JPS5645064A - Under coating film structure of thin film hybrid circuit - Google Patents
Under coating film structure of thin film hybrid circuitInfo
- Publication number
- JPS5645064A JPS5645064A JP12066879A JP12066879A JPS5645064A JP S5645064 A JPS5645064 A JP S5645064A JP 12066879 A JP12066879 A JP 12066879A JP 12066879 A JP12066879 A JP 12066879A JP S5645064 A JPS5645064 A JP S5645064A
- Authority
- JP
- Japan
- Prior art keywords
- film
- layer
- under coating
- exposure
- photoetching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/01—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate comprising only passive thin-film or thick-film elements formed on a common insulating substrate
- H01L27/016—Thin-film circuits
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Non-Adjustable Resistors (AREA)
Abstract
PURPOSE:To permit a fine process by providing a Cr layer between a Ta thermal oxide film and a glazed layer wherein the internal exposure of a resist film causing during a photoetching process is prevented. CONSTITUTION:An under coating Ta2O3 film 23 is stacked on a glazed layer 9 containing comparatively much PbO formed on a thin plate hybrid circuit substrate 10 through a Cr layer 16. The Cr has strong adhesion with glass or alumina and will form a film having big internal deformation without exfoliation. Furthermore, the Cr reflects the light of the wave length region of photoetching exposure. Therefore, excessive exposure will be prevented. With photoetching applied by using an under coating film composing of the above structure, the inside of an upper layer resist film will not be exposed by diffused reflection and by the exfoliation between the under coating film 23 and the glazed layer. Therefore, a fine process will be permitted and exposure hours will also be reduced.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12066879A JPS5645064A (en) | 1979-09-21 | 1979-09-21 | Under coating film structure of thin film hybrid circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12066879A JPS5645064A (en) | 1979-09-21 | 1979-09-21 | Under coating film structure of thin film hybrid circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5645064A true JPS5645064A (en) | 1981-04-24 |
Family
ID=14791952
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12066879A Pending JPS5645064A (en) | 1979-09-21 | 1979-09-21 | Under coating film structure of thin film hybrid circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5645064A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0191852U (en) * | 1987-12-07 | 1989-06-16 |
-
1979
- 1979-09-21 JP JP12066879A patent/JPS5645064A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0191852U (en) * | 1987-12-07 | 1989-06-16 | ||
JPH0548031Y2 (en) * | 1987-12-07 | 1993-12-20 |
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