properties
KR102287289B1 (en) * 2014-07-08 2021-08-06 주식회사 동진쎄미켐 TRANSPARENT ElECTROD COMPLEX
TWI738641B (en) * 2015-03-20 2021-09-11 日商味之素股份有限公司 Manufacturing method of package
MY189073A (en) 2015-07-08 2022-01-24 Hitachi Chemical Co Ltd Photosensitive element, laminated body, method for forming resist pattern, and method for producing printed circuit board
WO2017154920A1 (en) * 2016-03-08 2017-09-14 大日本印刷株式会社 Thermal transfer sheet and combination of transfer foil and thermal transfer sheet
KR102507152B1 (en) * 2017-07-06 2023-03-07 린텍 가부시키가이샤 Film for resin film formation and composite sheet for resin film formation
CN107172804B (en) * 2017-07-11 2023-12-26 昆山倬跃蓝天电子科技有限公司 Photosensitive covering film and product
CN110534647B (en) * 2019-08-28 2023-12-26 云谷(固安)科技有限公司 Flexible substrate, display substrate and display panel

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Publication number Priority date Publication date Assignee Title
JPS59137948A (en) * 1983-01-27 1984-08-08 Mitsubishi Chem Ind Ltd Photoresist material like dry film
IL84298A0 (en) * 1986-11-14 1988-03-31 Thiokol Morton Inc Improved photosensitive laminate
JP2992128B2 (en) * 1991-06-21 1999-12-20 日本合成化学工業株式会社 Photoresist film
JP3051252B2 (en) * 1992-02-28 2000-06-12 日本合成化学工業株式会社 Photoresist film laminating method
JPH06161098A (en) * 1992-11-20 1994-06-07 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition for sand blasting and photosensitive film formed by using the same
JP3241144B2 (en) * 1993-02-19 2001-12-25 日立化成工業株式会社 Photosensitive resin composition laminate, method for producing resist pattern, method for producing substrate, printed wiring board, printed wiring board and equipment
JP4129543B2 (en) * 2002-08-08 2008-08-06 三菱樹脂株式会社 Protective film for dry film resist
JP2005227398A (en) * 2004-02-10 2005-08-25 Fuji Photo Film Co Ltd Photosensitive transfer sheet
TWI318333B (en) * 2004-03-26 2009-12-11 Fujifilm Corp Photosensitive composition, photosensitive transfer material, light shielding layer for display device, color filter, liquid crystal display element, substrate having light shielding layer and process for producing the same
US20060037100A1 (en) * 2004-08-12 2006-02-16 Kim Young S Fungal resistant transgenic pepper plants and their production method
JP2006184902A (en) * 2004-12-22 2006-07-13 Rohm & Haas Electronic Materials Llc Method for forming optical device
KR101017550B1 (en) * 2006-04-28 2011-02-28 아사히 가세이 일렉트로닉스 가부시끼가이샤 Photosensitive resin laminate
JP4979391B2 (en) * 2007-01-17 2012-07-18 旭化成イーマテリアルズ株式会社 Photosensitive resin laminate
JP2009083482A (en) * 2007-09-13 2009-04-23 Asahi Kasei Electronics Co Ltd Photosensitive resin laminate

Also Published As

Publication number Publication date
CN101836162A (en) 2010-09-15
TW200937114A (en) 2009-09-01
TWI395058B (en) 2013-05-01
KR20090042192A (en) 2009-04-29
KR101115162B1 (en) 2012-02-24
JP2011501233A (en) 2011-01-06
HK1146751A1 (en) 2011-07-08
CN101836162B (en) 2012-11-14
JP5483734B2 (en) 2014-05-07

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