FR2752334B1 - Dispositif a semiconducteurs muni d'un cadre de montage et son procede de fabrication - Google Patents
Dispositif a semiconducteurs muni d'un cadre de montage et son procede de fabricationInfo
- Publication number
- FR2752334B1 FR2752334B1 FR9708739A FR9708739A FR2752334B1 FR 2752334 B1 FR2752334 B1 FR 2752334B1 FR 9708739 A FR9708739 A FR 9708739A FR 9708739 A FR9708739 A FR 9708739A FR 2752334 B1 FR2752334 B1 FR 2752334B1
- Authority
- FR
- France
- Prior art keywords
- manufacturing
- semiconductor device
- device provided
- mounting frame
- mounting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
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- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4821—Flat leads, e.g. lead frames with or without insulating supports
- H01L21/4825—Connection or disconnection of other leads to or from flat leads, e.g. wires, bumps, other flat leads
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- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
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- H01L2224/85438—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/8538—Bonding interfaces outside the semiconductor or solid-state body
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- H01L2224/854—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/85438—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/8538—Bonding interfaces outside the semiconductor or solid-state body
- H01L2224/85399—Material
- H01L2224/854—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/85463—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
- H01L2224/85464—Palladium (Pd) as principal constituent
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- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/157—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2924/15738—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950 C and less than 1550 C
- H01L2924/15747—Copper [Cu] as principal constituent
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- H—ELECTRICITY
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- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/20—Parameters
- H01L2924/201—Temperature ranges
- H01L2924/20105—Temperature range 150 C=<T<200 C, 423.15 K =< T < 473.15K
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- H01L2924/20—Parameters
- H01L2924/201—Temperature ranges
- H01L2924/20106—Temperature range 200 C=<T<250 C, 473.15 K =<T < 523.15K
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- H01L2924/20—Parameters
- H01L2924/201—Temperature ranges
- H01L2924/20107—Temperature range 250 C=<T<300 C, 523.15K =<T< 573.15K
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- H—ELECTRICITY
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/20—Parameters
- H01L2924/207—Diameter ranges
- H01L2924/20752—Diameter ranges larger or equal to 20 microns less than 30 microns
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/20—Parameters
- H01L2924/207—Diameter ranges
- H01L2924/20753—Diameter ranges larger or equal to 30 microns less than 40 microns
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Wire Bonding (AREA)
- Lead Frames For Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18461596 | 1996-07-15 |
Publications (2)
Publication Number | Publication Date |
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FR2752334A1 FR2752334A1 (fr) | 1998-02-13 |
FR2752334B1 true FR2752334B1 (fr) | 2002-07-12 |
Family
ID=16156330
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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FR9708739A Expired - Fee Related FR2752334B1 (fr) | 1996-07-15 | 1997-07-09 | Dispositif a semiconducteurs muni d'un cadre de montage et son procede de fabrication |
Country Status (5)
Country | Link |
---|---|
US (1) | US5994212A (fr) |
KR (1) | KR100454198B1 (fr) |
CN (1) | CN1131562C (fr) |
FR (1) | FR2752334B1 (fr) |
TW (1) | TW335526B (fr) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6165888A (en) * | 1997-10-02 | 2000-12-26 | Motorola, Inc. | Two step wire bond process |
JP2000138249A (ja) * | 1998-10-29 | 2000-05-16 | Matsushita Electric Ind Co Ltd | 突起電極形成方法及び実装方法 |
US6306685B1 (en) * | 2000-02-01 | 2001-10-23 | Advanced Semiconductor Engineering, Inc. | Method of molding a bump chip carrier and structure made thereby |
JP2001230360A (ja) * | 2000-02-18 | 2001-08-24 | Hitachi Ltd | 半導体集積回路装置およびその製造方法 |
JP2001250898A (ja) * | 2000-03-08 | 2001-09-14 | Mitsui Mining & Smelting Co Ltd | 金メッキビームリードの半導体素子への接合方法 |
KR100628900B1 (ko) * | 2000-04-25 | 2006-09-27 | 후지쯔 가부시끼가이샤 | 반도체 칩의 실장방법 |
KR20030066344A (ko) * | 2002-02-01 | 2003-08-09 | 에섹 트레이딩 에스에이 | 와이어본더로 접합시에 최적의 접합 파라미터들을결정하기 위한 방법 |
US7068344B2 (en) * | 2003-02-24 | 2006-06-27 | 3M Innovative Properties Company | Cholesteric liquid crystal optical bodies and methods of manufacture and use |
US6913708B2 (en) * | 2003-02-24 | 2005-07-05 | 3M Innovative Properties Company | Cholesteric liquid crystal drying process and solvent |
US7029729B2 (en) * | 2003-02-24 | 2006-04-18 | 3M Innovative Properties Company | Cholesteric liquid crystal additives |
JP2005314749A (ja) * | 2004-04-28 | 2005-11-10 | Shinei Hitec:Kk | 電子部品及びその表面処理方法 |
WO2006018671A1 (fr) * | 2004-08-19 | 2006-02-23 | Infineon Technologies Ag | Boitier a grilles de connexion a semi-conducteurs et a fils mixtes |
KR100646093B1 (ko) * | 2004-12-17 | 2006-11-15 | 엘지이노텍 주식회사 | 발광소자 패키지 |
US20060186179A1 (en) * | 2005-02-23 | 2006-08-24 | Levine Lee R | Apparatus and method for bonding wires |
US20100007007A1 (en) * | 2008-07-08 | 2010-01-14 | Samsung Electronics Co., Ltd | Semiconductor package |
JP5135164B2 (ja) * | 2008-10-22 | 2013-01-30 | 株式会社東芝 | ボンディング方法 |
US9293435B2 (en) * | 2009-09-11 | 2016-03-22 | Rohm Co., Ltd. | Semiconductor device and production method therefor |
JP6121692B2 (ja) * | 2012-11-05 | 2017-04-26 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
JP6092266B2 (ja) * | 2013-02-06 | 2017-03-08 | シャープ株式会社 | 発光装置の製造方法 |
ITMI20131530A1 (it) | 2013-09-17 | 2015-03-18 | St Microelectronics Srl | Dispositivo elettronico con elemento di interfaccia bimetallico per wire-bonding |
DE102016117389B4 (de) * | 2015-11-20 | 2020-05-28 | Semikron Elektronik Gmbh & Co. Kg | Leistungshalbleiterchip und Verfahren zur Herstellung eines Leistungshalbleiterchips und Leistungshalbleitereinrichtung |
JP6798294B2 (ja) * | 2016-12-08 | 2020-12-09 | 株式会社豊田中央研究所 | 半導体モジュールとその製造方法 |
CN107175400B (zh) * | 2017-04-14 | 2019-12-06 | 国家纳米科学中心 | 一种金丝焊接方法 |
CN112151489B (zh) * | 2020-09-01 | 2023-06-06 | 通富微电科技(南通)有限公司 | 引线框架、引线框架的形成方法及引线框架封装体 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS60254761A (ja) * | 1984-05-31 | 1985-12-16 | Sumitomo Electric Ind Ltd | 半導体装置用リ−ドフレ−ム |
JPS6149451A (ja) * | 1984-08-17 | 1986-03-11 | Hitachi Cable Ltd | 半導体用リ−ドフレ−ム |
JPS61287155A (ja) * | 1985-06-14 | 1986-12-17 | Hitachi Ltd | 半導体装置及び半導体装置の製造方法 |
US4707418A (en) * | 1985-06-26 | 1987-11-17 | National Semiconductor Corporation | Nickel plated copper tape |
JPS61111553A (ja) * | 1985-09-27 | 1986-05-29 | Hitachi Ltd | 半導体装置 |
JPS62136838A (ja) * | 1985-12-10 | 1987-06-19 | Mitsubishi Electric Corp | 半導体装置 |
JPS6378541A (ja) * | 1986-09-20 | 1988-04-08 | Fujitsu Ltd | ワイヤボンデイング方法 |
JP2603102B2 (ja) * | 1988-05-12 | 1997-04-23 | イビデン株式会社 | 電子部品搭載用基板の製造方法 |
US5148261A (en) * | 1989-08-25 | 1992-09-15 | International Business Machines Corporation | Thermocompression bonding in integrated circuit packaging |
US5242569A (en) * | 1989-08-25 | 1993-09-07 | International Business Machines Corporation | Thermocompression bonding in integrated circuit packaging |
JP2797542B2 (ja) * | 1989-11-06 | 1998-09-17 | ソニー株式会社 | リードフレームの製造方法 |
US5138431A (en) * | 1990-01-31 | 1992-08-11 | Vlsi Technology, Inc. | Lead and socket structures with reduced self-inductance |
JPH0479357A (ja) * | 1990-07-23 | 1992-03-12 | Matsushita Electron Corp | リードフレーム |
JP2970111B2 (ja) * | 1991-09-19 | 1999-11-02 | 日本電気株式会社 | リードフレーム、半導体装置及びその製造方法 |
SE9202823L (sv) * | 1992-09-30 | 1994-03-31 | Volvo Ab | Anordning och förfarande för uppladdning av elfordon |
JP2989406B2 (ja) * | 1993-01-29 | 1999-12-13 | シャープ株式会社 | 半導体装置用プリプレーテッドフレーム及びその製造方法 |
US5360991A (en) * | 1993-07-29 | 1994-11-01 | At&T Bell Laboratories | Integrated circuit devices with solderable lead frame |
JPH07254673A (ja) * | 1994-03-15 | 1995-10-03 | Fujitsu Ltd | リードフレームの製造方法 |
JPH07335804A (ja) * | 1994-06-14 | 1995-12-22 | Dainippon Printing Co Ltd | リードフレーム及びリードフレームの製造方法 |
JPH09232493A (ja) * | 1995-12-20 | 1997-09-05 | Seiichi Serizawa | リードフレーム |
US5735030A (en) * | 1996-06-04 | 1998-04-07 | Texas Instruments Incorporated | Low loop wire bonding |
-
1997
- 1997-06-30 TW TW086109175A patent/TW335526B/zh not_active IP Right Cessation
- 1997-07-09 FR FR9708739A patent/FR2752334B1/fr not_active Expired - Fee Related
- 1997-07-14 CN CN97114610A patent/CN1131562C/zh not_active Expired - Fee Related
- 1997-07-14 US US08/891,804 patent/US5994212A/en not_active Expired - Lifetime
- 1997-07-15 KR KR1019970032730A patent/KR100454198B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW335526B (en) | 1998-07-01 |
KR980012159A (ko) | 1998-04-30 |
CN1131562C (zh) | 2003-12-17 |
FR2752334A1 (fr) | 1998-02-13 |
KR100454198B1 (ko) | 2004-12-17 |
US5994212A (en) | 1999-11-30 |
CN1172350A (zh) | 1998-02-04 |
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