HK1026329A1 - Plasma treatment apparatus and plasma treatment method performed by use of the same apparatus - Google Patents

Plasma treatment apparatus and plasma treatment method performed by use of the same apparatus

Info

Publication number
HK1026329A1
HK1026329A1 HK00105475A HK00105475A HK1026329A1 HK 1026329 A1 HK1026329 A1 HK 1026329A1 HK 00105475 A HK00105475 A HK 00105475A HK 00105475 A HK00105475 A HK 00105475A HK 1026329 A1 HK1026329 A1 HK 1026329A1
Authority
HK
Hong Kong
Prior art keywords
plasma treatment
method performed
treatment method
same apparatus
same
Prior art date
Application number
HK00105475A
Other languages
English (en)
Inventor
Yasushi Sawada
Kosuke Nakamura
Hiroaki Kitamura
Yoshitami Inoue
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Publication of HK1026329A1 publication Critical patent/HK1026329A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32559—Protection means, e.g. coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatment Of Fiber Materials (AREA)
HK00105475A 1998-10-26 2000-09-01 Plasma treatment apparatus and plasma treatment method performed by use of the same apparatus HK1026329A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30400398 1998-10-26

Publications (1)

Publication Number Publication Date
HK1026329A1 true HK1026329A1 (en) 2000-12-08

Family

ID=17927898

Family Applications (1)

Application Number Title Priority Date Filing Date
HK00105475A HK1026329A1 (en) 1998-10-26 2000-09-01 Plasma treatment apparatus and plasma treatment method performed by use of the same apparatus

Country Status (7)

Country Link
US (1) US6424091B1 (fr)
EP (1) EP0997926B1 (fr)
KR (1) KR100320574B1 (fr)
CN (1) CN1141009C (fr)
DE (1) DE69929271T2 (fr)
HK (1) HK1026329A1 (fr)
TW (1) TW518367B (fr)

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CN112087854B (zh) * 2019-06-12 2024-01-23 中国石油化工股份有限公司 介质阻挡放电等离子体发生装置
CN112218418A (zh) * 2020-11-30 2021-01-12 清华大学 一种介质阻挡面放电单元以及电子设备
CN112509907A (zh) * 2020-11-30 2021-03-16 中船重工安谱（湖北）仪器有限公司 一种介质阻挡辉光放电离子源结构
CN113141700B (zh) * 2021-03-16 2022-07-12 深圳大学 大气压空气均匀介质阻挡放电的电极结构和方法
CN114269059A (zh) * 2021-12-06 2022-04-01 北京天恒盛通科技发展有限公司 单侧虹杠式等离子体发生器
CN117116787A (zh) * 2023-10-24 2023-11-24 苏州芯慧联半导体科技有限公司 晶圆键合方法及系统

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Also Published As

Publication number Publication date
DE69929271D1 (de) 2006-03-30
DE69929271T2 (de) 2006-09-21
KR20000029287A (ko) 2000-05-25
US6424091B1 (en) 2002-07-23
EP0997926A3 (fr) 2000-05-17
CN1141009C (zh) 2004-03-03
KR100320574B1 (ko) 2002-01-12
EP0997926A2 (fr) 2000-05-03
EP0997926B1 (fr) 2006-01-04
TW518367B (en) 2003-01-21
CN1254250A (zh) 2000-05-24

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