JPS5560946A - Photomask structure and method of making same - Google Patents

Photomask structure and method of making same

Info

Publication number
JPS5560946A
JPS5560946A JP10562179A JP10562179A JPS5560946A JP S5560946 A JPS5560946 A JP S5560946A JP 10562179 A JP10562179 A JP 10562179A JP 10562179 A JP10562179 A JP 10562179A JP S5560946 A JPS5560946 A JP S5560946A
Authority
JP
Japan
Prior art keywords
making same
photomask structure
photomask
making
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10562179A
Other languages
Japanese (ja)
Inventor
Makishimobuna Gunina Nina
Ibuanobuichi Poyarikofu Igooru
Buikutorobuna Rog Rejiyudemira
Buashiriebuichi Sutep Buarerii
Andoreebuichi Rab Konsutanchin
Mihairobuichi Chieru Anatorii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TSCHERNIKOV ANATOLI M
Original Assignee
TSCHERNIKOV ANATOLI M
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TSCHERNIKOV ANATOLI M filed Critical TSCHERNIKOV ANATOLI M
Publication of JPS5560946A publication Critical patent/JPS5560946A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Glass Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10562179A 1978-10-30 1979-08-21 Photomask structure and method of making same Pending JPS5560946A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU782675175A SU938338A1 (en) 1978-10-30 1978-10-30 Mask and method of manufacturing thereof

Publications (1)

Publication Number Publication Date
JPS5560946A true JPS5560946A (en) 1980-05-08

Family

ID=20789759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10562179A Pending JPS5560946A (en) 1978-10-30 1979-08-21 Photomask structure and method of making same

Country Status (6)

Country Link
JP (1) JPS5560946A (en)
CS (1) CS215215B1 (en)
DD (1) DD148177A3 (en)
DE (1) DE2930416C2 (en)
FR (1) FR2440568A1 (en)
SU (1) SU938338A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3525800A1 (en) * 1985-07-19 1987-01-22 Philips Patentverwaltung Circuit arrangement for a television receiver with a controllable intermediate-frequency video signal amplifier
EP0714119B1 (en) * 1990-05-09 2002-12-04 Canon Kabushiki Kaisha Pattern forming process and process for preparing semiconductor device utilizing said pattern forming process
DE19721524A1 (en) * 1997-05-22 1998-11-26 Hsm Gmbh Method of making an embossing cylinder

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3622319A (en) * 1966-10-20 1971-11-23 Western Electric Co Nonreflecting photomasks and methods of making same

Also Published As

Publication number Publication date
CS215215B1 (en) 1982-08-27
FR2440568A1 (en) 1980-05-30
DE2930416C2 (en) 1982-05-13
DD148177A3 (en) 1981-05-13
SU938338A1 (en) 1982-06-23
DE2930416A1 (en) 1980-05-14

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