AU2322797A - Gas flow control method - Google Patents

Gas flow control method

Info

Publication number
AU2322797A
AU2322797A AU23227/97A AU2322797A AU2322797A AU 2322797 A AU2322797 A AU 2322797A AU 23227/97 A AU23227/97 A AU 23227/97A AU 2322797 A AU2322797 A AU 2322797A AU 2322797 A AU2322797 A AU 2322797A
Authority
AU
Australia
Prior art keywords
control method
gas flow
flow control
gas
flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU23227/97A
Inventor
Edward M. Kaczorowski
William L. Manofsky Jr.
Michael E. Wilmer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of AU2322797A publication Critical patent/AU2322797A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F11/00—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it
    • G01F11/28—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with stationary measuring chambers having constant volume during measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Flow Control (AREA)
  • Output Control And Ontrol Of Special Type Engine (AREA)
  • Chemical Vapour Deposition (AREA)
AU23227/97A 1996-03-11 1997-03-11 Gas flow control method Abandoned AU2322797A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US61079196A 1996-03-11 1996-03-11
US08610791 1996-03-11
PCT/US1997/003893 WO1997034208A1 (en) 1996-03-11 1997-03-11 Gas flow control method

Publications (1)

Publication Number Publication Date
AU2322797A true AU2322797A (en) 1997-10-01

Family

ID=24446433

Family Applications (1)

Application Number Title Priority Date Filing Date
AU23227/97A Abandoned AU2322797A (en) 1996-03-11 1997-03-11 Gas flow control method

Country Status (3)

Country Link
AU (1) AU2322797A (en)
TW (1) TW335448B (en)
WO (1) WO1997034208A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6363958B1 (en) * 1999-05-10 2002-04-02 Parker-Hannifin Corporation Flow control of process gas in semiconductor manufacturing
US6119710A (en) 1999-05-26 2000-09-19 Cyber Instrument Technologies Llc Method for wide range gas flow system with real time flow measurement and correction
GB2373054B (en) * 1999-05-26 2003-03-26 Cyber Instr Technology Llc Wide range gas flow system with real time flow measurement and correction
US6777352B2 (en) 2002-02-11 2004-08-17 Applied Materials, Inc. Variable flow deposition apparatus and method in semiconductor substrate processing
KR101233632B1 (en) * 2006-03-07 2013-02-15 씨케이디 가부시키 가이샤 Gas flow rate verification unit
CN112269415B (en) * 2020-09-30 2022-12-16 深圳永晟中业达健康科技有限公司 Low-pressure cabin control method and device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4394871A (en) * 1980-12-31 1983-07-26 The Boeing Company Programmable pressure regulator for titanium superplastic forming apparatus
US5152309A (en) * 1991-05-29 1992-10-06 Westinghouse Electric Corp. Valve control apparatus
US5146941A (en) * 1991-09-12 1992-09-15 Unitech Development Corp. High turndown mass flow control system for regulating gas flow to a variable pressure system

Also Published As

Publication number Publication date
TW335448B (en) 1998-07-01
WO1997034208A1 (en) 1997-09-18

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