GB2497451A - Gate insulator layer for electronic devices - Google Patents
Gate insulator layer for electronic devices Download PDFInfo
- Publication number
- GB2497451A GB2497451A GB1303582.9A GB201303582A GB2497451A GB 2497451 A GB2497451 A GB 2497451A GB 201303582 A GB201303582 A GB 201303582A GB 2497451 A GB2497451 A GB 2497451A
- Authority
- GB
- United Kingdom
- Prior art keywords
- electronic devices
- gate insulator
- insulator layer
- polycycloolefins
- polycycloolefin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000012212 insulator Substances 0.000 title abstract 4
- 229920003050 poly-cycloolefin Polymers 0.000 abstract 4
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F32/00—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F32/00—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
- C08F32/02—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings
- C08F32/04—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings having one carbon-to-carbon double bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L45/00—Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/471—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising only organic materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/478—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a layer of composite material comprising interpenetrating or embedded materials, e.g. TiO2 particles in a polymer matrix
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/141—Organic polymers or oligomers comprising aliphatic or olefinic chains, e.g. poly N-vinylcarbazol, PVC or PTFE
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/151—Copolymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/464—Lateral top-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/80—Constructional details
- H10K10/88—Passivation; Containers; Encapsulations
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Composite Materials (AREA)
- Thin Film Transistor (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Electrodes Of Semiconductors (AREA)
- Formation Of Insulating Films (AREA)
- Electroluminescent Light Sources (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP10009118 | 2010-09-02 | ||
| US37979910P | 2010-09-03 | 2010-09-03 | |
| PCT/EP2011/004282 WO2012028279A1 (en) | 2010-09-02 | 2011-08-26 | Gate insulator layer for electronic devices |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB201303582D0 GB201303582D0 (en) | 2013-04-10 |
| GB2497451A true GB2497451A (en) | 2013-06-12 |
| GB2497451A8 GB2497451A8 (en) | 2013-06-19 |
Family
ID=44534260
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1303582.9A Withdrawn GB2497451A (en) | 2010-09-02 | 2011-08-26 | Gate insulator layer for electronic devices |
Country Status (11)
| Country | Link |
|---|---|
| US (2) | US9175123B2 (enExample) |
| EP (2) | EP2611841B1 (enExample) |
| JP (2) | JP6097216B2 (enExample) |
| KR (1) | KR101842735B1 (enExample) |
| CN (3) | CN103261250B (enExample) |
| DE (1) | DE112011102917T5 (enExample) |
| GB (1) | GB2497451A (enExample) |
| RU (1) | RU2013114414A (enExample) |
| SG (1) | SG187955A1 (enExample) |
| TW (1) | TWI618723B (enExample) |
| WO (1) | WO2012028279A1 (enExample) |
Families Citing this family (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5886189B2 (ja) * | 2009-05-25 | 2016-03-16 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | 架橋可能な誘電体、並びにその製造方法及び使用方法 |
| JP6097216B2 (ja) * | 2010-09-02 | 2017-03-15 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングMerck Patent Gesellschaft mit beschraenkter Haftung | 電子デバイス用のゲート絶縁層 |
| WO2012028278A1 (en) | 2010-09-02 | 2012-03-08 | Merck Patent Gmbh | Interlayer for electronic devices |
| US9082981B1 (en) | 2012-01-16 | 2015-07-14 | Polyera Corporation | Curable polymeric materials and related electronic devices |
| WO2013120581A1 (en) | 2012-02-15 | 2013-08-22 | Merck Patent Gmbh | Planarization layer for organic electronic devices |
| WO2013159881A2 (en) * | 2012-04-25 | 2013-10-31 | Merck Patent Gmbh | Bank structures for organic electronic devices |
| US9171961B2 (en) * | 2012-07-11 | 2015-10-27 | Polyera Corporation | Coating materials for oxide thin film transistors |
| US9450187B2 (en) * | 2012-09-04 | 2016-09-20 | Merck Patent Gmbh | Process of surface modification of dielectric structures in organic electronic devices to increase surface energy |
| WO2014044359A1 (en) | 2012-09-21 | 2014-03-27 | Merck Patent Gmbh | Organic semiconductor formulations |
| JP5860193B2 (ja) * | 2012-09-25 | 2016-02-16 | プロメラス, エルエルシー | マレイミド含有シクロオレフィンポリマーおよびその利用 |
| JP6393269B2 (ja) * | 2012-11-08 | 2018-09-19 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングMerck Patent Gesellschaft mit beschraenkter Haftung | バンク構造を有する有機電子デバイスの製造方法、これにより製造されたバンク構造および電子デバイス |
| US9035287B2 (en) * | 2013-02-01 | 2015-05-19 | Polyera Corporation | Polymeric materials for use in metal-oxide-semiconductor field-effect transistors |
| WO2014206916A1 (en) * | 2013-06-27 | 2014-12-31 | Basf Se | Metathesis polymers as dielectrics |
| US9356248B2 (en) * | 2013-08-16 | 2016-05-31 | Palo Alto Research Center Incorporated | Organic thin-film transistor |
| KR101718941B1 (ko) | 2013-09-30 | 2017-03-22 | 주식회사 엘지화학 | 광반응기를 갖는 고리형 올레핀 화합물 및 광반응성 중합체 |
| CN106068569B (zh) * | 2014-03-12 | 2019-03-22 | 默克专利股份有限公司 | 有机电子组合物及其器件 |
| JP6118287B2 (ja) * | 2014-03-26 | 2017-04-19 | 富士フイルム株式会社 | 半導体素子及び半導体素子の絶縁層形成用組成物 |
| JP6204580B2 (ja) * | 2014-05-08 | 2017-09-27 | 富士フイルム株式会社 | 薄膜トランジスタ及び絶縁層形成用組成物 |
| TWI659046B (zh) | 2015-05-06 | 2019-05-11 | Sumitomo Bakelite Co., Ltd. | 作爲永久介電材料的順丁烯二醯亞胺及環烯烴單體之聚合物 |
| US10147895B2 (en) | 2015-07-13 | 2018-12-04 | Flexterra, Inc. | Curable polymeric materials and their use for fabricating electronic devices |
| KR20180048651A (ko) * | 2015-08-31 | 2018-05-10 | 니폰 제온 가부시키가이샤 | 수지 조성물 |
| DE102015119939A1 (de) * | 2015-11-18 | 2017-05-18 | ALTANA Aktiengesellschaft | Vernetzbare polymere Materialien für dielektrische Schichten in elektronischen Bauteilen |
| US10429734B2 (en) | 2015-11-30 | 2019-10-01 | Promerus, Llc | Permanent dielectric compositions containing photoacid generator and base |
| KR102465353B1 (ko) * | 2015-12-02 | 2022-11-10 | 삼성전자주식회사 | 전계 효과 트랜지스터 및 이를 포함하는 반도체 소자 |
| US10840448B2 (en) * | 2016-02-17 | 2020-11-17 | Merck Patent Gmbh | Formulation of an organic functional material |
| CN108886096B (zh) | 2016-03-22 | 2022-10-28 | 普罗米鲁斯有限责任公司 | 含有双吖丙啶的有机电子组合物和其器件 |
| JP7122257B2 (ja) * | 2016-05-18 | 2022-08-19 | メルク パテント ゲーエムベーハー | 有機誘電体層及び有機電子デバイス |
| TWI732994B (zh) * | 2017-02-09 | 2021-07-11 | 日商住友電木股份有限公司 | 光配向膜形成用組成物及由其衍生之lcd器件 |
| WO2019130337A1 (en) * | 2017-12-27 | 2019-07-04 | Indian Institute Of Technology, Guwahati | Method for the fabrication of ultralow voltage operated, reduced bias stress, multi-layer dielectric system comprising n-type organic field effect transistors |
| WO2019130336A1 (en) * | 2017-12-27 | 2019-07-04 | Indian Institute Of Technology, Guwahati | Method for the fabrication of solution process, ultra-low operating voltage, stable organic field effect transistor |
| CN112204070B (zh) | 2018-01-19 | 2023-07-25 | 飞利斯有限公司 | 有机电介质材料及包含它们的器件 |
| WO2020002277A1 (en) | 2018-06-28 | 2020-01-02 | Merck Patent Gmbh | Method for producing an electronic device |
| TWI794520B (zh) * | 2018-06-29 | 2023-03-01 | 日商住友電木股份有限公司 | 作為 3d 列印材料之聚環烯烴單體及由能夠產生光酸之化合物活化之催化劑 |
| US11059938B2 (en) | 2018-10-05 | 2021-07-13 | Industrial Technology Research Institute | Film composition and a film prepared thereby |
| CN109698276A (zh) * | 2018-12-27 | 2019-04-30 | 广州天极电子科技有限公司 | 一种薄膜晶体管器件及其制备方法 |
| WO2020165270A1 (en) | 2019-02-12 | 2020-08-20 | The University Of Southampton | Device comprising piezoelectrically active layer and method for producing such device |
| TW202100575A (zh) | 2019-05-31 | 2021-01-01 | 美商普羅梅勒斯有限公司 | 作為光學或3d印刷材料的快速可光固化的多環烯烴組成物 |
| CN111848930B (zh) * | 2020-07-30 | 2021-07-13 | 清华大学 | 可溶性聚苯并呋喃及其制备方法与在合成5-取代苯并呋喃的应用 |
| JP7547899B2 (ja) | 2020-09-28 | 2024-09-10 | 住友ベークライト株式会社 | ワニスおよび樹脂膜 |
| KR102476024B1 (ko) * | 2021-01-19 | 2022-12-08 | 한국화학연구원 | 유기절연체 형성용 조성물 및 이를 포함하는 유기 절연체 및 박막 트랜지스터 |
| DE102021125407A1 (de) | 2021-09-30 | 2023-03-30 | Polymer Competence Center Leoben Gmbh | Verfahren zur Herstellung eines Dielektrikums für einen Kondensator und Verfahren zur Herstellung eines Kondensators und Kondensator |
| CN114316215B (zh) * | 2022-01-27 | 2023-07-04 | 安徽建筑大学 | 一种自交联成炭本征阻燃聚双环戊二烯工程材料及其制备方法 |
| JP2023116922A (ja) * | 2022-02-10 | 2023-08-23 | 住友ベークライト株式会社 | ポリノルボルネンの製造方法、ポリノルボルネン含有溶液、ポリノルボルネン粉末、感光性樹脂組成物、および半導体装置 |
| TW202334271A (zh) * | 2022-02-18 | 2023-09-01 | 美商普羅梅勒斯有限公司 | Romp本體聚合及陽離子聚合型組成物用雙觸媒體系 |
| CN116217805B (zh) * | 2023-01-07 | 2024-08-02 | 中北大学 | 一种降冰片烯基三铵类阳离子聚合物及其制备方法和应用 |
| TW202530282A (zh) * | 2023-09-11 | 2025-08-01 | 美商普羅梅勒斯有限公司 | 微流體裝置用多環烯烴聚合物製uv-奈米壓印微影裝置 |
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| US20080237583A1 (en) * | 2007-03-28 | 2008-10-02 | Seiko Epson Corporation | Method for manufacturing semiconductor device, semiconductor device, semiconductor circuit, electro-optical device, and electronic apparatus |
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| JP6097216B2 (ja) * | 2010-09-02 | 2017-03-15 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングMerck Patent Gesellschaft mit beschraenkter Haftung | 電子デバイス用のゲート絶縁層 |
| WO2012028278A1 (en) * | 2010-09-02 | 2012-03-08 | Merck Patent Gmbh | Interlayer for electronic devices |
-
2011
- 2011-08-26 JP JP2013526346A patent/JP6097216B2/ja active Active
- 2011-08-26 CN CN201180042505.9A patent/CN103261250B/zh active Active
- 2011-08-26 KR KR1020137008514A patent/KR101842735B1/ko active Active
- 2011-08-26 SG SG2013013982A patent/SG187955A1/en unknown
- 2011-08-26 RU RU2013114414/04A patent/RU2013114414A/ru not_active Application Discontinuation
- 2011-08-26 EP EP11749739.6A patent/EP2611841B1/en active Active
- 2011-08-26 CN CN201510255696.7A patent/CN105038069B/zh active Active
- 2011-08-26 EP EP13004590.9A patent/EP2676979B1/en active Active
- 2011-08-26 CN CN201510255678.9A patent/CN104877292A/zh active Pending
- 2011-08-26 DE DE112011102917T patent/DE112011102917T5/de not_active Withdrawn
- 2011-08-26 WO PCT/EP2011/004282 patent/WO2012028279A1/en not_active Ceased
- 2011-08-26 GB GB1303582.9A patent/GB2497451A/en not_active Withdrawn
- 2011-09-01 TW TW100131548A patent/TWI618723B/zh active
- 2011-09-01 US US13/223,884 patent/US9175123B2/en active Active
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2015
- 2015-08-11 US US14/823,066 patent/US9647222B2/en not_active Expired - Fee Related
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2017
- 2017-02-16 JP JP2017027227A patent/JP6334020B2/ja active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080237583A1 (en) * | 2007-03-28 | 2008-10-02 | Seiko Epson Corporation | Method for manufacturing semiconductor device, semiconductor device, semiconductor circuit, electro-optical device, and electronic apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103261250B (zh) | 2016-11-09 |
| JP2017141446A (ja) | 2017-08-17 |
| TWI618723B (zh) | 2018-03-21 |
| WO2012028279A9 (en) | 2012-05-31 |
| CN105038069B (zh) | 2017-10-17 |
| US20150372246A1 (en) | 2015-12-24 |
| JP2013541191A (ja) | 2013-11-07 |
| EP2676979B1 (en) | 2016-07-13 |
| US20120056183A1 (en) | 2012-03-08 |
| US9647222B2 (en) | 2017-05-09 |
| EP2611841B1 (en) | 2015-10-28 |
| DE112011102917T5 (de) | 2013-09-05 |
| RU2013114414A (ru) | 2014-10-10 |
| CN105038069A (zh) | 2015-11-11 |
| KR101842735B1 (ko) | 2018-03-27 |
| SG187955A1 (en) | 2013-03-28 |
| JP6097216B2 (ja) | 2017-03-15 |
| US9175123B2 (en) | 2015-11-03 |
| GB201303582D0 (en) | 2013-04-10 |
| KR20130114121A (ko) | 2013-10-16 |
| TW201219432A (en) | 2012-05-16 |
| GB2497451A8 (en) | 2013-06-19 |
| WO2012028279A1 (en) | 2012-03-08 |
| CN103261250A (zh) | 2013-08-21 |
| CN104877292A (zh) | 2015-09-02 |
| EP2611841A1 (en) | 2013-07-10 |
| EP2676979A1 (en) | 2013-12-25 |
| JP6334020B2 (ja) | 2018-05-30 |
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