CN103261250A - 用于电子器件的栅绝缘层 - Google Patents
用于电子器件的栅绝缘层 Download PDFInfo
- Publication number
- CN103261250A CN103261250A CN2011800425059A CN201180042505A CN103261250A CN 103261250 A CN103261250 A CN 103261250A CN 2011800425059 A CN2011800425059 A CN 2011800425059A CN 201180042505 A CN201180042505 A CN 201180042505A CN 103261250 A CN103261250 A CN 103261250A
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- China
- Prior art keywords
- insulation layer
- gate insulation
- group
- poly
- cyclic olefin
- Prior art date
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- Granted
Links
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Images
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F32/00—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
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- C—CHEMISTRY; METALLURGY
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F32/00—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
- C08F32/02—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings
- C08F32/04—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings having one carbon-to-carbon double bond
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L45/00—Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers
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- H10K10/40—Organic transistors
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- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/471—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising only organic materials
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- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/478—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a layer of composite material comprising interpenetrating or embedded materials, e.g. TiO2 particles in a polymer matrix
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- H10K10/40—Organic transistors
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- H10K10/464—Lateral top-gate IGFETs comprising only a single gate
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- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/80—Constructional details
- H10K10/88—Passivation; Containers; Encapsulations
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- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Composite Materials (AREA)
- Thin Film Transistor (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Formation Of Insulating Films (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
Description
添加剂 | Min>0.8cm2/Vs | Opt>1cm2/Vs |
无 | 180s | 300s |
0.7%CPTX | 120s | 240s |
0.5%二DMMI-丁基 | 90s | 120s |
Claims (40)
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CN201510255678.9A CN104877292A (zh) | 2010-09-02 | 2011-08-26 | 用于电子器件的栅绝缘层 |
CN201510255696.7A CN105038069B (zh) | 2010-09-02 | 2011-08-26 | 用于电子器件的栅绝缘层 |
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EP10009118 | 2010-09-02 | ||
EP10009118.0 | 2010-09-02 | ||
US37979910P | 2010-09-03 | 2010-09-03 | |
US61/379,799 | 2010-09-03 | ||
PCT/EP2011/004282 WO2012028279A1 (en) | 2010-09-02 | 2011-08-26 | Gate insulator layer for electronic devices |
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CN201510255696.7A Division CN105038069B (zh) | 2010-09-02 | 2011-08-26 | 用于电子器件的栅绝缘层 |
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CN201510255678.9A Pending CN104877292A (zh) | 2010-09-02 | 2011-08-26 | 用于电子器件的栅绝缘层 |
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US (2) | US9175123B2 (zh) |
EP (2) | EP2611841B1 (zh) |
JP (2) | JP6097216B2 (zh) |
KR (1) | KR101842735B1 (zh) |
CN (3) | CN105038069B (zh) |
DE (1) | DE112011102917T5 (zh) |
GB (1) | GB2497451A (zh) |
RU (1) | RU2013114414A (zh) |
SG (1) | SG187955A1 (zh) |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050186502A1 (en) * | 2004-01-30 | 2005-08-25 | Edmund Elce | Directly photodefinable polymer compositions and methods thereof |
US20050192409A1 (en) * | 2004-02-13 | 2005-09-01 | Rhodes Larry F. | Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof |
CN1698217A (zh) * | 2001-12-19 | 2005-11-16 | 艾夫西亚有限公司 | 使用有机电介质的有机场效应晶体管 |
JP2007251093A (ja) * | 2006-03-20 | 2007-09-27 | Nippon Zeon Co Ltd | ゲート絶縁膜、有機薄膜トランジスタ、該トランジスタの製造方法及び表示装置 |
CN101622289A (zh) * | 2006-12-06 | 2010-01-06 | 普罗米鲁斯有限责任公司 | 可直接光限定的聚合物组合物及其方法 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1278780A (en) | 1968-12-24 | 1972-06-21 | Agfa Gevaert | Photodimerisation and photopolymerisation of bis-maleimides |
US4565873A (en) | 1978-08-30 | 1986-01-21 | Ciba-Geigy Corporation | Silanes containing imide groups |
US5468819A (en) | 1993-11-16 | 1995-11-21 | The B.F. Goodrich Company | Process for making polymers containing a norbornene repeating unit by addition polymerization using an organo (nickel or palladium) complex |
US5789757A (en) | 1996-09-10 | 1998-08-04 | The Dexter Corporation | Malemide containing formulations and uses therefor |
US5861235A (en) | 1996-06-26 | 1999-01-19 | Dow Corning Asia, Ltd. | Ultraviolet-curable composition and method for patterning the cured product therefrom |
US6890847B1 (en) | 2000-02-22 | 2005-05-10 | Micron Technology, Inc. | Polynorbornene foam insulation for integrated circuits |
US6538087B2 (en) | 2000-07-28 | 2003-03-25 | Promerus, Llc | Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
US6423780B1 (en) * | 2001-02-07 | 2002-07-23 | Loctite | Heterobifunctional monomers and uses therefor |
US6690029B1 (en) | 2001-08-24 | 2004-02-10 | University Of Kentucky Research Foundation | Substituted pentacenes and electronic devices made with substituted pentacenes |
EP1459392B1 (en) | 2001-12-19 | 2011-09-21 | Merck Patent GmbH | Organic field effect transistor with an organic dielectric |
US20060020068A1 (en) | 2004-07-07 | 2006-01-26 | Edmund Elce | Photosensitive compositions based on polycyclic polymers for low stress, high temperature films |
US7674847B2 (en) | 2003-02-21 | 2010-03-09 | Promerus Llc | Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof |
WO2005007676A2 (en) | 2003-07-10 | 2005-01-27 | Rajadhyaksha V J | Glycopeptides for the treatment of als and other metabolic and autoimmune disorders |
ATE475971T1 (de) | 2003-11-28 | 2010-08-15 | Merck Patent Gmbh | Organische halbleiterschicht-formulierungen mit polyacenen und organischen binderpolymeren |
US7385221B1 (en) | 2005-03-08 | 2008-06-10 | University Of Kentucky Research Foundation | Silylethynylated heteroacenes and electronic devices made therewith |
JP2007150246A (ja) | 2005-11-02 | 2007-06-14 | Ricoh Co Ltd | 有機トランジスタ及び表示装置 |
JP2008130910A (ja) * | 2006-11-22 | 2008-06-05 | Nippon Zeon Co Ltd | 有機薄膜トランジスタ |
US8053515B2 (en) * | 2006-12-06 | 2011-11-08 | Promerus Llc | Directly photodefinable polymer compositions and methods thereof |
TWI332284B (en) | 2006-12-29 | 2010-10-21 | Ind Tech Res Inst | A battery electrode paste composition containing modified maleimides |
JP4872735B2 (ja) * | 2007-03-19 | 2012-02-08 | 住友ベークライト株式会社 | マレイミド基含有ポリノルボルネンを用いた新規光導波路 |
JP2008244362A (ja) * | 2007-03-28 | 2008-10-09 | Seiko Epson Corp | 半導体装置の製造方法、半導体装置、半導体回路、電気光学装置および電子機器 |
WO2008131836A1 (en) * | 2007-04-25 | 2008-11-06 | Merck Patent Gmbh | Process for preparing an electronic device |
US8309952B2 (en) * | 2007-08-28 | 2012-11-13 | Toppan Printing Co., Ltd. | Thin film transistor and method for manufacturing the same |
EP2277944A3 (en) | 2009-07-24 | 2012-01-04 | Electronics and Telecommunications Research Institute | Composition for organic dielectric and organic thin film transistor formed using the same |
GB2497451A (en) * | 2010-09-02 | 2013-06-12 | Merck Patent Gmbh | Gate insulator layer for electronic devices |
EP2611842B1 (en) | 2010-09-02 | 2015-11-04 | Merck Patent GmbH | Interlayer for electronic devices |
-
2011
- 2011-08-26 GB GB1303582.9A patent/GB2497451A/en not_active Withdrawn
- 2011-08-26 SG SG2013013982A patent/SG187955A1/en unknown
- 2011-08-26 CN CN201510255696.7A patent/CN105038069B/zh active Active
- 2011-08-26 CN CN201510255678.9A patent/CN104877292A/zh active Pending
- 2011-08-26 EP EP11749739.6A patent/EP2611841B1/en active Active
- 2011-08-26 KR KR1020137008514A patent/KR101842735B1/ko active IP Right Grant
- 2011-08-26 CN CN201180042505.9A patent/CN103261250B/zh active Active
- 2011-08-26 WO PCT/EP2011/004282 patent/WO2012028279A1/en active Application Filing
- 2011-08-26 RU RU2013114414/04A patent/RU2013114414A/ru not_active Application Discontinuation
- 2011-08-26 DE DE112011102917T patent/DE112011102917T5/de not_active Withdrawn
- 2011-08-26 JP JP2013526346A patent/JP6097216B2/ja active Active
- 2011-08-26 EP EP13004590.9A patent/EP2676979B1/en active Active
- 2011-09-01 US US13/223,884 patent/US9175123B2/en active Active
- 2011-09-01 TW TW100131548A patent/TWI618723B/zh active
-
2015
- 2015-08-11 US US14/823,066 patent/US9647222B2/en active Active
-
2017
- 2017-02-16 JP JP2017027227A patent/JP6334020B2/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1698217A (zh) * | 2001-12-19 | 2005-11-16 | 艾夫西亚有限公司 | 使用有机电介质的有机场效应晶体管 |
US20050186502A1 (en) * | 2004-01-30 | 2005-08-25 | Edmund Elce | Directly photodefinable polymer compositions and methods thereof |
US20050192409A1 (en) * | 2004-02-13 | 2005-09-01 | Rhodes Larry F. | Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof |
JP2007251093A (ja) * | 2006-03-20 | 2007-09-27 | Nippon Zeon Co Ltd | ゲート絶縁膜、有機薄膜トランジスタ、該トランジスタの製造方法及び表示装置 |
CN101622289A (zh) * | 2006-12-06 | 2010-01-06 | 普罗米鲁斯有限责任公司 | 可直接光限定的聚合物组合物及其方法 |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
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CN104105726A (zh) * | 2012-02-15 | 2014-10-15 | 默克专利股份有限公司 | 用于有机电子器件的平坦化层 |
US9490439B2 (en) | 2012-02-15 | 2016-11-08 | Merck Patent Gmbh | Planarization layer for organic electronic devices |
CN104105726B (zh) * | 2012-02-15 | 2017-05-31 | 默克专利股份有限公司 | 用于有机电子器件的平坦化层 |
CN106068569A (zh) * | 2014-03-12 | 2016-11-02 | 默克专利股份有限公司 | 有机电子组合物及其器件 |
CN106068569B (zh) * | 2014-03-12 | 2019-03-22 | 默克专利股份有限公司 | 有机电子组合物及其器件 |
CN108352450A (zh) * | 2015-11-18 | 2018-07-31 | 阿尔塔纳股份公司 | 用于电子器件中的介电层的可交联聚合材料 |
CN108352450B (zh) * | 2015-11-18 | 2022-04-05 | 阿尔塔纳股份公司 | 用于电子器件中的介电层的可交联聚合材料 |
CN109196676A (zh) * | 2016-05-18 | 2019-01-11 | 默克专利股份有限公司 | 有机介电层及有机电子器件 |
CN109698276A (zh) * | 2018-12-27 | 2019-04-30 | 广州天极电子科技有限公司 | 一种薄膜晶体管器件及其制备方法 |
CN111848930A (zh) * | 2020-07-30 | 2020-10-30 | 清华大学 | 可溶性聚苯并呋喃及其制备方法与在合成5-取代苯并呋喃的应用 |
CN111848930B (zh) * | 2020-07-30 | 2021-07-13 | 清华大学 | 可溶性聚苯并呋喃及其制备方法与在合成5-取代苯并呋喃的应用 |
CN116217805A (zh) * | 2023-01-07 | 2023-06-06 | 中北大学 | 一种降冰片烯基三铵类阳离子聚合物及其制备方法和应用 |
Also Published As
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TW201219432A (en) | 2012-05-16 |
JP2013541191A (ja) | 2013-11-07 |
KR101842735B1 (ko) | 2018-03-27 |
WO2012028279A1 (en) | 2012-03-08 |
EP2611841A1 (en) | 2013-07-10 |
US9175123B2 (en) | 2015-11-03 |
JP6097216B2 (ja) | 2017-03-15 |
US9647222B2 (en) | 2017-05-09 |
EP2611841B1 (en) | 2015-10-28 |
CN105038069A (zh) | 2015-11-11 |
RU2013114414A (ru) | 2014-10-10 |
KR20130114121A (ko) | 2013-10-16 |
EP2676979A1 (en) | 2013-12-25 |
CN103261250B (zh) | 2016-11-09 |
GB2497451A (en) | 2013-06-12 |
TWI618723B (zh) | 2018-03-21 |
WO2012028279A9 (en) | 2012-05-31 |
JP6334020B2 (ja) | 2018-05-30 |
US20150372246A1 (en) | 2015-12-24 |
US20120056183A1 (en) | 2012-03-08 |
JP2017141446A (ja) | 2017-08-17 |
GB2497451A8 (en) | 2013-06-19 |
CN105038069B (zh) | 2017-10-17 |
DE112011102917T5 (de) | 2013-09-05 |
EP2676979B1 (en) | 2016-07-13 |
GB201303582D0 (en) | 2013-04-10 |
CN104877292A (zh) | 2015-09-02 |
SG187955A1 (en) | 2013-03-28 |
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