UST954002I4 - Process for increasing mask life - Google Patents

Process for increasing mask life Download PDF

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Publication number
UST954002I4
UST954002I4 US05/659,177 US65917776A UST954002I4 US T954002 I4 UST954002 I4 US T954002I4 US 65917776 A US65917776 A US 65917776A US T954002 I4 UST954002 I4 US T954002I4
Authority
US
United States
Prior art keywords
photomask
chrome
thin film
approximately
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
US05/659,177
Inventor
Paul P. Castrucci
Robert H. Collins
Frank T. Deverse
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Priority to US05/659,177 priority Critical patent/UST954002I4/en
Application granted granted Critical
Publication of UST954002I4 publication Critical patent/UST954002I4/en
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Abstract

a method for semiconductor device manufacture comprising the steps of, (a) repetitively aligning photomasks over a surface of a semiconductor substrate, said substrate having a layer of opaque material on said surface, said opaque material being adapted to receive and retain a photographic pattern; and (b) at least one of said steps employing a photomask of a particular construction, said particularly constructed photomask being placed in physical contact with said opaque material, said particularly constructed photomask essentially consisting of a planar glass substrate having a thickness of approximately 0.25 inches, one surface of said glass substrate having a thin film of chrome thereon, said thin film of chrome having a thickness of approximately 0.1 microns, said thin film of chrome having a photographic pattern formed therein, a layer of SiO2 fully covering said thin film of chrome and said surface of said glass substrate, said SiO2 layer having a thickness of approximately 3,000 angstroms, whereby the useful life of said particularly constructed photomask is materially extended and said method for semiconductor device manufacture is rendered less costly and more efficient.
US05/659,177 1974-01-24 1976-02-17 Process for increasing mask life Pending UST954002I4 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US05/659,177 UST954002I4 (en) 1974-01-24 1976-02-17 Process for increasing mask life

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43632074A 1974-01-24 1974-01-24
US05/659,177 UST954002I4 (en) 1974-01-24 1976-02-17 Process for increasing mask life

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US43632074A Continuation 1974-01-24 1974-01-24

Publications (1)

Publication Number Publication Date
UST954002I4 true UST954002I4 (en) 1977-01-04

Family

ID=27030912

Family Applications (1)

Application Number Title Priority Date Filing Date
US05/659,177 Pending UST954002I4 (en) 1974-01-24 1976-02-17 Process for increasing mask life

Country Status (1)

Country Link
US (1) UST954002I4 (en)

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