HK1121132A1 - New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use - Google Patents
New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and useInfo
- Publication number
- HK1121132A1 HK1121132A1 HK09100896.6A HK09100896A HK1121132A1 HK 1121132 A1 HK1121132 A1 HK 1121132A1 HK 09100896 A HK09100896 A HK 09100896A HK 1121132 A1 HK1121132 A1 HK 1121132A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- lithographic plates
- coatings
- preparation
- methods
- new materials
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title 2
- 238000000034 method Methods 0.000 title 1
- 238000002360 preparation method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C275/00—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups
- C07C275/46—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups containing any of the groups, X being a hetero atom, Y being any atom, e.g. acylureas
- C07C275/58—Y being a hetero atom
- C07C275/62—Y being a nitrogen atom, e.g. biuret
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D159/00—Coating compositions based on polyacetals; Coating compositions based on derivatives of polyacetals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C271/16—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by singly-bound oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/027—Organoboranes and organoborohydrides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
- C08B11/00—Preparation of cellulose ethers
- C08B11/193—Mixed ethers, i.e. ethers with two or more different etherifying groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
- C08G18/6216—Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
- C08G18/622—Polymers of esters of alpha-beta ethylenically unsaturated carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
- C08G18/78—Nitrogen
- C08G18/785—Nitrogen containing tertiary amino groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D101/00—Coating compositions based on cellulose, modified cellulose, or cellulose derivatives
- C09D101/08—Cellulose derivatives
- C09D101/26—Cellulose ethers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
- C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/0325—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polysaccharides, e.g. cellulose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
- C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
- C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
- C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
- C07C2603/18—Fluorenes; Hydrogenated fluorenes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Wood Science & Technology (AREA)
- Manufacturing & Machinery (AREA)
- Thermal Sciences (AREA)
- Optics & Photonics (AREA)
- Biochemistry (AREA)
- Inorganic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Detergent Compositions (AREA)
- Printing Plates And Materials Therefor (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polyurethanes Or Polyureas (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US74747406P | 2006-05-17 | 2006-05-17 | |
PCT/CA2007/000820 WO2007131336A1 (en) | 2006-05-17 | 2007-05-09 | New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1121132A1 true HK1121132A1 (en) | 2009-04-17 |
Family
ID=38693485
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK09100896.6A HK1121132A1 (en) | 2006-05-17 | 2009-01-30 | New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
Country Status (12)
Country | Link |
---|---|
US (4) | US7910768B2 (xx) |
EP (1) | EP2018365B1 (xx) |
JP (1) | JP5254958B2 (xx) |
KR (1) | KR101174949B1 (xx) |
CN (1) | CN101454277B (xx) |
BR (1) | BRPI0707574B1 (xx) |
CA (1) | CA2652294C (xx) |
ES (1) | ES2530792T3 (xx) |
HK (1) | HK1121132A1 (xx) |
RU (1) | RU2443683C2 (xx) |
UA (1) | UA98450C2 (xx) |
WO (1) | WO2007131336A1 (xx) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7910768B2 (en) * | 2006-05-17 | 2011-03-22 | American Dye Source, Inc. | Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
CN101484484B (zh) * | 2006-08-24 | 2012-10-10 | 美洲染料资源公司 | 反应性近红外吸收聚合物粒子、其制备方法和用途 |
US7723013B2 (en) * | 2007-01-11 | 2010-05-25 | Southern Lithoplate, Inc. | Negative-acting photolithographic printing plate with improved pre-burn performance |
EP2098367A1 (en) * | 2008-03-05 | 2009-09-09 | Eastman Kodak Company | Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates |
US8354216B2 (en) * | 2008-07-15 | 2013-01-15 | Eastman Kodak Company | Negative-working imaging elements and methods of use |
US8137896B2 (en) * | 2008-07-29 | 2012-03-20 | Eastman Kodak Company | Method of preparing lithographic printing plates |
JP5622484B2 (ja) * | 2009-08-20 | 2014-11-12 | 富士フイルム株式会社 | 発色感光性組成物、平版印刷版原版及び新規シアニン色素 |
UA104323C2 (ru) | 2009-09-15 | 2014-01-27 | Майлен Груп | Сополимеры и сополимерные связующие вещества для светочувствительных покровных композиций для светочувствительных офсетных печатных форм для негативного копирования |
HUE031461T2 (en) | 2009-10-29 | 2017-07-28 | Mylan Group | Gallotannin compounds for coating compositions on lithographic printing plates |
TWI523768B (zh) | 2010-04-20 | 2016-03-01 | 米蘭集團公司 | 用於平版印刷的組成物 |
JP5593447B2 (ja) | 2010-09-14 | 2014-09-24 | マイラン・グループ | ポジティブワーキング感熱平板印刷基板用の近赤外線感光被覆用組成物のための共重合体 |
JP5955584B2 (ja) * | 2012-02-24 | 2016-07-20 | 株式会社Adeka | 新規化合物及び着色アルカリ現像性感光性組成物 |
KR101800292B1 (ko) | 2013-04-10 | 2017-11-22 | 밀란 그룹 | 적층 기판을 포함하는 평판 인쇄판 |
US10345442B2 (en) * | 2014-05-27 | 2019-07-09 | Honda Motor Co., Ltd. | Collision possibility determination device |
US20160259243A1 (en) * | 2015-03-03 | 2016-09-08 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
CN107922751B (zh) * | 2015-05-29 | 2020-05-19 | 富士胶片株式会社 | 近红外线吸收性色素多聚物、组合物、膜、滤光片、图案形成方法及装置 |
CN105859632B (zh) * | 2016-05-06 | 2019-04-02 | 南昌航空大学 | 一种电子束固化高透明防指纹树脂的制备方法 |
CN105778042B (zh) * | 2016-05-06 | 2018-09-07 | 南昌航空大学 | 一种电子束固化耐指纹聚氨酯丙烯酸酯的制备方法 |
CN105732943B (zh) * | 2016-05-06 | 2019-01-22 | 南昌航空大学 | 一种聚甲基丙烯酸甲酯用高透明防指纹树脂的制备方法 |
CN105778041B (zh) * | 2016-05-06 | 2019-01-15 | 南昌航空大学 | 一种耐磨耐指纹树脂的制备方法 |
CN105859631B (zh) * | 2016-05-06 | 2019-04-02 | 南昌航空大学 | 一种镀锌钢板用高透明防指纹树脂的制备方法 |
CN105778040B (zh) * | 2016-05-06 | 2018-08-24 | 南昌航空大学 | 一种环保耐指纹树脂的制备方法 |
WO2019013139A1 (ja) * | 2017-07-13 | 2019-01-17 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の製版方法、発色組成物、硬化性組成物、及び、画像形成材料 |
JP7075477B2 (ja) * | 2018-03-05 | 2022-05-25 | 富士フイルム株式会社 | 感光性組成物 |
WO2020026808A1 (ja) * | 2018-07-30 | 2020-02-06 | 富士フイルム株式会社 | 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 |
WO2021039252A1 (ja) * | 2019-08-28 | 2021-03-04 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法、化合物、樹脂 |
US20210078350A1 (en) | 2019-09-17 | 2021-03-18 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
US11714354B2 (en) | 2020-03-25 | 2023-08-01 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
CN111691219B (zh) * | 2020-05-28 | 2022-02-08 | 仙鹤股份有限公司 | 一种高撕裂度ctp版衬纸及其制备方法 |
WO2022212032A1 (en) | 2021-04-01 | 2022-10-06 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
US20230314935A1 (en) | 2022-03-03 | 2023-10-05 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
US20240069439A1 (en) | 2022-08-12 | 2024-02-29 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
CN117700586B (zh) * | 2024-02-05 | 2024-05-28 | 中国科学院理化技术研究所 | 基于聚苯乙烯类碘鎓盐及其光刻胶组合物 |
Family Cites Families (64)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2929710A (en) * | 1954-10-08 | 1960-03-22 | Du Pont | Polyvinyl acetal with terminal vinylidene groups |
US3043805A (en) * | 1958-08-05 | 1962-07-10 | Du Pont | Polymeric amides and their preparation |
US3418295A (en) * | 1965-04-27 | 1968-12-24 | Du Pont | Polymers and their preparation |
US3448089A (en) * | 1966-03-14 | 1969-06-03 | Du Pont | Photopolymerizable polymers containing free acid or acid anhydride groups reacted with glycidyl acrylate or glycidyl methacrylate |
US3885964A (en) * | 1974-05-31 | 1975-05-27 | Du Pont | Photoimaging process using nitroso dimer |
LU76471A1 (xx) * | 1976-12-24 | 1978-07-10 | ||
US4345017A (en) | 1980-10-06 | 1982-08-17 | Polaroid Corporation | Photographic products and processes with a pH sensitive xanthene light screening dye |
DE3144905A1 (de) * | 1981-11-12 | 1983-05-19 | Basf Ag, 6700 Ludwigshafen | Zur herstellung von druck- und reliefformen geeignetes lichtempfindliches auszeichnungsmaterial und verfahren zur herstellung von druck- und reliefformen mittels dieses aufzeichnungsmaterials |
US4701402A (en) * | 1984-02-13 | 1987-10-20 | Minnesota Mining And Manufacturing Company | Oxidative imaging |
US4656229A (en) * | 1985-12-02 | 1987-04-07 | National Starch And Chemical Corporation | Anaerobic adhesive compositions |
KR0138486B1 (ko) | 1993-04-20 | 1998-04-27 | 유미꾸라 레이이찌 | 평판인쇄원판 및 그의 제판방법 |
WO1996018133A1 (en) * | 1994-12-06 | 1996-06-13 | Napp Systems, Inc. | High-resolution letterpress printing plates and water-soluble photopolymerizable compositions comprising a polyvinylalcohol derivative useful therefor |
TR199800369T1 (xx) | 1995-09-02 | 1998-05-21 | New Transducers Limited | Titre�im d�n��t�r�c�leri. |
EP0770495B1 (en) | 1995-10-24 | 2002-06-19 | Agfa-Gevaert | A method for making a lithographic printing plate involving on press development |
CA2187046A1 (fr) | 1996-10-03 | 1998-04-03 | Alain Vallee | Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur |
US6008813A (en) | 1997-08-01 | 1999-12-28 | Mitsubishi Electric Information Technology Center America, Inc. (Ita) | Real-time PC based volume rendering system |
TW436491B (en) * | 1997-08-22 | 2001-05-28 | Ciba Sc Holding Ag | Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions |
US6261740B1 (en) | 1997-09-02 | 2001-07-17 | Kodak Polychrome Graphics, Llc | Processless, laser imageable lithographic printing plate |
JP3770436B2 (ja) * | 1997-12-15 | 2006-04-26 | 富士写真フイルム株式会社 | 光重合性組成物 |
WO1999048945A1 (fr) * | 1998-03-20 | 1999-09-30 | Nippon Soda Co., Ltd. | Composition photodurcissable contenant un sel d'iodonium |
JP2000119306A (ja) | 1998-03-20 | 2000-04-25 | Nippon Soda Co Ltd | ヨ―ドニウム塩化合物を含有する光硬化性組成物 |
DE19824546A1 (de) * | 1998-06-03 | 1999-12-09 | Basf Drucksysteme Gmbh | Herstellung vernetzbarer wasserlöslicher oder wasserdispergierbarer Zusammensetzungen und daraus erhältlicher strahlungsempfindlicher Gemische |
US6884562B1 (en) * | 1998-10-27 | 2005-04-26 | E. I. Du Pont De Nemours And Company | Photoresists and processes for microlithography |
US6687402B1 (en) | 1998-12-18 | 2004-02-03 | Cognex Corporation | Machine vision methods and systems for boundary feature comparison of patterns and images |
EP1035105A1 (de) * | 1999-03-11 | 2000-09-13 | Goldschmidt AG | Estergruppen enthaltende Iodoniumsalze und ihre Verwendung zur Strahlenhärtung kationisch härtender Massen |
US6124425A (en) | 1999-03-18 | 2000-09-26 | American Dye Source, Inc. | Thermally reactive near infrared absorption polymer coatings, method of preparing and methods of use |
US7964264B1 (en) * | 1999-03-30 | 2011-06-21 | 3M Innovative Properties Company | Adhesion-enhancing surfaces for marking materials |
US6255033B1 (en) | 1999-07-30 | 2001-07-03 | Creo, Ltd. | Positive acting photoresist compositions and imageable element |
AU5649400A (en) | 1999-09-21 | 2001-10-11 | Goldschmidt Ag | Photoinitiators containing urethane groups for cationic curing |
US6566035B1 (en) | 1999-10-29 | 2003-05-20 | Fuji Photo Film Co., Ltd. | Negative-type image recording material and precursor for negative-type lithographic printing plate |
US20020015826A1 (en) * | 2000-04-11 | 2002-02-07 | Darryl Desmarteau | Zwitterionic iodonium compounds and methods of application |
JP2002069110A (ja) * | 2000-09-01 | 2002-03-08 | Fuji Photo Film Co Ltd | 光重合性組成物 |
US6548222B2 (en) * | 2000-09-06 | 2003-04-15 | Gary Ganghui Teng | On-press developable thermosensitive lithographic printing plates |
JP4102014B2 (ja) | 2000-10-03 | 2008-06-18 | 富士フイルム株式会社 | 感光性平版印刷版 |
JP2002139828A (ja) * | 2000-11-06 | 2002-05-17 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
US6777155B2 (en) | 2000-10-03 | 2004-08-17 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
JP4253432B2 (ja) * | 2000-11-01 | 2009-04-15 | 富士フイルム株式会社 | 平版印刷版用原版 |
JP2002207293A (ja) * | 2001-01-12 | 2002-07-26 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
US6582882B2 (en) | 2001-04-04 | 2003-06-24 | Kodak Polychrome Graphics Llc | Imageable element comprising graft polymer |
US6899994B2 (en) | 2001-04-04 | 2005-05-31 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments |
US7049046B2 (en) * | 2004-03-30 | 2006-05-23 | Eastman Kodak Company | Infrared absorbing compounds and their use in imageable elements |
US6846614B2 (en) | 2002-02-04 | 2005-01-25 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates |
JP2003248285A (ja) * | 2001-08-07 | 2003-09-05 | Konica Corp | 熱現像銀塩写真感光材料 |
JP2003277437A (ja) * | 2002-02-15 | 2003-10-02 | Shipley Co Llc | 官能化ポリマー |
US7659046B2 (en) | 2002-04-10 | 2010-02-09 | Eastman Kodak Company | Water-developable infrared-sensitive printing plate |
US6983694B2 (en) | 2002-04-26 | 2006-01-10 | Agfa Gevaert | Negative-working thermal lithographic printing plate precursor comprising a smooth aluminum support |
JP2004012706A (ja) | 2002-06-05 | 2004-01-15 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
US6969575B2 (en) | 2002-08-29 | 2005-11-29 | Fuji Photo Film Co., Ltd. | On-press developable lithographic printing plate precursor |
US7001704B2 (en) | 2003-01-29 | 2006-02-21 | Fuji Photo Film Co., Ltd. | Presensitized lithographic plate comprising microcapsules |
JP4070637B2 (ja) | 2003-03-05 | 2008-04-02 | 富士フイルム株式会社 | 重合性組成物、それに用いる化合物、それに用いた画像形成材料および感光性平版印刷版 |
JP4473262B2 (ja) | 2003-03-14 | 2010-06-02 | コダック グラフィック コミュニケーションズ カナダ カンパニー | 放射線感受性素子の現像性促進 |
US7368215B2 (en) | 2003-05-12 | 2008-05-06 | Eastman Kodak Company | On-press developable IR sensitive printing plates containing an onium salt initiator system |
DE102004029501A1 (de) | 2004-06-18 | 2006-01-12 | Kodak Polychrome Graphics Gmbh | Modifizierte Polymere und ihre Verwendung bei der Herstellung von Lithographie-Druckplattenvorläufern |
US7279263B2 (en) | 2004-06-24 | 2007-10-09 | Kodak Graphic Communications Canada Company | Dual-wavelength positive-working radiation-sensitive elements |
US20060032390A1 (en) * | 2004-07-30 | 2006-02-16 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method |
JP2006058430A (ja) | 2004-08-18 | 2006-03-02 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP2006335826A (ja) * | 2005-05-31 | 2006-12-14 | Fujifilm Holdings Corp | インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法 |
WO2007003030A1 (en) | 2005-06-03 | 2007-01-11 | American Dye Source Inc. | Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use |
JP5204371B2 (ja) * | 2005-06-06 | 2013-06-05 | 富士フイルム株式会社 | インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法 |
JP5170960B2 (ja) * | 2005-08-29 | 2013-03-27 | 富士フイルム株式会社 | 平版印刷版原版、及び平版印刷方法 |
US7169518B1 (en) * | 2006-04-17 | 2007-01-30 | Eastman Kodak Company | Multilayer imageable element with improved chemical resistance |
US7910768B2 (en) | 2006-05-17 | 2011-03-22 | American Dye Source, Inc. | Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
CN101269564B (zh) | 2007-03-19 | 2012-02-15 | 成都新图印刷技术有限公司 | 热敏阴图平版印刷版的制备方法 |
DE112020004695T5 (de) | 2019-09-30 | 2022-07-28 | Robert Bosch (Australia) Pty Ltd | Verfahren und system zur verhinderung eines relaisangriffs unter einbeziehung einer kanalkohärenz |
-
2007
- 2007-05-09 US US11/746,252 patent/US7910768B2/en not_active Expired - Fee Related
- 2007-05-09 ES ES07719744T patent/ES2530792T3/es active Active
- 2007-05-09 CN CN200780005807.2A patent/CN101454277B/zh not_active Expired - Fee Related
- 2007-05-09 WO PCT/CA2007/000820 patent/WO2007131336A1/en active Application Filing
- 2007-05-09 EP EP07719744.0A patent/EP2018365B1/en not_active Not-in-force
- 2007-05-09 JP JP2009510242A patent/JP5254958B2/ja not_active Expired - Fee Related
- 2007-05-09 CA CA2652294A patent/CA2652294C/en not_active Expired - Fee Related
- 2007-05-09 BR BRPI0707574A patent/BRPI0707574B1/pt not_active IP Right Cessation
- 2007-05-09 KR KR1020087030720A patent/KR101174949B1/ko active IP Right Grant
- 2007-05-09 RU RU2008131537/05A patent/RU2443683C2/ru not_active IP Right Cessation
- 2007-09-05 UA UAA200810363A patent/UA98450C2/uk unknown
-
2009
- 2009-01-30 HK HK09100896.6A patent/HK1121132A1/xx not_active IP Right Cessation
- 2009-10-15 US US12/579,881 patent/US8323867B2/en not_active Expired - Fee Related
- 2009-10-15 US US12/579,844 patent/US8021827B2/en not_active Expired - Fee Related
-
2011
- 2011-07-25 US US13/189,908 patent/US20120003584A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20070269739A1 (en) | 2007-11-22 |
RU2443683C2 (ru) | 2012-02-27 |
EP2018365B1 (en) | 2014-11-19 |
CN101454277B (zh) | 2014-02-19 |
BRPI0707574A2 (pt) | 2011-05-10 |
US20120003584A1 (en) | 2012-01-05 |
UA98450C2 (uk) | 2012-05-25 |
RU2008131537A (ru) | 2010-02-10 |
KR101174949B1 (ko) | 2012-08-17 |
EP2018365A1 (en) | 2009-01-28 |
JP2009537458A (ja) | 2009-10-29 |
US20100035183A1 (en) | 2010-02-11 |
CA2652294A1 (en) | 2007-11-22 |
CN101454277A (zh) | 2009-06-10 |
KR20090016588A (ko) | 2009-02-16 |
BRPI0707574B1 (pt) | 2017-06-06 |
EP2018365A4 (en) | 2010-07-07 |
ES2530792T3 (es) | 2015-03-05 |
US20100062370A1 (en) | 2010-03-11 |
JP5254958B2 (ja) | 2013-08-07 |
US7910768B2 (en) | 2011-03-22 |
CA2652294C (en) | 2012-07-10 |
WO2007131336A1 (en) | 2007-11-22 |
US8323867B2 (en) | 2012-12-04 |
US8021827B2 (en) | 2011-09-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
HK1121132A1 (en) | New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use | |
ZA200808367B (en) | Method for the synthesis of 5-alkoxymethyl furfural ethers and their use | |
IL198626A0 (en) | Core-1 positive microorganisms, compositions containing the same and methods of use thereof | |
EP2023718A4 (en) | CREATINLIGATE COMPOUNDS AND APPLICATION METHOD THEREFOR | |
EP2152821A4 (en) | INK OR TONER COMPOSITIONS, METHODS OF USE, AND PRODUCTS DERIVED THEREFROM | |
ZA201104396B (en) | "substituted isoidoles as bace inhibitors and their use (new compounds 578)" | |
ZA200808017B (en) | Tetrahydropyridothienopyrimidine compounds and methods of use thereof | |
IL206562A0 (en) | Novel catechol derivative, pharmaceutical composition containing the same, use of the catechol derivative, and use of the pharmaceutical composition | |
ZA200801006B (en) | Polymer coatings containing phytochemical agents and methods for making and using same | |
ZA200905671B (en) | Heterocyclic compounds, compositions comprising them and methods of their use | |
IL198969A0 (en) | Modulators of c3a receptor and methods of use thereof | |
EP2382046A4 (en) | MICROTITER PLATE MASK AND USE METHOD THEREFOR | |
EP2183326A4 (en) | INK COMPOSITION AND METHOD OF USING THE SAME | |
GB0719248D0 (en) | Compounds and methods for pharmaceutical use | |
EP2285215A4 (en) | NOVEL COMPOUNDS, PHARMACEUTICAL COMPOSITIONS THEREFOR AND METHOD OF USE THEREOF | |
GB0708613D0 (en) | Toner, process for making toner and use of toner | |
PL1683840T3 (pl) | Odporne na redukcję pigmenty oparte na ferrycie cynkowym, sposób ich wytwarzania i ich zastosowanie | |
PL2044099T3 (pl) | Sposób wytwarzania S-fluorometylo-6,9-difluoro-11-hydroksy-16-metylo-17-propionyloksy-3-okso-androsta-1,4-dieno-17-karbotionianu oraz związki pośrednie | |
HK1135654A1 (en) | Method for the marking of materials, and ink for carrying out the same and usage thereof | |
GB0601684D0 (en) | Composition, process for preparation and method of use | |
IL198634A0 (en) | Novel compounds, pharmaceutical compositions containing same, and methods of use for same | |
DE112008003056T8 (de) | Chalcogenid-Film und Verfahren zu dessen Herstellung | |
PL1873140T3 (pl) | Nowe pochodne naftalenowe, sposób ich wytwarzania i kompozycje farmaceutyczne je zawierające | |
EP2305633A4 (en) | Novel Catechol Derivative, Pharmaceutical Composition Thereof, Use Of The Catechol Derivative And Use Of The Pharmaceutical Composition | |
GB0708614D0 (en) | Toner, process for making toner and use of toner |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20190512 |