FR2579487B1 - Appareil pour reguler l'ecoulement de particules fines - Google Patents

Appareil pour reguler l'ecoulement de particules fines

Info

Publication number
FR2579487B1
FR2579487B1 FR8604251A FR8604251A FR2579487B1 FR 2579487 B1 FR2579487 B1 FR 2579487B1 FR 8604251 A FR8604251 A FR 8604251A FR 8604251 A FR8604251 A FR 8604251A FR 2579487 B1 FR2579487 B1 FR 2579487B1
Authority
FR
France
Prior art keywords
controlling
flow
fine particles
fine
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8604251A
Other languages
English (en)
Other versions
FR2579487A1 (fr
Inventor
Kenji Ando
Yuji Chiba
Tatsuo Masaki
Masao Sugata
Kuniji Osabe
Osamu Kamiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP60059619A external-priority patent/JPS61218810A/ja
Priority claimed from JP60060841A external-priority patent/JPS61223313A/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of FR2579487A1 publication Critical patent/FR2579487A1/fr
Application granted granted Critical
Publication of FR2579487B1 publication Critical patent/FR2579487B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45582—Expansion of gas before it reaches the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45585—Compression of gas before it reaches the substrate
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
    • F15D—FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
    • F15D1/00—Influencing flow of fluids
FR8604251A 1985-03-26 1986-03-25 Appareil pour reguler l'ecoulement de particules fines Expired FR2579487B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP60059619A JPS61218810A (ja) 1985-03-26 1985-03-26 微粒子流の流れ制御装置
JP60060841A JPS61223313A (ja) 1985-03-27 1985-03-27 微粒子流の流れ制御装置

Publications (2)

Publication Number Publication Date
FR2579487A1 FR2579487A1 (fr) 1986-10-03
FR2579487B1 true FR2579487B1 (fr) 1989-05-12

Family

ID=26400676

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8604251A Expired FR2579487B1 (fr) 1985-03-26 1986-03-25 Appareil pour reguler l'ecoulement de particules fines

Country Status (3)

Country Link
DE (1) DE3610299A1 (fr)
FR (1) FR2579487B1 (fr)
GB (1) GB2175709B (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1272661A (fr) * 1985-05-11 1990-08-14 Yuji Chiba Appareil reacteur
DE3721875A1 (de) * 1987-07-02 1989-01-12 Gema Ransburg Ag Verfahren und einrichtung fuer eine pulverspruehbeschichtungsanlage
DE10320147A1 (de) * 2003-05-06 2004-12-09 Dürr Systems GmbH Verfahren und Versorgungssystem zur dosierten Materialversorgung einer Beschichtungsvorrichtung
WO2020119895A1 (fr) * 2018-12-11 2020-06-18 Applied Materials, Inc. Source de vapeur pour déposer une matière évaporée, buse pour une source de vapeur, système de dépôt par évaporation sous vide et procédé pour déposer une matière évaporée

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR544737A (fr) * 1921-05-26 1922-09-27 Arbed Procédé de chauffage à l'aide de combustibles pulvérisés
GB415446A (en) * 1931-11-25 1934-08-27 Daimler Benz Ag Method of and means for stabilising the flow of gas in pipes connected to reciprocating piston machines
GB891159A (en) * 1957-03-20 1962-03-14 Holmes & Co Ltd W C Improvements in or relating to the reduction or substantial elimination of pressure fluctuations in pipe lines
US3015481A (en) * 1959-12-11 1962-01-02 Archie H Clingensmith Tuyere assembly
FR1404306A (fr) * 1964-08-17 1965-06-25 Avco Corp Perfectionnements à la combustion de charbon pulvérisé
DE1523019C3 (de) * 1964-12-09 1975-09-04 Siemens Ag, 1000 Berlin Und 8000 Muenchen Einrichtung zur Einstellung und Konstanthaltung des Trägergasflusses bei gaschromatographischen Meßeinrichtungen
NL6712305A (fr) * 1966-09-12 1968-03-13
SE311449B (fr) * 1967-11-30 1969-06-09 Aga Ab
US3904505A (en) * 1970-03-20 1975-09-09 Space Sciences Inc Apparatus for film deposition
FR2122682A5 (fr) * 1971-01-20 1972-09-01 Siderurgie Fse Inst Rech
GB1336253A (en) * 1971-03-11 1973-11-07 Gaz De France Pressure regulating and reducing gas-flow meter for industrial installations
GB1342994A (en) * 1972-07-24 1974-01-10 Clarke Chapman John Thompson L Equalising flow in pipes
US4078097A (en) * 1976-07-09 1978-03-07 International Prototypes, Inc. Metallic coating process
US4200264A (en) * 1976-08-16 1980-04-29 Fumio Hori Apparatus for obtaining Mg and Ca through carbon reduction
FR2404126A1 (fr) * 1977-09-26 1979-04-20 Iceberg Transport Int Procede de production d'energie a partir d'un iceberg tabulaire
GB2007388A (en) * 1977-10-14 1979-05-16 Northern Eng Ind Proportioning flow in pipes
AU8288282A (en) * 1981-05-04 1982-11-11 Optical Coating Laboratory, Inc. Production and utilization of activated molecular beams
DE3127074A1 (de) * 1981-07-09 1983-01-27 Ernst Peiniger GmbH Unternehmen für Bautenschutz, 5090 Leverkusen Strahlgeraet, insbesondere fuer das druckluftstrahlen
DE3148756A1 (de) * 1981-12-09 1983-07-21 Dusan Dr.-Ing. 8000 München Nendl Ueberschallringduese
FR2519273A1 (fr) * 1982-01-07 1983-07-08 Camiva Dispositif de projection pour produit solide finement divise
CH659864A5 (de) * 1982-06-23 1987-02-27 Bbc Brown Boveri & Cie Lochplatte zur vergleichmaessigung der geschwindigkeitsverteilung in einem stroemungskanal.

Also Published As

Publication number Publication date
DE3610299C2 (fr) 1993-06-24
GB2175709B (en) 1989-06-28
GB8607606D0 (en) 1986-04-30
DE3610299A1 (de) 1986-10-02
GB2175709A (en) 1986-12-03
FR2579487A1 (fr) 1986-10-03

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