HK1146751A1 - Film type transfer material - Google Patents
Film type transfer materialInfo
- Publication number
- HK1146751A1 HK1146751A1 HK11100873.9A HK11100873A HK1146751A1 HK 1146751 A1 HK1146751 A1 HK 1146751A1 HK 11100873 A HK11100873 A HK 11100873A HK 1146751 A1 HK1146751 A1 HK 1146751A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- transfer material
- film type
- type transfer
- film
- type
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/0005—Enlarging or reduction of graphic information on a support by stretching or contracting the support, optionally in combination with the recording
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20070107798 | 2007-10-25 | ||
PCT/KR2008/006318 WO2009054705A2 (en) | 2007-10-25 | 2008-10-24 | Film type transfer material |
KR1020080104904A KR101115162B1 (en) | 2007-10-25 | 2008-10-24 | Film type transfer material |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1146751A1 true HK1146751A1 (en) | 2011-07-08 |
Family
ID=40765057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK11100873.9A HK1146751A1 (en) | 2007-10-25 | 2011-01-27 | Film type transfer material |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP5483734B2 (en) |
KR (1) | KR101115162B1 (en) |
CN (1) | CN101836162B (en) |
HK (1) | HK1146751A1 (en) |
MY (1) | MY167509A (en) |
TW (1) | TWI395058B (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101258733B1 (en) * | 2009-09-30 | 2013-04-30 | 코오롱인더스트리 주식회사 | Dry film photoresist |
CN103119663B (en) * | 2010-09-28 | 2015-06-24 | 三菱制纸株式会社 | Conductive material precursor and conductive material |
KR102194713B1 (en) | 2014-01-27 | 2020-12-23 | 삼성전기주식회사 | Dry film photoresist |
DE102014001688A1 (en) * | 2014-02-07 | 2015-08-13 | Giesecke & Devrient Gmbh | Production of a security element with color change properties |
KR102287289B1 (en) * | 2014-07-08 | 2021-08-06 | 주식회사 동진쎄미켐 | TRANSPARENT ElECTROD COMPLEX |
TWI738641B (en) * | 2015-03-20 | 2021-09-11 | 日商味之素股份有限公司 | Manufacturing method of package |
KR102611300B1 (en) | 2015-07-08 | 2023-12-08 | 가부시끼가이샤 레조낙 | Photosensitive element, laminated body, method for forming resist pattern, and method for producing printed circuit board |
WO2017154920A1 (en) * | 2016-03-08 | 2017-09-14 | 大日本印刷株式会社 | Thermal transfer sheet and combination of transfer foil and thermal transfer sheet |
KR102507152B1 (en) * | 2017-07-06 | 2023-03-07 | 린텍 가부시키가이샤 | Film for resin film formation and composite sheet for resin film formation |
CN107172804B (en) * | 2017-07-11 | 2023-12-26 | 昆山倬跃蓝天电子科技有限公司 | Photosensitive covering film and product |
WO2019215848A1 (en) | 2018-05-09 | 2019-11-14 | 日立化成株式会社 | Photosensitive element, barrier layer forming resin composition, resist pattern forming method, and printed wiring board manufacturing method |
CN110534647B (en) * | 2019-08-28 | 2023-12-26 | 云谷(固安)科技有限公司 | Flexible substrate, display substrate and display panel |
WO2024075158A1 (en) * | 2022-10-03 | 2024-04-11 | 株式会社レゾナック | Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59137948A (en) * | 1983-01-27 | 1984-08-08 | Mitsubishi Chem Ind Ltd | Photoresist material like dry film |
IL84298A0 (en) * | 1986-11-14 | 1988-03-31 | Thiokol Morton Inc | Improved photosensitive laminate |
JP2992128B2 (en) * | 1991-06-21 | 1999-12-20 | 日本合成化学工業株式会社 | Photoresist film |
JP3051252B2 (en) * | 1992-02-28 | 2000-06-12 | 日本合成化学工業株式会社 | Photoresist film laminating method |
JPH06161098A (en) * | 1992-11-20 | 1994-06-07 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition for sand blasting and photosensitive film formed by using the same |
JP3241144B2 (en) * | 1993-02-19 | 2001-12-25 | 日立化成工業株式会社 | Photosensitive resin composition laminate, method for producing resist pattern, method for producing substrate, printed wiring board, printed wiring board and equipment |
JP4129543B2 (en) * | 2002-08-08 | 2008-08-06 | 三菱樹脂株式会社 | Protective film for dry film resist |
JP2005227398A (en) * | 2004-02-10 | 2005-08-25 | Fuji Photo Film Co Ltd | Photosensitive transfer sheet |
TWI318333B (en) * | 2004-03-26 | 2009-12-11 | Fujifilm Corp | Photosensitive composition, photosensitive transfer material, light shielding layer for display device, color filter, liquid crystal display element, substrate having light shielding layer and process for producing the same |
US20060037100A1 (en) * | 2004-08-12 | 2006-02-16 | Kim Young S | Fungal resistant transgenic pepper plants and their production method |
EP1674905B1 (en) * | 2004-12-22 | 2008-10-15 | Rohm and Haas Electronic Materials, L.L.C. | Methods of forming optical devices having polymeric layers |
JP5155853B2 (en) * | 2006-04-28 | 2013-03-06 | 旭化成イーマテリアルズ株式会社 | Photosensitive resin laminate |
JP4979391B2 (en) * | 2007-01-17 | 2012-07-18 | 旭化成イーマテリアルズ株式会社 | Photosensitive resin laminate |
JP2009083482A (en) * | 2007-09-13 | 2009-04-23 | Asahi Kasei Electronics Co Ltd | Photosensitive resin laminate |
-
2008
- 2008-10-24 KR KR1020080104904A patent/KR101115162B1/en active IP Right Grant
- 2008-10-24 JP JP2010530935A patent/JP5483734B2/en active Active
- 2008-10-24 MY MYPI2010001855A patent/MY167509A/en unknown
- 2008-10-24 CN CN2008801126086A patent/CN101836162B/en active Active
- 2008-10-27 TW TW097141236A patent/TWI395058B/en active
-
2011
- 2011-01-27 HK HK11100873.9A patent/HK1146751A1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR101115162B1 (en) | 2012-02-24 |
CN101836162B (en) | 2012-11-14 |
MY167509A (en) | 2018-09-04 |
CN101836162A (en) | 2010-09-15 |
KR20090042192A (en) | 2009-04-29 |
TW200937114A (en) | 2009-09-01 |
TWI395058B (en) | 2013-05-01 |
JP2011501233A (en) | 2011-01-06 |
JP5483734B2 (en) | 2014-05-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20231024 |