HK1057621A1 - Method, apparatus and system for flow control of process gas in semiconductor manufacturing - Google Patents
Method, apparatus and system for flow control of process gas in semiconductor manufacturingInfo
- Publication number
- HK1057621A1 HK1057621A1 HK04100490A HK04100490A HK1057621A1 HK 1057621 A1 HK1057621 A1 HK 1057621A1 HK 04100490 A HK04100490 A HK 04100490A HK 04100490 A HK04100490 A HK 04100490A HK 1057621 A1 HK1057621 A1 HK 1057621A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- flow control
- process gas
- semiconductor manufacturing
- semiconductor
- manufacturing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
- G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
- G05D7/0647—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged in series
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/04—Control of fluid pressure without auxiliary power
- G05D16/06—Control of fluid pressure without auxiliary power the sensing element being a flexible membrane, yielding to pressure, e.g. diaphragm, bellows, capsule
- G05D16/063—Control of fluid pressure without auxiliary power the sensing element being a flexible membrane, yielding to pressure, e.g. diaphragm, bellows, capsule the sensing element being a membrane
- G05D16/0644—Control of fluid pressure without auxiliary power the sensing element being a flexible membrane, yielding to pressure, e.g. diaphragm, bellows, capsule the sensing element being a membrane the membrane acting directly on the obturator
- G05D16/0655—Control of fluid pressure without auxiliary power the sensing element being a flexible membrane, yielding to pressure, e.g. diaphragm, bellows, capsule the sensing element being a membrane the membrane acting directly on the obturator using one spring-loaded membrane
- G05D16/0661—Control of fluid pressure without auxiliary power the sensing element being a flexible membrane, yielding to pressure, e.g. diaphragm, bellows, capsule the sensing element being a membrane the membrane acting directly on the obturator using one spring-loaded membrane characterised by the loading mechanisms of the membrane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0324—With control of flow by a condition or characteristic of a fluid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7758—Pilot or servo controlled
- Y10T137/7759—Responsive to change in rate of fluid flow
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7758—Pilot or servo controlled
- Y10T137/7759—Responsive to change in rate of fluid flow
- Y10T137/776—Control by pressures across flow line valve
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7758—Pilot or servo controlled
- Y10T137/7761—Electrically actuated valve
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/86389—Programmer or timer
- Y10T137/86397—With independent valve controller
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Fluid Mechanics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Flow Control (AREA)
- Chemical Vapour Deposition (AREA)
- Measuring Volume Flow (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/535,750 US6363958B1 (en) | 1999-05-10 | 2000-03-27 | Flow control of process gas in semiconductor manufacturing |
PCT/US2001/005556 WO2001073820A2 (en) | 2000-03-27 | 2001-02-22 | Flow control of process gas in semiconductor manufacturing |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1057621A1 true HK1057621A1 (en) | 2004-04-08 |
Family
ID=24135599
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK04100490A HK1057621A1 (en) | 2000-03-27 | 2004-01-21 | Method, apparatus and system for flow control of process gas in semiconductor manufacturing |
Country Status (9)
Country | Link |
---|---|
US (2) | US6363958B1 (xx) |
EP (2) | EP1297396B1 (xx) |
JP (1) | JP4564223B2 (xx) |
KR (1) | KR100697893B1 (xx) |
CN (1) | CN1237423C (xx) |
AU (1) | AU2001241629A1 (xx) |
DE (1) | DE60128566T2 (xx) |
HK (1) | HK1057621A1 (xx) |
WO (1) | WO2001073820A2 (xx) |
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-
2000
- 2000-03-27 US US09/535,750 patent/US6363958B1/en not_active Expired - Lifetime
-
2001
- 2001-02-22 CN CNB018102581A patent/CN1237423C/zh not_active Expired - Lifetime
- 2001-02-22 AU AU2001241629A patent/AU2001241629A1/en not_active Abandoned
- 2001-02-22 WO PCT/US2001/005556 patent/WO2001073820A2/en active IP Right Grant
- 2001-02-22 JP JP2001571451A patent/JP4564223B2/ja not_active Expired - Lifetime
- 2001-02-22 EP EP01912892A patent/EP1297396B1/en not_active Expired - Lifetime
- 2001-02-22 DE DE60128566T patent/DE60128566T2/de not_active Expired - Lifetime
- 2001-02-22 EP EP04003331.8A patent/EP1424614B1/en not_active Expired - Lifetime
- 2001-02-22 KR KR1020027012643A patent/KR100697893B1/ko active IP Right Grant
-
2002
- 2002-02-06 US US10/066,659 patent/US6450200B1/en not_active Expired - Lifetime
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CN1432147A (zh) | 2003-07-23 |
KR100697893B1 (ko) | 2007-03-20 |
DE60128566D1 (de) | 2007-07-05 |
US6363958B1 (en) | 2002-04-02 |
EP1424614B1 (en) | 2014-01-01 |
US6450200B1 (en) | 2002-09-17 |
EP1297396A4 (en) | 2003-07-16 |
EP1297396A2 (en) | 2003-04-02 |
EP1297396B1 (en) | 2007-05-23 |
KR20020093857A (ko) | 2002-12-16 |
US20020092564A1 (en) | 2002-07-18 |
WO2001073820A3 (en) | 2002-02-14 |
EP1424614A3 (en) | 2005-03-23 |
EP1424614A2 (en) | 2004-06-02 |
AU2001241629A1 (en) | 2001-10-08 |
WO2001073820A2 (en) | 2001-10-04 |
JP4564223B2 (ja) | 2010-10-20 |
JP2003529218A (ja) | 2003-09-30 |
CN1237423C (zh) | 2006-01-18 |
DE60128566T2 (de) | 2008-01-31 |
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