GB8607604D0 - Controlling velocity of fine particles - Google Patents

Controlling velocity of fine particles

Info

Publication number
GB8607604D0
GB8607604D0 GB868607604A GB8607604A GB8607604D0 GB 8607604 D0 GB8607604 D0 GB 8607604D0 GB 868607604 A GB868607604 A GB 868607604A GB 8607604 A GB8607604 A GB 8607604A GB 8607604 D0 GB8607604 D0 GB 8607604D0
Authority
GB
United Kingdom
Prior art keywords
fine particles
controlling velocity
velocity
controlling
fine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB868607604A
Other versions
GB2174509A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP60059619A external-priority patent/JPS61218810A/en
Priority claimed from JP8540185A external-priority patent/JPS61220764A/en
Priority claimed from JP8540285A external-priority patent/JPS61220765A/en
Priority claimed from JP8540085A external-priority patent/JPS61220763A/en
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB8607604D0 publication Critical patent/GB8607604D0/en
Publication of GB2174509A publication Critical patent/GB2174509A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45582—Expansion of gas before it reaches the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45585—Compression of gas before it reaches the substrate
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
    • F15D—FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
    • F15D1/00—Influencing flow of fluids
GB08607604A 1985-03-26 1986-03-26 Controlling velocity of particles Withdrawn GB2174509A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP60059619A JPS61218810A (en) 1985-03-26 1985-03-26 Minute particle flow control apparatus
JP8540185A JPS61220764A (en) 1985-04-23 1985-04-23 Method for controlling speed of particle flow
JP8540285A JPS61220765A (en) 1985-04-23 1985-04-23 Method for controlling speed of fine particle flow
JP8540085A JPS61220763A (en) 1985-04-23 1985-04-23 Method for controlling speed of fine particle flow

Publications (2)

Publication Number Publication Date
GB8607604D0 true GB8607604D0 (en) 1986-04-30
GB2174509A GB2174509A (en) 1986-11-05

Family

ID=27463793

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08607604A Withdrawn GB2174509A (en) 1985-03-26 1986-03-26 Controlling velocity of particles

Country Status (3)

Country Link
DE (1) DE3610296A1 (en)
FR (1) FR2579486B1 (en)
GB (1) GB2174509A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1272661A (en) * 1985-05-11 1990-08-14 Yuji Chiba Reaction apparatus
US5043548A (en) * 1989-02-08 1991-08-27 General Electric Company Axial flow laser plasma spraying
AU3708495A (en) 1994-08-01 1996-03-04 Franz Hehmann Selected processing for non-equilibrium light alloys and products
US6110255A (en) * 1998-04-17 2000-08-29 Barrick Gold Corporation Nozzle for low pressure flash tanks for ore slurry

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE811900C (en) * 1948-10-02 1951-08-23 Metallgesellschaft Ag Process to facilitate the cold working of high-alloy steels
NL100168C (en) * 1955-05-02 1900-01-01
DE1523019C3 (en) * 1964-12-09 1975-09-04 Siemens Ag, 1000 Berlin Und 8000 Muenchen Device for setting and keeping the carrier gas flow constant in gas chromatographic measuring devices
FR1467158A (en) * 1965-12-14 1967-01-27 Siderurgie Fse Inst Rech Gas flow regulator
US3507294A (en) * 1966-12-14 1970-04-21 Philco Ford Corp Fluid flow control apparatus
FR1518843A (en) * 1967-02-13 1968-03-29 Radiotechnique Coprim Rtc Device for the deposition of thin films on semiconductor supports
SE311449B (en) * 1967-11-30 1969-06-09 Aga Ab
US3904505A (en) * 1970-03-20 1975-09-09 Space Sciences Inc Apparatus for film deposition
FR2108856A1 (en) * 1970-10-13 1972-05-26 Siderurgie Fse Inst Rech PROCESS FOR THE INTRODUCTION OF AUXILIARY FUELS IN A BLANKET AND TUBE FOR THE IMPLEMENTATION OF THIS PROCESS
GB1336253A (en) * 1971-03-11 1973-11-07 Gaz De France Pressure regulating and reducing gas-flow meter for industrial installations
GB1342994A (en) * 1972-07-24 1974-01-10 Clarke Chapman John Thompson L Equalising flow in pipes
FR2288282A1 (en) * 1974-10-15 1976-05-14 Siderurgie Fse Inst Rech TUBE FOR THE INJECTION OF AUXILIARY FUEL INTO TANK OVENS
GB2007388A (en) * 1977-10-14 1979-05-16 Northern Eng Ind Proportioning flow in pipes
DE2843408B1 (en) * 1978-10-05 1980-02-28 Prof Durst Franz J Process for producing the finest liquid drops
US4416421A (en) * 1980-10-09 1983-11-22 Browning Engineering Corporation Highly concentrated supersonic liquified material flame spray method and apparatus
AU8288282A (en) * 1981-05-04 1982-11-11 Optical Coating Laboratory, Inc. Production and utilization of activated molecular beams
JPS6015698B2 (en) * 1981-09-30 1985-04-20 日本真空技術株式会社 Evaporator with nozzle
JPS5956504A (en) * 1982-09-27 1984-04-02 Kobe Steel Ltd Blast tuyere of blast furnace

Also Published As

Publication number Publication date
GB2174509A (en) 1986-11-05
DE3610296C2 (en) 1991-05-02
FR2579486A1 (en) 1986-10-03
FR2579486B1 (en) 1989-05-26
DE3610296A1 (en) 1986-10-02

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)