JPS61111553A - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JPS61111553A JPS61111553A JP60212499A JP21249985A JPS61111553A JP S61111553 A JPS61111553 A JP S61111553A JP 60212499 A JP60212499 A JP 60212499A JP 21249985 A JP21249985 A JP 21249985A JP S61111553 A JPS61111553 A JP S61111553A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- thickness
- inner lead
- tab
- lead frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
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Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
め要約のデータは記録されません。
Description
【発明の詳細な説明】
この発明は金めつきを施こしたリードフレーム以下余白
に半導体ペレットをAu−3i共晶合金により接着させ
、後にワイヤーボンディングと樹脂封止や金属封止を行
なった構造に関する。
、後にワイヤーボンディングと樹脂封止や金属封止を行
なった構造に関する。
半導体ペレットをリードフレームに取シ付けるため、従
来では第1図囚のようにタブ部2とインナーリード部3
のAuめつき1の厚さを一様に等しくしたリードフレー
ムに、人u−3i共晶5を用いて第1図■のように半導
体ペレット4をタブ部2に接着している。6はワイヤ、
7はワイヤ圧着部である。
来では第1図囚のようにタブ部2とインナーリード部3
のAuめつき1の厚さを一様に等しくしたリードフレー
ムに、人u−3i共晶5を用いて第1図■のように半導
体ペレット4をタブ部2に接着している。6はワイヤ、
7はワイヤ圧着部である。
ここで間層になるのは、金は高価であるため、出来るだ
け金の使用量を低減することが望まれるのであるが、こ
れに応えてあまシタプの金めつき厚さを薄くするとAu
−3i共晶の濡れ不良を起こし、ペレットクラックを生
じる可能性がある。
け金の使用量を低減することが望まれるのであるが、こ
れに応えてあまシタプの金めつき厚さを薄くするとAu
−3i共晶の濡れ不良を起こし、ペレットクラックを生
じる可能性がある。
しかし、実際には半導体ペレットとリードフレームの導
通をはかる為に金ワイヤーを熱圧着しているが、インナ
ーリードの金めつきが薄くとも第2図から判るように圧
着ハガレ等の間項はない。従って従来では余分な金がイ
ンナーリード部に使われているため、リードフレームが
原価高となっているのが実情である。
通をはかる為に金ワイヤーを熱圧着しているが、インナ
ーリードの金めつきが薄くとも第2図から判るように圧
着ハガレ等の間項はない。従って従来では余分な金がイ
ンナーリード部に使われているため、リードフレームが
原価高となっているのが実情である。
本発明の目的はリードフレームの金めつき量を低減して
、安定なベレットとタブのAu−8i共晶の濡れを得る
と共にワイヤボンデングの熱圧着性を従来と同じレベル
とするリードフレーム焉参牛#を有する半導体装置を提
供するものである。
、安定なベレットとタブのAu−8i共晶の濡れを得る
と共にワイヤボンデングの熱圧着性を従来と同じレベル
とするリードフレーム焉参牛#を有する半導体装置を提
供するものである。
本発明は、半導体ベレットをコバール(又は4270イ
)のリードフレーム上にAu−8i共晶で接着するもの
において、タブ部の金めつき厚さは1.5μm以上を維
持するものの、インナーリードの金めつき厚さを0.3
〜1.0μmに薄くしたことを特徴とするもので、以下
、実施例につい゛て説明する。
)のリードフレーム上にAu−8i共晶で接着するもの
において、タブ部の金めつき厚さは1.5μm以上を維
持するものの、インナーリードの金めつき厚さを0.3
〜1.0μmに薄くしたことを特徴とするもので、以下
、実施例につい゛て説明する。
第3図は本発明の実施例を示すもので第1図囚と異なる
点はリードフレームのタブ2上の金めつきlの厚さが1
.5μm以上であるのに対して、原価低減のためインナ
ーリード部3の金めつき1の厚さを0.3〜1.0μm
と薄くした点でちる。このようにしても、ベレットの濡
れは第1図[F]と同じでAu−3i共晶5の濡れ不良
によるベレットクラックの可能性はない。また、インナ
ーリード部3のA tt線6.圧着部7ノ・ガレに対し
ても、金めつき厚さを0.3〜1.0μmにすることに
より問題は生じない。
点はリードフレームのタブ2上の金めつきlの厚さが1
.5μm以上であるのに対して、原価低減のためインナ
ーリード部3の金めつき1の厚さを0.3〜1.0μm
と薄くした点でちる。このようにしても、ベレットの濡
れは第1図[F]と同じでAu−3i共晶5の濡れ不良
によるベレットクラックの可能性はない。また、インナ
ーリード部3のA tt線6.圧着部7ノ・ガレに対し
ても、金めつき厚さを0.3〜1.0μmにすることに
より問題は生じない。
第4図はタブ2上で人Uめつき1の厚さが異なりベレッ
ト接着部1aのみ入りめっき厚さを1.5μm以上とし
、その他のタブ部1b及びインナーリード部3のめつき
1の厚さを0.3〜1.0μmとした場合である。この
ようにしても第3図と同様に問題は生ぜず、一方金の使
用量を更に低減できる。
ト接着部1aのみ入りめっき厚さを1.5μm以上とし
、その他のタブ部1b及びインナーリード部3のめつき
1の厚さを0.3〜1.0μmとした場合である。この
ようにしても第3図と同様に問題は生ぜず、一方金の使
用量を更に低減できる。
以上のように本発明の構成によυ金めつき使用量の低減
が出来、大巾な ゛ 参用≠央ヰ導体装置の原価低減が可能となるのでちる。
が出来、大巾な ゛ 参用≠央ヰ導体装置の原価低減が可能となるのでちる。
第1図(A)(B)は従来のリードフレームの概略断面
図とベレット接着の概略断面図、第2図はインナーリー
ドめつき厚とAu線の圧着・・ガレの相関図、第3図と
第4図は本発明のリードフレーム構造の概略断面図であ
る。 1・・・金めつき、2・・・リードフレーム(タブ部)
、3・・・リードフレーム(インナーリード部)、4・
・・半導体ペレット、5・・・Au−5i共晶接着層、
6・・・ALli、7・・・インナーリードのAu線圧
着部。 ソ 1 図 りυ
図とベレット接着の概略断面図、第2図はインナーリー
ドめつき厚とAu線の圧着・・ガレの相関図、第3図と
第4図は本発明のリードフレーム構造の概略断面図であ
る。 1・・・金めつき、2・・・リードフレーム(タブ部)
、3・・・リードフレーム(インナーリード部)、4・
・・半導体ペレット、5・・・Au−5i共晶接着層、
6・・・ALli、7・・・インナーリードのAu線圧
着部。 ソ 1 図 りυ
Claims (1)
- 1、インナーリード部の金めっき厚さをタブの金めっき
厚さよりも薄くしたリードフレームを有し、このリード
フレームのタブ上には半導体ペレットをボンディングす
る一方、インナーリード部にはワイヤをボンディングし
たことを特徴とする半導体装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60212499A JPS61111553A (ja) | 1985-09-27 | 1985-09-27 | 半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60212499A JPS61111553A (ja) | 1985-09-27 | 1985-09-27 | 半導体装置 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13516579A Division JPS5660043A (en) | 1979-10-22 | 1979-10-22 | Lead frame and semiconductor device having the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61111553A true JPS61111553A (ja) | 1986-05-29 |
Family
ID=16623673
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60212499A Pending JPS61111553A (ja) | 1985-09-27 | 1985-09-27 | 半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61111553A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2752334A1 (fr) * | 1996-07-15 | 1998-02-13 | Matsushita Electronics Corp | Dispositif a semiconducteurs muni d'un cadre de montage et son procede de fabrication |
CN103887183A (zh) * | 2012-12-21 | 2014-06-25 | 华为技术有限公司 | 金/硅共晶芯片焊接方法及晶体管 |
CN104319242A (zh) * | 2014-10-27 | 2015-01-28 | 中国兵器工业集团第二一四研究所苏州研发中心 | 厚膜基板无焊料共晶贴装方法 |
-
1985
- 1985-09-27 JP JP60212499A patent/JPS61111553A/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2752334A1 (fr) * | 1996-07-15 | 1998-02-13 | Matsushita Electronics Corp | Dispositif a semiconducteurs muni d'un cadre de montage et son procede de fabrication |
CN103887183A (zh) * | 2012-12-21 | 2014-06-25 | 华为技术有限公司 | 金/硅共晶芯片焊接方法及晶体管 |
WO2014094436A1 (zh) * | 2012-12-21 | 2014-06-26 | 华为技术有限公司 | 金/硅共晶芯片焊接方法及晶体管 |
CN104319242A (zh) * | 2014-10-27 | 2015-01-28 | 中国兵器工业集团第二一四研究所苏州研发中心 | 厚膜基板无焊料共晶贴装方法 |
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