HK1106609A1 - Mr sensor on an insulating substrate and method of manufacture - Google Patents

Mr sensor on an insulating substrate and method of manufacture

Info

Publication number
HK1106609A1
HK1106609A1 HK07112049.9A HK07112049A HK1106609A1 HK 1106609 A1 HK1106609 A1 HK 1106609A1 HK 07112049 A HK07112049 A HK 07112049A HK 1106609 A1 HK1106609 A1 HK 1106609A1
Authority
HK
Hong Kong
Prior art keywords
manufacture
sensor
insulating substrate
insulating
substrate
Prior art date
Application number
HK07112049.9A
Other languages
English (en)
Inventor
Li-Yan Zhu
Kazumasa Yasuda
Cheng Yih Liu
Winston Jose
Original Assignee
Sae Magnetics Hk Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sae Magnetics Hk Ltd filed Critical Sae Magnetics Hk Ltd
Publication of HK1106609A1 publication Critical patent/HK1106609A1/xx

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/40—Protective measures on heads, e.g. against excessive temperature 
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B2005/3996—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/10—Structure or manufacture of housings or shields for heads
    • G11B5/11—Shielding of head against electric or magnetic fields
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49043—Depositing magnetic layer or coating
    • Y10T29/49044—Plural magnetic deposition layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Magnetic Heads (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
HK07112049.9A 2004-03-09 2007-11-06 Mr sensor on an insulating substrate and method of manufacture HK1106609A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/797,653 US7239488B2 (en) 2004-03-09 2004-03-09 MR sensor on an insulating substrate and method of manufacture
PCT/US2005/007889 WO2005086889A2 (en) 2004-03-09 2005-03-09 Mr sensor on an insulating substrate and method of manufacture

Publications (1)

Publication Number Publication Date
HK1106609A1 true HK1106609A1 (en) 2008-03-14

Family

ID=34920099

Family Applications (1)

Application Number Title Priority Date Filing Date
HK07112049.9A HK1106609A1 (en) 2004-03-09 2007-11-06 Mr sensor on an insulating substrate and method of manufacture

Country Status (5)

Country Link
US (1) US7239488B2 (zh)
KR (1) KR20060130242A (zh)
CN (1) CN1969322B (zh)
HK (1) HK1106609A1 (zh)
WO (1) WO2005086889A2 (zh)

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US7301732B2 (en) * 2002-08-07 2007-11-27 Headway Technologies, Inc. GMR head design that suppresses tribocharge during its assembly
US7375931B2 (en) * 2005-09-30 2008-05-20 Hitachi Global Storage Technologies Netherlands, B.V. Magnetic recording head with ESD shunt trace
US7684148B2 (en) 2006-06-16 2010-03-23 International Business Machines Corporation Magnetic head with a conductive underlayer above substrate
US8169751B2 (en) 2006-06-27 2012-05-01 Hitachi Global Storage Technologies Netherlands B.V. Magnetoresistive sensor having a structure for activating and deactivating electrostatic discharge prevention circuitry
JP2008059705A (ja) * 2006-08-31 2008-03-13 Fujitsu Ltd 垂直通電型磁気ヘッド並びにその製造方法、ヘッドサスペンション組立体及び磁気記録装置。
JP5032949B2 (ja) * 2007-11-14 2012-09-26 エイチジーエスティーネザーランドビーブイ マイクロアクチュエータ、ヘッド・ジンバル・アセンブリ及びディスク・ドライブ装置
US8289651B2 (en) * 2007-11-16 2012-10-16 Texas Instruments Incorporated Apparatus to control heat dissipation in hard-disk drives
US8040632B2 (en) * 2007-12-12 2011-10-18 Samsung Electronics Co., Ltd. Grounding structure of TMR and GMR heads with a flying on-demand heater
US7768268B2 (en) * 2007-12-27 2010-08-03 Hitachi Global Storage Technologies Netherlands, B.V. Verification of a ground connection fabrication process for ESD resistors in magnetic heads
US8199444B2 (en) 2008-01-16 2012-06-12 International Business Machines Corporation Shunt for magnetoresistive transducer heads for electrostatic discharge protection
US8248727B2 (en) * 2008-02-07 2012-08-21 International Business Machines Corporation Magnetic head with components separated by insulative portions and electrically coupled together by connective element
US7969687B2 (en) * 2008-05-21 2011-06-28 Hitachi Global Storage Technologies Netherlands B.V. Magnetic head with delayed connection heater shunting
US8274762B2 (en) * 2008-05-30 2012-09-25 Hitachi Global Storage Technologies Netherlands B.V. Methods and systems for using resistivity of sensor film in an element shunt
US8472146B2 (en) * 2010-08-27 2013-06-25 HGST Netherlands B.V. Current perpendicular magnetoresistive sensor with a dummy shield for capacitance balancing
US9837107B2 (en) * 2016-02-12 2017-12-05 International Business Machines Corporation Tape head with electrically conducting surface to reduce triboelectric charging

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JPS57198578A (en) * 1981-05-29 1982-12-06 Sumitomo Special Metals Co Ltd Material for magnetic head and slider
JPH03248309A (ja) * 1990-02-26 1991-11-06 Tdk Corp 薄膜磁気ヘッド
EP0477941B1 (en) * 1990-09-28 1996-03-06 Sony Corporation Magneto-resistance effect type magnetic head
JPH0573903A (ja) * 1991-09-09 1993-03-26 Hitachi Ltd 磁気デイスクの評価方法
US6084743A (en) * 1992-12-14 2000-07-04 Maxtor Corporation Magnetic recorder apparatus with reduced debris accumlation on the recorder head and slider
JPH0773419A (ja) * 1993-09-02 1995-03-17 Matsushita Electric Ind Co Ltd 磁気抵抗効果型薄膜磁気ヘッド
US5557491A (en) * 1994-08-18 1996-09-17 International Business Machines Corporation Two terminal single stripe orthogonal MR head having biasing conductor integral with the lead layers
JPH08167123A (ja) * 1994-12-13 1996-06-25 Hitachi Ltd 磁気ヘッドの製造方法、磁気ヘッド素子群を有する基板、及び、磁気ヘッド素子群を有する基板の製造方法
JPH0991623A (ja) * 1995-09-19 1997-04-04 Hitachi Ltd 磁気抵抗効果型磁気ヘッド及びその製造方法
JP3366813B2 (ja) * 1996-09-17 2003-01-14 株式会社日立製作所 記録再生分離型ヘッド及び磁気ディスク装置
US5757591A (en) * 1996-11-25 1998-05-26 International Business Machines Corporation Magnetoresistive read/inductive write magnetic head assembly fabricated with silicon on hard insulator for improved durability and electrostatic discharge protection and method for manufacturing same
US5822153A (en) * 1997-01-03 1998-10-13 Censtor Corp. Hard disk drive having contact write and recessed magnetorestive read head
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JP3853934B2 (ja) * 1997-10-14 2006-12-06 アルプス電気株式会社 磁気抵抗効果型ヘッド用基板とその製造方法
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JP3583649B2 (ja) * 1999-04-27 2004-11-04 Ｔｄｋ株式会社 薄膜磁気ヘッドおよびその製造方法ならびに磁気抵抗効果装置
JP3473835B2 (ja) * 1999-06-10 2003-12-08 Ｔｄｋ株式会社 薄膜磁気ヘッド集合体及びその処理方法
US6415500B1 (en) * 2000-01-13 2002-07-09 Headway Technologies, Inc. Method to prevent electrostatic discharge for MR/GMR wafer fabrication
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JP2001250207A (ja) * 2000-03-03 2001-09-14 Matsushita Electric Ind Co Ltd 磁気ヘッド
JP2001307309A (ja) * 2000-04-24 2001-11-02 Hitachi Ltd 磁気ヘッドおよび磁気ヘッドの製造方法および磁気ヘッドウエハー基板および磁気ヘッド組立体および磁気ディスク装置
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JP3511601B2 (ja) * 2001-05-31 2004-03-29 Ｔｄｋ株式会社 薄膜磁気ヘッド集合体、その絶縁特性測定方法及び絶縁特性測定装置
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Also Published As

Publication number Publication date
US7239488B2 (en) 2007-07-03
WO2005086889A3 (en) 2006-09-14
US20050201019A1 (en) 2005-09-15
CN1969322A (zh) 2007-05-23
KR20060130242A (ko) 2006-12-18
WO2005086889A2 (en) 2005-09-22
CN1969322B (zh) 2010-05-12

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20140309