BR7802527A - Massa copiadora sensivel a radiacao e processo para a producao de imagens em relevo - Google Patents

Massa copiadora sensivel a radiacao e processo para a producao de imagens em relevo

Info

Publication number
BR7802527A
BR7802527A BR7802527A BR7802527A BR7802527A BR 7802527 A BR7802527 A BR 7802527A BR 7802527 A BR7802527 A BR 7802527A BR 7802527 A BR7802527 A BR 7802527A BR 7802527 A BR7802527 A BR 7802527A
Authority
BR
Brazil
Prior art keywords
embroidered
radiation
images
mass
production
Prior art date
Application number
BR7802527A
Other languages
English (en)
Inventor
J Sander
G Buhr
H Ruckert
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR7802527A publication Critical patent/BR7802527A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
BR7802527A 1977-04-25 1978-04-24 Massa copiadora sensivel a radiacao e processo para a producao de imagens em relevo BR7802527A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2718254A DE2718254C3 (de) 1977-04-25 1977-04-25 Strahlungsempfindliche Kopiermasse

Publications (1)

Publication Number Publication Date
BR7802527A true BR7802527A (pt) 1978-12-12

Family

ID=6007159

Family Applications (1)

Application Number Title Priority Date Filing Date
BR7802527A BR7802527A (pt) 1977-04-25 1978-04-24 Massa copiadora sensivel a radiacao e processo para a producao de imagens em relevo

Country Status (16)

Country Link
US (1) US4247611A (pt)
JP (1) JPS53133429A (pt)
AU (1) AU525946B2 (pt)
BE (1) BE866305A (pt)
BR (1) BR7802527A (pt)
CA (1) CA1128804A (pt)
CH (1) CH635448A5 (pt)
DE (1) DE2718254C3 (pt)
DK (1) DK176778A (pt)
FR (1) FR2389155A1 (pt)
GB (1) GB1602902A (pt)
IE (1) IE46621B1 (pt)
IT (1) IT1102623B (pt)
NL (1) NL7804303A (pt)
SE (1) SE444232B (pt)
ZA (1) ZA782331B (pt)

Families Citing this family (112)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2829511A1 (de) * 1978-07-05 1980-01-24 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
DE2928636A1 (de) * 1979-07-16 1981-02-12 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
US4356252A (en) * 1979-12-26 1982-10-26 E. I. Du Pont De Nemours And Company Photosensitive negative-working tonable element
US4294909A (en) 1979-12-26 1981-10-13 E. I. Du Pont De Nemours And Company Photosensitive negative-working toning process
DE3023201A1 (de) * 1980-06-21 1982-01-07 Hoechst Ag, 6000 Frankfurt Positiv arbeitendes strahlungsempfindliches gemisch
DE3038605A1 (de) * 1980-10-13 1982-06-03 Hoechst Ag, 6000 Frankfurt Verfahren zur herstellung von reliefkopien
DE3039926A1 (de) * 1980-10-23 1982-05-27 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
US4365019A (en) * 1981-08-06 1982-12-21 Eastman Kodak Company Positive-working resist quinone diazide containing composition and imaging method having improved development rates
US4366224A (en) * 1981-08-06 1982-12-28 American Hoechst Corporation Inorganic lithium developer composition
DE3144499A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3144480A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
JPS58219547A (ja) * 1982-06-16 1983-12-21 Hitachi Ltd ポジ形放射線感応性有機高分子材料
JPS58219736A (ja) * 1982-06-16 1983-12-21 Hitachi Ltd パターン形成方法
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
DE3236560A1 (de) 1982-10-02 1984-04-05 Hoechst Ag, 6230 Frankfurt Lichtempfindliches schichtuebertragungsmaterial und verfahren zur herstellung einer photoresistschablone
DE3323343A1 (de) * 1983-06-29 1985-01-10 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
JPS6010250A (ja) * 1983-06-30 1985-01-19 Fujitsu Ltd パタ−ン形成方法
GB8333901D0 (en) * 1983-12-20 1984-02-01 Minnesota Mining & Mfg Radiationsensitive compositions
US4564575A (en) * 1984-01-30 1986-01-14 International Business Machines Corporation Tailoring of novolak and diazoquinone positive resists by acylation of novolak
DE3406927A1 (de) * 1984-02-25 1985-08-29 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen
GB8413395D0 (en) * 1984-05-25 1984-07-04 Ciba Geigy Ag Production of images
DE3582697D1 (de) * 1984-06-07 1991-06-06 Hoechst Ag Positiv arbeitende strahlungsempfindliche beschichtungsloesung.
US4708925A (en) * 1984-12-11 1987-11-24 Minnesota Mining And Manufacturing Company Photosolubilizable compositions containing novolac phenolic resin
DE3445276A1 (de) * 1984-12-12 1986-06-19 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform
US4634659A (en) * 1984-12-19 1987-01-06 Lehigh University Processing-free planographic printing plate
US4737426A (en) * 1985-05-15 1988-04-12 Ciba-Geigy Corporation Cyclic acetals or ketals of beta-keto esters or amides
US4663269A (en) * 1985-08-07 1987-05-05 Polytechnic Institute Of New York Method of forming highly sensitive photoresist film in the absence of water
JPS62124557A (ja) * 1985-11-25 1987-06-05 Konishiroku Photo Ind Co Ltd 感光性組成物及び感光性平版印刷版材料
CA1308596C (en) * 1986-01-13 1992-10-13 Rohm And Haas Company Microplastic structures and method of manufacture
CA1307695C (en) * 1986-01-13 1992-09-22 Wayne Edmund Feely Photosensitive compounds and thermally stable and aqueous developablenegative images
US4897336A (en) * 1986-04-11 1990-01-30 Chien James C W Self-developing radiation sensitive resist with amorphous polymer having haloalkyl substitution derived from cycic ether
DE3621376A1 (de) * 1986-06-26 1988-01-07 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial
DE3628720A1 (de) * 1986-08-23 1988-02-25 Hoechst Ag Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck
DE3635303A1 (de) 1986-10-17 1988-04-28 Hoechst Ag Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten
JPH0654382B2 (ja) * 1986-11-18 1994-07-20 富士写真フイルム株式会社 感光性組成物
JPS63265242A (ja) * 1987-04-23 1988-11-01 Fuji Photo Film Co Ltd 多色画像形成方法
DE3725741A1 (de) * 1987-08-04 1989-02-16 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch
DE3725949A1 (de) * 1987-08-05 1989-02-16 Hoechst Ag Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von negativen reliefkopien
DE3730783A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3821585A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung
DE3730787A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3730785A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3737734A1 (de) * 1987-11-06 1989-05-18 Hoechst Ag Strahlungsempfindliches gemisch
JP2623309B2 (ja) * 1988-02-22 1997-06-25 ユーシービー ソシエテ アノニム レジストパターンを得る方法
DE3810631A1 (de) * 1988-03-29 1989-10-12 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial mit hohem waermestand
DE58900825D1 (de) * 1988-06-13 1992-03-26 Ciba Geigy Ag Ungesaettigte beta-ketoesteracetale und ihre anwendungen.
DE3820699A1 (de) * 1988-06-18 1989-12-21 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3821584A1 (de) * 1988-06-25 1989-12-28 Hoechst Ag Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichungsmaterial fuer hochenergetische strahlung
DE3827901A1 (de) * 1988-08-17 1990-02-22 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3907953A1 (de) * 1989-03-11 1990-09-13 Hoechst Ag Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung
DE3907954A1 (de) * 1989-03-11 1990-09-13 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
DE3930086A1 (de) * 1989-09-09 1991-03-21 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3940965A1 (de) * 1989-12-12 1991-06-13 Basf Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefstrukturen
DE4002397A1 (de) * 1990-01-27 1991-08-01 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4003025A1 (de) * 1990-02-02 1991-08-08 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
JPH0480758A (ja) * 1990-07-23 1992-03-13 Fuji Photo Film Co Ltd 感光性組成物
EP0502819A1 (de) * 1991-03-01 1992-09-09 Ciba-Geigy Ag Säurekatalytisch vernetzbare Copolymere
EP0501919A1 (de) * 1991-03-01 1992-09-02 Ciba-Geigy Ag Strahlungsempfindliche Zusammensetzungen auf der Basis von Polyphenolen und Acetalen
DE4112970A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Saeurespaltbare strahlungsempfindliche verbindungen, diese enthaltendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4112968A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Saeurespaltbare verbindungen, diese enthaltendes positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4112969A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Saeurespaltbare strahlungsempflindliche verbindungen, diese enthaltendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US5364738A (en) * 1991-10-07 1994-11-15 Fuji Photo Film Co., Ltd. Light-sensitive composition
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
US5339737B1 (en) * 1992-07-20 1997-06-10 Presstek Inc Lithographic printing plates for use with laser-discharge imaging apparatus
US5379698A (en) * 1992-07-20 1995-01-10 Presstek, Inc. Lithographic printing members for use with laser-discharge imaging
USRE35512F1 (en) * 1992-07-20 1998-08-04 Presstek Inc Lithographic printing members for use with laser-discharge imaging
US5353705A (en) * 1992-07-20 1994-10-11 Presstek, Inc. Lithographic printing members having secondary ablation layers for use with laser-discharge imaging apparatus
AU674518B2 (en) * 1992-07-20 1997-01-02 Presstek, Inc. Lithographic printing plates for use with laser-discharge imaging apparatus
US5351617A (en) * 1992-07-20 1994-10-04 Presstek, Inc. Method for laser-discharge imaging a printing plate
DE4242051A1 (de) * 1992-12-14 1994-06-16 Hoechst Ag N,N-Disubstituierte Sulfonamide und damit hergestelltes strahlungsempfindliches Gemisch
DE4242050A1 (de) * 1992-12-14 1994-06-16 Hoechst Ag Polymere mit N,N-disubstituierten Sulfonamid-Seitengruppen und deren Verwendung
JPH06230574A (ja) * 1993-02-05 1994-08-19 Fuji Photo Film Co Ltd ポジ型感光性組成物
US5372915A (en) * 1993-05-19 1994-12-13 Eastman Kodak Company Method of making a lithographic printing plate containing a resole resin and a novolac resin in the radiation sensitive layer
JPH07140666A (ja) * 1993-06-04 1995-06-02 Internatl Business Mach Corp <Ibm> マイクロリトグラフィックレジスト組成物、酸不安定化合物、マイクロリトグラフィックレリーフ画像形成方法及び酸感知性ポリマー組成物
GB9326150D0 (en) * 1993-12-22 1994-02-23 Alcan Int Ltd Electrochemical roughening method
DE4414896A1 (de) * 1994-04-28 1995-11-02 Hoechst Ag Positiv arbeitendes strahlungempfindliches Gemisch
DE4414897A1 (de) * 1994-04-28 1995-11-02 Hoechst Ag Aromatische Diazoniumsalze und deren Verwendung in strahlungsempfindlichen Gemischen
US5466557A (en) * 1994-08-29 1995-11-14 Eastman Kodak Company Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates
JPH0876380A (ja) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd ポジ型印刷版組成物
DE4444669A1 (de) * 1994-12-15 1996-06-20 Hoechst Ag Strahlungsempfindliches Gemisch
JPH0954437A (ja) 1995-06-05 1997-02-25 Fuji Photo Film Co Ltd 化学増幅型ポジレジスト組成物
JP3506817B2 (ja) * 1995-07-26 2004-03-15 クラリアント インターナショナル リミテッド 放射線感応性組成物
TW466256B (en) 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
JP3591672B2 (ja) 1996-02-05 2004-11-24 富士写真フイルム株式会社 ポジ型感光性組成物
US6060222A (en) * 1996-11-19 2000-05-09 Kodak Polcyhrome Graphics Llc 1Postitve-working imaging composition and element and method of forming positive image with a laser
JP3858374B2 (ja) * 1997-09-18 2006-12-13 コニカミノルタホールディングス株式会社 感光性組成物及び画像形成材料
US6174646B1 (en) * 1997-10-21 2001-01-16 Konica Corporation Image forming method
GB2335283B (en) 1998-03-13 2002-05-08 Horsell Graphic Ind Ltd Improvements in relation to pattern-forming methods
EP1031878A1 (en) 1999-02-23 2000-08-30 Shipley Company LLC Novel polymers and photoresist compositions comprising same
JP3969909B2 (ja) 1999-09-27 2007-09-05 富士フイルム株式会社 ポジ型フォトレジスト組成物
JP3963624B2 (ja) 1999-12-22 2007-08-22 富士フイルム株式会社 遠紫外線露光用ポジ型フォトレジスト組成物
AUPQ700100A0 (en) * 2000-04-18 2000-05-11 Orbital Engine Company (Australia) Proprietary Limited Engine speed control for internal combustion engines
EP1235104A4 (en) * 2000-08-29 2008-10-01 Jsr Corp COMPOSITION HAVING SUBSTANTIALLY MODIFIABLE REFRACTION INDEX AND METHOD FOR FORMING REFRACTION INDEX PATTERN
EP1350814A4 (en) * 2000-12-11 2007-09-19 Jsr Corp RADIATION SENSITIVE COMPOSITION, VARIABLE REFRACTION INDEX AND METHOD OF ALTERING REFRACTIVE INDEX
RU2281310C2 (ru) 2001-02-19 2006-08-10 Джей Эс Эр КОРПОРЕЙШН Чувствительная к облучению композиция, изменяющая показатель преломления
US7125647B2 (en) 2001-03-13 2006-10-24 Jsr Corporation Radiation-sensitive composition changing in refractive index and utilization thereof
JP2003043682A (ja) * 2001-08-01 2003-02-13 Jsr Corp 感放射線性誘電率変化性組成物、誘電率変化法
US7838619B2 (en) * 2002-01-14 2010-11-23 The General Hospital Corporation Biodegradable polyketal polymers and methods for their formation and use
EP1562077B1 (en) * 2002-10-23 2018-01-17 Merck Patent GmbH Chemically amplified positive photosensitive resin composition
JP4163964B2 (ja) * 2003-01-07 2008-10-08 岡本化学工業株式会社 画像形成組成物およびそれを用いた感光性平版印刷版
JP4440600B2 (ja) * 2003-10-31 2010-03-24 Ａｚエレクトロニックマテリアルズ株式会社 厚膜および超厚膜対応化学増幅型感光性樹脂組成物
JP4396443B2 (ja) 2004-08-18 2010-01-13 コニカミノルタエムジー株式会社 感光性平版印刷版の製造方法及び使用方法
US20070172758A1 (en) * 2006-01-20 2007-07-26 Konica Minolta Medical & Graphic, Inc. Planographic printing plate material and its manufacturing process
JP2010113142A (ja) * 2008-11-06 2010-05-20 Sekisui Chem Co Ltd ポジ型感光性組成物及び導電パターンの形成方法
JP5419208B2 (ja) * 2009-05-11 2014-02-19 株式会社ダイセル 交互共重合体とその製造方法
US8846981B2 (en) 2012-01-30 2014-09-30 Southern Lithoplate, Inc. 1,1-di[(alkylphenoxy)ethoxy]cyclohexanes
US8632943B2 (en) 2012-01-30 2014-01-21 Southern Lithoplate, Inc. Near-infrared sensitive, positive-working, image forming composition and photographic element containing a 1,1-di[(alkylphenoxy)ethoxy]cyclohexane
US9063420B2 (en) * 2013-07-16 2015-06-23 Rohm And Haas Electronic Materials Llc Photoresist composition, coated substrate, and method of forming electronic device

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2892712A (en) * 1954-04-23 1959-06-30 Du Pont Process for preparing relief images
GB1180845A (en) * 1967-08-08 1970-02-11 Agfa Gevaert Nv Light-Sensitive Polymers and their use in the preparation of Photographic Printing Plates
US3753718A (en) * 1972-02-04 1973-08-21 Scott Paper Co Photosensitive medium comprising a cyclic acetal of furfural, a lower haloalkane, and silica
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US4007209A (en) * 1972-07-01 1977-02-08 Badische Anilin- & Soda-Fabrik Aktiengesellschaft Acetals which act as photoinitiators
DE2232365C2 (de) * 1972-07-01 1982-06-09 Basf Ag, 6700 Ludwigshafen Durch UV-Bestrahlung polymerisierbare Gemische
US3915704A (en) * 1973-11-01 1975-10-28 Xerox Corp Photoinduced, acid catalyzed degradation of degradable polymers
US3964907A (en) * 1973-11-12 1976-06-22 Xerox Corporation Method for the preparation of relief printing masters
US3984253A (en) * 1974-04-22 1976-10-05 Eastman Kodak Company Imaging processes and elements therefor
US3923514A (en) * 1974-06-27 1975-12-02 Xerox Corp Method for the preparation of relief printing masters
US3963491A (en) * 1974-06-27 1976-06-15 Xerox Corporation Imaging method
US3991033A (en) * 1975-01-30 1976-11-09 E. I. Du Pont De Nemours & Company Photosensitive and degradable polyoxymethylene polymers and their application in imaging
CH621416A5 (pt) * 1975-03-27 1981-01-30 Hoechst Ag
US4086210A (en) * 1976-05-10 1978-04-25 Eastman Kodak Company Radiation sensitive polymeric o-nitrophenyl acetals
US4108839A (en) * 1977-01-21 1978-08-22 E. I. Du Pont De Nemours And Company Photosensitive polyaldehydes and use in photoimaging

Also Published As

Publication number Publication date
JPS6239420B2 (pt) 1987-08-22
BE866305A (fr) 1978-10-24
DE2718254A1 (de) 1978-11-02
ZA782331B (en) 1979-04-25
DE2718254C3 (de) 1980-04-10
IE780787L (en) 1978-10-25
IT1102623B (it) 1985-10-07
NL7804303A (nl) 1978-10-27
SE444232B (sv) 1986-03-24
AU3535678A (en) 1979-10-25
US4247611A (en) 1981-01-27
CA1128804A (en) 1982-08-03
AU525946B2 (en) 1982-12-09
SE7804587L (sv) 1978-10-26
JPS53133429A (en) 1978-11-21
FR2389155B1 (pt) 1982-02-26
DE2718254B2 (de) 1979-08-02
DK176778A (da) 1978-10-26
CH635448A5 (de) 1983-03-31
GB1602902A (en) 1981-11-18
IT7849011A0 (it) 1978-04-21
FR2389155A1 (fr) 1978-11-24
IE46621B1 (en) 1983-08-10

Similar Documents

Publication Publication Date Title
BR7802527A (pt) Massa copiadora sensivel a radiacao e processo para a producao de imagens em relevo
BR7803299A (pt) Processo para a manufatura de tetrafluoretano
HK42488A (en) Electrophotographic photosensitive member and process for production thereof
BR7803708A (pt) Processo e dispositivo para a fabricacao de clinquer de cimento
BR7808435A (pt) Processo para a formacao de nitrodiarilamina
BR8006818A (pt) Processo e conjunto para a representacao de uma imagem de semitons
BR7808444A (pt) Processo para a formacao de nitrodiarilamina
BR7800912A (pt) Processo para cloracao em massa de polietileno solido finamente dividido e polietileno clorado obtido pelo processo
BR7705010A (pt) Processo para formar um tonalizador;tonalizador obtido;revelador;e processo eletrostatografico de formacao de image
BR7708336A (pt) Processo para a producao do hipoclorito de magnesio bibasico
BR7701117A (pt) Sistema produtor de imagem e processo para a producao de uma imagem colorida
BR7806690A (pt) Processo para a preparacao de para-alquilfenois
BR8004033A (pt) Material de copias fotopolimerizavel e processo para a producao de imagens em relevo
BR7805685A (pt) Processo para a preparacao de p-benzoquinonodicetais
BR7804351A (pt) Processo e dispositivo para a fabricacao de chapas
BR7805873A (pt) Processo para a preparacao de tetrahidrofurano-2-onas halogeneo-vinil-substituidas
BR7805962A (pt) Membro de formacao de imagem e processo de formacao de imagem
BR7800185A (pt) Processo para producao de tiazolino-2-tionas e tiazolino-2-tionas
BR8004735A (pt) Processo e dispositivo para a producao de cloreto de cianogenio puro
GB2102028B (en) Electrophotographic photosensitive member and process for production thereof
BR7803540A (pt) Aperfeicoamento em processo para a producao de acosilicio eletro-magnetico
BR7801200A (pt) Processo para a producao de compostos organicos e sua aplicacao
BR7703347A (pt) Processo para a preparacao de granulados aparelhagem e granulados
BR7802613A (pt) Processo para a preparacao de antranilamidas
BR7801832A (pt) Processo para a preparacao de 2-hidroxibenzotiazol