FR2579486B1 - Procede pour regler la vitesse de particules fines - Google Patents
Procede pour regler la vitesse de particules finesInfo
- Publication number
- FR2579486B1 FR2579486B1 FR8604250A FR8604250A FR2579486B1 FR 2579486 B1 FR2579486 B1 FR 2579486B1 FR 8604250 A FR8604250 A FR 8604250A FR 8604250 A FR8604250 A FR 8604250A FR 2579486 B1 FR2579486 B1 FR 2579486B1
- Authority
- FR
- France
- Prior art keywords
- adjusting
- speed
- fine particles
- fine
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010419 fine particle Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45582—Expansion of gas before it reaches the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45585—Compression of gas before it reaches the substrate
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15D—FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
- F15D1/00—Influencing flow of fluids
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- General Engineering & Computer Science (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Coating Apparatus (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60059619A JPS61218810A (ja) | 1985-03-26 | 1985-03-26 | 微粒子流の流れ制御装置 |
JP8540085A JPS61220763A (ja) | 1985-04-23 | 1985-04-23 | 微粒子流の速度調整方法及びそれを用いた微粒子の堆積方法 |
JP8540285A JPS61220765A (ja) | 1985-04-23 | 1985-04-23 | 微粒子流の速度制御方法 |
JP8540185A JPS61220764A (ja) | 1985-04-23 | 1985-04-23 | 微粒子流の速度制御方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2579486A1 FR2579486A1 (fr) | 1986-10-03 |
FR2579486B1 true FR2579486B1 (fr) | 1989-05-26 |
Family
ID=27463793
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8604250A Expired FR2579486B1 (fr) | 1985-03-26 | 1986-03-25 | Procede pour regler la vitesse de particules fines |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE3610296A1 (enrdf_load_stackoverflow) |
FR (1) | FR2579486B1 (enrdf_load_stackoverflow) |
GB (1) | GB2174509A (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1272661A (en) * | 1985-05-11 | 1990-08-14 | Yuji Chiba | Reaction apparatus |
US5043548A (en) * | 1989-02-08 | 1991-08-27 | General Electric Company | Axial flow laser plasma spraying |
US6544357B1 (en) | 1994-08-01 | 2003-04-08 | Franz Hehmann | Selected processing for non-equilibrium light alloys and products |
US6110255A (en) * | 1998-04-17 | 2000-08-29 | Barrick Gold Corporation | Nozzle for low pressure flash tanks for ore slurry |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE811900C (de) * | 1948-10-02 | 1951-08-23 | Metallgesellschaft Ag | Verfahren zur Erleichterung der Kaltverformung von hochlegierten Staehlen |
NL100168C (enrdf_load_stackoverflow) * | 1955-05-02 | 1900-01-01 | ||
DE1523019C3 (de) * | 1964-12-09 | 1975-09-04 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Einrichtung zur Einstellung und Konstanthaltung des Trägergasflusses bei gaschromatographischen Meßeinrichtungen |
FR1467158A (fr) * | 1965-12-14 | 1967-01-27 | Siderurgie Fse Inst Rech | Dispositif de réglage de débit de gaz |
US3507294A (en) * | 1966-12-14 | 1970-04-21 | Philco Ford Corp | Fluid flow control apparatus |
FR1518843A (fr) * | 1967-02-13 | 1968-03-29 | Radiotechnique Coprim Rtc | Dispositif pour le dépôt de couches minces sur des supports semi-conducteurs |
SE311449B (enrdf_load_stackoverflow) * | 1967-11-30 | 1969-06-09 | Aga Ab | |
US3904505A (en) * | 1970-03-20 | 1975-09-09 | Space Sciences Inc | Apparatus for film deposition |
FR2108856A1 (fr) * | 1970-10-13 | 1972-05-26 | Siderurgie Fse Inst Rech | Procede pour l'introduction de combustibles auxilliaires dans un haut fourneau et tuyere pour la mise en oeuvre de ce procede |
GB1336253A (en) * | 1971-03-11 | 1973-11-07 | Gaz De France | Pressure regulating and reducing gas-flow meter for industrial installations |
GB1342994A (en) * | 1972-07-24 | 1974-01-10 | Clarke Chapman John Thompson L | Equalising flow in pipes |
FR2288282A1 (fr) * | 1974-10-15 | 1976-05-14 | Siderurgie Fse Inst Rech | Tuyere pour l'injection de combustible auxiliaire dans les fours a cuve |
GB2007388A (en) * | 1977-10-14 | 1979-05-16 | Northern Eng Ind | Proportioning flow in pipes |
DE2843408B1 (de) * | 1978-10-05 | 1980-02-28 | Prof Durst Franz J | Verfahren zum Herstellen feinster Fluessigkeitstropfen |
US4416421A (en) * | 1980-10-09 | 1983-11-22 | Browning Engineering Corporation | Highly concentrated supersonic liquified material flame spray method and apparatus |
AU8288282A (en) * | 1981-05-04 | 1982-11-11 | Optical Coating Laboratory, Inc. | Production and utilization of activated molecular beams |
JPS6015698B2 (ja) * | 1981-09-30 | 1985-04-20 | 日本真空技術株式会社 | ノズル付蒸発器 |
JPS5956504A (ja) * | 1982-09-27 | 1984-04-02 | Kobe Steel Ltd | 溶鉱炉送風羽口 |
-
1986
- 1986-03-25 FR FR8604250A patent/FR2579486B1/fr not_active Expired
- 1986-03-26 GB GB08607604A patent/GB2174509A/en not_active Withdrawn
- 1986-03-26 DE DE19863610296 patent/DE3610296A1/de active Granted
Also Published As
Publication number | Publication date |
---|---|
DE3610296C2 (enrdf_load_stackoverflow) | 1991-05-02 |
GB8607604D0 (en) | 1986-04-30 |
DE3610296A1 (de) | 1986-10-02 |
GB2174509A (en) | 1986-11-05 |
FR2579486A1 (fr) | 1986-10-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |