FR2364495A1 - Masques de projection d'images electroniques - Google Patents
Masques de projection d'images electroniquesInfo
- Publication number
- FR2364495A1 FR2364495A1 FR7727345A FR7727345A FR2364495A1 FR 2364495 A1 FR2364495 A1 FR 2364495A1 FR 7727345 A FR7727345 A FR 7727345A FR 7727345 A FR7727345 A FR 7727345A FR 2364495 A1 FR2364495 A1 FR 2364495A1
- Authority
- FR
- France
- Prior art keywords
- mask
- image projection
- electronic image
- mask pattern
- apertures
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electron Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Masques de projection d'images électroniques convenant pour la fabrication des circuits intégrés et circuits à bulles magnétiques consistant en un masque optique classique portant de plus un revêtement transparent recouvrant le motif de masque et les régions du substrat exposées à travers les ouvertures du motif de masque. Ce revêtement transparent porte une image métallique dont le motif correspond aux ouvertures du motif de masque, la densité optique de l'image étant de nature à faire baisser la transmission lumineuse moyenne par les ouvertures du masque jusqu'à une valeur de 25 à 80 % de la transmission lumineuse moyenne par ces ouvertures en l'absence d'image métallique. Un tel masque permet d'engendrer le faisceau d'électrons voulu à l'aide d'une seule exposition à la lumière. Application : fabrication de circuits intégrés.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB37390/76A GB1557064A (en) | 1976-09-09 | 1976-09-09 | Masks suitable for use in electron image projectors |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2364495A1 true FR2364495A1 (fr) | 1978-04-07 |
FR2364495B1 FR2364495B1 (fr) | 1981-06-26 |
Family
ID=10396109
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7727345A Granted FR2364495A1 (fr) | 1976-09-09 | 1977-09-09 | Masques de projection d'images electroniques |
Country Status (5)
Country | Link |
---|---|
US (1) | US4137458A (fr) |
JP (1) | JPS5816612B2 (fr) |
DE (1) | DE2740180C2 (fr) |
FR (1) | FR2364495A1 (fr) |
GB (1) | GB1557064A (fr) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4231811A (en) * | 1979-09-13 | 1980-11-04 | Intel Corporation | Variable thickness self-aligned photoresist process |
GB2066487B (en) * | 1979-12-18 | 1983-11-23 | Philips Electronic Associated | Alignment of exposure masks |
JPS6057217B2 (ja) * | 1980-11-18 | 1985-12-13 | セイコーエプソン株式会社 | X線露光用マスク |
JPS5789221A (en) * | 1980-11-25 | 1982-06-03 | Seiko Epson Corp | Multiple mask |
DE3235064A1 (de) * | 1982-09-22 | 1984-03-22 | Siemens AG, 1000 Berlin und 8000 München | Tunnelkathodenmaske fuer die elektronenlithografie, verfahren zu ihrer herstellung und verfahren zu ihrem betrieb |
KR910000756B1 (en) * | 1984-11-20 | 1991-02-06 | Fujitsu Ltd | Method for projection photoelectron image |
GB2180669A (en) * | 1985-09-20 | 1987-04-01 | Phillips Electronic And Associ | An electron emissive mask for an electron beam image projector, its manufacture, and the manufacture of a solid state device using such a mask |
JPH01158731A (ja) * | 1987-12-15 | 1989-06-21 | Fujitsu Ltd | 光電子転写露光方法およびこれに用いられるマスク |
JP2513404Y2 (ja) * | 1988-09-13 | 1996-10-09 | 株式会社フジクラ | 光ファイバカプラのケ―スの取付構造 |
US6476401B1 (en) | 1999-09-16 | 2002-11-05 | Applied Materials, Inc. | Moving photocathode with continuous regeneration for image conversion in electron beam lithography |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1911497A1 (de) * | 1968-03-14 | 1969-11-06 | Ilford Ltd | Zusammengesetzte vorsensibilisierte lithographische Platte und Verfahren zur Herstellung einer Druckplatte |
FR2212445A1 (fr) * | 1972-12-29 | 1974-07-26 | Rca Corp | |
FR2280924A1 (fr) * | 1974-08-02 | 1976-02-27 | Silec Semi Conducteurs | Procede de protection de masques de photogravure et masques obtenus |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3519873A (en) * | 1968-12-18 | 1970-07-07 | Westinghouse Electric Corp | Multiple beam electron source for pattern generation |
US3679497A (en) * | 1969-10-24 | 1972-07-25 | Westinghouse Electric Corp | Electron beam fabrication system and process for use thereof |
GB1328803A (en) * | 1969-12-17 | 1973-09-05 | Mullard Ltd | Methods of manufacturing semiconductor devices |
US3710101A (en) * | 1970-10-06 | 1973-01-09 | Westinghouse Electric Corp | Apparatus and method for alignment of members to electron beams |
US3832561A (en) * | 1973-10-01 | 1974-08-27 | Westinghouse Electric Corp | Method and apparatus for electron beam alignment with a substrate by schottky barrier contacts |
US3895234A (en) * | 1973-06-15 | 1975-07-15 | Westinghouse Electric Corp | Method and apparatus for electron beam alignment with a member |
US4008402A (en) * | 1974-07-18 | 1977-02-15 | Westinghouse Electric Corporation | Method and apparatus for electron beam alignment with a member by detecting X-rays |
-
1976
- 1976-09-09 GB GB37390/76A patent/GB1557064A/en not_active Expired
-
1977
- 1977-09-07 DE DE2740180A patent/DE2740180C2/de not_active Expired
- 1977-09-08 JP JP52107183A patent/JPS5816612B2/ja not_active Expired
- 1977-09-09 FR FR7727345A patent/FR2364495A1/fr active Granted
- 1977-09-12 US US05/832,180 patent/US4137458A/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1911497A1 (de) * | 1968-03-14 | 1969-11-06 | Ilford Ltd | Zusammengesetzte vorsensibilisierte lithographische Platte und Verfahren zur Herstellung einer Druckplatte |
FR2212445A1 (fr) * | 1972-12-29 | 1974-07-26 | Rca Corp | |
FR2280924A1 (fr) * | 1974-08-02 | 1976-02-27 | Silec Semi Conducteurs | Procede de protection de masques de photogravure et masques obtenus |
Also Published As
Publication number | Publication date |
---|---|
FR2364495B1 (fr) | 1981-06-26 |
JPS5816612B2 (ja) | 1983-04-01 |
JPS5355985A (en) | 1978-05-20 |
DE2740180A1 (de) | 1978-03-16 |
DE2740180C2 (de) | 1984-07-12 |
US4137458A (en) | 1979-01-30 |
GB1557064A (en) | 1979-12-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |