GB2174509A - Controlling velocity of particles - Google Patents

Controlling velocity of particles Download PDF

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Publication number
GB2174509A
GB2174509A GB08607604A GB8607604A GB2174509A GB 2174509 A GB2174509 A GB 2174509A GB 08607604 A GB08607604 A GB 08607604A GB 8607604 A GB8607604 A GB 8607604A GB 2174509 A GB2174509 A GB 2174509A
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United Kingdom
Prior art keywords
fine particles
pressure
nozzle
ratio
velocity
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GB08607604A
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GB8607604D0 (en
Inventor
Kenji Ando
Yuji Chiba
Tatsuo Masaki
Masao Sugata
Kuniji Osabe
Osamu Kamiya
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Canon Inc
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Canon Inc
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Publication date
Priority claimed from JP60059619A external-priority patent/JPS61218810A/en
Priority claimed from JP8540185A external-priority patent/JPS61220764A/en
Priority claimed from JP8540085A external-priority patent/JPS61220763A/en
Priority claimed from JP8540285A external-priority patent/JPS61220765A/en
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB8607604D0 publication Critical patent/GB8607604D0/en
Publication of GB2174509A publication Critical patent/GB2174509A/en
Withdrawn legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563Gas nozzles
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228Gas flow assisted PVD deposition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561Gas plumbing upstream of the reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45582Expansion of gas before it reaches the substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45585Compression of gas before it reaches the substrate
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F15FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
    • F15DFLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
    • F15D1/00Influencing flow of fluids

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • General Engineering & Computer Science (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Coating Apparatus (AREA)

Abstract

A process for controlling a velocity of fine particles comprises: providing a convergent-divergent nozzle 1 in a flow path of said fine particles; and causing a pressure ratio P/Po of a pressure P in a downstream side to a pressure Po in a upstream side to become a critical ratio of pressure or less. The apparatus may comprise also flow chamber 3, vacuum chambers 4a and b, adjustable orifice skimmer 7, shut off valve 13 and target 6 movable by cylinder 14. <IMAGE>

Description

SPECIFICATION Process for controlling velocity of fine particles Background of the invention Field of the invention The present invention relates to a process for controlling a velocity of fine particles, employed for transportation or blowing of fine particles and adaptable to film forming, formation of composite material, doping etc. with fine particles, or a field of fine particle formation.
In the present specification, the fine particles include atoms, molecules, ultra-fine particles and general fine particles. The ultra-fine particles mean those generally smaller than 0.5 Fm, obtained for example by evaporation in gas, plasma evaporation, chemical vapor reaction, colloidal precipitation in liquid or pyrolysis of liquid spray. The general fine particles mean fine particles obtained by ordinary methods such as mechanical crushing, crystallization or precipitation. A beam means a flow with a substantially constant cross section along the flow direction independently of the geometry of said cross section.
Description of the related art In general, fine particles are dispersed and suspended in a carrier gas and are transported by the flow of said carrier gas.
Conventionally, the control of velocity of fine particles in the transportation thereof has merely been achieved by defining the entire flow of the fine particles flowing together with the carrier gas by means of a pipe or a casing, and further adjusting the pressure difference between the upstream and downstream sides.
In case of blowing the fine particles to a substrate, they are generally ejected with carrier gas from a nozzle. The nozzle employed in such fine particle blowing is a straight or convergent nozzle, and the control of velocity of the fine particles ejected has merely been achieved by adjusting the pressure difference between pressures in front of and in the rear of the nozzle. However, with the conventional control of the velocity merely based on the pressure difference, control of the velocity of the entire flow of the fine particles is difficult to be expected because the flow of the fine particles is rendered a dispersed flow or broader density distribution.Furthermore, with the flow control based on the pressure difference alone, no accurate control of the velocity of the fine particles can be expected because magnitude of the pressure difference does not always have direct relationship with magnitude of the velocity. Rather, the velocity depends on a factor other than the pressure difference. If the velocity of the fine particles cannot exactly be controlled, for example, the fine particles are deactivated by delay of transportation in transporting the fine particles and film formation etc. by blow of the fine particles is easily inhibited because of too large or small kinetic energy of the fine particles blown.
Summary of the invention The present invention is to overcome the above-explained problems.
More specifically, an object of the present invention is to provide a novel process for controlling a velocity of fine particles.
The above-mentioned object can be achieved by the present invention as will be explained in the following. According to one aspect of the present invention, there is provided a process for controlling a velocity of fine particles, comprising: providing a convergent-divergent nozzle in a flow path of said fine particles; and causing a pressure ratio P/Po of a pressure P in a downstream side to a pressure Po in a upstream side to become a critical ratio of pressure or less.According to another aspect of the present invention, there is provided a process for controlling a velocity of fine particles, comprising: providing a convergent-divergent nozzle in a flow path of said fine particles; causing a pressure ratio P/Po of a pressure P in a downstream side to a pressure Po in a upstream side to become a critical ratio of pressure or less; and suitably selecting a ratio of a aperture cross-sectional area to that of a throat of said nozzle.
According to a further aspect of the present invention, there is provided a process for controlling a velocity of fine particles, comprising: providing a convergent-divergent nozzle in a flow path of said fine particles; and causing a pressure ratio P/Po of a pressure P in a downstream side to a pressure Po in a upstream side to become above a critical ratio of pressure. According to a sill further aspect of the present invention, there is provided a process for controlling a velocity of fine particles, comprising: providing a convergent-divergent nozzle in a flow path of said fine particles; causing a pressure ratio P/Po of a pressure P in a downstream side to a pressure Po in a upstream side to become above a critical ratio of pressure; and suitably selecting a ratio of a aperture cross-sectional area to that of a throat of said nozzle.
Brief description of the drawings Figure 1 is a schematic view showing the basic principle of the present invention; Figure 2 is a schematic view of a film-formation with ultra-fine particles embodying the present invention; Figures 3A to 3C are views showing embodiments of gas exciting means; Figures 4A to 4D are views showing shapes of the convergent-divergent nozzle; and Figure 5 its a schematic view of a skimmer.
Detailed description of the preferred embodiments The present invention is illustrated below referring to the Figures.
Figure 1 is a schematic view showing the basic principal of the present invention, that is, of a process for controlling a velocity of fine particles, comprising: providing a convergent-divergent nozzle in a flow path of said fine particles; and causing a pressure ratio of P/Po of a pressure P in a downstream side to a pressure Po in a upstream side to become above or not more than a critical ratio of pressure.
A convergent-divergent nozzle 1 employed in the present invention has an aperture cross section which, as shown in Figure 1, is gradually reduced from an inlet 1a to an intermediate throat 2 and is then gradually enlarged toward an outlet 1 b. For the convenience of explanation, in Figure 1, the inlet and outlet of the convergent-divergent nozzle 1 are respectively connected to a closed upstream chamber 3 and a closed downstream chamber 4. However, the inlet and outlet of the convergent-divergent nozzle 1 of the present invention may be connected to closed or open systems as long as the fine particles are caused to pass together with carrier gas by a pressure difference therebetween.
An optimum expansion condition in the present invention means that the pressure P1 at the nozzle outlet 1 b is equal to the pressure P in the downstream chamber 4, whereby the flow from the nozzle has a beam characteristic.
Under an underexpansion condition P1 > P, the ejected fow rapidly diverges toward the outside, starting from the outlet of the nozzle, so that a uniform flow cannot be obtained. On the other hand, under an overexpansion condition P, < P, the flow is liable to cause peeling-off in the nozzle, thus becoming unstable, ahd also tends to generate a shock wave and being not suitable for the present purpose. For obtaining an optimum expansion flow, pressure sensors are provided at or around the outlet of the nozzle and the downstream chamber respectively, and P, at the upstream portion and P at the downstream portion is controlled so that the pressures detected by the sensors may be approximately equal to each other.
In the present invention, a pressure difference between the upstream chamber 3 and the downstream chamber 4 is generated, as shown in Figure 1, by supplying the upstream chamber 3 with carrier gas in which the fine particles are dispersed in a suspension state, and evacuating the downstream chamber 4 with a vacuum pump 5, whereby the supplied carrier gas containing the fine particles flows from the upstream chamber 3 to the downstream chamber 4 through the convergent-divergent nozzle 1.
The convergent-divergent nozzle 1 performs functions not only of ejecting the fine particles together with carrier gas according to the pressure difference between the upstream and downstream sides, but also of rendering the ejected flow of carrier gas and fine particles uniform. Such uniform flow of fine particles can result in easy control of a velocity of a whole flow.
The convergent-divergent nozzle 1 is capable of adjusting the velocity of fine particles ejected with the carrier gas, by suitable selections of a pressure ratio P/P, of the pressure P in the downstream chamber 4 to the pressure P, in the upstream chamber, and a ratio AlA* of the aperture cross-sectional area A of the outlet 1b to that A* of the throat 2. If said ratio P/P, of the pressures in the upstream and downstream chambers 3, 4 is larger than a critical ratio of pressure, the flow velocity at the outlet of the nozzle 1 becomes subsonic or less, and the fine particles and the carrier gas are ejected at a reduced velocity.
On the other hand, if said pressure ratio P/PO is the critical ratio of pressure or less, said flow velocity at the outlet becomes supersonic, so that the fine particles and the carrier gas are ejected at an supersonic velocity.
If the flow of the fine particles is assumed to a compressive one-dimensional flow with adiabatic expansion, the Mach number M that can be reached by the flow is determined by the pressure P, of the upstream chamber and the pressure P of the downstream chamber, according to a following formula:
wherein u is the velocity of the fine particle flow, a is the local acoustic velocity at this point, and hy is the ratio of specific heats of said fluid; M exceeds 1 when the ratio P/P, is the critical ratio of pressure or less; and M is below 1 when the ratio P/P, is above the critical ratio of pressure.
The acoustic velocity a can be determined by a formula:
wherein T is the local temperature and R is gas constant. Also there stands a following relation among the aperture cross sections A, A* of the outlet 1b and throat 2, and the Mach number M:
It is therefore possible to regulate the velocity of the flow of fine particles ejected from the nozzle 1, by selecting the aperture ratio A/A* according to the Mach number M determined by the equation (1) from the pressure ratio P/PO of the upstream and downstream chambers, or by regulating said ratio P/PO according to the value of M determined by the equation (2) from the aperture ratio A/A*. The velocity u of the flow of fine particles can be determined by a following equation (3):
wherein to represent the temperature of the upstream chamber 3.
When the ratio P/PO is above a critical ratio of pressure, the velocity of the fine particles goes up to the Mach number M according to the above formula (1) at the throat 2 of the convergent-divergent nozzle 1.
Thereafter, the flow of the fine particles is ejected out of the nozzle while decelating. The decelating mode between passage at the throat 2 and ejection varies depending on a ratio A/A* of the aperture cross-sectional area A of the outlet 1 b to that A* of the throat 2. Accordingly, the velocity of the fine particles ejected together with the carrier gas can be controlled by adjusting the ratio A/A* under a subsonic condition. Furthermore, the flow of the fine particles can be formed as a beam.
In ejection of the fine particles in the ratio P/PO being above a critical ratio of pressure, the carrier gas and the fine particles becom a uniform diffused flow. Although the flow is a diffused one, a density distribution of the fine particles is uniform and degree of the diffusion can be controlled by the ratio A/A* of aperture cross-sectional areas in the convergent-divergent nozzle 1. Therefore, the fine particles with a desired diffusing degree can be transported in the downstream chamber 4, in a spatially independent state, and thus the velocity of the fine particles can exactly be controlled.
On the other hand, the carrier gas and fine particles, if ejected in a direction in the form of an highspeed flow when the ratio P/PO is a critical ratio of pressure or less, constitute a beam, substantially maintaining the cross section immediately after the ejection. Consequently the fine particles, transported by said carrier gas, also constitute a beam which is transported at a highspeed in the downstream chamber 4, with minimum diffusion and spatially without interference with the walls of the downstream chamber 4, so that the velocity of the particles can exactly be controlled.
It is therefore rendered possible to capture active fine particles on the substrate 6 in the downstream chamber 4 in satisfactory active state, by generating said active fine particles in the upstream chamber 3 and transporting said particles through the nozzle 1, or by generating said active fine particles in or immediately after said nozzle 1 and transporting said particles, in the form of a spatially independent beam, controlling a velocity of fine particles under a supersonic condition. Also kinetic energy of said particles when they are blown can be easily controlled since the fine particles are blown onto the substrate 6 in the form of a beam of which velocity is controlled. Also under a subsonic condition, the similar results can be obtained.
Figure 2 schematically show an embodiment in which the present invention is applied to an apparatus for film formation with ultra-fine particles, wherein illustrated are a convergent-divergent nozzle 1; an upstream chamber 3; a first downstream chamber 4a; and a second downstream chamber 4b.
The upstream chamber 3 and the first downstream chamber 4a are constructed as an integral unit, and, to said first downstream chamber 4a, there are detachably connected a skimmer 7, a gate valve 8 and the second downstream chamber 4b in similar unit structures, through flanges of a common diameter, which will hereinafter be referred to as common flanges. The upstream chamber 3, first downstream chamber 4a and second downstream chamber 4b are maintained at successively higher degrees of vacuum by a vacuum system to be explained later.
To a side of the upstream chamber 3 there is connected, by a common flange, a gas exciting means 9 which generates active ultra-fine particles by plasma and sends said particles to the confronting convergent-divergent nozzle 1, together with carrier gas such as hydrogen, helium, argon or nitrogen. The upstream chamber 3 may be provided with an anti-adhesion treatment on the inner walls thereof, in order to prevent the adhesion of thus generated ultra-fine particles onto said inner walls. Due to the pressure difference between the upstream chamber 3 and the first downstream chamber 4a caused by the higher degree of vacuum in the latter, the generated ultra-fine particles flow, together with said carrier gas, through the nozzle 1 to the first downstream chamber 4a.
As shown in Figure 3A, the gas exciting device 9 has a rod-shaped first electrode 9a housed in a tubular second electrode 9b, wherein the carrier gas and raw material gas are supplied in said second electrode 9b and an electric discharge is induced between said electrodes 9a, 9b. The gas exciting device 9 may also be constructed, as shown in Figure 3B, with a porous first electrode 9a for supplying the carrier gas and raw material gas therethrough to the space between the first and second electrodes, or, as shown in Figure 3C, with a tube composed of semicircular electrodes 9a, 9b separated by insulators 9c into which the carrier gas and raw material gas are supplied.
The convergent-divergent nozzle 1 is mounted, by a common flange, on a lateral end of the first downstream chamber 4a directed toward the upstream chamber 3 so as to protrude in the upstream chamber 3, with the inlet 1a opened in said upstream chamber 3 and the exit Ib opened in said first downstream chamber 4a. Said nozzle 1 may also be mounted so as to protrude in the first downstream chamber 4a.
The protruding direction of the nozzle 1 is determined according to the size, quantity and nature of the ultra-fine particles to be transported.
As explained before, the cross section of the convergent-divergent nozzle 1 is gradually reduced from the inlet 1a to the throat 2, and is then gradually expanded to the outlet 1b, and the differential coefficient of the streamline at the channel changes continuously and reaches zero at the throat 2, thereby minimizing the formation of grow boundary layers in the nozzle 1. In the present invention, the streamline at the channel in the nozzle 1 means the curve of the internal wall on a cross-section along the direction of flow. In this manner it is rendered possible to select the effective cross section of the flow in the nozzle 1 close to the designed value and to fully exploit the performance of the nozzle 1.As shown in a magnified view in Figure 4A, the internal periphery in the vicinity of the outlet 1 b is preferably substantially parallel to the central axis, or, has a differential coefficient equal to zero, in order to facilitate the formation of a parallel flow, since the direction of flow of the ejected carrier gas and fine particles is affected, to a certain extent, by the direction of the internal periphery in the vicinity of the outlet 1 b.
However, if the angle a of the internal wall from the throat 2 to the outlet 1 b with respect to the central axis is selected smaller than 7 , preferably 5 or less as shown in Figure 4B, it is possible to prevent the peeling-off phenomenon and to maintain a substantially uniform state in the ejected carrier gas and ultra-fine particles. Consequently, in such a case, the above-mentioned parallel internal peripheral wall can be dispensed with, and the manufacture of the nozzle 1 can be facilitated by the elimination of said parallel wall portion. Also a slit-shaped ejection of the carrier gas and ultra-fine particles can be obtained by employing a rectangular nozzle 1 as shown in Figure 4C.
The above-mentioned peeling-off phenomenon means a formation of an enlarged boundary layer between the internal wall of the nozzle 1 and the passing fluid, caused for example by a projection on said internal wall, giving rise to an uneven flow, and such phenomenon tends to occur more frequently in the flow of a higher velocity. In order to prevent such peeling-off phenomenon, the aforementioned angle a is preferably selected smaller when the internal wall of the nozzle 1 is finished less precisely. The internal wall of the nozzle 1 should be finished with a precision indicated by three, preferably four, inverted triangle marks as defined in the JIS B 0601.Since the peeling-off phenomenon in the divergent portion of the nozzle 1 significantly affects the flow of carrier gas and ultra-fine particles thereafter, the emphasis on the surface finishing should be given to said divergent portion, in order to facilitate the fabrication of the nozzle 1. Also for preventing said peeling-off phenomenon, it is necessary to form the throat portion 2 with a smooth curve and to avoid the presence of an infinitely large differential coefficient in the change rate of the cross-sectional area.
Examples of the material of the convergent-divergent nozzle 1 include metals such as iron and stainless steel, plastics such as acrylic resin, polyvinyl chloride, polyethylene, polystryene and polypropylene, ceramic materials, quartz, glass etc. Said material can be selected in consideration of absence of reaction with the ultrafine particles to be generated, ease of mechanical working, gas emission in the vacuum system. Also the internal wall of the nozzle 1 may be plated or coated with a material that prevents adhesion of or reaction with the ultra-fine particles. An example of such material is polyfluoroethylene coating.
The length of the convergent-divergent nozzle 1 can be arbitrarily decided, in consideration, for example, of the length of the apparatus. The thermal energy is converted into kinetic energy while the carrier gas and fine particles pass the nozzle 1. Particularly in case of a subsonic ejection, the thermal energy is significantly reduced to reach a supercooled state. Thus, if the carrier gas contains condensable components, it is also possible to form the ultra-fine particles by condensing said components by such supercooling. Such method allows to obtain homogeneous ultra-fine particles, due to the formation of homogeneous nucleation. Also in such case, the convergent-divergent nozzle 1 should preferably be longer for achieving sufficient condensation. On the other hand, such condensation increases the thermal energy and reduces the kinetic energy.Consequently, in order to maintain high-speed ejection, the nozzle 1 should preferably be shorter.
By passing the flow of carrier gas, containing ultra-fine particles through the aforementioned convergent-divergent nozzle 1, with an appropriate selection of the pressure ratio P/PO of the upstream chamber 3 and the downstream chamber 4 and of an aperture area ratio A/A* of the throat 2 and the outlet 1 b, velocity of said flow is controlled, flowing at a speed determined by the pressure ratio and the aperture area ratio from the first downstream chamber 4a to the second downstream chamber 4b. Particularly, when the ratio P/PO is a critical ratio of pressure or less, the flow of carrier gas is formed as a high speed beam.
The skimmer 7 is a variable aperture which can be externally regulated to stepwise vary the area of the aperture between the first downstream chamber 4a and the second downstream chamber 4b, in order to maintain a higher degree of vacuum in the second downstream chamber 4b than in the first 4a. More specifically, said skimmer is composed, as shown in Figure 5, of two adjusting plates 11, 11' which are respectively provided with notches 10, 10' and which are slidably positioned in such a manner that said notches 10, 10' mutually oppose. Said adjusting plates 1-1, 11' can be moved externally, and the notches 10, 10' cooperate each other to define an aperture which allows the beam to pass and still is capable of maintaining a sufficient degree of vacuum in the second downstream chamber. Also the shape of the notches 10,10' of the skimmer 7 and of the adjusting plates 11, 11' is not limited to the foregoing V shape shown in Figure 5 but may be semi-circular or otherwise.
The gate valve 8 is provided with a dam-shaped valve member 13 opened or closed by a handle 12, and is fully opened when the beam flows. By closing said gate valve 8, it is rendered possible to exchange the unit of the second downstream chamber 4b while maintaining the upstream chamber 3 and the first downstream chamber 4a in vacuum state. In case the ultra-fine particles are easily oxidizable metal particles, it is rendered possible to replace the unit without danger of rapid oxidation by employing a ball valve or the like as said gate valve 8 and replacing the second downstream chamber 4b together with said ball valve.
In the second downstream chamber 4b, there is provided a substrate 6 for capturing the ultra-fine particles, transported in the form of a beam, as a film. Said substrate is mounted on a substrate holder 16 at an end of a sliding shaft 15 which is mounted in the second downstream chamber 4b through a common flange and is moved by a cylinder 14. In front of the substrate 6 there is provided a shutter 17 for intercepting the beam when required. Also the substrate holder 16 is capable of heating or cooling the substrate 6 to an optimum condition for capturing the ultrafine particles.
On the top and bottom walls of the upstream chamber 3 and the second downstream chamber 4b, glass windows 18 are mounted by common flanges as illustrated for enabling observation of the interior.
Though not illustrated, similar glass windows are mounted by common flanges on the front and rear walls of the upstream chamber 3, first downstream chamber 4a and second downstream chamber 4b.
These glass windows, when removed, may be utilized for mounting various measuring instruments or a load lock chamber through the common flanges.
In the following there will be explained a vacuum system to be employed in the present embodiment.
The upstream chamber 3 is connected to a main valve 20a through a pressure regulating valve 19. The first downstream chamber 4a is directly connected to the main valve 20a, which is in turn connected to a vacuum pump 5a. The second downstream chamber 4b is connected to a main valve 20b which is connected to a vacuum valve 5b. Rough pumps 21a, 21b are respectively connected to the upstream side of the main valves 20a, 20b through preliminary vacuum valves 22a, 22b, and are also connected to the vacuum pumps 5a, 5b through auxiliary valves 23a, 23b. Said rough pumps 21a, 21b are used for preliminary evacuation of the upstream chamber 3, first downstream chamber 4a and second downstream chamber 4b. Leak/purge valves 24a - 24h are provided for the chambers 3, 4a, 4b and pumps 5a, 5b, 21a, 21b.
At first the preliminary vacuum valves 22a, 22b and the pressure regulating valve 19 are opened to effect preliminary evacuation of the upstream chamber 3 and first and second downstream chambers 4a, 4b by means of the rough pumps 21a, 21b. Then the preliminary vacuum valves 22a, 22b are closed and the auxiliary valves 23a, 23b and the main valves 20a, 20b are opened to sufficiently evacuate the upstream chamber 3 and the first and second downstream chambers 4a, 4b by the vacuum pumps 5a, 5b.
In this state the opening of the pressure regulating valve 19 is controlled to achieve a higher degree of vacuum in the first downstream chamber 4a than in the upstream chamber 3, then the carrier gas and the raw material gas are supplied and the skimmer 7 is regulated to achieve a still higher degree of vacuum in the second downstream chamber 4b than in the first downstream chamber 4a. Said regulation can also be achieved by the main valve 20b. Further control is made in such a manner that each of the chambers 3, 4a, 4b is maintained at a constant degree of vacuum throughout the generation of ultra-fine particles and the film formation by beam ejection. Said control can be achieved either manually or automatically by detecting the pressures in the chambers 3, 4a, 4b and accordingly driving the pressure regulating valve 19, main valves 20a, 20b and skimmer 7.
The upstream chamber 3 and the first downstream chamber 4a may be provided with separate vacuum pumps for the above-mentioned vacuum control. However, if a single vacuum pump 5a is employed, as explained above, for evacuation in the direction of beam flow to control the degree of vacuum in the upstream chamber 3 and the first downstream chamber 4a, the pressure difference therebetween can be maintained constant even when the vacuum pump 5a has certain pulsation. It is therefore made easier to maintain a constant flow state, which is easily affected by a change in the pressure difference.
The suction by the vacuum pumps 5a, 5b is preferably from upside, particularly in the first and second downstream chambers 4a, 4b, since such suction from upside will prevent, to a certain extent, the descent of beam by gravity.
The above-explained apparatus of the present embodiment can also be subjected to following modifications.
Firstly, the convergent-divergent nozzle 1 may be inclined vertically or horizontally, or may be so constructed as to perform a scanning motion over a certain range to form a film over a larger area. Such inclination or scanning motion is advantageous when combined with the rectangular nozzle shown in Figure 4C.
It is also possible to form the nozzle 1 with an insulator such as quartz and to supply a microwave thereto, thereby generating active ultra-fine particles therein, or to form the nozzle with a translucent material and to irradiate the flow with light of various wavelength such as ultraviolet light, infrared light or laser light. Also there may be provided plural nozzles 1 to generate plural beams simultaneously. Particularly, the connection of plural nozzles 1 with independent upstream chambers 3 enables to simultaneously generate beams of different fine particles, thereby realizing lamination or mixed capture of different fine particles, or even generation of new fine particles through collisions of crossing beams.
The substrate 6 may be rendered vertically or horizontally movable, or rotatably supported, in order to receive the beam over a wide area. Also the substrate may be unwound and advanced from a roll to receive the beam, thereby subjecting a web-shaped substrate to the treatment with fine particles. Furthermore the treatment with the fine particles may be applied to a rotating drum-shaped substrate 6.
The above-explained embodiment consists of the upstream chamber 3, first downstream chamber 4a and second downstream chamber 4b, but it is also possible to eliminate the second downstream chamber 4b or to connect additional downstream chanber or chambers to the second downstream chamber.
The first downstream chamber 4a may be operated under an open system if the upstream chamber 3 is pressurized, or, the upstream chamber 3 may be operated under an open system if the first downstream chamber 4a is reduced in pressure. It is also possible to pressurize the upstream chamber 3 as in an autoclave and to depressurize the first and ensuing downstream chambers.
In the foregoing explanation the active ultra-fine particles are generated in the upstream chamber 3, but they can also be generated elsewhere and supplied to said chamber together with the carrier gas. It is furthermore possible to provide a valve for opening and closing the constricting-spreading valve 1 and to intermittently open and close said valve thereby temporarily storing the fine particles in the upstream chamber 3. The energy supply in the downstream side, including the throat 2, of the nozzle 1 may be synchronized with the opening and closing of said valve to significantly reduce the load of the vacuum system and to obtain a pulsating flow of fine particles, while achieving effective utilization of the raw material gas. For a given evacuating condition, a high degree of vacuum can be more easily attained in the downstream side, by such intermittent opening and closing.In such case, there may be provided a chamber for temporarily storing the fine particles, between the upstream chamber 3 and the constrictingspreading nozzle 1.
It is furthermore possible to employ plural nozzles 1 in series and to regulate the pressure ratio between the upstream side and downstream side of each nozzle, in order to maintain a constant beam speed, and to employ spherical chamber to prevent the formation of dead spaces.
According to the present invention, fine particles can be transported as a uniformly dispersed ejection flow or as an supersonic beam. Thus, supersonic or subsonic transportation of fine particles can be achieved in a spatially independent state while surely controlling the velocity. Accordingly, it is rendered possible to securely transport the active fine particles to the capturing position in the active state, and to exactly control kinetic energy in blowing. It is also excepted to abtain a new field of reaction, realized by the presence of a beam in the form of an ultra-high speed beam flow, and by the conversion of thermal energy into kinetic energy at the beam formation, to maintain the fine particle in energetically frozen state. Furthermore, utilizing the above-mentioned energetically frozen state, the process for controlling the velocity of the present invention is capable of defining a microscopic state of the molecules in the fluid to handle a transition from a state to another. More specifically, there is opened a possibility of a novel gaseous chemical reaction in which the molecule is defined to the energy level thereof and is given an energy corresponding to said energy level. There is provided a new field of energy transfer, which can be easily utilized for obtaining intermolecular compounds formed with relatively weak intermolecular forces such as hydrogen bond or van der Waals force.

Claims (11)

1. A process for controlling a velocity of fine particles, comprising: providing a convergent-divergent nozzle in a flow path of said fine particles; and causing a pressure ratio P/PO of a pressure P in a downstream side to a pressure P0 in a upstream side to become a critical ratio of pressure or less.
2. A process according to Claim 1, wherein said nozzle is operated under an optimum expansion condition.
3. A process according to Claim 1, wherein the differential coefficient of the streamline at the channel inside said nozzle varies continuously and is equal to zero at a throat portion of said nozzle.
4. A process for controlling a velocity of fine particles, comprising: providing a convergent-divergent nozzle in a flow path of said fine particles; causing a pressure ratio P/PO of a pressure P in a downstream side to a pressure P0 in a upstream side to become a critical ratio of pressure or less; and suitably selecting a ratio of a aperture cross-sectional area to that of a throat of said nozzle.
5. A process according to Claim 4, wherein said nozzle is operated under an optimum expansion condition.
6. A process according to Claim 4, wherein the differential coefficient of the streamline at the channel inside said nozzle varies continuously and is equal to zero at a throat portion of said nozzle.
7. A process for controlling a velocity of fine particles, comprising: providing a convergent-divergent nozzle in a flow path of said fine particles; and causing a pressure ratio P/PO of a pressure P in a downstream side to a pressure P0 in a upstream side to become above a critical ratio of pressure.
8. A process according to Claim 7, wherein the differential coefficient of the streamline at the channel inside said nozzle varies continuously and is equal to zero at a throat portion of said nozzle.
9. A process for controlling a velocity of fine particles, comprising: providing a convergent-divergent nozzle in a flow path of said fine particles; causing a pressure ratio P/PO of a pressure P in a downstream side to a pressure P0 in a upstream side to become a critical ratio of pressure or less; and suitably selecting a ratio of a aperture cross-sectional area to that of a throat of said nozzle.
10. A process according to Claim 9, wherein the differential coefficient of the streamline at the channel inside said nozzle varies continuously and is equal to zero at a throat portion of said nozzle.
11. A process for controlling the velocity of fine particles substantially as herein described with reference to the accompanying drawings.
GB08607604A 1985-03-26 1986-03-26 Controlling velocity of particles Withdrawn GB2174509A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP60059619A JPS61218810A (en) 1985-03-26 1985-03-26 Minute particle flow control apparatus
JP8540185A JPS61220764A (en) 1985-04-23 1985-04-23 Method for controlling speed of particle flow
JP8540085A JPS61220763A (en) 1985-04-23 1985-04-23 Method for controlling speed of fine particle flow
JP8540285A JPS61220765A (en) 1985-04-23 1985-04-23 Method for controlling speed of fine particle flow

Publications (2)

Publication Number Publication Date
GB8607604D0 GB8607604D0 (en) 1986-04-30
GB2174509A true GB2174509A (en) 1986-11-05

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DE (1) DE3610296A1 (en)
FR (1) FR2579486B1 (en)
GB (1) GB2174509A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2175708B (en) * 1985-05-11 1989-07-05 Canon Kk Reaction apparatus
WO1996004409A1 (en) * 1994-08-01 1996-02-15 Franz Hehmann Selected processing for non-equilibrium light alloys and products
WO1999054515A1 (en) * 1998-04-17 1999-10-28 Barrick Gold Corporation Nozzle for low pressure flash tanks for ore slurry

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5043548A (en) * 1989-02-08 1991-08-27 General Electric Company Axial flow laser plasma spraying

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1057120A (en) * 1964-12-09 1967-02-01 Siemens Ag An arrangement for setting and keeping constant the mass flow of gases
GB1166495A (en) * 1965-12-14 1969-10-08 Siderurgie Fse Inst Rech Device for Regulating the Rate of Flow of Gas
US3507294A (en) * 1966-12-14 1970-04-21 Philco Ford Corp Fluid flow control apparatus
US3556409A (en) * 1967-11-30 1971-01-19 Aga Ab Fluid control device
GB1336253A (en) * 1971-03-11 1973-11-07 Gaz De France Pressure regulating and reducing gas-flow meter for industrial installations
GB1342994A (en) * 1972-07-24 1974-01-10 Clarke Chapman John Thompson L Equalising flow in pipes
US3904505A (en) * 1970-03-20 1975-09-09 Space Sciences Inc Apparatus for film deposition
GB2007388A (en) * 1977-10-14 1979-05-16 Northern Eng Ind Proportioning flow in pipes
EP0064288A1 (en) * 1981-05-04 1982-11-10 Optical Coating Laboratory, Inc. Method and apparatus for the production and utilization of activated molecular beams

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE811900C (en) * 1948-10-02 1951-08-23 Metallgesellschaft Ag Process to facilitate the cold working of high-alloy steels
NL206772A (en) * 1955-05-02 1900-01-01
FR1518843A (en) * 1967-02-13 1968-03-29 Radiotechnique Coprim Rtc Device for the deposition of thin films on semiconductor supports
FR2108856A1 (en) * 1970-10-13 1972-05-26 Siderurgie Fse Inst Rech PROCESS FOR THE INTRODUCTION OF AUXILIARY FUELS IN A BLANKET AND TUBE FOR THE IMPLEMENTATION OF THIS PROCESS
FR2288282A1 (en) * 1974-10-15 1976-05-14 Siderurgie Fse Inst Rech TUBE FOR THE INJECTION OF AUXILIARY FUEL INTO TANK OVENS
DE2843408B1 (en) * 1978-10-05 1980-02-28 Prof Durst Franz J Process for producing the finest liquid drops
US4416421A (en) * 1980-10-09 1983-11-22 Browning Engineering Corporation Highly concentrated supersonic liquified material flame spray method and apparatus
JPS6015698B2 (en) * 1981-09-30 1985-04-20 日本真空技術株式会社 Evaporator with nozzle
JPS5956504A (en) * 1982-09-27 1984-04-02 Kobe Steel Ltd Blast tuyere of blast furnace

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1057120A (en) * 1964-12-09 1967-02-01 Siemens Ag An arrangement for setting and keeping constant the mass flow of gases
GB1166495A (en) * 1965-12-14 1969-10-08 Siderurgie Fse Inst Rech Device for Regulating the Rate of Flow of Gas
US3507294A (en) * 1966-12-14 1970-04-21 Philco Ford Corp Fluid flow control apparatus
US3556409A (en) * 1967-11-30 1971-01-19 Aga Ab Fluid control device
US3904505A (en) * 1970-03-20 1975-09-09 Space Sciences Inc Apparatus for film deposition
GB1336253A (en) * 1971-03-11 1973-11-07 Gaz De France Pressure regulating and reducing gas-flow meter for industrial installations
GB1342994A (en) * 1972-07-24 1974-01-10 Clarke Chapman John Thompson L Equalising flow in pipes
GB2007388A (en) * 1977-10-14 1979-05-16 Northern Eng Ind Proportioning flow in pipes
EP0064288A1 (en) * 1981-05-04 1982-11-10 Optical Coating Laboratory, Inc. Method and apparatus for the production and utilization of activated molecular beams

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2175708B (en) * 1985-05-11 1989-07-05 Canon Kk Reaction apparatus
WO1996004409A1 (en) * 1994-08-01 1996-02-15 Franz Hehmann Selected processing for non-equilibrium light alloys and products
US6908516B2 (en) 1994-08-01 2005-06-21 Franz Hehmann Selected processing for non-equilibrium light alloys and products
WO1999054515A1 (en) * 1998-04-17 1999-10-28 Barrick Gold Corporation Nozzle for low pressure flash tanks for ore slurry
US6110255A (en) * 1998-04-17 2000-08-29 Barrick Gold Corporation Nozzle for low pressure flash tanks for ore slurry
US6482250B1 (en) 1998-04-17 2002-11-19 Barrick Gold Corporation Nozzle for low pressure flash tanks for ore slurry

Also Published As

Publication number Publication date
DE3610296C2 (en) 1991-05-02
FR2579486A1 (en) 1986-10-03
FR2579486B1 (en) 1989-05-26
DE3610296A1 (en) 1986-10-02
GB8607604D0 (en) 1986-04-30

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