TWI738641B - Manufacturing method of package - Google Patents

Manufacturing method of package Download PDF

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TWI738641B
TWI738641B TW105108549A TW105108549A TWI738641B TW I738641 B TWI738641 B TW I738641B TW 105108549 A TW105108549 A TW 105108549A TW 105108549 A TW105108549 A TW 105108549A TW I738641 B TWI738641 B TW I738641B
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infrared
manufacturing
resin composition
sheet
composition layer
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TW105108549A
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TW201705580A (en
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大橋賢
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日商味之素股份有限公司
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • H10K50/842Containers
    • H10K50/8426Peripheral sealing arrangements, e.g. adhesives, sealants
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • H05B33/04Sealing arrangements, e.g. against humidity
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Packages (AREA)
  • Wrappers (AREA)

Abstract

本發明提供一種製造方法,其係以樹脂組成物層封裝基板上之有機EL元件之封裝體之製造方法,且包含下述步驟:(1)將支撐體、樹脂組成物層及保護膜(cover film)依此順序積層而成之封裝用薄片,不剝離保護膜而以近紅外線至中紅外線乾燥機乾燥之步驟,及(2)自乾燥之封裝用薄片剝離保護膜後,以封裝用薄片之樹脂組成物層封裝有機EL元件之步驟。 The present invention provides a manufacturing method, which is a manufacturing method of a package body for encapsulating an organic EL element on a substrate with a resin composition layer, and includes the following steps: (1) a support, a resin composition layer and a protective film (cover film) The encapsulation sheet laminated in this order, the step of drying with a near-infrared to mid-infrared dryer without peeling off the protective film, and (2) After peeling the protective film from the dried encapsulating sheet, use the resin of the encapsulating sheet The composition layer encapsulates the organic EL device.

Description

封裝體之製造方法 Manufacturing method of package

本發明係有關以樹脂組成物層封裝基板上之有機EL(電致發光)元件而成之封裝體(尤其是有機EL裝置)之製造方法。又,本發明係關於封裝基板上之有機EL元件之方法。 The present invention relates to a method for manufacturing a package (especially an organic EL device) formed by encapsulating an organic EL (Electroluminescence) element on a substrate with a resin composition layer. In addition, the present invention relates to a method of packaging organic EL devices on a substrate.

有機EL元件係於發光材料中使用有機物質之發光元件,由於可藉低電壓獲得高亮度之發光,故近幾年來備受矚目。然而,有機EL元件有對於水分抗性極弱,有因水分而使亮度降低、不發光、電極與發光層之界面剝離、金屬氧化而高電阻化之問題。因此,為了將元件內部與外氣中之水分遮斷,已進行例如以覆蓋基板上形成之發光層全面之方式形成樹脂組成物層而封裝有機EL元件(例如專利文獻1~3)。 Organic EL devices are light-emitting devices that use organic substances in light-emitting materials. Because they can achieve high-brightness light emission with low voltage, they have attracted attention in recent years. However, organic EL elements have extremely weak resistance to moisture, and have the problems of reduced brightness due to moisture, no light emission, separation of the interface between the electrode and the light-emitting layer, metal oxidation and high resistance. Therefore, in order to shield the inside of the element from moisture in the outside air, for example, a resin composition layer is formed so as to cover the entire surface of the light-emitting layer formed on the substrate to encapsulate the organic EL element (for example, Patent Documents 1 to 3).

〔先前技術文獻〕 [Prior technical literature] 〔專利文獻〕 〔Patent Documents〕

[專利文獻1]國際公開第2010/084938號 [Patent Document 1] International Publication No. 2010/084938

[專利文獻2]國際公開第2010/084939號 [Patent Document 2] International Publication No. 2010/084939

[專利文獻3]國際公開第2011/016408號 [Patent Document 3] International Publication No. 2011/016408

於支撐體上形成樹脂組成物層而用以封裝有機EL元件之薄片(以下有時簡稱為「封裝用薄片」)中存在之微量水分亦有對有機EL元件帶來不良影響之情況。因此,封裝用薄片期望以乾燥狀態運送保存。然而,該情況下亦難以完全防止水分侵入,即使微量水分侵入亦成為問題。 The small amount of moisture present in the sheet used to encapsulate the organic EL device by forming the resin composition layer on the support (hereinafter sometimes referred to as the "encapsulation sheet") may also adversely affect the organic EL device. Therefore, the packaging sheet is desirably transported and stored in a dry state. However, in this case, it is also difficult to completely prevent the intrusion of moisture, and even a small amount of moisture ingress becomes a problem.

於封裝有機EL元件之前,雖考慮使封裝用薄片乾燥,但為了乾燥而於過高溫度使封裝用薄片加熱時,由於封裝用薄片(尤其是其樹脂組成物)進行變性(例如,硬化)故而不佳。另一方面,於低溫之真空乾燥時則有乾燥耗費時間之問題。 Before encapsulating the organic EL element, it is considered to dry the encapsulation sheet, but when the encapsulation sheet is heated at an excessively high temperature for drying, the encapsulation sheet (especially its resin composition) is denatured (e.g., cured) Bad. On the other hand, there is a problem of time-consuming drying in low-temperature vacuum drying.

又,使用於封裝之前之封裝用薄片之樹脂組成物層一般係以保護膜保護。關於封裝用薄片,認為水分主要係含於樹脂組成物層中,封裝用薄片之樹脂組成物層之乾燥於將保護膜剝離後進行乾燥係有效。然而,剝離保護膜後乾燥時,乾燥中可能於樹脂組成物層表面附著汙物等,而對有機EL元件造成不良影響。 In addition, the resin composition layer of the encapsulation sheet used before encapsulation is generally protected by a protective film. Regarding the encapsulation sheet, it is considered that moisture is mainly contained in the resin composition layer, and the drying of the resin composition layer of the encapsulation sheet is effective after peeling off the protective film. However, when drying after peeling off the protective film, dirt or the like may adhere to the surface of the resin composition layer during drying, which may adversely affect the organic EL element.

本發明係鑑於如上述情況而完成者,其目的在於提供包含將支撐體、樹脂組成物層及保護膜(cover film)依此順序積層而成之封裝用薄片,不剝離保護膜,而有效地乾燥封裝用薄片之步驟之有機EL元件之封裝體之製造方法。 The present invention was completed in view of the above-mentioned circumstances, and its object is to provide a support body, a resin composition layer, and a protective film (cover film) The packaging sheet laminated in this order does not peel off the protective film, but is a method of manufacturing the packaging body of the organic EL device in the step of effectively drying the packaging sheet.

本發明人等經積極檢討之結果,發現於以封裝用薄片封裝有機EL元件而製造封裝體時,封裝用薄片中所含之微量水分對有機EL元件可能造成不良影響,藉由將封裝用薄片中所含之水分減少至一定值以下,可顯著改善有機EL元件之壽命,且藉由在封裝步驟前導入以近紅外線至中紅外線乾燥機之乾燥步驟,即使不剝離保護膜,亦可有效地乾燥封裝用薄片去除水分。基於該見解之本發明係如下。 As a result of active review, the inventors found that when the organic EL device is encapsulated with a packaging sheet to produce a package, the trace moisture contained in the packaging sheet may have an adverse effect on the organic EL device. The moisture contained in it is reduced to below a certain value, which can significantly improve the life of the organic EL device, and by introducing a drying step from near infrared to mid-infrared dryer before the packaging step, it can be dried effectively even if the protective film is not peeled off The encapsulation sheet removes moisture. The present invention based on this knowledge is as follows.

[1]一種製造方法,其係以樹脂組成物層封裝基板上之有機EL元件之封裝體之製造方法,且包含下述步驟:(1)將支撐體、樹脂組成物層及保護膜依此順序積層而成之封裝用薄片,不剝離保護膜而以近紅外線至中紅外線乾燥機乾燥之步驟,及(2)自乾燥之封裝用薄片剝離保護膜後,以封裝用薄片之樹脂組成物層封裝有機EL元件之步驟。 [1] A manufacturing method, which is a manufacturing method of a package body that encapsulates an organic EL element on a substrate with a resin composition layer, and includes the following steps: (1) The support, the resin composition layer, and the protective film are arranged accordingly The encapsulation sheet is laminated in order, and the protective film is dried by a near-infrared to mid-infrared dryer without peeling off the protective film. (2) After the protective film is peeled off from the dried encapsulation sheet, it is encapsulated with the resin composition layer of the encapsulation sheet Steps for organic EL devices.

[2]如前述[1]之製造方法,其中步驟(2)係在與步驟(1)相同製造產線內進行。 [2] The manufacturing method of [1] above, wherein step (2) is performed in the same manufacturing line as step (1).

[3]如前述[1]或[2]之製造方法,其中接續步驟(1) 進行步驟(2)。 [3] The manufacturing method as described in [1] or [2], wherein the following step (1) Go to step (2).

[4]如前述[1]~[3]中任一項之製造方法,其中自步驟(1)之乾燥後至步驟(2)之封裝開始之前之時間為1~60分鐘。 [4] The manufacturing method according to any one of [1] to [3] above, wherein the time from drying in step (1) to before packaging in step (2) is 1 to 60 minutes.

[5]如前述[1]~[3]中任一項之製造方法,其中自步驟(1)之乾燥後至步驟(2)之封裝開始之前之時間為1~30分鐘。 [5] The manufacturing method according to any one of [1] to [3] above, wherein the time from drying in step (1) to before packaging in step (2) is 1 to 30 minutes.

[6]如前述[1]~[3]中任一項之製造方法,其中自步驟(1)之乾燥後至步驟(2)之封裝開始之前之時間為1~15分鐘。 [6] The manufacturing method according to any one of [1] to [3] above, wherein the time from drying in step (1) to before packaging in step (2) is 1 to 15 minutes.

[7]如前述[1]~[3]中任一項之製造方法,其中自步驟(1)之乾燥後至步驟(2)之封裝開始之前之時間為1~10分鐘。 [7] The manufacturing method of any one of [1] to [3] above, wherein the time from drying in step (1) to before packaging in step (2) is 1 to 10 minutes.

[8]如前述[1]~[7]中任一項之製造方法,其中自近紅外線至中紅外線乾燥機照射之近紅外線至中紅外線之峰值波長為1.0~4.0μm之範圍內。 [8] The manufacturing method according to any one of [1] to [7] above, wherein the peak wavelength of the near-infrared to mid-infrared irradiated from the near-infrared to mid-infrared dryer is in the range of 1.0 to 4.0 μm.

[9]如前述[1]~[7]中任一項之製造方法,其中自近紅外線至中紅外線乾燥機照射之近紅外線至中紅外線之峰值波長為1.0~3.5μm之範圍內。 [9] The manufacturing method according to any one of [1] to [7] above, wherein the peak wavelength of the near-infrared to mid-infrared irradiated from the near-infrared to mid-infrared dryer is in the range of 1.0 to 3.5 μm.

[10]如前述[1]~[7]中任一項之製造方法,其中自近紅外線至中紅外線乾燥機照射之近紅外線至中紅外線之峰值波長為1.25~3.5μm之範圍內。 [10] The manufacturing method according to any one of [1] to [7] above, wherein the peak wavelength of the near-infrared to mid-infrared irradiated from the near-infrared to mid-infrared dryer is in the range of 1.25 to 3.5 μm.

[11]如前述[1]~[7]中任一項之製造方法,其中自近紅外線至中紅外線乾燥機照射之近紅外線至中紅外線之峰 值波長為1.5~3.5μm之範圍內。 [11] The manufacturing method as described in any one of [1] to [7] above, wherein the peak from near infrared to mid-infrared irradiated from the near-infrared to mid-infrared dryer The value wavelength is within the range of 1.5~3.5μm.

[12]如前述[1]~[11]中任一項之製造方法,其中近紅外線至中紅外線乾燥機之乾燥溫度為60~160℃,乾燥時間為0.5~60分鐘。 [12] The manufacturing method as described in any one of [1] to [11], wherein the drying temperature of the near-infrared to mid-infrared dryer is 60-160°C, and the drying time is 0.5-60 minutes.

[13]如前述[12]之製造方法,其中近紅外線至中紅外線乾燥機之乾燥溫度為60~140℃。 [13] The manufacturing method of [12] above, wherein the drying temperature of the near-infrared to mid-infrared dryer is 60~140°C.

[14]如前述[12]之製造方法,其中近紅外線至中紅外線乾燥機之乾燥溫度為60~130℃。 [14] The manufacturing method of [12] above, wherein the drying temperature of the near-infrared to mid-infrared dryer is 60~130°C.

[15]如前述[12]之製造方法,其中近紅外線至中紅外線乾燥機之乾燥溫度為80~130℃。 [15] The manufacturing method of [12] above, wherein the drying temperature of the near-infrared to mid-infrared dryer is 80~130°C.

[16]如前述[12]之製造方法,其中近紅外線至中紅外線乾燥機之乾燥溫度為90~130℃。 [16] The manufacturing method as described in [12] above, wherein the drying temperature of the near-infrared to mid-infrared dryer is 90~130°C.

[17]如前述[12]~[16]中任一項之製造方法,其中近紅外線至中紅外線乾燥機之乾燥時間為1~30分鐘。 [17] The manufacturing method of any one of [12] to [16] above, wherein the drying time of the near-infrared to mid-infrared dryer is 1 to 30 minutes.

[18]如前述[12]~[16]中任一項之製造方法,其中近紅外線至中紅外線乾燥機之乾燥時間為5~30分鐘。 [18] The manufacturing method of any one of [12] to [16] above, wherein the drying time of the near infrared to mid infrared dryer is 5 to 30 minutes.

[19]如前述[12]~[16]中任一項之製造方法,其中近紅外線至中紅外線乾燥機之乾燥時間為5~15分鐘。 [19] The manufacturing method of any one of [12] to [16] above, wherein the drying time of the near-infrared to mid-infrared dryer is 5-15 minutes.

[20]如前述[1]~[19]中任一項之製造方法,其中步驟(1)後之封裝用薄片之含水率為500重量ppm以下。 [20] The manufacturing method according to any one of [1] to [19] above, wherein the moisture content of the packaging sheet after step (1) is 500 ppm by weight or less.

[21]如前述[1]~[19]中任一項之製造方法,其中步驟(1)後之封裝用薄片之含水率為400重量ppm以下。 [21] The manufacturing method according to any one of [1] to [19], wherein the moisture content of the packaging sheet after step (1) is 400 ppm by weight or less.

[22]如前述[1]~[19]中任一項之製造方法,其中步驟(1)後之封裝用薄片之含水率為300重量ppm以下。 [22] The manufacturing method according to any one of [1] to [19], wherein the moisture content of the packaging sheet after step (1) is 300 ppm by weight or less.

[23]如前述[1]~[19]中任一項之製造方法,其中步驟(1)後之封裝用薄片之含水率為250重量ppm以下。 [23] The manufacturing method of any one of [1] to [19] above, wherein the moisture content of the packaging sheet after step (1) is 250 ppm by weight or less.

[24]如前述[1]~[19]中任一項之製造方法,其中步驟(1)後之封裝用薄片之含水率為200重量ppm以下。 [24] The manufacturing method of any one of [1] to [19] above, wherein the moisture content of the packaging sheet after step (1) is 200 ppm by weight or less.

[25]如前述[1]~[19]中任一項之製造方法,其中步驟(1)後之樹脂組成物層之含水率為2000重量ppm以下。 [25] The manufacturing method of any one of [1] to [19] above, wherein the moisture content of the resin composition layer after step (1) is 2000 ppm by weight or less.

[26]如前述[1]~[19]中任一項之製造方法,其中步驟(1)後之樹脂組成物層之含水率為1800重量ppm以下。 [26] The production method according to any one of [1] to [19], wherein the moisture content of the resin composition layer after step (1) is 1800 ppm by weight or less.

[27]如前述[1]~[19]中任一項之製造方法,其中步驟(1)後之樹脂組成物層之含水率為1600重量ppm以下。 [27] The production method as described in any one of [1] to [19], wherein the moisture content of the resin composition layer after step (1) is 1600 ppm by weight or less.

[28]如前述[1]~[19]中任一項之製造方法,其中步驟(1)後之樹脂組成物層之含水率為1400重量ppm以下。 [28] The production method according to any one of [1] to [19], wherein the moisture content of the resin composition layer after step (1) is 1400 ppm by weight or less.

[29]如前述[1]~[19]中任一項之製造方法,其中步驟(1)後之樹脂組成物層之含水率為1200重量ppm以下。 [29] The manufacturing method of any one of [1] to [19] above, wherein the moisture content of the resin composition layer after step (1) is 1200 ppm by weight or less.

[30]如前述[1]~[19]中任一項之製造方法,其中步驟(1)後之樹脂組成物層之含水率為1000重量ppm以下。 [30] The production method according to any one of [1] to [19] above, wherein the moisture content of the resin composition layer after step (1) is 1000 wtppm or less.

[31]如前述[1]~[19]中任一項之製造方法,其中步驟(1)後之樹脂組成物層之含水率為850重量ppm以下。 [31] The production method of any one of [1] to [19] above, wherein the moisture content of the resin composition layer after step (1) is 850 wtppm or less.

[32]如前述[1]~[31]中任一項之製造方法,其中以近紅外線至中紅外線乾燥機之乾燥係在乾燥的空氣或乾燥的惰性氣體氛圍下進行。 [32] The manufacturing method of any one of [1] to [31] above, wherein the drying with a near-infrared to mid-infrared dryer is performed under dry air or dry inert gas atmosphere.

[33]如前述[32]之製造方法,其中乾燥的空氣或乾燥的惰性氣體中所含之水蒸氣量為0~500ppm。 [33] The manufacturing method as described in [32] above, wherein the amount of water vapor contained in the dry air or dry inert gas is 0 to 500 ppm.

[34]如前述[32]之製造方法,其中乾燥的空氣或乾燥的惰性氣體中所含之水蒸氣量為0~250ppm。 [34] The manufacturing method of [32] above, wherein the amount of water vapor contained in the dry air or dry inert gas is 0 to 250 ppm.

[35]如前述[32]之製造方法,其中乾燥的空氣或乾燥的惰性氣體中所含之水蒸氣量為0~100ppm。 [35] The manufacturing method as described in [32], wherein the amount of water vapor contained in the dry air or dry inert gas is 0-100 ppm.

[36]如前述[32]之製造方法,其中乾燥的空氣或乾燥的惰性氣體中所含之水蒸氣量為0~50ppm。 [36] The manufacturing method as described in [32], wherein the amount of water vapor contained in the dry air or dry inert gas is 0-50 ppm.

[37]如前述[32]之製造方法,其中乾燥的空氣或乾燥的惰性氣體中所含之水蒸氣量為0~30ppm。 [37] The manufacturing method of the aforementioned [32], wherein the amount of water vapor contained in the dry air or dry inert gas is 0 to 30 ppm.

[38]如前述[1]~[37]中任一項之製造方法,其中來自近紅外線至中紅外線乾燥機之紅外線係自保護膜之側照射至封裝用薄片。 [38] The manufacturing method according to any one of [1] to [37], wherein the infrared rays from the near-infrared to mid-infrared dryer are irradiated from the side of the protective film to the packaging sheet.

[39]如前述[1]~[38]中任一項之製造方法,其中近紅外線至中紅外線乾燥機之光源與封裝用薄片之距離為5~100cm。 [39] The manufacturing method according to any one of [1] to [38], wherein the distance between the light source of the near-infrared to mid-infrared dryer and the packaging sheet is 5-100 cm.

[40]如前述[1]~[38]中任一項之製造方法,其中近紅外線至中紅外線乾燥機之光源與封裝用薄片之距離為10~50cm。 [40] The manufacturing method of any one of [1] to [38] above, wherein the distance between the light source of the near-infrared to mid-infrared dryer and the packaging sheet is 10 to 50 cm.

[41]如前述[1]~[38]中任一項之製造方法,其中近紅外線至中紅外線乾燥機之光源與封裝用薄片之距離為10~30cm。 [41] The manufacturing method of any one of [1] to [38] above, wherein the distance between the light source of the near-infrared to mid-infrared dryer and the packaging sheet is 10 to 30 cm.

[42]如前述[1]~[41]中任一項之製造方法,其中紅外線對於封裝用薄片之照射角度為0~80度。 [42] The manufacturing method as described in any one of [1] to [41], wherein the irradiation angle of the infrared rays to the packaging sheet is 0 to 80 degrees.

[43]如前述[1]~[41]中任一項之製造方法,其中紅外線對於封裝用薄片之照射角度為0~70度。 [43] The manufacturing method according to any one of [1] to [41], wherein the irradiation angle of the infrared rays to the packaging sheet is 0 to 70 degrees.

[44]如前述[1]~[41]中任一項之製造方法,其中紅外線對於封裝用薄片之照射角度為0~60度。 [44] The manufacturing method according to any one of [1] to [41], wherein the irradiation angle of the infrared rays to the packaging sheet is 0-60 degrees.

[45]如前述[1]~[44]中任一項之製造方法,其中保護膜係聚對苯二甲酸乙二酯膜、聚萘二甲酸乙二酯膜、聚丙烯膜或環烯烴聚合物膜。 [45] The manufacturing method according to any one of the aforementioned [1] to [44], wherein the protective film is a polyethylene terephthalate film, a polyethylene naphthalate film, a polypropylene film or a cyclic olefin polymer物膜。 Material film.

[46]如前述[1]~[44]中任一項之製造方法,其中保護膜係聚對苯二甲酸乙二酯膜、聚萘二甲酸乙二酯膜或環烯烴聚合物膜。 [46] The manufacturing method according to any one of [1] to [44], wherein the protective film is a polyethylene terephthalate film, a polyethylene naphthalate film or a cycloolefin polymer film.

[47]如前述[1]~[44]中任一項之製造方法,其中保護膜係聚對苯二甲酸乙二酯膜。 [47] The manufacturing method according to any one of [1] to [44], wherein the protective film is a polyethylene terephthalate film.

[48]如前述[1]~[47]中任一項之製造方法,其中保護膜厚度為10~200μm。 [48] The manufacturing method of any one of [1] to [47] above, wherein the thickness of the protective film is 10 to 200 μm.

[49]如前述[1]~[47]中任一項之製造方法,其中保護膜厚度為20~200μm。 [49] The manufacturing method of any one of [1] to [47], wherein the thickness of the protective film is 20 to 200 μm.

[50]如前述[1]~[47]中任一項之製造方法,其中保護膜厚度為10~125μm。 [50] The manufacturing method as described in any one of [1] to [47], wherein the thickness of the protective film is 10 to 125 μm.

[51]如前述[1]~[47]中任一項之製造方法,其中保護 膜厚度為20~125μm。 [51] The manufacturing method as described in any one of [1] to [47], wherein the protection The film thickness is 20~125μm.

[52]如前述[1]~[51]中任一項之製造方法,其中步驟(2)之有機EL元件之封裝係藉由使樹脂組成物層與有機EL元件接觸之方式使封裝用薄片與基板積層而進行。 [52] The manufacturing method of any one of [1] to [51] above, wherein the encapsulation of the organic EL element in step (2) is achieved by contacting the resin composition layer with the organic EL element. Laminated with the substrate.

[53]如前述[52]之製造方法,其中步驟(2)之積層係在惰性氣體氛圍下或真空下進行。 [53] The manufacturing method of the aforementioned [52], wherein the lamination of step (2) is carried out under an inert gas atmosphere or a vacuum.

依據本發明之方法,可不剝離使支撐體、樹脂組成物層及保護膜依此順序積層而成之封裝用薄片之保護膜,而有效地乾燥封裝用薄片。又,依據本發明之方法,即使在較低之溫度亦可有效地使封裝用薄片乾燥。 According to the method of the present invention, the protective film of the packaging sheet formed by laminating the support, the resin composition layer and the protective film in this order can be effectively dried without peeling off the packaging sheet. In addition, according to the method of the present invention, the packaging sheet can be effectively dried even at a relatively low temperature.

[步驟(1)] [step 1)]

本發明之方法包含使用近紅外線至中紅外線乾燥機,不剝離保護膜地使封裝用薄片乾燥之步驟(1)。 The method of the present invention includes the step (1) of drying the sealing sheet without peeling off the protective film using a near-infrared to mid-infrared dryer.

(1-1)近紅外線至中紅外線乾燥機 (1-1) Near-infrared to mid-infrared dryer

本說明書中,所謂近紅外線至中紅外線乾燥機意指照射近紅外線至中紅外線之乾燥機。近紅外線至中紅外線乾燥機之光源(加熱器)中所用之燈絲(熱源)舉例為例如 鎢、鎳鉻合金、碳、KANTHAL(註冊商標)等,較好為鎢、KANTHAL,特佳為鎢。為了有效地乾燥樹脂組成物層,較好使用可照射峰值波長為1.0~4.0μm之範圍內之近紅外線至中紅外線之乾燥機。峰值波長更好為1.0~3.5μm,進而較好為1.25~3.5μm,又更好為1.5~3.5μm之範圍內。又,本說明書中之近紅外線至中紅外線區域意指波長為0.78~4.0μm之範圍,近紅外線區域意指波長為0.78μm以上未達2.0μm之範圍,中紅外線區域意指波長為2.0μm以上4.0μm以下之範圍。本說明書中,近紅外線至中紅外線有時簡稱為紅外線,近紅外線至中紅外線乾燥機有時簡稱為紅外線乾燥機。 In this specification, the so-called near-infrared to mid-infrared dryer means a dryer that irradiates near-infrared to mid-infrared. Examples of filament (heat source) used in the light source (heater) of the near-infrared to mid-infrared dryer are for example Tungsten, nickel-chromium alloy, carbon, KANTHAL (registered trademark), etc., preferably tungsten, KANTHAL, and particularly preferably tungsten. In order to effectively dry the resin composition layer, it is preferable to use a dryer that can irradiate near-infrared rays to mid-infrared rays with a peak wavelength in the range of 1.0 to 4.0 μm. The peak wavelength is more preferably in the range of 1.0 to 3.5 μm, still more preferably in the range of 1.25 to 3.5 μm, and still more preferably in the range of 1.5 to 3.5 μm. In addition, the near-infrared to mid-infrared region in this specification means the wavelength range of 0.78~4.0μm, the near-infrared region means the range where the wavelength is 0.78μm or more but less than 2.0μm, and the mid-infrared region means the wavelength is 2.0μm or more. The range below 4.0μm. In this specification, near-infrared to mid-infrared rays are sometimes abbreviated as infrared, and near-infrared to mid-infrared dryers are sometimes abbreviated as infrared dryers.

以近紅外線至中紅外線乾燥機之乾燥較好在乾燥的空氣或乾燥的惰性氣體氛圍下進行。所謂惰性氣體舉例為例如氮、氬、氦、氖等。空氣或惰性氣體中所含之水蒸氣量較好為0~500ppm(亦即0~500μmol/mol),更好為0~250ppm,又更好為0~100ppm,再更好為0~50ppm,特佳為0~30ppm。 Drying with a near-infrared to mid-infrared dryer is preferably performed under dry air or dry inert gas atmosphere. Examples of the inert gas include nitrogen, argon, helium, and neon. The amount of water vapor contained in the air or inert gas is preferably 0 to 500 ppm (that is, 0 to 500 μmol/mol), more preferably 0 to 250 ppm, still more preferably 0 to 100 ppm, still more preferably 0 to 50 ppm, Especially preferred is 0~30ppm.

為了避免對樹脂組成物層之不良影響且有效地乾燥,乾燥溫度較好為60~160℃,更好為60~140℃,再更好為60~130℃,又更好為80~130℃,特佳為90~130℃,乾燥時間較好為0.5~60分鐘,更好為1~30分鐘,又更好為5~30分鐘,再更好為5~15分鐘。此處所謂乾燥溫度意指樹脂組成物上之保護膜之表面溫度,可藉由於保護膜上安裝表面接觸型K熱電偶而測定。又,所謂乾燥時間 意指保護膜表面溫度處於特定乾燥溫度之時間。 In order to avoid adverse effects on the resin composition layer and effectively dry, the drying temperature is preferably 60-160°C, more preferably 60-140°C, still more preferably 60-130°C, and still more preferably 80-130°C , Particularly preferably 90~130°C, and the drying time is preferably 0.5~60 minutes, more preferably 1~30 minutes, still more preferably 5~30 minutes, still more preferably 5~15 minutes. The so-called drying temperature here means the surface temperature of the protective film on the resin composition, which can be measured by installing a surface contact type K thermocouple on the protective film. Also, the so-called drying time It means the time when the surface temperature of the protective film is at a specific drying temperature.

紅外線較好自保護膜側照射至封裝用薄片。為了有效地乾燥封裝用薄片,近紅外線至中紅外線乾燥機之光源(加熱器)與封裝用薄片之距離較好為5~100cm,更好為10~50cm,又更好為10~30cm。紅外線之照射角度較好為0~80度,更好為0~70度,又更好為0~60度。 Infrared rays are preferably irradiated to the packaging sheet from the protective film side. In order to effectively dry the packaging sheet, the distance between the light source (heater) of the near-infrared to mid-infrared dryer and the packaging sheet is preferably 5-100 cm, more preferably 10-50 cm, and still more preferably 10-30 cm. The irradiation angle of infrared rays is preferably 0 to 80 degrees, more preferably 0 to 70 degrees, and still more preferably 0 to 60 degrees.

搬送於紅外乾燥機時,為了防止封裝用薄片之撓曲,能以將封裝用薄片固定於玻璃基板等之狀態搬送至紅外乾燥機並乾燥。 When transporting to an infrared dryer, in order to prevent bending of the packaging sheet, the packaging sheet can be transported to the infrared dryer and dried in a state where the packaging sheet is fixed to a glass substrate, etc.

用於乾燥可使用市售之近紅外線至中紅外線乾燥機。市售之近紅外線至中紅外線乾燥機舉例為例如日本NGK INSULATORS公司製之近紅外波長控制系統等。 For drying, a commercially available near-infrared to mid-infrared dryer can be used. Examples of commercially available near-infrared to mid-infrared dryers are, for example, the near-infrared wavelength control system manufactured by NGK INSULATORS, Japan.

(1-2)封裝用薄片 (1-2) Packaging sheet

步驟(1)中,將支撐體、樹脂組成物層及保護膜依此順序積層而成之封裝用薄片,不剝離保護膜而乾燥。作為封裝用薄片可使用以往之封裝用薄片。 In the step (1), the encapsulation sheet formed by laminating the support, the resin composition layer, and the protective film in this order is dried without peeling the protective film. As the packaging sheet, a conventional packaging sheet can be used.

(1-2-1)支撐體 (1-2-1) Support

作為封裝用薄片之支撐體舉例為例如聚乙烯、聚丙烯(PP)等之聚烯烴、聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)等之聚酯、聚碳酸酯(PC)、聚醯亞胺(PI)、環烯烴聚合物(COP)、聚氯乙烯等之塑膠膜。塑膠膜可僅使用1種,亦可併用2種以上。支撐體較 好為PET膜、PEN膜或COP膜,更好為PET膜。 Examples of the support for the packaging sheet include polyolefins such as polyethylene and polypropylene (PP), polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), etc. Plastic films of polycarbonate (PC), polyimide (PI), cycloolefin polymer (COP), polyvinyl chloride, etc. Only one type of plastic film may be used, or two or more types may be used in combination. Support body is relatively It is preferably a PET film, a PEN film or a COP film, and more preferably a PET film.

為了提高封裝用薄片之防濕性,亦可使用具有障蔽層之塑膠膜作為支撐體。封裝用薄片中,可使障蔽層與樹脂組成物層接觸,亦可障蔽層不與樹脂組成物層接觸(亦即於與樹脂組成物層接觸之支撐體之面相反側的支撐體之面上形成障蔽層)。作為障蔽層舉例為例如氮化矽等之氮化物、氧化鋁等之氧化物、不鏽鋼箔、鋁箔等之金屬箔等。障蔽層可為2層以上之多層構造。至於具有障蔽層之塑膠膜的塑膠膜舉例為例如聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、聚碳酸酯、環烯烴聚合物等之膜。塑膠膜亦可為2層以上之多層構造。具有障蔽層之塑膠膜亦可使用市售品。作為附鋁箔之聚對苯二甲酸乙二酯膜之市售品舉例為例如東海東洋鋁銷售公司製「附PET之Al(1N30)」、福田金屬公司製之「附PET之AL3025」等。 In order to improve the moisture resistance of the packaging sheet, a plastic film with a barrier layer can also be used as a support. In the encapsulation sheet, the barrier layer may be in contact with the resin composition layer, or the barrier layer may not be in contact with the resin composition layer (that is, on the surface of the support body on the opposite side of the support body in contact with the resin composition layer) To form a barrier layer). Examples of the barrier layer include nitrides such as silicon nitride, oxides such as aluminum oxide, and metal foils such as stainless steel foil and aluminum foil. The barrier layer can be a multilayer structure of two or more layers. As for the plastic film with the barrier layer, examples of the plastic film are films such as polyethylene terephthalate, polyethylene naphthalate, polycarbonate, and cycloolefin polymer. The plastic film can also have a multi-layer structure with more than 2 layers. Commercial products can also be used for plastic films with barrier layers. Examples of commercially available products of polyethylene terephthalate film with aluminum foil include "Al (1N30) with PET" manufactured by Tokai Toyo Aluminium Sales Co., Ltd., "AL3025 with PET" manufactured by Fukuda Metal Co., Ltd., and the like.

例如以本發明之製造方法所得之封裝體使用於顯示器用途時,亦可使用偏光板作為支撐體。又,支撐體亦可由具有障蔽層之塑膠膜及偏光板等之具有不同機能之複數層構成。例如可使用以光學黏著薄片(OCA)等之接著劑貼合具有障蔽層之塑膠膜及偏光板者作為支撐體。該情況下,封裝用薄片成為具有障蔽層之塑膠膜與樹脂組成物層接觸之構成。 For example, when the package obtained by the manufacturing method of the present invention is used for display purposes, a polarizing plate can also be used as a support. In addition, the support can also be composed of multiple layers with different functions, such as a plastic film with a barrier layer and a polarizing plate. For example, an adhesive such as an optical adhesive sheet (OCA) can be used to bond a plastic film with a barrier layer and a polarizing plate as a support. In this case, the packaging sheet has a structure in which the plastic film having the barrier layer is in contact with the resin composition layer.

支撐體亦可藉由聚矽氧樹脂系脫模劑、醇酸樹脂系脫模劑、氟樹脂系脫模劑等施以脫模處理、消光處 理、電暈處理等。支撐體之厚度並未特別限制,基於處理性之觀點,支撐體厚度之下限較好為10μm,更好為20μm,其上限較好為200μm,更好為125μm。支撐體厚度之較佳範圍(亦即較佳之上下限組合)為(i)10~200μm,(ii)20~200μm,(iii)10~125μm,及(iv)20~125μm。 The support can also be subjected to mold release treatment and matting with silicone resin-based mold release agents, alkyd resin-based mold release agents, fluororesin-based mold release agents, etc. Treatment, corona treatment, etc. The thickness of the support is not particularly limited. From the viewpoint of handling properties, the lower limit of the support thickness is preferably 10 μm, more preferably 20 μm, and the upper limit thereof is preferably 200 μm, more preferably 125 μm. The preferred range of the thickness of the support (that is, the preferred combination of upper and lower limits) is (i) 10 to 200 μm, (ii) 20 to 200 μm, (iii) 10 to 125 μm, and (iv) 20 to 125 μm.

(1-2-2)保護膜 (1-2-2)Protective film

作為封裝用薄片之保護膜舉例為與支撐體之塑膠膜同樣者。保護膜較好為PET膜、PEN膜、PP膜或COP膜,更好為PET膜、PEN膜或COP膜,又更好為PET膜。保護膜亦可藉由聚矽氧樹脂系脫模劑、醇酸樹脂系脫模劑、氟樹脂系脫模劑等施以脫模處理、消光處理、電暈處理等。保護膜亦可為2層以上之多層構造。保護膜之厚度並未特別限制。基於處理性及封裝用薄片之乾燥等之觀點,保護膜厚度之下限較好為10μm,更好為20μm,其上限較好為200μm,更好為125μm。保護膜厚度之較佳範圍(亦即較佳之上下限組合)為(i)10~200μm,(ii)20~200μm,(iii)10~125μm,及(iv)20~125μm。 Examples of the protective film of the packaging sheet are the same as the plastic film of the support. The protective film is preferably a PET film, a PEN film, a PP film or a COP film, more preferably a PET film, a PEN film or a COP film, and still more preferably a PET film. The protective film may also be subjected to mold release treatment, matting treatment, corona treatment, etc., with silicone resin-based mold release agents, alkyd resin-based mold release agents, fluororesin-based mold release agents, and the like. The protective film may also have a multilayer structure of two or more layers. The thickness of the protective film is not particularly limited. From the viewpoints of handling properties and drying of the packaging sheet, the lower limit of the thickness of the protective film is preferably 10 μm, more preferably 20 μm, and the upper limit thereof is preferably 200 μm, more preferably 125 μm. The preferred range of the thickness of the protective film (that is, the preferred combination of upper and lower limits) is (i) 10~200 μm, (ii) 20~200 μm, (iii) 10~125 μm, and (iv) 20~125 μm.

(1-2-3)樹脂組成物層 (1-2-3) Resin composition layer

本發明所用之封裝用薄片可為熱硬化型封裝用薄片,亦可為感壓接著型封裝用薄片。此處,所謂熱硬化型封裝用薄片意指具有熱硬化性樹脂組成物層之封裝用薄片,使 該封裝用薄片與基板積層後,對其等加熱形成硬化之樹脂組成物層(封裝層)之薄片。所謂感壓接著型封裝用薄片意指已形成封裝層之封裝用薄片,於該封裝用薄片與基板積層後並無必要加熱之薄片。用以形成熱硬化型之封裝用薄片之樹脂組成物層之熱硬化性樹脂組成物並未特別限制,可使用WO2010/084938中記載者等之以往習知者。用以形成感壓接著型之封裝用薄片之樹脂組成物層之樹脂組成物(以下有時簡稱為「感壓接著型之組成物」)並未特別限制,可使用WO2013/108731、WO2011/062167中記載者等之以往習知者。樹脂組成物層亦可為WO2011/016408中記載者等之2層以上之樹脂組成物層而成多層構造。 The packaging sheet used in the present invention may be a thermosetting type packaging sheet or a pressure-sensitive adhesive type packaging sheet. Here, the so-called thermosetting encapsulation sheet means an encapsulation sheet having a layer of thermosetting resin composition, so that After the encapsulation sheet and the substrate are laminated, they are heated to form a hardened resin composition layer (encapsulation layer) sheet. The so-called pressure-sensitive adhesive encapsulation sheet refers to a encapsulation sheet in which an encapsulation layer has been formed, and it is not necessary to heat the encapsulation sheet after the encapsulation sheet and the substrate are laminated. The thermosetting resin composition used to form the resin composition layer of the thermosetting encapsulation sheet is not particularly limited, and conventionally known ones such as those described in WO2010/084938 can be used. The resin composition used to form the resin composition layer of the pressure-sensitive adhesive type encapsulation sheet (hereinafter sometimes referred to as "pressure-sensitive adhesive type composition") is not particularly limited, and WO2013/108731, WO2011/062167 can be used Those who have been acquainted in the past, such as those recorded in the document. The resin composition layer may have a multilayer structure of two or more resin composition layers such as those described in WO2011/016408.

熱硬化性樹脂組成物較好含有環氧樹脂及硬化劑。環氧樹脂及硬化劑並無特別限制,可使用以往習知者。熱硬化性樹脂組成物亦可含有熱塑性樹脂。 The thermosetting resin composition preferably contains an epoxy resin and a curing agent. The epoxy resin and hardener are not particularly limited, and conventionally known ones can be used. The thermosetting resin composition may contain a thermoplastic resin.

感壓接著型之組成物較好含有α-烯烴系樹脂及黏著賦予劑。α-烯烴系樹脂及黏著賦予劑並未特別限制,可使用以往習知者。作為α-烯烴系樹脂舉例為例如聚乙烯、聚異丁烯等之α-烯烴之聚合物。α-烯烴系樹脂亦可為共聚物。作為該共聚物舉例為不同α-烯烴之共聚物、α-烯烴與α-烯烴以外之單體(例如苯乙烯、非共軛二烯等)之共聚物等。 The pressure-sensitive adhesive composition preferably contains an α-olefin resin and an adhesive imparting agent. The α-olefin resin and the adhesion-imparting agent are not particularly limited, and conventionally known ones can be used. Examples of the α-olefin resin include α-olefin polymers such as polyethylene and polyisobutylene. The α-olefin resin may also be a copolymer. Examples of the copolymer include copolymers of different α-olefins, copolymers of α-olefins and monomers other than α-olefins (for example, styrene, non-conjugated diene, etc.).

熱硬化性樹脂組成物及感壓接著型之組成物均可含有添加劑。作為添加劑舉例為例如吸濕性金屬氧化 物(例如氧化鈣、燒成鋁碳酸鎂等)、吸濕性金屬氧化物以外之無機填充劑(例如氧化矽、雲母、滑石等)。 Both the thermosetting resin composition and the pressure-sensitive adhesive composition may contain additives. Examples of additives are, for example, hygroscopic metal oxidation (E.g. calcium oxide, calcined hydrotalcite, etc.), inorganic fillers other than hygroscopic metal oxides (e.g. silica, mica, talc, etc.).

[步驟(2)] [Step (2)]

本發明之方法包含自乾燥之封裝用薄片剝離保護膜後,以封裝用薄片之樹脂組成物層封裝有機EL元件之步驟(2)。為了活用步驟(1)之效果,步驟(2)較好與步驟(1)於同一製造產線內進行。又,基於相同理由,步驟(1)至步驟(2)之間較好為為60分鐘以內。且基於相同理由,較好接續步驟(1)而進行步驟(2)(詳言之,於步驟(1)後,不進行其他步驟,而進行步驟(2))。 The method of the present invention includes the step (2) of encapsulating the organic EL element with the resin composition layer of the encapsulating sheet after peeling off the protective film from the dried encapsulating sheet. In order to utilize the effect of step (1), step (2) is preferably carried out in the same manufacturing line as step (1). In addition, for the same reason, the period between step (1) and step (2) is preferably within 60 minutes. And for the same reason, it is better to proceed to step (1) and proceed to step (2) (in detail, after step (1), no other steps are performed but step (2)).

(2-1)基板 (2-1) Substrate

本發明使用之基板並未特別限定,可使用習知者。基板較好為自玻璃、附氧化銦錫(ITO)之玻璃、聚醯亞胺(PI)、聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)、聚碳酸酯(PC)及環烯烴聚合物(COP)所成之群選擇之至少一者。基板厚度較好為0.1~1.0mm,更好為0.1~0.7mm。有機EL元件之厚度較好為0.01~1μm,更好為0.05~0.5μm。 The substrate used in the present invention is not particularly limited, and conventional ones can be used. The substrate is preferably from glass, glass with indium tin oxide (ITO), polyimide (PI), polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate At least one selected from the group consisting of ester (PC) and cycloolefin polymer (COP). The thickness of the substrate is preferably from 0.1 to 1.0 mm, more preferably from 0.1 to 0.7 mm. The thickness of the organic EL element is preferably from 0.01 to 1 μm, more preferably from 0.05 to 0.5 μm.

有機EL元件亦可具有用以抑制因水分之劣化之其他構造。例如有機EL元件上亦可形成鈍化膜。該情況下,封裝用薄片成為自鈍化膜上開始積層。鈍化膜並未 特別限定,可使用例如藉由濺鍍、CVD法等形成之SiN、SiON、SiO2、Al2O3、TiO2等之無機膜;丙烯酸樹脂、聚醯亞胺系PARYLENE等之高分子膜、與無機膜積層而成之多層構造之積層膜;等之習知鈍化膜。鈍化膜厚度並未特別限制,較好為1~3μm。 The organic EL device may also have other structures for suppressing deterioration due to moisture. For example, a passivation film may be formed on the organic EL element. In this case, the encapsulation sheet starts to be laminated on the passivation film. The passivation film is not particularly limited. For example, inorganic films such as SiN, SiON, SiO 2 , Al 2 O 3 , and TiO 2 formed by sputtering, CVD method, etc.; acrylic resin, polyimide-based PARYLENE, etc. can be used. Polymer film, multi-layer structure laminated film with inorganic film; etc. conventional passivation film. The thickness of the passivation film is not particularly limited, but is preferably 1 to 3 μm.

為了自有機EL元件取出光,基板及封裝用薄片之支撐體之任一者必須為透明。例如於封裝用薄片中使用不透明支撐體(例如具有不透明障蔽層之塑膠膜)時,為了自基板側取出光必須使用透明基板。 In order to extract light from the organic EL element, any one of the substrate and the support of the packaging sheet must be transparent. For example, when an opaque support (for example, a plastic film with an opaque barrier layer) is used in the packaging sheet, a transparent substrate must be used in order to extract light from the substrate side.

(2-2)封裝 (2-2) Package

封裝係以使樹脂組成物層與有機EL元件接觸之方式使封裝用薄片與基板積層而進行。又,前述有機EL元件如上述亦包含具有用以抑制劣化之其他構造之有機EL元件。例如,前述有機EL元件具有鈍化膜時,所謂「樹脂組成物層與有機EL元件接觸」意指「樹脂組成物層與有機EL元件之鈍化膜接觸」。 The encapsulation is performed by laminating the encapsulation sheet and the substrate so that the resin composition layer and the organic EL element are in contact with each other. In addition, the aforementioned organic EL element also includes organic EL elements having other structures for suppressing deterioration as described above. For example, when the aforementioned organic EL element has a passivation film, "the resin composition layer is in contact with the organic EL element" means "the resin composition layer is in contact with the passivation film of the organic EL element".

為了防止乾燥之封裝用薄片再度吸附水分,較好於步驟(1)之乾燥後迅速以封裝用薄片之樹脂組成物層封裝具有有機EL元件之基板。步驟(1)之乾燥後至步驟(2)之封裝開始前之時間若為大氣氛圍下,較好為1~60分鐘,更好為1~30分鐘,又更好為1~15分鐘,特佳為1~10分鐘。此處,所謂「步驟(2)之封裝開始」意指自封裝用薄片剝離保護膜後,封裝用薄片之樹脂組成物 層與有機EL元件接觸之時點。 In order to prevent the dried encapsulation sheet from re-absorbing moisture, it is preferable to encapsulate the substrate with the organic EL element with the resin composition layer of the encapsulation sheet immediately after drying in step (1). If the time between the drying of step (1) and the beginning of the encapsulation of step (2) is in an atmospheric atmosphere, it is preferably 1 to 60 minutes, more preferably 1 to 30 minutes, and even more preferably 1 to 15 minutes. Preferably, it is 1 to 10 minutes. Here, the "start of encapsulation in step (2)" means the resin composition of the encapsulation sheet after peeling off the protective film from the encapsulation sheet The point when the layer is in contact with the organic EL element.

為了防止水分吸附於乾燥之封裝用薄片之樹脂組成物層,封裝較好在惰性氣體氛圍下或真空下進行。作為惰性氣體舉例為例如氮、氬、氦、氖等。在惰性氣體氛圍下進行封裝時之周圍壓力(惰性氣體壓力)較好為1×105Pa左右。在真空下進行封裝時之周圍壓力(減壓度)較好為1~1×103Pa,更好為1~1×102Pa。 In order to prevent moisture from being adsorbed on the resin composition layer of the dried packaging sheet, the packaging is preferably performed under an inert gas atmosphere or a vacuum. Examples of the inert gas include nitrogen, argon, helium, and neon. The surrounding pressure (inert gas pressure) during packaging under an inert gas atmosphere is preferably about 1×10 5 Pa. The ambient pressure (degree of decompression) during packaging under vacuum is preferably 1 to 1×10 3 Pa, more preferably 1 to 1×10 2 Pa.

積層所使用之裝置並未特別限制,可使用習知者例如輥積層機、加壓機等。又亦可併用複數裝置例如輥積層機與加壓機。 The device used for lamination is not particularly limited, and conventional ones such as roll laminators, presses, etc. can be used. It is also possible to use a plurality of devices such as a roll laminator and a press in combination.

(2-2-1)輥積層機 (2-2-1) Roll Laminator

使用輥積層機時,該輥之速度,為了達成樹脂組成物層對支撐體之良好密著性,較好為10~1500mm/分鐘,更好為100~500mm/分鐘。 When using a roll laminator, in order to achieve good adhesion of the resin composition layer to the support, the speed of the roll is preferably 10 to 1500 mm/min, more preferably 100 to 500 mm/min.

輥積層機之輥壓,為了避免對有機EL元件之損傷,較好為0~0.5MPa,更好為0~0.3MPa。此處所謂輥壓意指由空氣針筒之加壓力,係以錶壓(原壓)表示。且所謂輥壓為0意指加壓力為0。輥壓為0時,利用輥積層機積層後,較好以後述之加壓機加壓積層體。 In order to avoid damage to the organic EL element, the roll pressure of the roll laminator is preferably 0 to 0.5 MPa, more preferably 0 to 0.3 MPa. The so-called roll pressure here means the pressure applied by the air syringe, which is expressed in gauge pressure (original pressure). The so-called roll pressure of 0 means that the pressing force is 0. When the roll pressure is 0, it is preferable to press the layered product with a press machine described later after layering with a roll laminator.

輥積層機之輥溫度,為了使樹脂組成物層軟化、提高對基板之追隨性,較好為30~120℃,更好為40~110℃,又更好50~100℃。此處輥溫度意指於輥中內置加熱器,數位控制之輥表面之溫度,可藉由表面接觸型 K熱電偶測定。 In order to soften the resin composition layer and improve the followability to the substrate, the roll temperature of the roll laminator is preferably 30 to 120°C, more preferably 40 to 110°C, and even more preferably 50 to 100°C. The roller temperature here means the temperature of the roller surface that is digitally controlled by the built-in heater in the roller, which can be controlled by the surface contact type K thermocouple measurement.

為了積層可以使用市售之輥積層機。作為市售之輥積層機舉例為例如FUJIPLA公司製之「LPD2325」、大成LAMINATOR公司製之「輥積層機VA770H」、「輥積層機VA700」、「輥積層機VAII-700」、伯東公司製「Mach630up」等。作為輥積層機之輥材質舉例為例如不鏽鋼、橡膠等,較佳為矽橡膠。 For lamination, a commercially available roll laminator can be used. Examples of commercially available roll laminators are, for example, "LPD2325" manufactured by FUJIPLA, "Roll Laminator VA770H" manufactured by Dasei Laminator, "Roll Laminator VA700", "Roll Laminator VAII-700", and "Roll Laminator VAII-700" manufactured by Hakuto Co., Ltd. Mach630up" and so on. Examples of the material of the roll of the roll laminator are, for example, stainless steel, rubber, etc., preferably silicon rubber.

(2-2-2)加壓機 (2-2-2) Pressing machine

使用加壓機時,為了防止因壓力使EL元件龜裂,其加壓較好為0.01~0.5MPa,更好為0.01~0.3MPa。此處所謂加壓機之加壓意指藉由真空油壓汽缸或荷重而控制之施加於被加壓體之壓力(意即施加於封裝用薄片表面之壓力)。 When using a press, in order to prevent the EL element from cracking due to pressure, the pressurization is preferably 0.01 to 0.5 MPa, more preferably 0.01 to 0.3 MPa. The pressurization of the press here refers to the pressure applied to the pressurized body (meaning the pressure applied to the surface of the packaging sheet) controlled by a vacuum hydraulic cylinder or load.

加壓機之加壓溫度較好為30~120℃,更好為40~120℃,又更好為50~110℃,再更好為60~100℃,其加壓時間較好為20~450秒,更好為60~300秒。此處加壓機之加壓溫度意指於加壓機之加壓部分(例如金屬板等平板)表面內置匣加熱器,數位控制之加壓部分表面之溫度,可藉由表面接觸型K熱電偶測定。 The pressing temperature of the press is preferably 30~120°C, more preferably 40~120°C, still more preferably 50~110°C, still more preferably 60~100°C, and its pressing time is preferably 20~ 450 seconds, more preferably 60~300 seconds. The pressing temperature of the pressing machine here means that a cassette heater is built into the surface of the pressing part of the pressing machine (such as a flat plate such as a metal plate), and the surface temperature of the pressing part is digitally controlled. Even determination.

為了積層,可使用市售加壓機。作為市售加壓機舉例為例如MOTON公司製之「批式真空加壓積層機CVP-300」、北川精機公司製真空加壓加壓機「VHI-2051」等之平板加壓機。加壓用之平板之材質舉例為例如 不鏽鋼、鐵等之合金,較好為不鏽鋼。 For stacking, a commercially available press can be used. Examples of commercially available presses include flat presses such as "Batch Vacuum Pressurization Laminator CVP-300" manufactured by MOTON Corporation, and "VHI-2051" vacuum pressurizing presses manufactured by Kitagawa Seiki Co., Ltd. Examples of the material of the pressurized plate are for example Alloys such as stainless steel and iron are preferably stainless steel.

(2-3)樹脂組成物層之硬化 (2-3) Hardening of resin composition layer

使用熱硬化型之封裝用薄片時,加熱封裝用薄片與基板之積層體並硬化,形成樹脂組成物層(亦即封裝層)。硬化可使用例如熱風循環式烘箱、紅外線加熱器、加熱槍、高頻感應加熱裝置、加熱板等進行。為了積層而使用加壓機進行熱加壓時,積層及樹脂組成物層之硬化亦可同時進行。硬化溫度係隨使用之樹脂組成物層及支撐體而異,但較好為80~120℃,更好為80~110℃,硬化時間較好為10~120分鐘,更好為10~60分鐘。所形成之硬化樹脂組成物層厚度較好為3~200μm,更好為5~150μm,又更好為10~100μm。 When a thermosetting type encapsulation sheet is used, the laminate of the encapsulation sheet and the substrate is heated and cured to form a resin composition layer (that is, an encapsulation layer). Hardening can be performed using, for example, a hot-air circulating oven, an infrared heater, a heat gun, a high-frequency induction heating device, a heating plate, and the like. When using a pressing machine to heat and press for lamination, hardening of the lamination and the resin composition layer may be performed simultaneously. The curing temperature varies with the resin composition layer and support used, but is preferably 80-120°C, more preferably 80-110°C, and curing time is preferably 10 to 120 minutes, more preferably 10 to 60 minutes . The thickness of the formed hardened resin composition layer is preferably 3 to 200 μm, more preferably 5 to 150 μm, and still more preferably 10 to 100 μm.

使用感壓接著型之封裝用薄片時,在該封裝用薄片與基板之積層前,藉由加熱該封裝用薄片,即能使樹脂組成物層硬化。然而,該封裝用薄片與基板之積層後,亦可進而加熱該等。於積層後加熱感壓接著型封裝用薄片時,為了避免有機EL元件之熱劣化,其加熱溫度較好為50~150℃,更好為60~100℃,又更好為60~90℃。 When a pressure-sensitive adhesive type encapsulation sheet is used, the resin composition layer can be cured by heating the encapsulation sheet before lamination of the encapsulation sheet and the substrate. However, after the packaging sheet and the substrate are laminated, they may be further heated. In order to avoid thermal deterioration of the organic EL element when heating the pressure-sensitive adhesive packaging sheet after lamination, the heating temperature is preferably 50 to 150°C, more preferably 60 to 100°C, and more preferably 60 to 90°C.

封裝用薄片之水分可藉後述試驗例1中記載之條件使用卡爾費雪水分測定裝置測定。封裝用薄片之含水率可自所測定之水分(重量)及封裝用薄片之重量基於下述式算出。 The moisture content of the packaging sheet can be measured using the Karl Fischer moisture measuring device under the conditions described in Test Example 1 described later. The moisture content of the sealing sheet can be calculated from the measured moisture (weight) and the weight of the sealing sheet based on the following formula.

封裝用薄片之含水率(重量ppm)=(所測定之水 分)/(封裝用薄片之重量)×106 Moisture content of the packaging sheet (weight ppm) = (measured moisture) / (weight of the packaging sheet) × 10 6

步驟(1)後之封裝用薄片之含水率較好為500重量ppm以下,更好為400重量ppm以下,又更好為300重量ppm以下,特佳為250重量ppm以下,最好為200重量ppm以下。 The moisture content of the packaging sheet after step (1) is preferably 500 wt ppm or less, more preferably 400 wt ppm or less, still more preferably 300 wt ppm or less, particularly preferably 250 wt ppm or less, most preferably 200 wt ppm Below ppm.

又封裝用薄片中所含之水分,由於係認為僅含於樹脂組成物中,故含水率之評價較好為假定水分僅含於樹脂組成物層中,基於換算為樹脂組成物層中所含之含水率之值而進行。樹脂組成物層中所含之含水率可自如上述般測定之封裝用薄片之水分(重量)、封裝用薄片之重量及樹脂組成物層之重量比基於下述式算出。 In addition, since the moisture contained in the encapsulation sheet is considered to be contained only in the resin composition, the evaluation of the moisture content is preferably based on the assumption that the moisture is contained only in the resin composition layer, based on the conversion into the resin composition layer. The value of the moisture content. The moisture content contained in the resin composition layer can be calculated from the moisture (weight) of the encapsulation sheet measured as described above, the weight of the encapsulation sheet, and the weight ratio of the resin composition layer based on the following formula.

樹脂組成物層之含水率(重量ppm)=(所測定之水分)/(封裝用薄片之重量×樹脂組成物層之重量比)×106 The moisture content of the resin composition layer (weight ppm) = (measured moisture)/(the weight of the packaging sheet × the weight ratio of the resin composition layer) × 10 6

上述式所用之樹脂組成物層之重量比可例如預先測定封裝用薄片中之支撐體、保護膜等之其他層之重量,基於下述式算出。 The weight ratio of the resin composition layer used in the above formula can be calculated based on the following formula by measuring the weight of other layers such as the support and the protective film in the encapsulation sheet in advance, for example.

樹脂組成物層之重量比=(封裝用薄片之重量-其他層重量)/封裝用薄片之重量 The weight ratio of the resin composition layer = (the weight of the packaging sheet-the weight of the other layers) / the weight of the packaging sheet

步驟(1)後之樹脂組成物層之含水率較好為2000重量ppm以下,更好為1800重量ppm以下,又更好為1600重量ppm以下,在更好為1400重量ppm以下,進而更好為1200重量ppm以下,特佳為1000重量ppm以下,最好為850重量ppm以下。 The moisture content of the resin composition layer after step (1) is preferably 2000 ppm by weight or less, more preferably 1800 ppm by weight or less, still more preferably 1600 ppm by weight or less, more preferably 1400 ppm by weight or less, and still more preferably It is 1200 ppm by weight or less, particularly preferably 1000 ppm by weight or less, and most preferably 850 ppm by weight or less.

〔實施例〕 [Example]

藉由以下之製造例、試驗例及實施例更具體說明本發明,但本發明不限於該等者。 The following manufacturing examples, test examples, and examples illustrate the present invention in more detail, but the present invention is not limited to these.

製造例1:熱硬化型之封裝用薄片1之製造 Manufacturing example 1: Manufacturing of thermosetting type packaging sheet 1

將液狀雙酚A型環氧樹脂(三菱化學公司製「jER828EL」,環氧當量:約185g/eq)56重量份、矽烷偶合劑(信越化學工業公司製「KBM403」)1.2重量份、滑石粉末(日本TALC公司製「FG-15」)2重量份及燒成鋁碳酸鎂(協和化學公司製「KW2200」)15重量份混練後,以3輥混合機進行分散,獲得混合物。 Liquid bisphenol A epoxy resin ("jER828EL" manufactured by Mitsubishi Chemical Corporation, epoxy equivalent: about 185g/eq) 56 parts by weight, silane coupling agent ("KBM403" manufactured by Shin-Etsu Chemical Co., Ltd.) 1.2 parts by weight, talc After kneading 2 parts by weight of powder ("FG-15" manufactured by TALC, Japan) and 15 parts by weight of calcined hydrotalcite ("KW2200" manufactured by Kyowa Chemical Company), the mixture was dispersed with a 3-roll mixer to obtain a mixture.

將硬化促進劑(SUN APRO公司製「U-3512T」)1.5重量份溶解於苯氧基樹脂之甲基乙基酮(MEK)溶液(三菱化學公司製「YL7213B35」,濃度:35重量%)81重量份(苯氧基樹脂:28.4重量份)之混合物中,調配藉由3輥混合機分散而調製之上述混合物、固體雙酚A型環氧樹脂(三菱化學公司製「jER1001」,環氧當量:約475g/eq)MEK溶液(濃度:80重量%)30重量份、有機溶劑分散型膠體氧化矽(氧化矽粒徑:10~15nm,固體成分:30重量%,MEK溶劑,日產化學工業公司製「MEK-EC-2130Y」)20重量份與離子液體硬化劑(N-乙醯基甘胺酸四丁基鏻鹽)3重量份,以高速旋轉混合機均一分散獲得樹脂組成物漆料。 Dissolve 1.5 parts by weight of a hardening accelerator ("U-3512T" manufactured by SUN APRO) in a methyl ethyl ketone (MEK) solution of phenoxy resin ("YL7213B35" manufactured by Mitsubishi Chemical Corporation, concentration: 35% by weight) 81 In a mixture of parts by weight (phenoxy resin: 28.4 parts by weight), the above mixture prepared by dispersing with a 3-roll mixer, solid bisphenol A epoxy resin (manufactured by Mitsubishi Chemical Corporation "jER1001", epoxy equivalent : About 475g/eq) 30 parts by weight of MEK solution (concentration: 80% by weight), organic solvent-dispersed colloidal silica (silica particle size: 10-15nm, solid content: 30% by weight, MEK solvent, Nissan Chemical Industry Co., Ltd. Prepare 20 parts by weight of "MEK-EC-2130Y") and 3 parts by weight of ionic liquid hardener (N-acetylglycine tetrabutylphosphonium salt), and uniformly disperse them with a high-speed rotating mixer to obtain a resin composition paint.

使用具有障蔽層之塑膠膜(東海東洋鋁銷售公司製「附PET之Al(1N30)」,塑膠膜:厚25μm之 聚對苯二甲酸乙二酯(PET)膜,障蔽層:厚30μm之鋁箔)作為支撐體,將所得樹脂組成物漆料以乾燥後之樹脂組成物層厚成為20μm之方式,以模嘴塗佈機均一塗佈於支撐體之障蔽層上,於80~100℃(平均90℃)乾燥5分鐘(樹脂組成物層中之殘留溶劑量:2重量%)。 Use plastic film with barrier layer ("Al(1N30) with PET" manufactured by Tokai Toyo Aluminium Sales Co., Ltd.), plastic film: 25μm thick Polyethylene terephthalate (PET) film, barrier layer: 30μm thick aluminum foil) as a support, the resulting resin composition paint is coated with a die mouth so that the thickness of the resin composition after drying becomes 20μm Coat the barrier layer of the support uniformly by the cloth machine, and dry it at 80~100°C (average 90°C) for 5 minutes (residual solvent amount in the resin composition layer: 2% by weight).

使用以醇酸系脫模劑處理之厚38μm之PET膜作為保護膜,將其貼合於樹脂組成物層表面邊捲取為滾筒狀。滾筒狀之封裝用薄片切成寬507mm,獲得封裝用薄片1(橫:507mm,縱:336mm)。 A PET film with a thickness of 38 μm treated with an alkyd release agent was used as a protective film, and it was wound into a roll shape while being bonded to the surface of the resin composition layer. The drum-shaped packaging sheet was cut into a width of 507 mm to obtain a packaging sheet 1 (width: 507 mm, length: 336 mm).

製造例2:感壓接著型封裝用薄片2之製造 Manufacturing example 2: Manufacturing of pressure-sensitive adhesive type packaging sheet 2

於聚異丁烯(BASF公司製「Oppanol B100」,33重量%IPSOL 150溶液)41重量份中,混合氫化脂環式石油樹脂(EXXON MOBIL公司製「Escorez 5340」)20重量份、液狀聚異丁烯(新日本石油公司製「Tetrax 3T」)5重量份、馬來酸酐改質之異丁烯(新日本石油公司製「HV-300M」)9重量份,以高速旋轉混合機均一分散獲得混合溶液。於該混合溶液中,混合環氧樹脂(DIC公司製「HP7200H」,50重量%IPSOL 150溶液)5.3重量份及陰離子聚合型硬化劑(2,4,6-參(二氰基甲基)酚)0.6重量份,以高速旋轉混合機均一分散獲得漆料。 In 41 parts by weight of polyisobutylene ("Oppanol B100" manufactured by BASF, 33% by weight IPSOL 150 solution), 20 parts by weight of hydrogenated alicyclic petroleum resin ("Escorez 5340" manufactured by EXXON MOBIL) was mixed with 20 parts by weight of liquid polyisobutylene ( 5 parts by weight of "Tetrax 3T" manufactured by Nippon Oil Corporation and 9 parts by weight of isobutylene modified by maleic anhydride ("HV-300M" manufactured by Nippon Oil Corporation) were uniformly dispersed with a high-speed rotary mixer to obtain a mixed solution. In this mixed solution, 5.3 parts by weight of epoxy resin (“HP7200H” 50% by weight IPSOL 150 solution manufactured by DIC Corporation) and an anionic polymer hardener (2,4,6-ginseng (dicyanomethyl)phenol ) 0.6 parts by weight, uniformly dispersed with a high-speed rotating mixer to obtain the paint.

使用具有障蔽層之塑膠膜(東海東洋鋁銷售公司製「附PET之Al(1N30)」,塑膠膜:厚25μm之聚對苯二甲酸乙二酯(PET)膜,障蔽層:厚30μm之鋁箔)作為支撐體,將所得漆料以乾燥後之樹脂組成物層厚 成為20μm之方式,以模嘴塗佈機均一塗佈,於80℃乾燥30分鐘,於130℃加熱硬化30分鐘,獲得樹脂組成物薄片。使用以聚矽氧系脫模劑處理之厚30μm之PET膜作為保護膜,將其貼合於樹脂組成物層表面邊捲取為滾筒狀。滾筒狀之封裝用薄片切成寬507mm,獲得封裝用薄片2(橫:507mm,縱:336mm)。 Use plastic film with barrier layer ("Al with PET (1N30)" made by Tokai Toyo Aluminium Sales Co., Ltd. Plastic film: 25μm thick polyethylene terephthalate (PET) film, barrier layer: 30μm thick aluminum foil ) As a support, the obtained paint is made to the thickness of the resin composition after drying The thickness is 20 μm, uniform coating is performed with a die-nozzle coater, dried at 80°C for 30 minutes, and heated and cured at 130°C for 30 minutes to obtain a resin composition sheet. A 30μm thick PET film treated with a silicone-based release agent is used as a protective film, and it is wound into a roll while being attached to the surface of the resin composition layer. The drum-shaped packaging sheet was cut into a width of 507 mm to obtain packaging sheet 2 (width: 507 mm, length: 336 mm).

製造例3:感壓接著型封裝用薄片3之製造 Manufacturing example 3: Manufacturing of pressure-sensitive adhesive type packaging sheet 3

將馬來酸酐改質之聚丙烯/聚丁烯共聚物(星光PMC公司製「T-YP279」,丙烯單位/丁烯單位=64重量%/36重量%,馬來酸酐基濃度0.464mmol/g,數平均分子量35000,無規共聚物,40重量% SWASOL溶液)20重量份與燒成鋁碳酸鎂(協和化學工業公司製「DHT-4C」)14重量份混合以3輥混合機混練後,以高速旋轉混合機混合含有環己基環之飽和烴樹脂純化物(荒川化學公司製「TFS13-030」,60重量%甲苯溶液)50重量份,獲得均一混合溶液。將所得混合溶液與甲基丙烯酸縮水甘油酯改質之丙烯/聚丁烯共聚物(星光PMC公司製「T-YP276」,甲基丙烯酸縮水甘油酯改質之丙烯/聚丁烯共聚物,丙烯單位/丁烯單位=64重量%/36重量%,縮水甘油基濃度0.638mmol/g,數平均分子量57000,無機共聚物,40重量% SWASOL溶液)14重量份與陰離子聚合型硬化劑(2,4,6-參(二氰基甲基)酚)0.5重量份,以高速旋轉混合機均一分散獲得漆料。 Polypropylene/polybutene copolymer modified by maleic anhydride ("T-YP279" manufactured by Starlight PMC Co., Ltd., propylene unit/butene unit=64% by weight/36% by weight, maleic anhydride group concentration 0.464mmol/g , Number average molecular weight 35000, random copolymer, 40% by weight SWASOL solution) 20 parts by weight and 14 parts by weight of calcined hydrotalcite ("DHT-4C" manufactured by Kyowa Chemical Industry Co., Ltd.) are mixed and kneaded with a 3-roll mixer, 50 parts by weight of the purified saturated hydrocarbon resin containing a cyclohexyl ring ("TFS13-030" manufactured by Arakawa Chemical Co., Ltd., 60% by weight toluene solution) was mixed with a high-speed rotary mixer to obtain a homogeneous mixed solution. Propylene/polybutene copolymer modified with glycidyl methacrylate (Xingguang PMC "T-YP276", glycidyl methacrylate modified propylene/polybutene copolymer, propylene Unit/butene unit=64% by weight/36% by weight, glycidyl concentration 0.638mmol/g, number average molecular weight 57,000, inorganic copolymer, 40% by weight SWASOL solution) 14 parts by weight and anionic polymerization hardener (2, 0.5 parts by weight of 4,6-ginseng (dicyanomethyl)phenol) was uniformly dispersed with a high-speed rotating mixer to obtain a paint.

使用具有障蔽層之塑膠膜(東海東洋鋁銷售 公司製「附PET之Al(1N30)」,塑膠膜:厚25μm之聚對苯二甲酸乙二酯(PET)膜,障蔽層:厚30μm之鋁箔)作為支撐體,將所得漆料以乾燥後之樹脂組成物層厚成為30μm之方式,以模嘴塗佈機均一塗佈,於80℃乾燥30分鐘,於130℃加熱硬化60分鐘,獲得樹脂組成物薄片。使用以聚矽氧系脫模劑處理之厚38μm之PET膜作為保護膜,將其貼合於樹脂組成物層表面邊捲取為滾筒狀。滾筒狀之封裝用薄片切成寬507mm,獲得封裝用薄片3(橫:507mm,縱:336mm)。 Use plastic film with barrier layer (sold by Tokai Toyo Aluminum The company made "Al with PET (1N30)", plastic film: 25μm thick polyethylene terephthalate (PET) film, barrier layer: 30μm thick aluminum foil) as a support, and the resulting paint is dried The thickness of the resin composition layer was 30 μm, and the coating was uniformly coated with a die-nozzle coater, dried at 80°C for 30 minutes, and heated and cured at 130°C for 60 minutes to obtain a resin composition sheet. A 38μm thick PET film treated with a silicone-based release agent was used as a protective film, and it was wound into a roll while being attached to the surface of the resin composition layer. The drum-shaped packaging sheet was cut into a width of 507 mm to obtain a packaging sheet 3 (width: 507 mm, length: 336 mm).

試驗例1:乾燥之封裝用薄片及樹脂組成物層之含水率計算 Test Example 1: Calculation of moisture content of dried packaging sheet and resin composition layer

使用紅外線乾燥機(日本NGK INSULATORS公司製之「近紅外線波長控制系統」,燈絲:KANTHAL或鎢)、熱風乾燥機(YAMATO科學公司製「精密恆溫器」)或真空乾燥機(YAMATO科學公司製「方型真空乾燥機」,減壓度:100Pa),以下表1~3所示之溫度及時間,使如上述所得之封裝用薄片1~3,以剝離保護膜或不剝離保護膜而乾燥。 Use an infrared dryer ("Near Infrared Wavelength Control System" manufactured by NGK INSULATORS, Japan, filament: KANTHAL or tungsten), hot air dryer ("Precision Thermostat" manufactured by YAMATO Scientific Co.), or vacuum dryer ("Precision Thermostat" manufactured by Yamato Scientific Co., Ltd.) "Square vacuum dryer", decompression degree: 100Pa), and the temperature and time shown in Tables 1 to 3 below, to dry the encapsulating sheets 1 to 3 obtained as described above with or without peeling the protective film.

使用紅外線乾燥機之乾燥係於氮氣氛圍中(水蒸氣量:20ppm以下)下將紅外線自保護膜側照射封裝用薄片而進行。自紅外線乾燥機照射之紅外線之峰值波長於燈絲為KANTHAL時為3μm附近,於燈絲為鎢時為1.5μm附近。又,封裝用薄片1及3之乾燥所用之紅外線 乾燥機之燈絲為KANTHAL。封裝用薄片2之乾燥所用之紅外線乾燥機之燈絲為鎢。且,紅外線乾燥機之光源(加熱器)與封裝用薄片之距離調整為15cm,紅外線之照射角度調整為0~60度。 Drying using an infrared dryer is performed by irradiating infrared rays from the protective film side to the sealing sheet in a nitrogen atmosphere (amount of water vapor: 20 ppm or less). The peak wavelength of the infrared rays irradiated from the infrared dryer is around 3μm when the filament is KANTHAL, and around 1.5μm when the filament is tungsten. In addition, infrared rays used for drying of packaging sheets 1 and 3 The filament of the dryer is KANTHAL. The filament of the infrared dryer used for drying the packaging sheet 2 is tungsten. In addition, the distance between the light source (heater) of the infrared dryer and the packaging sheet is adjusted to 15cm, and the infrared radiation angle is adjusted to 0-60 degrees.

自乾燥後之封裝用薄片1~3切出試料(橫:約100mm,縱:約100mm,重量:100~300mg),剝離保護膜,使用電量滴定法之卡爾費雪水分測定裝置(三菱化學分析公司製「微量水分測定裝置CA-200」)測定封裝用薄片之水分。裝置係由設置有可加熱之樣品之玻璃容器與裝入有於加熱樣品時供滴定氣化的水分之反應液之滴定裝置所構成。氣化之水分藉由流動流量:250±25ml/min之氮氣而自玻璃容器移動至滴定裝置之反應液側。測定係於置換為氮氣氛圍下(水蒸氣量<0.1ppm)之玻璃容器內投入樣品,測定於130℃之條件下氣化之水分,算出封裝用薄片之含水率及樹脂組成物層之含水率。結果示於下述表1~3。 Cut out the sample (width: about 100mm, length: about 100mm, weight: 100~300mg) from the dried packaging sheet 1~3, peel off the protective film, and use the Karl Fischer moisture measurement device (Mitsubishi Chemical Analysis) by coulometric titration The company's "Trace Moisture Measuring Apparatus CA-200") measures the moisture of the packaging sheet. The device is composed of a glass container equipped with a heatable sample and a titration device filled with a reaction liquid for titrating the vaporized water when the sample is heated. The vaporized water is moved from the glass container to the reaction liquid side of the titration device by flowing nitrogen gas with a flow rate of 250±25ml/min. The measurement is performed by putting the sample in a glass container replaced with a nitrogen atmosphere (water vapor content <0.1ppm), measuring the moisture vaporized at 130°C, and calculating the moisture content of the packaging sheet and the moisture content of the resin composition layer . The results are shown in Tables 1 to 3 below.

試驗例2:乾燥之封裝用薄片之以Ca膜之封裝性評價試驗 Test Example 2: Evaluation test of the encapsulation property with Ca film of the dried encapsulation sheet

使用形成Ca膜代替有機EL元件之玻璃基板,進行有機EL元件封裝之模擬試驗,評價利用乾燥之封裝用薄片之封裝性。 Using a glass substrate on which a Ca film is formed instead of an organic EL element, a simulation test of the encapsulation of an organic EL element is performed, and the encapsulation performance of the dried encapsulation sheet is evaluated.

詳言之,首先於玻璃基板(厚:700μm,橫:50mm,縱:50mm)上蒸鍍Ca,形成Ca膜(厚:約 300nm,橫:40mm,縱:40mm)。所得玻璃基板於Ca膜周圍具有5mm之封裝寬度(亦即未形成Ca膜之玻璃基板與封裝用薄片接觸之寬度)。 Specifically, first, Ca is vapor-deposited on a glass substrate (thickness: 700 μm, horizontal: 50 mm, vertical: 50 mm) to form a Ca film (thickness: approximately 300nm, horizontal: 40mm, vertical: 40mm). The resulting glass substrate has a packaging width of 5 mm around the Ca film (that is, the contact width between the glass substrate without the Ca film and the packaging sheet).

其次,以下述表1~3所示之溫度及時間乾燥試驗例1所記載之封裝用薄片1~3(橫:50mm,縱:50mm),乾燥後以180秒以使樹脂組成物層與Ca膜接觸之方式積層封裝用薄片與玻璃基板,封裝Ca膜。該積層係使用輥積層機(FUJIPLA公司製「LPD2325」,輥材質:橡膠)以輥溫度:90℃,輥速度:360mm/分鐘,輥壓:0.2MPa,氮氣氛圍下之條件進行。又,使用熱硬化型之封裝用薄片1時,使用加熱板(AS ONE公司製「HP-2SA」),使封裝用薄片與玻璃基板之積層體在氛圍下110℃加熱30分鐘,使樹脂組成物層熱硬化。 Next, the encapsulation sheets 1 to 3 (width: 50 mm, length: 50 mm) described in Test Example 1 were dried at the temperature and time shown in Tables 1 to 3 below, and after drying, the resin composition layer and Ca The method of film contact is to laminate the encapsulation sheet and the glass substrate to encapsulate the Ca film. The lamination was carried out using a roll stacker ("LPD2325" manufactured by FUJIPLA, roll material: rubber) under the conditions of roll temperature: 90°C, roll speed: 360 mm/min, roll pressure: 0.2 MPa, and nitrogen atmosphere. In addition, when using the thermosetting type encapsulation sheet 1, use a hot plate ("HP-2SA" manufactured by AS ONE) to heat the laminate of the encapsulation sheet and the glass substrate at 110°C for 30 minutes in an atmosphere to make the resin composition The layer is thermally hardened.

使如上述所得之封裝用薄片與玻璃基板之積層體裝入加速試驗機(ESPEC公司製「小型環境試驗器SH-222」,溫度:60℃,濕度:90%RH),藉由Ca(不透明)+2H2O→Ca(OH)2(透明)之反應,測定不透明之Ca膜縮小5mm之時間(開始縮小時間)作為封裝用薄片之封裝性指標,界以下基準評價。開始縮小時間越長,其封裝用薄片之封裝性越優異。結果示於下述表1~3。 The laminate of the encapsulation sheet and glass substrate obtained as described above is loaded into an accelerated testing machine ("Small Environmental Tester SH-222" manufactured by ESPEC Corporation, temperature: 60°C, humidity: 90%RH), and Ca (opaque) )+2H 2 O→Ca(OH) 2 (transparent), measure the time for the opaque Ca film to shrink by 5mm (start shrinking time) as an index of the encapsulation of the encapsulation sheet, and evaluate it according to the following benchmarks. The longer the initial shrinking time, the better the sealing performance of the packaging sheet. The results are shown in Tables 1 to 3 below.

○:開始縮小時間為600小時以上。 ○: The time to start shrinking is 600 hours or more.

△:開始縮小時間為300小時以上且未達600小時。 △: The start shrinking time is more than 300 hours and less than 600 hours.

×:開始縮小時間未達300小時。 ×: The time to start shrinking is less than 300 hours.

又,使用熱硬化型封裝用薄片1時,樹脂組 成物層熱硬化後以目視觀察Ca膜表面,藉以下基準評價。又,以目視觀察使用感壓接著型之封裝用薄片3時之Ca膜表面,藉以下基準評價。結果示於下述表1及3。 Also, when using thermosetting type packaging sheet 1, the resin group The surface of the Ca film was visually observed after the resultant layer was thermally cured, and evaluated based on the following criteria. In addition, the surface of the Ca film when the pressure-sensitive adhesive type sealing sheet 3 was used was visually observed, and evaluated based on the following criteria. The results are shown in Tables 1 and 3 below.

○:封裝前後Ca膜表面未變化,見到鏡面狀之銀色光澤。 ○: The surface of the Ca film remains unchanged before and after packaging, and a mirror-like silver luster is seen.

△:Ca膜表面之銀色光澤變鈍,變色為灰色。 △: The silver luster on the surface of the Ca film becomes dull and the color becomes gray.

×:Ca膜消失,自基材側觀察時見到多數凹凸。 ×: The Ca film disappeared, and many irregularities were seen when viewed from the substrate side.

Figure 105108549-A0202-12-0027-1
Figure 105108549-A0202-12-0027-1

Figure 105108549-A0202-12-0028-2
Figure 105108549-A0202-12-0028-2

Figure 105108549-A0202-12-0029-3
Figure 105108549-A0202-12-0029-3

如表1所示,使用未乾燥之封裝用薄片1(No.1-5,封裝用薄片之含水率:1290重量ppm)或利用真空乾燥機未剝離保護膜而乾燥之封裝用薄片1(No.1-4,封裝用薄片之含水率:768重量ppm)之封裝性評價試驗中,樹脂組成物層硬化後玻璃基板上之Ca膜表面劣化。又使用利用熱風乾燥機(100℃,5分鐘)未剝離保護膜而乾燥之封裝用薄片1(No.1-3,封裝用薄片之含水率:511重量ppm)之封裝性評價試驗中,樹脂組成物層硬化後玻璃基板上之Ca膜表面稍劣化。由該等結果教示其含水率超過500重量ppm之封裝用薄片不適於封裝。 As shown in Table 1, use undried packaging sheet 1 (No.1-5, moisture content of packaging sheet: 1290 wtppm) or use a vacuum dryer without peeling off the protective film and dry packaging sheet 1 (No. .1-4, Moisture content of encapsulation sheet: 768 ppm by weight) In the encapsulation evaluation test, the surface of the Ca film on the glass substrate deteriorated after the resin composition layer was cured. In the encapsulation evaluation test, the encapsulation sheet 1 (No. 1-3, moisture content of the encapsulation sheet: 511 wtppm) dried without peeling the protective film using a hot air dryer (100°C, 5 minutes), the resin After the composition layer is hardened, the surface of the Ca film on the glass substrate is slightly deteriorated. These results teach that encapsulation sheets whose moisture content exceeds 500 ppm by weight are not suitable for encapsulation.

又,如表1所示,使用熱風乾燥機(100℃,5分鐘)剝離保護膜而乾燥之封裝用薄片1(No.1-2)其含水率為153重量ppm,且開始縮小時間超過600小時,含水率及封裝性均良好。然而,剝離保護膜進行乾燥時,乾燥中汙染樹脂組成物層,其結果有對有機EL元件帶來不良影響之虞。 Also, as shown in Table 1, the encapsulation sheet 1 (No.1-2) dried by peeling off the protective film using a hot air dryer (100°C, 5 minutes) has a moisture content of 153 wtppm and a shrinkage time of over 600 When it is small, the moisture content and encapsulation are both good. However, when the protective film is peeled off and dried, the resin composition layer is contaminated during drying, and as a result, there is a risk of adversely affecting the organic EL element.

又,如表1所示,藉由使用近紅外線至中紅外線乾燥機(100℃,5分鐘)即使不剝離保護膜,封裝用薄片1(No.1-1)之含水率亦可減低至75重量ppm。此推定係因近紅外線照射激發保護膜及樹脂組成物層之水分,透過保護膜而蒸發之故。 In addition, as shown in Table 1, by using a near-infrared to mid-infrared dryer (100°C, 5 minutes) without peeling off the protective film, the moisture content of the packaging sheet 1 (No. 1-1) can be reduced to 75 Weight ppm. This presumption is due to the fact that the water in the protective film and the resin composition layer is excited by near-infrared radiation to evaporate through the protective film.

如表2所示,未乾燥之封裝用薄片2(No.2-5)之含水率較高而為2900重量ppm,教示其不適於封裝。又,使用熱風乾燥機(100℃,5分鐘)且不剝離保護膜而乾燥之封裝用薄片2之含水率(No.2-4)較高為1131重量ppm,且其開始縮小時間較短而未達300小時。 As shown in Table 2, the undried packaging sheet 2 (No. 2-5) has a high moisture content of 2900 ppm by weight, which teaches that it is not suitable for packaging. In addition, the moisture content (No. 2-4) of the packaging sheet 2 dried using a hot air dryer (100°C, 5 minutes) without peeling off the protective film is 1131 ppm by weight, and the shrinking time is relatively short. Less than 300 hours.

又,如表2所示,藉由使用熱風乾燥機於高溫(No.2-2,130℃)或長時間(No.2-3,840分鐘=14小時)乾燥,即使不剝離保護膜,亦可使封裝用薄片之含水率減低,可提高其封裝性。然而,高溫乾燥有對樹脂組成物層帶來不良影響之虞,且長時間乾燥效率差。 Also, as shown in Table 2, by using a hot air dryer to dry at high temperature (No. 2-2, 130°C) or long time (No. 2-3, 840 minutes = 14 hours), even if the protective film is not peeled off, The moisture content of the packaging sheet can also be reduced, and its packaging performance can be improved. However, high-temperature drying may have an adverse effect on the resin composition layer, and the drying efficiency for a long time is poor.

又,如表2所示,藉由使用近紅外線至中紅外線乾燥機(110℃,5分鐘),即使不剝離保護膜,封 裝用薄片2(No.2-1)之含水率亦可減低至31重量ppm。由該結果可知使用近紅外線至中紅外線乾燥機之乾燥,不僅對熱硬化型封裝用薄片有用,對於感壓接著型之封裝用薄片亦有用。 Also, as shown in Table 2, by using a near-infrared to mid-infrared dryer (110°C, 5 minutes), even if the protective film is not peeled off, the seal The moisture content of the mounting sheet 2 (No. 2-1) can also be reduced to 31 wtppm. From this result, it can be seen that drying using a near-infrared to mid-infrared dryer is useful not only for thermosetting encapsulation sheets, but also for pressure-sensitive adhesive encapsulation sheets.

如表3所示,使用未乾燥之封裝用薄片3(No.3-6,封裝用薄片之含水率:3890重量ppm,樹脂組成物層之含水率:18507重量ppm)或未剝離保護膜使用熱風乾燥機(130℃,30分鐘)乾燥之封裝用薄片3(No.3-3,封裝用薄片之含水率:1114重量ppm,樹脂組成物層含水率:5433重量ppm)之封裝性評價試驗中,玻璃基板上之Ca膜表面劣化。由該等結果,教示樹脂組成物層之含水率超過2000重量ppm之封裝用薄片不適於封裝。 As shown in Table 3, use the undried packaging sheet 3 (No. 3-6, the moisture content of the packaging sheet: 3890 wtppm, the moisture content of the resin composition layer: 18507 wtppm) or use the unpeeled protective film Encapsulation evaluation test of sealing sheet 3 (No.3-3, moisture content of sealing sheet: 1114 wtppm, moisture content of resin composition layer: 5433 wtppm) dried by hot air dryer (130°C, 30 minutes) In this case, the surface of the Ca film on the glass substrate is deteriorated. From these results, it is taught that the encapsulation sheet with the moisture content of the resin composition layer exceeding 2000 ppm by weight is not suitable for encapsulation.

又,如表3所示,使用熱風乾燥機藉由長時間(No.3-4,130℃,60分鐘)乾燥,即使不剝離保護膜,雖可某程度減低封裝用薄片之含水率,但乾燥效率惡化,有不易提高封裝性能之傾向。 Also, as shown in Table 3, using a hot-air dryer to dry for a long time (No. 3-4, 130°C, 60 minutes), even if the protective film is not peeled off, although the moisture content of the packaging sheet can be reduced to some extent, The drying efficiency deteriorates, and there is a tendency that it is not easy to improve the packaging performance.

又,如表3所示,藉由使用近紅外線至中紅外線乾燥機,即使不剝離保護膜,於短時間(10~30分鐘)封裝用薄片3(No.3-1及No.3-2)之含水率亦可減低至57~64重量ppm,樹脂組成物層之含水率可減低至272~307重量ppm,可提高封裝性能。 Also, as shown in Table 3, by using a near-infrared to mid-infrared dryer, even if the protective film is not peeled off, the packaging sheet 3 (No.3-1 and No.3-2) can be used in a short time (10-30 minutes). The moisture content of) can also be reduced to 57~64wtppm, and the moisture content of the resin composition layer can be reduced to 272~307wtppm, which can improve the encapsulation performance.

試驗例3:於乾燥之封裝用薄片之有機EL的封裝性能評 價試驗 Test Example 3: Evaluation of the encapsulation performance of organic EL in a dry encapsulation sheet Price test

使用有機EL元件,評價乾燥之封裝用薄片之封裝性。 Using organic EL elements, evaluate the encapsulation properties of the dried encapsulation sheet.

詳言之,首先於附氧化銦錫(ITO)之玻璃基板(GEOMATEC公司製)上以使發光面積成為4mm2之方式形成有機EL元件(有機膜厚:110nm,Al陰極厚:100nm)。 Specifically, first, an organic EL element (organic film thickness: 110 nm, Al cathode thickness: 100 nm) was formed on a glass substrate with indium tin oxide (ITO) (manufactured by GEOMATEC) so that the light-emitting area became 4 mm 2.

其次,以下述表4及5所示之溫度及時間使試驗例1所記載之封裝用薄片1或3(橫:15mm,縱:25mm)乾燥,乾燥後以180秒以使樹脂組成物與有機EL元件接觸之方式使封裝用薄片與附ITO之玻璃基板積層並封裝有機EL元件。該積層係使用輥積層機(FUJIPLA公司製「LPD2325」,輥材質:橡膠)以輥溫度:90℃,輥速度:360mm/分鐘,輥壓:0.2MPa,氮氣氛圍下之條件進行。又,使用熱硬化型之封裝用薄片1時,使用加熱板(AS ONE公司製「HP-2SA」),使樹脂用薄片與玻璃基板在氮氣氛圍下110℃加熱30分鐘,使樹脂組成物熱硬化。 Next, the encapsulation sheet 1 or 3 (horizontal: 15 mm, vertical: 25 mm) described in Test Example 1 was dried at the temperature and time shown in Tables 4 and 5 below, and after drying, the resin composition was combined with the organic The contact method of the EL element is to laminate the encapsulation sheet and the glass substrate with ITO to encapsulate the organic EL element. The lamination was carried out using a roll stacker ("LPD2325" manufactured by FUJIPLA, roll material: rubber) under the conditions of roll temperature: 90°C, roll speed: 360 mm/min, roll pressure: 0.2 MPa, and nitrogen atmosphere. Also, when using a thermosetting type encapsulation sheet 1, use a hot plate ("HP-2SA" manufactured by AS ONE) to heat the resin sheet and glass substrate at 110°C for 30 minutes in a nitrogen atmosphere to heat the resin composition hardening.

以如此所得之封裝用薄片1封裝之有機EL元件之發光面以CCD相機(KYENCE公司製)以100倍之倍率觀察,測量發光面中全部體積中之剛封裝後之暗點比例並評價。此處,所謂暗點意指元件與水分接觸時產生之非發光部分。該暗點比例越小,其封裝用薄片之封裝性能越優異。結果示於表4。 The light-emitting surface of the organic EL element encapsulated by the thus-obtained packaging sheet 1 was observed with a CCD camera (manufactured by KYENCE) at a magnification of 100 times, and the ratio of dark spots in the entire volume of the light-emitting surface immediately after packaging was measured and evaluated. Here, the so-called dark spot refers to the non-luminous part generated when the element is in contact with moisture. The smaller the dark spot ratio, the better the packaging performance of the packaging sheet. The results are shown in Table 4.

○:暗點比例未達1.0% ○: The proportion of dark spots is less than 1.0%

△:暗點比例為1.0%以上且未達5.0% △: The proportion of dark spots is 1.0% or more and less than 5.0%

×:暗點比例為5.0%以上 ×: The ratio of dark spots is 5.0% or more

使用感壓接著型之封裝用薄片3時,首先,於後述之加速試驗前,以CCD相機對以如上述所得之封裝用薄片封裝之有機EL元件之發光面以100倍之倍率進行觀察,測量其發光面積(初期發光面積)。其次封裝用薄片在氮氣氛圍下於85℃加熱100小時,進行劣化加速試驗。以CCD相機對該加速試驗後之有機EL元件之發光面以100倍之倍率進行觀察,於加速試驗後亦測定發光之發光面面積(發光殘存面積)。自如上述測量之初期發光面積及發光殘存面積,基於下述式算出發光殘存面積之比例。 When using the pressure-sensitive adhesive type encapsulation sheet 3, first, before the acceleration test described later, observe and measure the light-emitting surface of the organic EL element encapsulated with the encapsulation sheet obtained as described above with a CCD camera at a magnification of 100 times Its light-emitting area (initial light-emitting area). Next, the packaging sheet was heated at 85°C for 100 hours in a nitrogen atmosphere, and the deterioration accelerated test was performed. The light-emitting surface of the organic EL device after the acceleration test was observed with a CCD camera at a magnification of 100 times, and the area of the light-emitting surface (remaining light-emitting area) was also measured after the acceleration test. Based on the initial emission area and the remaining emission area measured above, the ratio of the remaining emission area is calculated based on the following formula.

發光殘存面積之比例(%)=初期發光面積/發光殘存面積×100 The ratio of luminous residual area (%) = initial luminous area / luminous residual area × 100

結果示於下表5。 The results are shown in Table 5 below.

○:發光殘存面積之比例為70%以上 ○: The proportion of luminous residual area is more than 70%

△:發光殘存面積之比例為50%以上且未達70% △: The proportion of luminous residual area is more than 50% and less than 70%

×:發光殘存面積之比例未達50% ×: The proportion of luminous residual area is less than 50%

Figure 105108549-A0202-12-0034-4
Figure 105108549-A0202-12-0034-4

Figure 105108549-A0202-12-0034-5
Figure 105108549-A0202-12-0034-5

如表4所示,使用未乾燥之封裝用薄片1(No.1-10,封裝用薄片之含水率:1290重量ppm)或利用熱風乾燥機未剝離保護膜而乾燥之封裝用薄片1(No.1-9,封裝用薄片之含水率:511重量ppm)之封裝性評價試驗中,剛封裝後之有機EL元件之發光面存在多數暗點。教示與使用Ca膜之試驗例2之結果同樣,其含水率超過500重量ppm之封裝用薄片不適於封裝,但亦為使用有機EL元件之本試驗例。 As shown in Table 4, use undried packaging sheet 1 (No. 1-10, moisture content of packaging sheet: 1290 wtppm) or use a hot air dryer without peeling off the protective film and dry packaging sheet 1 (No. .1-9, Moisture content of encapsulation sheet: 511 wtppm) In the encapsulation evaluation test, there are many dark spots on the light-emitting surface of the organic EL element immediately after encapsulation. The teaching is the same as the result of Test Example 2 using a Ca film. The packaging sheet with a moisture content of more than 500 ppm by weight is not suitable for packaging, but it is also this test example using an organic EL element.

又,如表4所示,使用熱風乾燥機(100℃,10分鐘)剝離保護膜而乾燥之封裝用薄片1(No.1-8),封裝用薄片之含水率為107重量ppm,且剛封裝後存在於有機EL元件之發光面之暗點較少。然而,若剝離保護膜進行乾燥,則乾燥中樹脂組成物汙染,其結果有對有機EL元件造成不良影響之可能性。 Also, as shown in Table 4, the encapsulation sheet 1 (No. 1-8) dried by peeling off the protective film using a hot air dryer (100°C, 10 minutes), the moisture content of the encapsulation sheet is 107 ppm by weight, and the moisture content is 107 wtppm. After encapsulation, there are fewer dark spots on the light-emitting surface of the organic EL device. However, if the protective film is peeled off and dried, the resin composition is contaminated during drying, and as a result, there is a possibility of adversely affecting the organic EL element.

又,如表4所示,藉由使用近紅外線至中紅外線乾燥機(90℃,5分鐘~10分鐘),即使不剝離保護膜,封裝用薄片1(No.1-6及No.1-7)之含水率亦可減低至150重量ppm。使用該等封裝有機EL元件時,暗點之比例少,可良好封裝。 Also, as shown in Table 4, by using a near-infrared to mid-infrared dryer (90°C, 5 minutes to 10 minutes), even if the protective film is not peeled off, the packaging sheet 1 (No. 1-6 and No. 1- 7) The moisture content can also be reduced to 150 ppm by weight. When using such encapsulated organic EL devices, the proportion of dark spots is small, and they can be well packaged.

如表5所示,使用未乾燥之封裝用薄片3(No.3-12,封裝用薄片之含水率:2900重量ppm)或使用熱風乾燥機未剝離保護膜而短時間乾燥之封裝用薄片3(No.3-10,封裝用薄片之含水率:710重量ppm)之封裝性能評價試驗中,發光殘存面積之比例大幅降低。其結果 認為是由於乾燥不充分,故封裝用薄片3殘存水分,而使有機EL元件劣化之故。 As shown in Table 5, use undried packaging sheet 3 (No.3-12, moisture content of packaging sheet: 2900 wtppm) or use a hot air dryer without peeling off the protective film and dry the packaging sheet 3 in a short time (No. 3-10, Moisture content of packaging sheet: 710 wtppm) In the packaging performance evaluation test, the ratio of the residual area of luminescence was greatly reduced. as a result It is considered that due to insufficient drying, moisture remained in the sealing sheet 3, which degraded the organic EL element.

又,如表5所示,藉由使用近紅外線至中紅外線乾燥機(130℃,5分鐘~10分鐘),即使不剝離保護膜,封裝用薄片3(No.3-7及No.3-8)之含水率亦可減低至約100重量ppm。由該結果可知使用近紅外線至中紅外線乾燥機之乾燥,不僅於熱硬化型封裝用薄片有用,於感壓接著型之封裝用薄片亦有用。 Also, as shown in Table 5, by using a near-infrared to mid-infrared dryer (130°C, 5 minutes to 10 minutes), even if the protective film is not peeled off, the encapsulation sheet 3 (No. 3-7 and No. 3- 8) The moisture content can also be reduced to about 100 ppm by weight. From this result, it can be seen that drying using a near-infrared to mid-infrared dryer is useful not only for thermosetting type packaging sheets, but also for pressure-sensitive adhesive type packaging sheets.

〔產業上之可利用性〕 〔Industrial availability〕

依據本發明方法,即使不剝離使支撐體、樹脂組成物層及保護膜依此順序積層之封裝用薄片之保護膜,亦可有效地使封裝用薄片乾燥。因此,本發明方法可用於製造以樹脂組成物層封裝基板上之有機EL元件之封裝體(尤其是有機EL裝置)。 According to the method of the present invention, the encapsulation sheet can be effectively dried even without peeling off the protective film of the encapsulation sheet in which the support, the resin composition layer, and the protective film are laminated in this order. Therefore, the method of the present invention can be used to manufacture packages (especially organic EL devices) that encapsulate organic EL devices on a substrate with a resin composition layer.

本申請案係以於日本提出申請之特願2015-058486號為基礎,其內容全文包含於本說明書中。 This application is based on Japanese Patent Application No. 2015-058486 filed in Japan, and the entire content is included in this specification.

Claims (10)

一種封裝體之製造方法,其係以樹脂組成物層封裝基板上之有機EL元件之封裝體之製造方法,且包含下述步驟:(1)將使支撐體、樹脂組成物層及保護膜(cover film)依此順序積層而成之封裝用薄片,不剝離保護膜而以近紅外線至中紅外線乾燥機乾燥之步驟,及(2)自乾燥之封裝用薄片剝離保護膜後,以封裝用薄片之樹脂組成物層封裝有機EL元件之步驟。 A method for manufacturing a package, which is a method for manufacturing a package for encapsulating an organic EL element on a substrate with a resin composition layer, and includes the following steps: (1) A support, a resin composition layer, and a protective film ( cover film) the packaging sheet laminated in this order, the step of drying with a near-infrared to mid-infrared dryer without peeling off the protective film, and (2) after peeling off the protective film from the dried packaging sheet, use the packaging sheet The resin composition layer encapsulates the organic EL device. 如請求項1之製造方法,其中步驟(2)係與步驟(1)在相同製造產線內進行。 Such as the manufacturing method of claim 1, wherein step (2) is performed in the same manufacturing line as step (1). 如請求項1或2之製造方法,其中接續步驟(1)進行步驟(2)。 For example, the manufacturing method of claim 1 or 2, wherein step (1) is continued to step (2). 如請求項1或2之製造方法,其中自步驟(1)之乾燥後至步驟(2)之封裝開始之前之時間為1~60分鐘。 Such as the manufacturing method of claim 1 or 2, wherein the time from drying in step (1) to before packaging in step (2) is 1 to 60 minutes. 如請求項1或2之製造方法,其中自近紅外線至中紅外線乾燥機照射之近紅外線至中紅外線之峰值波長為1.0~3.5μm之範圍內。 Such as the manufacturing method of claim 1 or 2, wherein the peak wavelength of the near-infrared to the mid-infrared irradiated from the near-infrared to the mid-infrared dryer is within the range of 1.0~3.5μm. 如請求項1或2之製造方法,其中近紅外線至中紅外線乾燥機之乾燥溫度為60~160℃,乾燥時間為0.5~60分鐘。 Such as the manufacturing method of claim 1 or 2, wherein the drying temperature of the near-infrared to mid-infrared dryer is 60~160℃, and the drying time is 0.5~60 minutes. 如請求項6之製造方法,其中近紅外線至中紅外線乾燥機之乾燥溫度為60~130℃。 Such as the manufacturing method of claim 6, wherein the drying temperature of the near-infrared to mid-infrared dryer is 60~130°C. 如請求項1或2之製造方法,其中步驟(1)後之 封裝用薄片之含水率為500重量ppm以下。 Such as the manufacturing method of claim 1 or 2, wherein after step (1) The moisture content of the sealing sheet is 500 ppm by weight or less. 如請求項1或2之製造方法,其中步驟(1)後之樹脂組成物層之含水率為2000重量ppm以下。 The manufacturing method of claim 1 or 2, wherein the moisture content of the resin composition layer after step (1) is 2000 ppm by weight or less. 如請求項1或2之製造方法,其中步驟(2)之有機EL元件之封裝係藉由使樹脂組成物層與有機EL元件接觸之方式使封裝用薄片與基板積層而進行。 According to the manufacturing method of claim 1 or 2, wherein the encapsulation of the organic EL device in step (2) is performed by laminating the encapsulation sheet and the substrate so that the resin composition layer and the organic EL device are in contact with each other.
TW105108549A 2015-03-20 2016-03-18 Manufacturing method of package TWI738641B (en)

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