FR2440568A1 - Masque de photogravure et procede d'obtention dudit masque - Google Patents
Masque de photogravure et procede d'obtention dudit masqueInfo
- Publication number
- FR2440568A1 FR2440568A1 FR7924060A FR7924060A FR2440568A1 FR 2440568 A1 FR2440568 A1 FR 2440568A1 FR 7924060 A FR7924060 A FR 7924060A FR 7924060 A FR7924060 A FR 7924060A FR 2440568 A1 FR2440568 A1 FR 2440568A1
- Authority
- FR
- France
- Prior art keywords
- photo
- life
- reduced
- boron
- template
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SU782675175A SU938338A1 (ru) | 1978-10-30 | 1978-10-30 | Фотошаблон и способ его изготовлени |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2440568A1 true FR2440568A1 (fr) | 1980-05-30 |
Family
ID=20789759
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7924060A Pending FR2440568A1 (fr) | 1978-10-30 | 1979-09-27 | Masque de photogravure et procede d'obtention dudit masque |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS5560946A (de) |
CS (1) | CS215215B1 (de) |
DD (1) | DD148177A3 (de) |
DE (1) | DE2930416C2 (de) |
FR (1) | FR2440568A1 (de) |
SU (1) | SU938338A1 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2585205A1 (fr) * | 1985-07-19 | 1987-01-23 | Philips Nv | Montage de circuit pour un recepteur de television comportant un amplificateur de signal video fi reglable |
EP0706088A1 (de) * | 1990-05-09 | 1996-04-10 | Canon Kabushiki Kaisha | Fotomaske zum Ätzen von Mustern |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19721524A1 (de) * | 1997-05-22 | 1998-11-26 | Hsm Gmbh | Verfahren zur Herstellung eines Prägezylinders |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3622319A (en) * | 1966-10-20 | 1971-11-23 | Western Electric Co | Nonreflecting photomasks and methods of making same |
-
1978
- 1978-10-30 SU SU782675175A patent/SU938338A1/ru active
-
1979
- 1979-07-26 DE DE19792930416 patent/DE2930416C2/de not_active Expired
- 1979-08-21 JP JP10562179A patent/JPS5560946A/ja active Pending
- 1979-09-27 FR FR7924060A patent/FR2440568A1/fr active Pending
- 1979-10-18 CS CS708579A patent/CS215215B1/cs unknown
- 1979-10-26 DD DD21649479A patent/DD148177A3/de not_active IP Right Cessation
Non-Patent Citations (3)
Title |
---|
ABJP/77 * |
EXBK/70 * |
EXBK/72 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2585205A1 (fr) * | 1985-07-19 | 1987-01-23 | Philips Nv | Montage de circuit pour un recepteur de television comportant un amplificateur de signal video fi reglable |
EP0706088A1 (de) * | 1990-05-09 | 1996-04-10 | Canon Kabushiki Kaisha | Fotomaske zum Ätzen von Mustern |
Also Published As
Publication number | Publication date |
---|---|
JPS5560946A (en) | 1980-05-08 |
SU938338A1 (ru) | 1982-06-23 |
DD148177A3 (de) | 1981-05-13 |
CS215215B1 (en) | 1982-08-27 |
DE2930416C2 (de) | 1982-05-13 |
DE2930416A1 (de) | 1980-05-14 |
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