FR2389155A1 - Matiere a copier sensible aux rayonnements - Google Patents
Matiere a copier sensible aux rayonnementsInfo
- Publication number
- FR2389155A1 FR2389155A1 FR7812009A FR7812009A FR2389155A1 FR 2389155 A1 FR2389155 A1 FR 2389155A1 FR 7812009 A FR7812009 A FR 7812009A FR 7812009 A FR7812009 A FR 7812009A FR 2389155 A1 FR2389155 A1 FR 2389155A1
- Authority
- FR
- France
- Prior art keywords
- radiation sensitive
- compound
- action
- copy material
- relates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Holo Graphy (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
L'invention est relative à une matière à copier sensible aux rayonnements, contenant : a. un composé qui libère un acide sous l'action d'un rayonnement actinique, et b. un composé organique polymère à groupes acétal récurrents dans la chaîne principale, dont la solubilité dans un révélateur liquide est accrue par l'action d'un acide, caractérisée en ce que dans le composé polymère, les atomes de carbone terminaux des alcools formant les groupes acétal sont de nature aliphatique. Elle a également pour objet un procédé pour l'obtention d'images en relief.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2718254A DE2718254C3 (de) | 1977-04-25 | 1977-04-25 | Strahlungsempfindliche Kopiermasse |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2389155A1 true FR2389155A1 (fr) | 1978-11-24 |
FR2389155B1 FR2389155B1 (fr) | 1982-02-26 |
Family
ID=6007159
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7812009A Granted FR2389155A1 (fr) | 1977-04-25 | 1978-04-24 | Matiere a copier sensible aux rayonnements |
Country Status (16)
Country | Link |
---|---|
US (1) | US4247611A (fr) |
JP (1) | JPS53133429A (fr) |
AU (1) | AU525946B2 (fr) |
BE (1) | BE866305A (fr) |
BR (1) | BR7802527A (fr) |
CA (1) | CA1128804A (fr) |
CH (1) | CH635448A5 (fr) |
DE (1) | DE2718254C3 (fr) |
DK (1) | DK176778A (fr) |
FR (1) | FR2389155A1 (fr) |
GB (1) | GB1602902A (fr) |
IE (1) | IE46621B1 (fr) |
IT (1) | IT1102623B (fr) |
NL (1) | NL7804303A (fr) |
SE (1) | SE444232B (fr) |
ZA (1) | ZA782331B (fr) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0150315A2 (fr) * | 1984-01-30 | 1985-08-07 | International Business Machines Corporation | Façonnage par acylation des photoréserves positives à base de novolak/quinonediazide |
EP0251059A2 (fr) * | 1986-06-26 | 1988-01-07 | Hoechst Aktiengesellschaft | Matériel pour l'enregistrement photosensible |
EP0312751A2 (fr) * | 1987-09-13 | 1989-04-26 | Hoechst Aktiengesellschaft | Composition sensible aux rayonnements à effet positif et matériel d'enregistrement sensible aux rayonnements produit de cette composition |
EP0315080A2 (fr) * | 1987-11-06 | 1989-05-10 | Hoechst Aktiengesellschaft | Compositions photosensible |
EP0315748A2 (fr) * | 1987-09-13 | 1989-05-17 | Hoechst Aktiengesellschaft | Composistion sensible aux rayonnements à effet positif et matériel d'enregistrement sensible aux rayonnements produit de cette composition |
EP0330406A2 (fr) * | 1988-02-22 | 1989-08-30 | Japan Synthetic Rubber Co., Ltd. | Composition de résine sensible au rayonnement |
EP0387623A2 (fr) * | 1989-03-11 | 1990-09-19 | Hoechst Aktiengesellschaft | Mélange positif photosensible et matériau photosensible pour l'enregistrement des radiations de haute énergie |
EP0388677A2 (fr) * | 1989-03-11 | 1990-09-26 | Hoechst Aktiengesellschaft | Composition photodurcissable et matériau d'enregistrement photosensible à base de cette composition pour rayonnements de haute énergie |
EP0404206A2 (fr) * | 1982-08-23 | 1990-12-27 | International Business Machines Corporation | Composition photoréserve |
EP0432599A2 (fr) * | 1989-12-12 | 1991-06-19 | BASF Aktiengesellschaft | Composition photosensible et procédé pour la fabrication de structures en relief |
Families Citing this family (102)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2829511A1 (de) * | 1978-07-05 | 1980-01-24 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
DE2928636A1 (de) * | 1979-07-16 | 1981-02-12 | Hoechst Ag | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
US4356252A (en) * | 1979-12-26 | 1982-10-26 | E. I. Du Pont De Nemours And Company | Photosensitive negative-working tonable element |
US4294909A (en) | 1979-12-26 | 1981-10-13 | E. I. Du Pont De Nemours And Company | Photosensitive negative-working toning process |
DE3023201A1 (de) * | 1980-06-21 | 1982-01-07 | Hoechst Ag, 6000 Frankfurt | Positiv arbeitendes strahlungsempfindliches gemisch |
DE3038605A1 (de) * | 1980-10-13 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Verfahren zur herstellung von reliefkopien |
DE3039926A1 (de) * | 1980-10-23 | 1982-05-27 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial |
DE3107109A1 (de) * | 1981-02-26 | 1982-09-09 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial |
US4366224A (en) * | 1981-08-06 | 1982-12-28 | American Hoechst Corporation | Inorganic lithium developer composition |
US4365019A (en) * | 1981-08-06 | 1982-12-21 | Eastman Kodak Company | Positive-working resist quinone diazide containing composition and imaging method having improved development rates |
DE3144480A1 (de) * | 1981-11-09 | 1983-05-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial |
DE3144499A1 (de) * | 1981-11-09 | 1983-05-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial |
DE3151078A1 (de) * | 1981-12-23 | 1983-07-28 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung von reliefbildern |
JPS58219547A (ja) * | 1982-06-16 | 1983-12-21 | Hitachi Ltd | ポジ形放射線感応性有機高分子材料 |
JPS58219736A (ja) * | 1982-06-16 | 1983-12-21 | Hitachi Ltd | パターン形成方法 |
DE3236560A1 (de) | 1982-10-02 | 1984-04-05 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches schichtuebertragungsmaterial und verfahren zur herstellung einer photoresistschablone |
DE3323343A1 (de) * | 1983-06-29 | 1985-01-10 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial |
JPS6010250A (ja) * | 1983-06-30 | 1985-01-19 | Fujitsu Ltd | パタ−ン形成方法 |
GB8333901D0 (en) * | 1983-12-20 | 1984-02-01 | Minnesota Mining & Mfg | Radiationsensitive compositions |
DE3406927A1 (de) * | 1984-02-25 | 1985-08-29 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen |
GB8413395D0 (en) * | 1984-05-25 | 1984-07-04 | Ciba Geigy Ag | Production of images |
EP0164083B1 (fr) * | 1984-06-07 | 1991-05-02 | Hoechst Aktiengesellschaft | Solution de revêtement photosensible positive |
US4708925A (en) * | 1984-12-11 | 1987-11-24 | Minnesota Mining And Manufacturing Company | Photosolubilizable compositions containing novolac phenolic resin |
DE3445276A1 (de) * | 1984-12-12 | 1986-06-19 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform |
US4634659A (en) * | 1984-12-19 | 1987-01-06 | Lehigh University | Processing-free planographic printing plate |
US4737426A (en) * | 1985-05-15 | 1988-04-12 | Ciba-Geigy Corporation | Cyclic acetals or ketals of beta-keto esters or amides |
US4663269A (en) * | 1985-08-07 | 1987-05-05 | Polytechnic Institute Of New York | Method of forming highly sensitive photoresist film in the absence of water |
JPS62124557A (ja) * | 1985-11-25 | 1987-06-05 | Konishiroku Photo Ind Co Ltd | 感光性組成物及び感光性平版印刷版材料 |
CA1307695C (fr) * | 1986-01-13 | 1992-09-22 | Wayne Edmund Feely | Substances photosensibles et images negatives thermiquement stables et developpables en solution aqueuse |
CA1308596C (fr) * | 1986-01-13 | 1992-10-13 | Rohm And Haas Company | Structure microplastique et methode de fabrication correspondante |
US4897336A (en) * | 1986-04-11 | 1990-01-30 | Chien James C W | Self-developing radiation sensitive resist with amorphous polymer having haloalkyl substitution derived from cycic ether |
DE3628720A1 (de) * | 1986-08-23 | 1988-02-25 | Hoechst Ag | Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck |
DE3635303A1 (de) | 1986-10-17 | 1988-04-28 | Hoechst Ag | Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten |
JPH0654382B2 (ja) * | 1986-11-18 | 1994-07-20 | 富士写真フイルム株式会社 | 感光性組成物 |
JPS63265242A (ja) * | 1987-04-23 | 1988-11-01 | Fuji Photo Film Co Ltd | 多色画像形成方法 |
DE3725741A1 (de) * | 1987-08-04 | 1989-02-16 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch |
DE3725949A1 (de) * | 1987-08-05 | 1989-02-16 | Hoechst Ag | Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von negativen reliefkopien |
DE3730783A1 (de) * | 1987-09-13 | 1989-03-23 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3821585A1 (de) * | 1987-09-13 | 1989-03-23 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung |
DE3810631A1 (de) * | 1988-03-29 | 1989-10-12 | Hoechst Ag | Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial mit hohem waermestand |
EP0347381B1 (fr) * | 1988-06-13 | 1992-02-12 | Ciba-Geigy Ag | Béta-cétoester-acétals et leurs applications |
DE3820699A1 (de) * | 1988-06-18 | 1989-12-21 | Hoechst Ag | Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3821584A1 (de) * | 1988-06-25 | 1989-12-28 | Hoechst Ag | Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichungsmaterial fuer hochenergetische strahlung |
DE3827901A1 (de) * | 1988-08-17 | 1990-02-22 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE69029104T2 (de) | 1989-07-12 | 1997-03-20 | Fuji Photo Film Co Ltd | Polysiloxane und positiv arbeitende Resistmasse |
DE3930086A1 (de) * | 1989-09-09 | 1991-03-21 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3930087A1 (de) * | 1989-09-09 | 1991-03-14 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE4002397A1 (de) * | 1990-01-27 | 1991-08-01 | Hoechst Ag | Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE4003025A1 (de) * | 1990-02-02 | 1991-08-08 | Hoechst Ag | Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen |
JPH0480758A (ja) * | 1990-07-23 | 1992-03-13 | Fuji Photo Film Co Ltd | 感光性組成物 |
EP0502819A1 (fr) * | 1991-03-01 | 1992-09-09 | Ciba-Geigy Ag | Copolymères durcissables par des acides |
EP0501919A1 (fr) * | 1991-03-01 | 1992-09-02 | Ciba-Geigy Ag | Compositions sensibles aux radiations à base de polyphenols et acétals |
DE4112970A1 (de) * | 1991-04-20 | 1992-10-22 | Hoechst Ag | Saeurespaltbare strahlungsempfindliche verbindungen, diese enthaltendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE4112969A1 (de) * | 1991-04-20 | 1992-10-22 | Hoechst Ag | Saeurespaltbare strahlungsempflindliche verbindungen, diese enthaltendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE4112968A1 (de) * | 1991-04-20 | 1992-10-22 | Hoechst Ag | Saeurespaltbare verbindungen, diese enthaltendes positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
EP0536690B1 (fr) * | 1991-10-07 | 1998-09-09 | Fuji Photo Film Co., Ltd. | Composition photosensible |
JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
US5353705A (en) * | 1992-07-20 | 1994-10-11 | Presstek, Inc. | Lithographic printing members having secondary ablation layers for use with laser-discharge imaging apparatus |
AU674518B2 (en) * | 1992-07-20 | 1997-01-02 | Presstek, Inc. | Lithographic printing plates for use with laser-discharge imaging apparatus |
US5351617A (en) * | 1992-07-20 | 1994-10-04 | Presstek, Inc. | Method for laser-discharge imaging a printing plate |
USRE35512F1 (en) * | 1992-07-20 | 1998-08-04 | Presstek Inc | Lithographic printing members for use with laser-discharge imaging |
US5339737B1 (en) * | 1992-07-20 | 1997-06-10 | Presstek Inc | Lithographic printing plates for use with laser-discharge imaging apparatus |
US5379698A (en) * | 1992-07-20 | 1995-01-10 | Presstek, Inc. | Lithographic printing members for use with laser-discharge imaging |
DE4242050A1 (de) * | 1992-12-14 | 1994-06-16 | Hoechst Ag | Polymere mit N,N-disubstituierten Sulfonamid-Seitengruppen und deren Verwendung |
DE4242051A1 (de) * | 1992-12-14 | 1994-06-16 | Hoechst Ag | N,N-Disubstituierte Sulfonamide und damit hergestelltes strahlungsempfindliches Gemisch |
JPH06230574A (ja) * | 1993-02-05 | 1994-08-19 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
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GB9326150D0 (en) * | 1993-12-22 | 1994-02-23 | Alcan Int Ltd | Electrochemical roughening method |
DE4414896A1 (de) * | 1994-04-28 | 1995-11-02 | Hoechst Ag | Positiv arbeitendes strahlungempfindliches Gemisch |
DE4414897A1 (de) * | 1994-04-28 | 1995-11-02 | Hoechst Ag | Aromatische Diazoniumsalze und deren Verwendung in strahlungsempfindlichen Gemischen |
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JPH0876380A (ja) | 1994-09-06 | 1996-03-22 | Fuji Photo Film Co Ltd | ポジ型印刷版組成物 |
DE4444669A1 (de) * | 1994-12-15 | 1996-06-20 | Hoechst Ag | Strahlungsempfindliches Gemisch |
JPH0954437A (ja) | 1995-06-05 | 1997-02-25 | Fuji Photo Film Co Ltd | 化学増幅型ポジレジスト組成物 |
JP3506817B2 (ja) * | 1995-07-26 | 2004-03-15 | クラリアント インターナショナル リミテッド | 放射線感応性組成物 |
TW466256B (en) | 1995-11-24 | 2001-12-01 | Ciba Sc Holding Ag | Borate photoinitiator compounds and compositions comprising the same |
JP3591672B2 (ja) | 1996-02-05 | 2004-11-24 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
US6060222A (en) * | 1996-11-19 | 2000-05-09 | Kodak Polcyhrome Graphics Llc | 1Postitve-working imaging composition and element and method of forming positive image with a laser |
JP3858374B2 (ja) * | 1997-09-18 | 2006-12-13 | コニカミノルタホールディングス株式会社 | 感光性組成物及び画像形成材料 |
US6174646B1 (en) * | 1997-10-21 | 2001-01-16 | Konica Corporation | Image forming method |
GB2335283B (en) | 1998-03-13 | 2002-05-08 | Horsell Graphic Ind Ltd | Improvements in relation to pattern-forming methods |
EP1031878A1 (fr) * | 1999-02-23 | 2000-08-30 | Shipley Company LLC | Nouveaux polymères et compositions pour photoréserves les comprenant |
JP3969909B2 (ja) | 1999-09-27 | 2007-09-05 | 富士フイルム株式会社 | ポジ型フォトレジスト組成物 |
JP3963624B2 (ja) | 1999-12-22 | 2007-08-22 | 富士フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
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- 1978-04-21 SE SE7804587A patent/SE444232B/sv not_active IP Right Cessation
- 1978-04-21 IE IE787/78A patent/IE46621B1/en unknown
- 1978-04-21 IT IT49011/78A patent/IT1102623B/it active
- 1978-04-21 CA CA301,725A patent/CA1128804A/fr not_active Expired
- 1978-04-21 AU AU35356/78A patent/AU525946B2/en not_active Expired
- 1978-04-21 NL NL7804303A patent/NL7804303A/xx not_active Application Discontinuation
- 1978-04-24 BE BE187054A patent/BE866305A/fr not_active IP Right Cessation
- 1978-04-24 CH CH441978A patent/CH635448A5/de not_active IP Right Cessation
- 1978-04-24 DK DK176778A patent/DK176778A/da not_active Application Discontinuation
- 1978-04-24 FR FR7812009A patent/FR2389155A1/fr active Granted
- 1978-04-24 JP JP4919678A patent/JPS53133429A/ja active Granted
- 1978-04-24 ZA ZA00782331A patent/ZA782331B/xx unknown
- 1978-04-24 BR BR7802527A patent/BR7802527A/pt unknown
- 1978-04-24 GB GB16074/78A patent/GB1602902A/en not_active Expired
- 1978-04-24 US US05/899,271 patent/US4247611A/en not_active Expired - Lifetime
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FR2305757A1 (fr) * | 1975-03-27 | 1976-10-22 | Hoechst Ag | Matiere a copier sensible aux radiations |
Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0404206A3 (fr) * | 1982-08-23 | 1991-02-27 | International Business Machines Corporation | Composition photoréserve |
EP0404206A2 (fr) * | 1982-08-23 | 1990-12-27 | International Business Machines Corporation | Composition photoréserve |
EP0150315A3 (fr) * | 1984-01-30 | 1987-04-29 | International Business Machines Corporation | Façonnage par acylation des photoréserves positives à base de novolak/quinonediazide |
EP0150315A2 (fr) * | 1984-01-30 | 1985-08-07 | International Business Machines Corporation | Façonnage par acylation des photoréserves positives à base de novolak/quinonediazide |
EP0251059A3 (en) * | 1986-06-26 | 1989-06-07 | Hoechst Aktiengesellschaft | Photosensitive registration material |
EP0251059A2 (fr) * | 1986-06-26 | 1988-01-07 | Hoechst Aktiengesellschaft | Matériel pour l'enregistrement photosensible |
EP0315748A2 (fr) * | 1987-09-13 | 1989-05-17 | Hoechst Aktiengesellschaft | Composistion sensible aux rayonnements à effet positif et matériel d'enregistrement sensible aux rayonnements produit de cette composition |
EP0312751A2 (fr) * | 1987-09-13 | 1989-04-26 | Hoechst Aktiengesellschaft | Composition sensible aux rayonnements à effet positif et matériel d'enregistrement sensible aux rayonnements produit de cette composition |
EP0312751A3 (fr) * | 1987-09-13 | 1991-07-31 | Hoechst Aktiengesellschaft | Composition sensible aux rayonnements à effet positif et matériel d'enregistrement sensible aux rayonnements produit de cette composition |
EP0315748A3 (fr) * | 1987-09-13 | 1991-07-31 | Hoechst Aktiengesellschaft | Composistion sensible aux rayonnements à effet positif et matériel d'enregistrement sensible aux rayonnements produit de cette composition |
EP0315080A2 (fr) * | 1987-11-06 | 1989-05-10 | Hoechst Aktiengesellschaft | Compositions photosensible |
EP0315080A3 (fr) * | 1987-11-06 | 1991-05-08 | Hoechst Aktiengesellschaft | Compositions photosensible |
EP0330406A2 (fr) * | 1988-02-22 | 1989-08-30 | Japan Synthetic Rubber Co., Ltd. | Composition de résine sensible au rayonnement |
EP0330406A3 (fr) * | 1988-02-22 | 1992-03-18 | Japan Synthetic Rubber Co., Ltd. | Composition de résine sensible au rayonnement |
EP0387623A3 (fr) * | 1989-03-11 | 1991-07-24 | Hoechst Aktiengesellschaft | Mélange positif photosensible et matériau photosensible pour l'enregistrement des radiations de haute énergie |
EP0388677A3 (fr) * | 1989-03-11 | 1991-07-31 | Hoechst Aktiengesellschaft | Composition photodurcissable et matériau d'enregistrement photosensible à base de cette composition pour rayonnements de haute énergie |
EP0388677A2 (fr) * | 1989-03-11 | 1990-09-26 | Hoechst Aktiengesellschaft | Composition photodurcissable et matériau d'enregistrement photosensible à base de cette composition pour rayonnements de haute énergie |
EP0387623A2 (fr) * | 1989-03-11 | 1990-09-19 | Hoechst Aktiengesellschaft | Mélange positif photosensible et matériau photosensible pour l'enregistrement des radiations de haute énergie |
EP0432599A2 (fr) * | 1989-12-12 | 1991-06-19 | BASF Aktiengesellschaft | Composition photosensible et procédé pour la fabrication de structures en relief |
EP0432599B1 (fr) * | 1989-12-12 | 1997-03-19 | BASF Aktiengesellschaft | Composition photosensible et procédé pour la fabrication de structures en relief |
Also Published As
Publication number | Publication date |
---|---|
DE2718254A1 (de) | 1978-11-02 |
JPS53133429A (en) | 1978-11-21 |
SE444232B (sv) | 1986-03-24 |
CA1128804A (fr) | 1982-08-03 |
DE2718254C3 (de) | 1980-04-10 |
FR2389155B1 (fr) | 1982-02-26 |
DE2718254B2 (de) | 1979-08-02 |
GB1602902A (en) | 1981-11-18 |
BR7802527A (pt) | 1978-12-12 |
US4247611A (en) | 1981-01-27 |
DK176778A (da) | 1978-10-26 |
JPS6239420B2 (fr) | 1987-08-22 |
NL7804303A (nl) | 1978-10-27 |
AU3535678A (en) | 1979-10-25 |
ZA782331B (en) | 1979-04-25 |
IE780787L (en) | 1978-10-25 |
BE866305A (fr) | 1978-10-24 |
IT7849011A0 (it) | 1978-04-21 |
IT1102623B (it) | 1985-10-07 |
SE7804587L (sv) | 1978-10-26 |
AU525946B2 (en) | 1982-12-09 |
CH635448A5 (de) | 1983-03-31 |
IE46621B1 (en) | 1983-08-10 |
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