GB2174509A - Controlling velocity of particles - Google Patents
Controlling velocity of particles Download PDFInfo
- Publication number
- GB2174509A GB2174509A GB08607604A GB8607604A GB2174509A GB 2174509 A GB2174509 A GB 2174509A GB 08607604 A GB08607604 A GB 08607604A GB 8607604 A GB8607604 A GB 8607604A GB 2174509 A GB2174509 A GB 2174509A
- Authority
- GB
- United Kingdom
- Prior art keywords
- fine particles
- pressure
- nozzle
- ratio
- velocity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000002245 particle Substances 0.000 title description 6
- 239000010419 fine particle Substances 0.000 claims abstract description 88
- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 53
- 238000000034 method Methods 0.000 claims abstract description 23
- 230000008569 process Effects 0.000 claims abstract description 21
- 239000012159 carrier gas Substances 0.000 description 31
- 239000011882 ultra-fine particle Substances 0.000 description 22
- 239000000758 substrate Substances 0.000 description 13
- 239000007789 gas Substances 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 11
- 230000001276 controlling effect Effects 0.000 description 11
- 230000001105 regulatory effect Effects 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 238000007664 blowing Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- -1 plasma evaporation Substances 0.000 description 4
- 239000012530 fluid Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 230000010349 pulsation Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004781 supercooling Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45582—Expansion of gas before it reaches the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45585—Compression of gas before it reaches the substrate
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15D—FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
- F15D1/00—Influencing flow of fluids
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- General Engineering & Computer Science (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Coating Apparatus (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60059619A JPS61218810A (ja) | 1985-03-26 | 1985-03-26 | 微粒子流の流れ制御装置 |
| JP8540085A JPS61220763A (ja) | 1985-04-23 | 1985-04-23 | 微粒子流の速度調整方法及びそれを用いた微粒子の堆積方法 |
| JP8540285A JPS61220765A (ja) | 1985-04-23 | 1985-04-23 | 微粒子流の速度制御方法 |
| JP8540185A JPS61220764A (ja) | 1985-04-23 | 1985-04-23 | 微粒子流の速度制御方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| GB8607604D0 GB8607604D0 (en) | 1986-04-30 |
| GB2174509A true GB2174509A (en) | 1986-11-05 |
Family
ID=27463793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB08607604A Withdrawn GB2174509A (en) | 1985-03-26 | 1986-03-26 | Controlling velocity of particles |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE3610296A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2579486B1 (enrdf_load_stackoverflow) |
| GB (1) | GB2174509A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2175708B (en) * | 1985-05-11 | 1989-07-05 | Canon Kk | Reaction apparatus |
| WO1996004409A1 (en) * | 1994-08-01 | 1996-02-15 | Franz Hehmann | Selected processing for non-equilibrium light alloys and products |
| WO1999054515A1 (en) * | 1998-04-17 | 1999-10-28 | Barrick Gold Corporation | Nozzle for low pressure flash tanks for ore slurry |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5043548A (en) * | 1989-02-08 | 1991-08-27 | General Electric Company | Axial flow laser plasma spraying |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1057120A (en) * | 1964-12-09 | 1967-02-01 | Siemens Ag | An arrangement for setting and keeping constant the mass flow of gases |
| GB1166495A (en) * | 1965-12-14 | 1969-10-08 | Siderurgie Fse Inst Rech | Device for Regulating the Rate of Flow of Gas |
| US3507294A (en) * | 1966-12-14 | 1970-04-21 | Philco Ford Corp | Fluid flow control apparatus |
| US3556409A (en) * | 1967-11-30 | 1971-01-19 | Aga Ab | Fluid control device |
| GB1336253A (en) * | 1971-03-11 | 1973-11-07 | Gaz De France | Pressure regulating and reducing gas-flow meter for industrial installations |
| GB1342994A (en) * | 1972-07-24 | 1974-01-10 | Clarke Chapman John Thompson L | Equalising flow in pipes |
| US3904505A (en) * | 1970-03-20 | 1975-09-09 | Space Sciences Inc | Apparatus for film deposition |
| GB2007388A (en) * | 1977-10-14 | 1979-05-16 | Northern Eng Ind | Proportioning flow in pipes |
| EP0064288A1 (en) * | 1981-05-04 | 1982-11-10 | Optical Coating Laboratory, Inc. | Method and apparatus for the production and utilization of activated molecular beams |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE811900C (de) * | 1948-10-02 | 1951-08-23 | Metallgesellschaft Ag | Verfahren zur Erleichterung der Kaltverformung von hochlegierten Staehlen |
| NL100168C (enrdf_load_stackoverflow) * | 1955-05-02 | 1900-01-01 | ||
| FR1518843A (fr) * | 1967-02-13 | 1968-03-29 | Radiotechnique Coprim Rtc | Dispositif pour le dépôt de couches minces sur des supports semi-conducteurs |
| FR2108856A1 (fr) * | 1970-10-13 | 1972-05-26 | Siderurgie Fse Inst Rech | Procede pour l'introduction de combustibles auxilliaires dans un haut fourneau et tuyere pour la mise en oeuvre de ce procede |
| FR2288282A1 (fr) * | 1974-10-15 | 1976-05-14 | Siderurgie Fse Inst Rech | Tuyere pour l'injection de combustible auxiliaire dans les fours a cuve |
| DE2843408B1 (de) * | 1978-10-05 | 1980-02-28 | Prof Durst Franz J | Verfahren zum Herstellen feinster Fluessigkeitstropfen |
| US4416421A (en) * | 1980-10-09 | 1983-11-22 | Browning Engineering Corporation | Highly concentrated supersonic liquified material flame spray method and apparatus |
| JPS6015698B2 (ja) * | 1981-09-30 | 1985-04-20 | 日本真空技術株式会社 | ノズル付蒸発器 |
| JPS5956504A (ja) * | 1982-09-27 | 1984-04-02 | Kobe Steel Ltd | 溶鉱炉送風羽口 |
-
1986
- 1986-03-25 FR FR8604250A patent/FR2579486B1/fr not_active Expired
- 1986-03-26 GB GB08607604A patent/GB2174509A/en not_active Withdrawn
- 1986-03-26 DE DE19863610296 patent/DE3610296A1/de active Granted
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1057120A (en) * | 1964-12-09 | 1967-02-01 | Siemens Ag | An arrangement for setting and keeping constant the mass flow of gases |
| GB1166495A (en) * | 1965-12-14 | 1969-10-08 | Siderurgie Fse Inst Rech | Device for Regulating the Rate of Flow of Gas |
| US3507294A (en) * | 1966-12-14 | 1970-04-21 | Philco Ford Corp | Fluid flow control apparatus |
| US3556409A (en) * | 1967-11-30 | 1971-01-19 | Aga Ab | Fluid control device |
| US3904505A (en) * | 1970-03-20 | 1975-09-09 | Space Sciences Inc | Apparatus for film deposition |
| GB1336253A (en) * | 1971-03-11 | 1973-11-07 | Gaz De France | Pressure regulating and reducing gas-flow meter for industrial installations |
| GB1342994A (en) * | 1972-07-24 | 1974-01-10 | Clarke Chapman John Thompson L | Equalising flow in pipes |
| GB2007388A (en) * | 1977-10-14 | 1979-05-16 | Northern Eng Ind | Proportioning flow in pipes |
| EP0064288A1 (en) * | 1981-05-04 | 1982-11-10 | Optical Coating Laboratory, Inc. | Method and apparatus for the production and utilization of activated molecular beams |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2175708B (en) * | 1985-05-11 | 1989-07-05 | Canon Kk | Reaction apparatus |
| WO1996004409A1 (en) * | 1994-08-01 | 1996-02-15 | Franz Hehmann | Selected processing for non-equilibrium light alloys and products |
| US6908516B2 (en) | 1994-08-01 | 2005-06-21 | Franz Hehmann | Selected processing for non-equilibrium light alloys and products |
| WO1999054515A1 (en) * | 1998-04-17 | 1999-10-28 | Barrick Gold Corporation | Nozzle for low pressure flash tanks for ore slurry |
| US6110255A (en) * | 1998-04-17 | 2000-08-29 | Barrick Gold Corporation | Nozzle for low pressure flash tanks for ore slurry |
| US6482250B1 (en) | 1998-04-17 | 2002-11-19 | Barrick Gold Corporation | Nozzle for low pressure flash tanks for ore slurry |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3610296C2 (enrdf_load_stackoverflow) | 1991-05-02 |
| GB8607604D0 (en) | 1986-04-30 |
| FR2579486B1 (fr) | 1989-05-26 |
| DE3610296A1 (de) | 1986-10-02 |
| FR2579486A1 (fr) | 1986-10-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |