HK1146751A1 - Film type transfer material - Google Patents

Film type transfer material

Info

Publication number
HK1146751A1
HK1146751A1 HK11100873.9A HK11100873A HK1146751A1 HK 1146751 A1 HK1146751 A1 HK 1146751A1 HK 11100873 A HK11100873 A HK 11100873A HK 1146751 A1 HK1146751 A1 HK 1146751A1
Authority
HK
Hong Kong
Prior art keywords
transfer material
film type
type transfer
film
type
Prior art date
Application number
HK11100873.9A
Inventor
Hee Wan Moon
Seung Je Jho
Byeong Il Lee
Original Assignee
Kolon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/KR2008/006318 external-priority patent/WO2009054705A2/en
Application filed by Kolon Inc filed Critical Kolon Inc
Publication of HK1146751A1 publication Critical patent/HK1146751A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/0005Enlarging or reduction of graphic information on a support by stretching or contracting the support, optionally in combination with the recording
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
HK11100873.9A 2007-10-25 2011-01-27 Film type transfer material HK1146751A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR20070107798 2007-10-25
PCT/KR2008/006318 WO2009054705A2 (en) 2007-10-25 2008-10-24 Film type transfer material
KR1020080104904A KR101115162B1 (en) 2007-10-25 2008-10-24 Film type transfer material

Publications (1)

Publication Number Publication Date
HK1146751A1 true HK1146751A1 (en) 2011-07-08

Family

ID=40765057

Family Applications (1)

Application Number Title Priority Date Filing Date
HK11100873.9A HK1146751A1 (en) 2007-10-25 2011-01-27 Film type transfer material

Country Status (6)

Country Link
JP (1) JP5483734B2 (en)
KR (1) KR101115162B1 (en)
CN (1) CN101836162B (en)
HK (1) HK1146751A1 (en)
MY (1) MY167509A (en)
TW (1) TWI395058B (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101258733B1 (en) * 2009-09-30 2013-04-30 코오롱인더스트리 주식회사 Dry film photoresist
CN103119663B (en) * 2010-09-28 2015-06-24 三菱制纸株式会社 Conductive material precursor and conductive material
KR102194713B1 (en) 2014-01-27 2020-12-23 삼성전기주식회사 Dry film photoresist
DE102014001688A1 (en) * 2014-02-07 2015-08-13 Giesecke & Devrient Gmbh Production of a security element with color change properties
KR102287289B1 (en) * 2014-07-08 2021-08-06 주식회사 동진쎄미켐 TRANSPARENT ElECTROD COMPLEX
TWI738641B (en) * 2015-03-20 2021-09-11 日商味之素股份有限公司 Manufacturing method of package
KR102611300B1 (en) 2015-07-08 2023-12-08 가부시끼가이샤 레조낙 Photosensitive element, laminated body, method for forming resist pattern, and method for producing printed circuit board
WO2017154920A1 (en) * 2016-03-08 2017-09-14 大日本印刷株式会社 Thermal transfer sheet and combination of transfer foil and thermal transfer sheet
KR102507152B1 (en) * 2017-07-06 2023-03-07 린텍 가부시키가이샤 Film for resin film formation and composite sheet for resin film formation
CN107172804B (en) * 2017-07-11 2023-12-26 昆山倬跃蓝天电子科技有限公司 Photosensitive covering film and product
WO2019215848A1 (en) 2018-05-09 2019-11-14 日立化成株式会社 Photosensitive element, barrier layer forming resin composition, resist pattern forming method, and printed wiring board manufacturing method
CN110534647B (en) * 2019-08-28 2023-12-26 云谷(固安)科技有限公司 Flexible substrate, display substrate and display panel
WO2024075158A1 (en) * 2022-10-03 2024-04-11 株式会社レゾナック Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59137948A (en) * 1983-01-27 1984-08-08 Mitsubishi Chem Ind Ltd Photoresist material like dry film
IL84298A0 (en) * 1986-11-14 1988-03-31 Thiokol Morton Inc Improved photosensitive laminate
JP2992128B2 (en) * 1991-06-21 1999-12-20 日本合成化学工業株式会社 Photoresist film
JP3051252B2 (en) * 1992-02-28 2000-06-12 日本合成化学工業株式会社 Photoresist film laminating method
JPH06161098A (en) * 1992-11-20 1994-06-07 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition for sand blasting and photosensitive film formed by using the same
JP3241144B2 (en) * 1993-02-19 2001-12-25 日立化成工業株式会社 Photosensitive resin composition laminate, method for producing resist pattern, method for producing substrate, printed wiring board, printed wiring board and equipment
JP4129543B2 (en) * 2002-08-08 2008-08-06 三菱樹脂株式会社 Protective film for dry film resist
JP2005227398A (en) * 2004-02-10 2005-08-25 Fuji Photo Film Co Ltd Photosensitive transfer sheet
TWI318333B (en) * 2004-03-26 2009-12-11 Fujifilm Corp Photosensitive composition, photosensitive transfer material, light shielding layer for display device, color filter, liquid crystal display element, substrate having light shielding layer and process for producing the same
US20060037100A1 (en) * 2004-08-12 2006-02-16 Kim Young S Fungal resistant transgenic pepper plants and their production method
EP1674905B1 (en) * 2004-12-22 2008-10-15 Rohm and Haas Electronic Materials, L.L.C. Methods of forming optical devices having polymeric layers
JP5155853B2 (en) * 2006-04-28 2013-03-06 旭化成イーマテリアルズ株式会社 Photosensitive resin laminate
JP4979391B2 (en) * 2007-01-17 2012-07-18 旭化成イーマテリアルズ株式会社 Photosensitive resin laminate
JP2009083482A (en) * 2007-09-13 2009-04-23 Asahi Kasei Electronics Co Ltd Photosensitive resin laminate

Also Published As

Publication number Publication date
KR101115162B1 (en) 2012-02-24
CN101836162B (en) 2012-11-14
MY167509A (en) 2018-09-04
CN101836162A (en) 2010-09-15
KR20090042192A (en) 2009-04-29
TW200937114A (en) 2009-09-01
TWI395058B (en) 2013-05-01
JP2011501233A (en) 2011-01-06
JP5483734B2 (en) 2014-05-07

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20231024