CS215215B1 - Photoelectric master form and method of producing the same - Google Patents
Photoelectric master form and method of producing the same Download PDFInfo
- Publication number
- CS215215B1 CS215215B1 CS708579A CS708579A CS215215B1 CS 215215 B1 CS215215 B1 CS 215215B1 CS 708579 A CS708579 A CS 708579A CS 708579 A CS708579 A CS 708579A CS 215215 B1 CS215215 B1 CS 215215B1
- Authority
- CS
- Czechoslovakia
- Prior art keywords
- photoelectric
- layer
- producing
- coating
- masking
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SU782675175A SU938338A1 (ru) | 1978-10-30 | 1978-10-30 | Фотошаблон и способ его изготовлени |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CS215215B1 true CS215215B1 (en) | 1982-08-27 |
Family
ID=20789759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS708579A CS215215B1 (en) | 1978-10-30 | 1979-10-18 | Photoelectric master form and method of producing the same |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5560946A (de) |
| CS (1) | CS215215B1 (de) |
| DD (1) | DD148177A3 (de) |
| DE (1) | DE2930416C2 (de) |
| FR (1) | FR2440568A1 (de) |
| SU (1) | SU938338A1 (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3525800A1 (de) * | 1985-07-19 | 1987-01-22 | Philips Patentverwaltung | Schaltungsanordnung fuer einen fernsehempfaenger mit einem regelbaren zf-videosignalverstaerker |
| EP0706088A1 (de) * | 1990-05-09 | 1996-04-10 | Canon Kabushiki Kaisha | Fotomaske zum Ätzen von Mustern |
| DE19721524A1 (de) * | 1997-05-22 | 1998-11-26 | Hsm Gmbh | Verfahren zur Herstellung eines Prägezylinders |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3622319A (en) * | 1966-10-20 | 1971-11-23 | Western Electric Co | Nonreflecting photomasks and methods of making same |
-
1978
- 1978-10-30 SU SU782675175A patent/SU938338A1/ru active
-
1979
- 1979-07-26 DE DE19792930416 patent/DE2930416C2/de not_active Expired
- 1979-08-21 JP JP10562179A patent/JPS5560946A/ja active Pending
- 1979-09-27 FR FR7924060A patent/FR2440568A1/fr active Pending
- 1979-10-18 CS CS708579A patent/CS215215B1/cs unknown
- 1979-10-26 DD DD21649479A patent/DD148177A3/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5560946A (en) | 1980-05-08 |
| SU938338A1 (ru) | 1982-06-23 |
| FR2440568A1 (fr) | 1980-05-30 |
| DD148177A3 (de) | 1981-05-13 |
| DE2930416C2 (de) | 1982-05-13 |
| DE2930416A1 (de) | 1980-05-14 |
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