TW335448B - Gas flow control method - Google Patents
Gas flow control methodInfo
- Publication number
- TW335448B TW335448B TW085109913A TW85109913A TW335448B TW 335448 B TW335448 B TW 335448B TW 085109913 A TW085109913 A TW 085109913A TW 85109913 A TW85109913 A TW 85109913A TW 335448 B TW335448 B TW 335448B
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- cavity
- control method
- gas flow
- flow control
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F11/00—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it
- G01F11/28—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with stationary measuring chambers having constant volume during measurement
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Chemical Vapour Deposition (AREA)
- Flow Control (AREA)
- Output Control And Ontrol Of Special Type Engine (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
Abstract
A method for injecting a specific mass of gas to a point-of-use location, including the following steps: filling with a gas a cavity in one embodiment in a known volume; measuring the pressure and temperature of the gas in the cavity; and releasing during a programmed period specific property of gas into the treatmetn chamber based on the pressure and temperature values adjusted at the transmission rate of the valve in the downstream of the cavity.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US61079196A | 1996-03-11 | 1996-03-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW335448B true TW335448B (en) | 1998-07-01 |
Family
ID=24446433
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW085109913A TW335448B (en) | 1996-03-11 | 1996-08-14 | Gas flow control method |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU2322797A (en) |
TW (1) | TW335448B (en) |
WO (1) | WO1997034208A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI414763B (en) * | 2006-03-07 | 2013-11-11 | Ckd Corp | Gas flow calibration device |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6363958B1 (en) * | 1999-05-10 | 2002-04-02 | Parker-Hannifin Corporation | Flow control of process gas in semiconductor manufacturing |
US6119710A (en) * | 1999-05-26 | 2000-09-19 | Cyber Instrument Technologies Llc | Method for wide range gas flow system with real time flow measurement and correction |
GB2381589B (en) * | 1999-05-26 | 2003-09-10 | Cyber Instr Technology Llc | Wide range gas flow system with real time flow measurement and correction |
US6777352B2 (en) | 2002-02-11 | 2004-08-17 | Applied Materials, Inc. | Variable flow deposition apparatus and method in semiconductor substrate processing |
CN112269415B (en) * | 2020-09-30 | 2022-12-16 | 深圳永晟中业达健康科技有限公司 | Low-pressure cabin control method and device |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4394871A (en) * | 1980-12-31 | 1983-07-26 | The Boeing Company | Programmable pressure regulator for titanium superplastic forming apparatus |
US5152309A (en) * | 1991-05-29 | 1992-10-06 | Westinghouse Electric Corp. | Valve control apparatus |
US5146941A (en) * | 1991-09-12 | 1992-09-15 | Unitech Development Corp. | High turndown mass flow control system for regulating gas flow to a variable pressure system |
-
1996
- 1996-08-14 TW TW085109913A patent/TW335448B/en active
-
1997
- 1997-03-11 WO PCT/US1997/003893 patent/WO1997034208A1/en active Application Filing
- 1997-03-11 AU AU23227/97A patent/AU2322797A/en not_active Abandoned
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI414763B (en) * | 2006-03-07 | 2013-11-11 | Ckd Corp | Gas flow calibration device |
Also Published As
Publication number | Publication date |
---|---|
WO1997034208A1 (en) | 1997-09-18 |
AU2322797A (en) | 1997-10-01 |
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